JP7609304B2 - シリコーン鎖含有重合体、シリコーン鎖含有重合体の製造方法、コーティング組成物、レジスト組成物及び物品 - Google Patents

シリコーン鎖含有重合体、シリコーン鎖含有重合体の製造方法、コーティング組成物、レジスト組成物及び物品 Download PDF

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JP7609304B2
JP7609304B2 JP2023571342A JP2023571342A JP7609304B2 JP 7609304 B2 JP7609304 B2 JP 7609304B2 JP 2023571342 A JP2023571342 A JP 2023571342A JP 2023571342 A JP2023571342 A JP 2023571342A JP 7609304 B2 JP7609304 B2 JP 7609304B2
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group
meth
polymerizable monomer
silicone chain
containing polymer
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JPWO2023140036A1 (https=
JPWO2023140036A5 (https=
Inventor
純平 植野
真幸 畑瀬
潤 野口
良平 清水
祐貴 野口
慎 笹本
秀也 鈴木
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DIC Corp
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DIC Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/08—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/18—Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/285—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/285—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety
    • C08F220/287—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety and containing polypropylene oxide in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/068—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/022—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polycondensates with side or terminal unsaturations
    • C08F299/024—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polycondensates with side or terminal unsaturations the unsaturation being in acrylic or methacrylic groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D151/00—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • C09D151/08—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • C09D151/085—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds on to polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D155/00—Coating compositions based on homopolymers or copolymers, obtained by polymerisation reactions only involving carbon-to-carbon unsaturated bonds, not provided for in groups C09D123/00 - C09D153/00
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2150/00—Compositions for coatings

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
JP2023571342A 2022-01-18 2022-12-22 シリコーン鎖含有重合体、シリコーン鎖含有重合体の製造方法、コーティング組成物、レジスト組成物及び物品 Active JP7609304B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2022005566 2022-01-18
JP2022005566 2022-01-18
PCT/JP2022/047259 WO2023140036A1 (ja) 2022-01-18 2022-12-22 シリコーン鎖含有重合体、シリコーン鎖含有重合体の製造方法、コーティング組成物、レジスト組成物及び物品

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JPWO2023140036A1 JPWO2023140036A1 (https=) 2023-07-27
JPWO2023140036A5 JPWO2023140036A5 (https=) 2024-02-15
JP7609304B2 true JP7609304B2 (ja) 2025-01-07

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US (1) US20250109255A1 (https=)
EP (1) EP4467581A4 (https=)
JP (1) JP7609304B2 (https=)
KR (1) KR20240131318A (https=)
CN (1) CN118510818A (https=)
TW (1) TW202337964A (https=)
WO (1) WO2023140036A1 (https=)

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WO2025058077A1 (ja) * 2023-09-15 2025-03-20 富士フイルム株式会社 化合物、組成物、機能性材料、ハロゲン化銀写真感光材料、及び、拡散転写型ハロゲン化銀写真感光材料
JP2025073650A (ja) * 2023-10-27 2025-05-13 信越化学工業株式会社 表面改質剤及び該表面改質剤を含む組成物
TW202540239A (zh) * 2024-03-26 2025-10-16 日商Ｄｉｃ股份有限公司 硬塗層形成用組成物、膜、積層體、偏光板及圖像顯示裝置

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JP2002241698A (ja) 2001-02-16 2002-08-28 Kusumoto Kasei Kk 塗料・インキ用平滑剤
JP2011116880A (ja) 2009-12-04 2011-06-16 Kusumoto Kasei Kk リコート時の付着性を損なわない塗料用レベリング剤
JP2018199765A (ja) 2017-05-26 2018-12-20 楠本化成株式会社 両親媒性ブロック共重合体を利用した塗料用レベリング剤

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JP2900408B2 (ja) * 1989-06-27 1999-06-02 大日本インキ化学工業株式会社 低起泡性フッ素系界面活性剤
JP3911790B2 (ja) * 1997-09-29 2007-05-09 東洋インキ製造株式会社 剥離剤およびそれを使用した剥離ライナー
JP4431920B2 (ja) * 2000-06-14 2010-03-17 Ｄｉｃ株式会社 低摩耗構造体
JP4097434B2 (ja) 2002-02-07 2008-06-11 楠本化成株式会社 非水塗料用平滑剤
JP4221964B2 (ja) * 2002-07-15 2009-02-12 東洋インキ製造株式会社 隔壁用組成物、それを用いた画素形成用基板および画素の形成方法
JP4379088B2 (ja) * 2002-11-11 2009-12-09 東洋インキ製造株式会社 隔壁用組成物、それを用いた画素形成用基板および画素の形成方法
JP2005060461A (ja) * 2003-08-08 2005-03-10 Toyo Ink Mfg Co Ltd 水性塗料組成物
JP4994951B2 (ja) * 2006-05-25 2012-08-08 中国塗料株式会社 ポリエーテル変性シリコーンを含むオルガノポリシロキサンチオブロックビニル共重合体、その共重合体含有組成物、防汚塗料組成物、その塗膜および防汚方法
JP2010085606A (ja) * 2008-09-30 2010-04-15 Dic Corp 乳化剤、硬化性組成物及び懸濁粒子デバイス用フィルム
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WO2017037123A1 (en) 2015-08-31 2017-03-09 Byk-Chemie Gmbh Copolymers containing polysiloxane macromonomer units, process of their preparation and their use in coating compositions and polymeric moulding compounds
JP2017227883A (ja) * 2016-06-17 2017-12-28 キヤノン株式会社 トナー粒子の製造方法並びに樹脂粒子の製造方法
KR102876885B1 (ko) * 2019-08-22 2025-10-24 닛토 가세이 가부시끼 가이샤 방오 도료 조성물
JP2021084972A (ja) * 2019-11-28 2021-06-03 ナトコ株式会社 コーティング組成物及び積層フィルム
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JP7288234B2 (ja) * 2020-12-17 2023-06-07 Dic株式会社 化合物、レベリング剤、コーティング組成物、レジスト組成物及び物品
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JP2002241698A (ja) 2001-02-16 2002-08-28 Kusumoto Kasei Kk 塗料・インキ用平滑剤
JP2011116880A (ja) 2009-12-04 2011-06-16 Kusumoto Kasei Kk リコート時の付着性を損なわない塗料用レベリング剤
JP2018199765A (ja) 2017-05-26 2018-12-20 楠本化成株式会社 両親媒性ブロック共重合体を利用した塗料用レベリング剤

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EP4467581A1 (en) 2024-11-27
TW202337964A (zh) 2023-10-01
WO2023140036A1 (ja) 2023-07-27
EP4467581A4 (en) 2025-05-07
JPWO2023140036A1 (https=) 2023-07-27
US20250109255A1 (en) 2025-04-03
KR20240131318A (ko) 2024-08-30
CN118510818A (zh) 2024-08-16

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