JP7612315B1 - 活性ガス生成装置 - Google Patents

活性ガス生成装置 Download PDF

Info

Publication number
JP7612315B1
JP7612315B1 JP2024535491A JP2024535491A JP7612315B1 JP 7612315 B1 JP7612315 B1 JP 7612315B1 JP 2024535491 A JP2024535491 A JP 2024535491A JP 2024535491 A JP2024535491 A JP 2024535491A JP 7612315 B1 JP7612315 B1 JP 7612315B1
Authority
JP
Japan
Prior art keywords
dielectric
electrode
film
dielectric film
space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2024535491A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2025094419A1 (https=
JPWO2025094419A5 (https=
Inventor
廉 有田
祐司 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TMEIC Corp
Original Assignee
TMEIC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TMEIC Corp filed Critical TMEIC Corp
Priority claimed from PCT/JP2024/001258 external-priority patent/WO2025094419A1/ja
Application granted granted Critical
Publication of JP7612315B1 publication Critical patent/JP7612315B1/ja
Publication of JPWO2025094419A1 publication Critical patent/JPWO2025094419A1/ja
Publication of JPWO2025094419A5 publication Critical patent/JPWO2025094419A5/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2431Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes using cylindrical electrodes, e.g. rotary drums
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348Dielectric barrier discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/2406Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2437Multilayer systems

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2024535491A 2023-11-01 2024-01-18 活性ガス生成装置 Active JP7612315B1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPPCT/JP2023/039462 2023-11-01
JP2023039462 2023-11-01
PCT/JP2024/001258 WO2025094419A1 (ja) 2023-11-01 2024-01-18 活性ガス生成装置

Publications (3)

Publication Number Publication Date
JP7612315B1 true JP7612315B1 (ja) 2025-01-14
JPWO2025094419A1 JPWO2025094419A1 (https=) 2025-05-08
JPWO2025094419A5 JPWO2025094419A5 (https=) 2025-10-02

Family

ID=94213743

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024535491A Active JP7612315B1 (ja) 2023-11-01 2024-01-18 活性ガス生成装置

Country Status (4)

Country Link
JP (1) JP7612315B1 (https=)
KR (1) KR20250090329A (https=)
CN (1) CN120239998A (https=)
TW (1) TW202533630A (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008186660A (ja) * 2007-01-29 2008-08-14 Kyocera Corp 電極構造体およびこれを用いたプラズマ生成装置
JP2009233535A (ja) * 2008-03-26 2009-10-15 Kyocera Corp 誘電性構造体、誘電性構造体の製造方法、誘電性構造体を用いた放電装置、並びに流体改質装置
CN204014246U (zh) * 2014-09-02 2014-12-10 中国工程物理研究院流体物理研究所 多层介质阻挡放电低温等离子体产生装置
JP2016507255A (ja) * 2012-12-18 2016-03-10 リンデ アクチエンゲゼルシャフトLinde Aktiengesellschaft プラズマの流れを提供する装置
WO2019138456A1 (ja) * 2018-01-10 2019-07-18 東芝三菱電機産業システム株式会社 活性ガス生成装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008186660A (ja) * 2007-01-29 2008-08-14 Kyocera Corp 電極構造体およびこれを用いたプラズマ生成装置
JP2009233535A (ja) * 2008-03-26 2009-10-15 Kyocera Corp 誘電性構造体、誘電性構造体の製造方法、誘電性構造体を用いた放電装置、並びに流体改質装置
JP2016507255A (ja) * 2012-12-18 2016-03-10 リンデ アクチエンゲゼルシャフトLinde Aktiengesellschaft プラズマの流れを提供する装置
CN204014246U (zh) * 2014-09-02 2014-12-10 中国工程物理研究院流体物理研究所 多层介质阻挡放电低温等离子体产生装置
WO2019138456A1 (ja) * 2018-01-10 2019-07-18 東芝三菱電機産業システム株式会社 活性ガス生成装置

Also Published As

Publication number Publication date
TW202533630A (zh) 2025-08-16
KR20250090329A (ko) 2025-06-19
JPWO2025094419A1 (https=) 2025-05-08
CN120239998A (zh) 2025-07-01

Similar Documents

Publication Publication Date Title
EP3806586B1 (en) Active gas generation device
TWI717394B (zh) 具有熱阻流件之靜電卡盤
US7109660B2 (en) Plasma processing device and baffle plate thereof
ES2229731T3 (es) Electrodo para procesos con plasma y procedimiento de fabricacion y uso del mismo.
KR101167351B1 (ko) 이온화 장치
KR100440658B1 (ko) 플라스마 방전 기체가 처리 챔버로 주입되는 고전력 rf전극을 절연시키는 방법 및 장치
EP3740045B1 (en) Active gas generation apparatus
US9177839B2 (en) Cover part, process gas diffusing and supplying unit, and substrate processing apparatus
US20060175772A1 (en) Substrate holding mechanism using electrostaic chuck and method of manufacturing the same
WO2011142957A2 (en) Inductive plasma source with metallic shower head using b-field concentrator
EP3886540A1 (en) Active gas generation device
EP3879946A1 (en) Activated gas generation device
WO2020165964A1 (ja) 活性ガス生成装置
CN114916255A (zh) 活性气体生成装置
TW202405233A (zh) 活性氣體生成裝置
JP7612315B1 (ja) 活性ガス生成装置
JP7481786B1 (ja) 活性ガス生成装置
KR100286993B1 (ko) 부식 방지 전극 접속을 가지는 정전형 척
WO2025094419A1 (ja) 活性ガス生成装置
JP5235033B2 (ja) 電極アッセンブリ及びプラズマ処理装置
US6869575B2 (en) Ozonizer
JP7493905B1 (ja) 活性ガス生成装置
CN218160306U (zh) 偏压装置及基片处理设备
JP7289608B1 (ja) 活性ガス生成装置
KR102518875B1 (ko) 대기압 플라즈마 기판처리장치

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20240613

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20240613

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20241224

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20241224

R150 Certificate of patent or registration of utility model

Ref document number: 7612315

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150