JP7626207B2 - 照明光学系、露光装置、照明方法、デバイス製造方法及びフラットパネルディスプレイの製造方法 - Google Patents

照明光学系、露光装置、照明方法、デバイス製造方法及びフラットパネルディスプレイの製造方法 Download PDF

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JP7626207B2
JP7626207B2 JP2023517539A JP2023517539A JP7626207B2 JP 7626207 B2 JP7626207 B2 JP 7626207B2 JP 2023517539 A JP2023517539 A JP 2023517539A JP 2023517539 A JP2023517539 A JP 2023517539A JP 7626207 B2 JP7626207 B2 JP 7626207B2
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light
pulsed light
optical system
pulsed
illumination
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Japanese (ja)
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JPWO2022230847A1 (https=
JPWO2022230847A5 (ja
Inventor
正紀 加藤
恭志 水野
聡 川戸
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/35—Optical coupling means having switching means
    • G02B6/351—Optical coupling means having switching means involving stationary waveguides with moving interposed optical elements
    • G02B6/3512—Optical coupling means having switching means involving stationary waveguides with moving interposed optical elements the optical element being reflective, e.g. mirror
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2023517539A 2021-04-27 2022-04-26 照明光学系、露光装置、照明方法、デバイス製造方法及びフラットパネルディスプレイの製造方法 Active JP7626207B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025004055A JP2025061202A (ja) 2021-04-27 2025-01-10 露光装置、及びデバイス製造方法

Applications Claiming Priority (7)

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JP2021075410 2021-04-27
JP2021075410 2021-04-27
JP2021075408 2021-04-27
JP2021075408 2021-04-27
JP2021075409 2021-04-27
JP2021075409 2021-04-27
PCT/JP2022/018810 WO2022230847A1 (ja) 2021-04-27 2022-04-26 照明光学系、露光装置及びフラットパネルディスプレイの製造方法

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JPWO2022230847A1 JPWO2022230847A1 (https=) 2022-11-03
JPWO2022230847A5 JPWO2022230847A5 (ja) 2024-02-02
JP7626207B2 true JP7626207B2 (ja) 2025-02-04

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JP2025004055A Pending JP2025061202A (ja) 2021-04-27 2025-01-10 露光装置、及びデバイス製造方法

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US (1) US20240085794A1 (https=)
JP (2) JP7626207B2 (https=)
KR (1) KR20230160327A (https=)
TW (1) TW202301035A (https=)
WO (1) WO2022230847A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202301035A (zh) * 2021-04-27 2023-01-01 日商尼康股份有限公司 照明光學系統、曝光裝置及平板顯示器之製造方法
WO2025197436A1 (ja) * 2024-03-19 2025-09-25 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002523905A (ja) 1998-08-20 2002-07-30 オルボテック リミテッド レーザ繰り返し率増倍器
JP2004157219A (ja) 2002-11-05 2004-06-03 Fuji Photo Film Co Ltd 露光ヘッドおよび露光装置
JP2006053240A (ja) 2004-08-10 2006-02-23 Noritsu Koki Co Ltd レーザー光変調装置
JP2008182115A (ja) 2007-01-25 2008-08-07 Nikon Corp 露光方法及び露光装置並びにマイクロデバイスの製造方法
JP2009300543A (ja) 2008-06-10 2009-12-24 Orc Mfg Co Ltd 露光描画装置
JP2017535821A (ja) 2014-11-27 2017-11-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 複数の個々に制御可能な書込ヘッドを含むリソグラフィ装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006171426A (ja) 2004-12-16 2006-06-29 Fuji Photo Film Co Ltd 照明光学系及びそれを用いた露光装置
US7714986B2 (en) * 2007-05-24 2010-05-11 Asml Netherlands B.V. Laser beam conditioning system comprising multiple optical paths allowing for dose control
JP5731063B2 (ja) * 2011-04-08 2015-06-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、プログラマブル・パターニングデバイス、及びリソグラフィ方法
TW202301035A (zh) * 2021-04-27 2023-01-01 日商尼康股份有限公司 照明光學系統、曝光裝置及平板顯示器之製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002523905A (ja) 1998-08-20 2002-07-30 オルボテック リミテッド レーザ繰り返し率増倍器
JP2004157219A (ja) 2002-11-05 2004-06-03 Fuji Photo Film Co Ltd 露光ヘッドおよび露光装置
JP2006053240A (ja) 2004-08-10 2006-02-23 Noritsu Koki Co Ltd レーザー光変調装置
JP2008182115A (ja) 2007-01-25 2008-08-07 Nikon Corp 露光方法及び露光装置並びにマイクロデバイスの製造方法
JP2009300543A (ja) 2008-06-10 2009-12-24 Orc Mfg Co Ltd 露光描画装置
JP2017535821A (ja) 2014-11-27 2017-11-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 複数の個々に制御可能な書込ヘッドを含むリソグラフィ装置

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Publication number Publication date
JPWO2022230847A1 (https=) 2022-11-03
KR20230160327A (ko) 2023-11-23
JP2025061202A (ja) 2025-04-10
US20240085794A1 (en) 2024-03-14
WO2022230847A1 (ja) 2022-11-03
TW202301035A (zh) 2023-01-01

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