JP7665444B2 - 光硬化性樹脂組成物 - Google Patents

光硬化性樹脂組成物 Download PDF

Info

Publication number
JP7665444B2
JP7665444B2 JP2021107654A JP2021107654A JP7665444B2 JP 7665444 B2 JP7665444 B2 JP 7665444B2 JP 2021107654 A JP2021107654 A JP 2021107654A JP 2021107654 A JP2021107654 A JP 2021107654A JP 7665444 B2 JP7665444 B2 JP 7665444B2
Authority
JP
Japan
Prior art keywords
component
resin composition
groups
photocurable resin
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2021107654A
Other languages
English (en)
Japanese (ja)
Other versions
JP2022027496A (ja
JP2022027496A5 (https=
Inventor
江美 大石
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to US17/387,853 priority Critical patent/US11667741B2/en
Publication of JP2022027496A publication Critical patent/JP2022027496A/ja
Publication of JP2022027496A5 publication Critical patent/JP2022027496A5/ja
Application granted granted Critical
Publication of JP7665444B2 publication Critical patent/JP7665444B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
JP2021107654A 2020-07-31 2021-06-29 光硬化性樹脂組成物 Active JP7665444B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US17/387,853 US11667741B2 (en) 2020-07-31 2021-07-28 Photocurable resin composition

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020130784 2020-07-31
JP2020130784 2020-07-31

Publications (3)

Publication Number Publication Date
JP2022027496A JP2022027496A (ja) 2022-02-10
JP2022027496A5 JP2022027496A5 (https=) 2024-07-03
JP7665444B2 true JP7665444B2 (ja) 2025-04-21

Family

ID=80264081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021107654A Active JP7665444B2 (ja) 2020-07-31 2021-06-29 光硬化性樹脂組成物

Country Status (1)

Country Link
JP (1) JP7665444B2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7828824B2 (ja) * 2022-04-28 2026-03-12 株式会社ミマキエンジニアリング 三次元造形物の製造方法
WO2026014140A1 (ja) * 2024-07-09 2026-01-15 富士フイルム株式会社 自己形成光導波路用組成物、自己形成光導波路、自己形成光導波路の製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013014718A (ja) 2011-07-06 2013-01-24 Nippon Shokubai Co Ltd 光学用紫外線硬化型樹脂組成物、硬化物及び表示装置
WO2016143559A1 (ja) 2015-03-10 2016-09-15 コニカミノルタ株式会社 立体造形用インク組成物、インクセットおよび立体造形物の製造方法
JP2019065214A (ja) 2017-10-03 2019-04-25 ゼネラル株式会社 光硬化性クリアインク

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013014718A (ja) 2011-07-06 2013-01-24 Nippon Shokubai Co Ltd 光学用紫外線硬化型樹脂組成物、硬化物及び表示装置
WO2016143559A1 (ja) 2015-03-10 2016-09-15 コニカミノルタ株式会社 立体造形用インク組成物、インクセットおよび立体造形物の製造方法
JP2019065214A (ja) 2017-10-03 2019-04-25 ゼネラル株式会社 光硬化性クリアインク

Also Published As

Publication number Publication date
JP2022027496A (ja) 2022-02-10

Similar Documents

Publication Publication Date Title
JP5846974B2 (ja) 光インプリント用硬化性組成物、パターン形成方法およびパターン
JP5767615B2 (ja) インプリント用下層膜組成物およびこれを用いたパターン形成方法
CN111205394B (zh) 光固化性材料组合物及其固化物
JP6029558B2 (ja) 光インプリント用硬化性組成物、パターン形成方法、微細パターン、および半導体デバイスの製造方法
JP2014093385A (ja) インプリント用密着膜の製造方法およびパターン形成方法
JP2013202982A (ja) インプリント用下層膜組成物およびこれを用いたパターン形成方法
JP7665444B2 (ja) 光硬化性樹脂組成物
WO2014050855A1 (ja) 光インプリント用硬化性組成物、パターン形成方法、微細パターンおよび半導体デバイスの製造方法
JPWO2017141935A1 (ja) 光学的立体造形用組成物
JP7577475B2 (ja) 光硬化性樹脂組成物
JP6399084B2 (ja) ３ｄ造形用光硬化性組成物および３ｄ造形物の製造方法
US20250257221A1 (en) Photocurable resin composition
US11667741B2 (en) Photocurable resin composition
JP2009138017A (ja) 光造形用光硬化性組成物、炭化造形物、及びその製造方法
JP6009907B2 (ja) インプリント用硬化性組成物、パターン形成方法およびパターン
US11834539B2 (en) Photocurable material composition, cured product of photocurable material composition and manufacturing method thereof
JP2012033517A (ja) 光インプリント用硬化性組成物およびそれを用いた硬化物の製造方法
JP2016165862A (ja) 光硬化性立体造形用樹脂組成物、並びに、立体造形物及びその製造方法
JP7762010B2 (ja) 光硬化性組成物及びその硬化物
JP2017179005A (ja) 硬化性組成物、およびそれを用いる硬化物
JP2023105936A (ja) 光硬化性樹脂組成物
JP2017217767A (ja) 光硬化性吐出用樹脂組成物及びそれを用いた硬化物、印刷物
US12291648B2 (en) Energy ray-curable resin compositions and its cured products
JP2021095567A (ja) 光硬化性材料組成物並びに光硬化性材料組成物の硬化物及びその製造方法
JP6286950B2 (ja) 硬化性樹脂組成物およびそれを用いたパターン形成方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240625

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240625

TRDD Decision of grant or rejection written
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20250307

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20250311

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20250409

R150 Certificate of patent or registration of utility model

Ref document number: 7665444

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150