JPWO2022230847A1 - - Google Patents

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Publication number
JPWO2022230847A1
JPWO2022230847A1 JP2023517539A JP2023517539A JPWO2022230847A1 JP WO2022230847 A1 JPWO2022230847 A1 JP WO2022230847A1 JP 2023517539 A JP2023517539 A JP 2023517539A JP 2023517539 A JP2023517539 A JP 2023517539A JP WO2022230847 A1 JPWO2022230847 A1 JP WO2022230847A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2023517539A
Other languages
Japanese (ja)
Other versions
JPWO2022230847A5 (ja
JP7626207B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed filed Critical
Publication of JPWO2022230847A1 publication Critical patent/JPWO2022230847A1/ja
Publication of JPWO2022230847A5 publication Critical patent/JPWO2022230847A5/ja
Priority to JP2025004055A priority Critical patent/JP2025061202A/ja
Application granted granted Critical
Publication of JP7626207B2 publication Critical patent/JP7626207B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/35—Optical coupling means having switching means
    • G02B6/351—Optical coupling means having switching means involving stationary waveguides with moving interposed optical elements
    • G02B6/3512—Optical coupling means having switching means involving stationary waveguides with moving interposed optical elements the optical element being reflective, e.g. mirror
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2023517539A 2021-04-27 2022-04-26 照明光学系、露光装置、照明方法、デバイス製造方法及びフラットパネルディスプレイの製造方法 Active JP7626207B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025004055A JP2025061202A (ja) 2021-04-27 2025-01-10 露光装置、及びデバイス製造方法

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2021075410 2021-04-27
JP2021075410 2021-04-27
JP2021075408 2021-04-27
JP2021075408 2021-04-27
JP2021075409 2021-04-27
JP2021075409 2021-04-27
PCT/JP2022/018810 WO2022230847A1 (ja) 2021-04-27 2022-04-26 照明光学系、露光装置及びフラットパネルディスプレイの製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025004055A Division JP2025061202A (ja) 2021-04-27 2025-01-10 露光装置、及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JPWO2022230847A1 true JPWO2022230847A1 (https=) 2022-11-03
JPWO2022230847A5 JPWO2022230847A5 (ja) 2024-02-02
JP7626207B2 JP7626207B2 (ja) 2025-02-04

Family

ID=83848146

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2023517539A Active JP7626207B2 (ja) 2021-04-27 2022-04-26 照明光学系、露光装置、照明方法、デバイス製造方法及びフラットパネルディスプレイの製造方法
JP2025004055A Pending JP2025061202A (ja) 2021-04-27 2025-01-10 露光装置、及びデバイス製造方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025004055A Pending JP2025061202A (ja) 2021-04-27 2025-01-10 露光装置、及びデバイス製造方法

Country Status (5)

Country Link
US (1) US20240085794A1 (https=)
JP (2) JP7626207B2 (https=)
KR (1) KR20230160327A (https=)
TW (1) TW202301035A (https=)
WO (1) WO2022230847A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202301035A (zh) * 2021-04-27 2023-01-01 日商尼康股份有限公司 照明光學系統、曝光裝置及平板顯示器之製造方法
WO2025197436A1 (ja) * 2024-03-19 2025-09-25 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002523905A (ja) * 1998-08-20 2002-07-30 オルボテック リミテッド レーザ繰り返し率増倍器
JP2004157219A (ja) * 2002-11-05 2004-06-03 Fuji Photo Film Co Ltd 露光ヘッドおよび露光装置
JP2006053240A (ja) * 2004-08-10 2006-02-23 Noritsu Koki Co Ltd レーザー光変調装置
JP2008182115A (ja) * 2007-01-25 2008-08-07 Nikon Corp 露光方法及び露光装置並びにマイクロデバイスの製造方法
JP2009300543A (ja) * 2008-06-10 2009-12-24 Orc Mfg Co Ltd 露光描画装置
JP2017535821A (ja) * 2014-11-27 2017-11-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 複数の個々に制御可能な書込ヘッドを含むリソグラフィ装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006171426A (ja) 2004-12-16 2006-06-29 Fuji Photo Film Co Ltd 照明光学系及びそれを用いた露光装置
US7714986B2 (en) * 2007-05-24 2010-05-11 Asml Netherlands B.V. Laser beam conditioning system comprising multiple optical paths allowing for dose control
JP5731063B2 (ja) * 2011-04-08 2015-06-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、プログラマブル・パターニングデバイス、及びリソグラフィ方法
TW202301035A (zh) * 2021-04-27 2023-01-01 日商尼康股份有限公司 照明光學系統、曝光裝置及平板顯示器之製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002523905A (ja) * 1998-08-20 2002-07-30 オルボテック リミテッド レーザ繰り返し率増倍器
JP2004157219A (ja) * 2002-11-05 2004-06-03 Fuji Photo Film Co Ltd 露光ヘッドおよび露光装置
JP2006053240A (ja) * 2004-08-10 2006-02-23 Noritsu Koki Co Ltd レーザー光変調装置
JP2008182115A (ja) * 2007-01-25 2008-08-07 Nikon Corp 露光方法及び露光装置並びにマイクロデバイスの製造方法
JP2009300543A (ja) * 2008-06-10 2009-12-24 Orc Mfg Co Ltd 露光描画装置
JP2017535821A (ja) * 2014-11-27 2017-11-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 複数の個々に制御可能な書込ヘッドを含むリソグラフィ装置

Also Published As

Publication number Publication date
KR20230160327A (ko) 2023-11-23
JP2025061202A (ja) 2025-04-10
US20240085794A1 (en) 2024-03-14
JP7626207B2 (ja) 2025-02-04
WO2022230847A1 (ja) 2022-11-03
TW202301035A (zh) 2023-01-01

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