TW202301035A - 照明光學系統、曝光裝置及平板顯示器之製造方法 - Google Patents

照明光學系統、曝光裝置及平板顯示器之製造方法 Download PDF

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Publication number
TW202301035A
TW202301035A TW111115814A TW111115814A TW202301035A TW 202301035 A TW202301035 A TW 202301035A TW 111115814 A TW111115814 A TW 111115814A TW 111115814 A TW111115814 A TW 111115814A TW 202301035 A TW202301035 A TW 202301035A
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TW
Taiwan
Prior art keywords
light
pulsed light
optical system
pulsed
illumination
Prior art date
Application number
TW111115814A
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English (en)
Chinese (zh)
Inventor
加藤正紀
水野恭志
川戸聡
Original Assignee
日商尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商尼康股份有限公司 filed Critical 日商尼康股份有限公司
Publication of TW202301035A publication Critical patent/TW202301035A/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/35—Optical coupling means having switching means
    • G02B6/351—Optical coupling means having switching means involving stationary waveguides with moving interposed optical elements
    • G02B6/3512—Optical coupling means having switching means involving stationary waveguides with moving interposed optical elements the optical element being reflective, e.g. mirror
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW111115814A 2021-04-27 2022-04-26 照明光學系統、曝光裝置及平板顯示器之製造方法 TW202301035A (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2021-075408 2021-04-27
JP2021-075410 2021-04-27
JP2021075410 2021-04-27
JP2021075408 2021-04-27
JP2021-075409 2021-04-27
JP2021075409 2021-04-27

Publications (1)

Publication Number Publication Date
TW202301035A true TW202301035A (zh) 2023-01-01

Family

ID=83848146

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111115814A TW202301035A (zh) 2021-04-27 2022-04-26 照明光學系統、曝光裝置及平板顯示器之製造方法

Country Status (5)

Country Link
US (1) US20240085794A1 (https=)
JP (2) JP7626207B2 (https=)
KR (1) KR20230160327A (https=)
TW (1) TW202301035A (https=)
WO (1) WO2022230847A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202301035A (zh) * 2021-04-27 2023-01-01 日商尼康股份有限公司 照明光學系統、曝光裝置及平板顯示器之製造方法
WO2025197436A1 (ja) * 2024-03-19 2025-09-25 株式会社ニコン 露光方法、露光装置、及びデバイス製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69819044T2 (de) * 1998-08-20 2004-08-12 Orbotech Ltd. Laserwiederholfrequenzvervielfacher
JP2004157219A (ja) * 2002-11-05 2004-06-03 Fuji Photo Film Co Ltd 露光ヘッドおよび露光装置
JP2006053240A (ja) * 2004-08-10 2006-02-23 Noritsu Koki Co Ltd レーザー光変調装置
JP2006171426A (ja) 2004-12-16 2006-06-29 Fuji Photo Film Co Ltd 照明光学系及びそれを用いた露光装置
JP5211487B2 (ja) * 2007-01-25 2013-06-12 株式会社ニコン 露光方法及び露光装置並びにマイクロデバイスの製造方法
US7714986B2 (en) * 2007-05-24 2010-05-11 Asml Netherlands B.V. Laser beam conditioning system comprising multiple optical paths allowing for dose control
JP2009300543A (ja) * 2008-06-10 2009-12-24 Orc Mfg Co Ltd 露光描画装置
JP5731063B2 (ja) * 2011-04-08 2015-06-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、プログラマブル・パターニングデバイス、及びリソグラフィ方法
TWI707207B (zh) * 2014-11-27 2020-10-11 德商卡爾蔡司Ｓｍｔ有限公司 包含多個可個別控制之寫入頭的微影裝置
TW202301035A (zh) * 2021-04-27 2023-01-01 日商尼康股份有限公司 照明光學系統、曝光裝置及平板顯示器之製造方法

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Publication number Publication date
JPWO2022230847A1 (https=) 2022-11-03
KR20230160327A (ko) 2023-11-23
JP2025061202A (ja) 2025-04-10
US20240085794A1 (en) 2024-03-14
JP7626207B2 (ja) 2025-02-04
WO2022230847A1 (ja) 2022-11-03

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