JP7678896B2 - 基板検査方法、基板検査プログラム、及び基板検査装置 - Google Patents

基板検査方法、基板検査プログラム、及び基板検査装置 Download PDF

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JP7678896B2
JP7678896B2 JP2023566251A JP2023566251A JP7678896B2 JP 7678896 B2 JP7678896 B2 JP 7678896B2 JP 2023566251 A JP2023566251 A JP 2023566251A JP 2023566251 A JP2023566251 A JP 2023566251A JP 7678896 B2 JP7678896 B2 JP 7678896B2
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達弥 徳丸
直 西山
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Tokyo Electron Ltd
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    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/12—Circuits of general importance; Signal processing
    • G01N2201/129—Using chemometrical methods
    • G01N2201/1296—Using chemometrical methods using neural networks
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20072—Graph-based image processing
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20081—Training; Learning
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/20—Special algorithmic details
    • G06T2207/20084—Artificial neural networks [ANN]
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Signal Processing (AREA)
  • Image Analysis (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Image Processing (AREA)
JP2023566251A 2021-12-10 2022-11-28 基板検査方法、基板検査プログラム、及び基板検査装置 Active JP7678896B2 (ja)

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JP2025076763A JP2025105959A (ja) 2021-12-10 2025-05-02 基板検査方法、基板検査プログラム、及び基板検査装置

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JP2021200806 2021-12-10
JP2021200806 2021-12-10
PCT/JP2022/043802 WO2023106157A1 (ja) 2021-12-10 2022-11-28 基板検査方法、基板検査プログラム、及び基板検査装置

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US (1) US20250037267A1 (https=)
JP (2) JP7678896B2 (https=)
KR (1) KR20240117592A (https=)
CN (1) CN118355266A (https=)
TW (1) TW202338746A (https=)
WO (1) WO2023106157A1 (https=)

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WO2021024624A1 (ja) 2019-08-08 2021-02-11 三菱瓦斯化学株式会社 難燃性ポリイミド成形材料及び成形体

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019131742A1 (ja) 2017-12-27 2019-07-04 株式会社 Ｐｒｅｆｅｒｒｅｄ Ｎｅｔｗｏｒｋｓ 検査処理装置、検査処理方法、およびプログラム
JP2019124591A (ja) 2018-01-17 2019-07-25 東京エレクトロン株式会社 基板の欠陥検査装置、基板の欠陥検査方法及び記憶媒体
WO2020246366A1 (ja) 2019-06-06 2020-12-10 東京エレクトロン株式会社 基板検査装置、基板検査システム及び基板検査方法
JP2021140739A (ja) 2020-02-28 2021-09-16 株式会社Pros Cons プログラム、学習済みモデルの生成方法、情報処理方法及び情報処理装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019131742A1 (ja) 2017-12-27 2019-07-04 株式会社 Ｐｒｅｆｅｒｒｅｄ Ｎｅｔｗｏｒｋｓ 検査処理装置、検査処理方法、およびプログラム
JP2019124591A (ja) 2018-01-17 2019-07-25 東京エレクトロン株式会社 基板の欠陥検査装置、基板の欠陥検査方法及び記憶媒体
WO2020246366A1 (ja) 2019-06-06 2020-12-10 東京エレクトロン株式会社 基板検査装置、基板検査システム及び基板検査方法
JP2021140739A (ja) 2020-02-28 2021-09-16 株式会社Pros Cons プログラム、学習済みモデルの生成方法、情報処理方法及び情報処理装置

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JP2025105959A (ja) 2025-07-10
WO2023106157A1 (ja) 2023-06-15
CN118355266A (zh) 2024-07-16
TW202338746A (zh) 2023-10-01
KR20240117592A (ko) 2024-08-01
US20250037267A1 (en) 2025-01-30
JPWO2023106157A1 (https=) 2023-06-15

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