JP7673258B2 - ペリクル、露光原版、及び露光装置、並びにペリクルの作製方法、及びマスク用粘着剤層の試験方法 - Google Patents

ペリクル、露光原版、及び露光装置、並びにペリクルの作製方法、及びマスク用粘着剤層の試験方法 Download PDF

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Publication number
JP7673258B2
JP7673258B2 JP2023578524A JP2023578524A JP7673258B2 JP 7673258 B2 JP7673258 B2 JP 7673258B2 JP 2023578524 A JP2023578524 A JP 2023578524A JP 2023578524 A JP2023578524 A JP 2023578524A JP 7673258 B2 JP7673258 B2 JP 7673258B2
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Japan
Prior art keywords
adhesive layer
pellicle
mask
meth
photomask
Prior art date
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JP2023578524A
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English (en)
Japanese (ja)
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JPWO2023149343A1 (enrdf_load_stackoverflow
Inventor
裕 吉村
恵一 柿原
亮 田中
裕司 丸山
昌嗣 東
理計 山内
友和 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
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Mitsui Chemicals Inc
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02—Non-macromolecular additives
    • C09J11/06—Non-macromolecular additives organic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/062—Copolymers with monomers not covered by C09J133/06
    • C09J133/066—Copolymers with monomers not covered by C09J133/06 containing -OH groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2023578524A 2022-02-04 2023-01-26 ペリクル、露光原版、及び露光装置、並びにペリクルの作製方法、及びマスク用粘着剤層の試験方法 Active JP7673258B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022016697 2022-02-04
JP2022016697 2022-02-04
PCT/JP2023/002458 WO2023149343A1 (ja) 2022-02-04 2023-01-26 ペリクル、露光原版、及び露光装置、並びにペリクルの作製方法、及びマスク用粘着剤層の試験方法

Publications (2)

Publication Number Publication Date
JPWO2023149343A1 JPWO2023149343A1 (enrdf_load_stackoverflow) 2023-08-10
JP7673258B2 true JP7673258B2 (ja) 2025-05-08

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JP2023578524A Active JP7673258B2 (ja) 2022-02-04 2023-01-26 ペリクル、露光原版、及び露光装置、並びにペリクルの作製方法、及びマスク用粘着剤層の試験方法

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Country Link
US (1) US20250093767A1 (enrdf_load_stackoverflow)
JP (1) JP7673258B2 (enrdf_load_stackoverflow)
KR (1) KR20240132343A (enrdf_load_stackoverflow)
CN (1) CN118661134A (enrdf_load_stackoverflow)
TW (1) TWI870772B (enrdf_load_stackoverflow)
WO (1) WO2023149343A1 (enrdf_load_stackoverflow)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007156397A (ja) 2005-05-09 2007-06-21 Mitsui Chemicals Inc 汚染の少ないペリクル及びその製造方法
JP2016167070A (ja) 2009-11-18 2016-09-15 旭化成株式会社 ペリクル
JP2020160466A (ja) 2020-06-12 2020-10-01 旭化成株式会社 ペリクル
JP2020194182A (ja) 2019-04-16 2020-12-03 信越化学工業株式会社 ペリクル、ペリクル付露光原版、半導体装置の製造方法、液晶表示板の製造方法、露光原版の再生方法及び剥離残渣低減方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010210974A (ja) * 2009-03-11 2010-09-24 Shin-Etsu Chemical Co Ltd ペリクルの製造方法及びペリクル
JP2017090719A (ja) 2015-11-11 2017-05-25 旭化成株式会社 ペリクル
US20210185793A1 (en) * 2019-12-13 2021-06-17 Applied Materials, Inc. Adhesive material removal from photomask in ultraviolet lithography application

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007156397A (ja) 2005-05-09 2007-06-21 Mitsui Chemicals Inc 汚染の少ないペリクル及びその製造方法
JP2016167070A (ja) 2009-11-18 2016-09-15 旭化成株式会社 ペリクル
JP2020194182A (ja) 2019-04-16 2020-12-03 信越化学工業株式会社 ペリクル、ペリクル付露光原版、半導体装置の製造方法、液晶表示板の製造方法、露光原版の再生方法及び剥離残渣低減方法
JP2020160466A (ja) 2020-06-12 2020-10-01 旭化成株式会社 ペリクル

Also Published As

Publication number Publication date
JPWO2023149343A1 (enrdf_load_stackoverflow) 2023-08-10
US20250093767A1 (en) 2025-03-20
TWI870772B (zh) 2025-01-21
KR20240132343A (ko) 2024-09-03
CN118661134A (zh) 2024-09-17
TW202340853A (zh) 2023-10-16
WO2023149343A1 (ja) 2023-08-10

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