JPWO2023140036A1 - - Google Patents
Info
- Publication number
- JPWO2023140036A1 JPWO2023140036A1 JP2023571342A JP2023571342A JPWO2023140036A1 JP WO2023140036 A1 JPWO2023140036 A1 JP WO2023140036A1 JP 2023571342 A JP2023571342 A JP 2023571342A JP 2023571342 A JP2023571342 A JP 2023571342A JP WO2023140036 A1 JPWO2023140036 A1 JP WO2023140036A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/08—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/18—Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/285—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/285—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety
- C08F220/287—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety and containing polypropylene oxide in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/068—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/022—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polycondensates with side or terminal unsaturations
- C08F299/024—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polycondensates with side or terminal unsaturations the unsaturation being in acrylic or methacrylic groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D151/00—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
- C09D151/08—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- C09D151/085—Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds on to polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D155/00—Coating compositions based on homopolymers or copolymers, obtained by polymerisation reactions only involving carbon-to-carbon unsaturated bonds, not provided for in groups C09D123/00 - C09D153/00
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2150/00—Compositions for coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022005566 | 2022-01-18 | ||
| JP2022005566 | 2022-01-18 | ||
| PCT/JP2022/047259 WO2023140036A1 (ja) | 2022-01-18 | 2022-12-22 | シリコーン鎖含有重合体、シリコーン鎖含有重合体の製造方法、コーティング組成物、レジスト組成物及び物品 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2023140036A1 true JPWO2023140036A1 (https=) | 2023-07-27 |
| JPWO2023140036A5 JPWO2023140036A5 (https=) | 2024-02-15 |
| JP7609304B2 JP7609304B2 (ja) | 2025-01-07 |
Family
ID=87348207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023571342A Active JP7609304B2 (ja) | 2022-01-18 | 2022-12-22 | シリコーン鎖含有重合体、シリコーン鎖含有重合体の製造方法、コーティング組成物、レジスト組成物及び物品 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20250109255A1 (https=) |
| EP (1) | EP4467581A4 (https=) |
| JP (1) | JP7609304B2 (https=) |
| KR (1) | KR20240131318A (https=) |
| CN (1) | CN118510818A (https=) |
| TW (1) | TW202337964A (https=) |
| WO (1) | WO2023140036A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025058077A1 (ja) * | 2023-09-15 | 2025-03-20 | 富士フイルム株式会社 | 化合物、組成物、機能性材料、ハロゲン化銀写真感光材料、及び、拡散転写型ハロゲン化銀写真感光材料 |
| JP2025073650A (ja) * | 2023-10-27 | 2025-05-13 | 信越化学工業株式会社 | 表面改質剤及び該表面改質剤を含む組成物 |
| TW202540239A (zh) * | 2024-03-26 | 2025-10-16 | 日商Ｄｉｃ股份有限公司 | 硬塗層形成用組成物、膜、積層體、偏光板及圖像顯示裝置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0330825A (ja) * | 1989-06-27 | 1991-02-08 | Dainippon Ink & Chem Inc | 低起泡性フッ素系界面活性剤 |
| JP2002241698A (ja) * | 2001-02-16 | 2002-08-28 | Kusumoto Kasei Kk | 塗料・インキ用平滑剤 |
| JP2011116880A (ja) * | 2009-12-04 | 2011-06-16 | Kusumoto Kasei Kk | リコート時の付着性を損なわない塗料用レベリング剤 |
| JP2018199765A (ja) * | 2017-05-26 | 2018-12-20 | 楠本化成株式会社 | 両親媒性ブロック共重合体を利用した塗料用レベリング剤 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3911790B2 (ja) * | 1997-09-29 | 2007-05-09 | 東洋インキ製造株式会社 | 剥離剤およびそれを使用した剥離ライナー |
| JP4431920B2 (ja) * | 2000-06-14 | 2010-03-17 | Ｄｉｃ株式会社 | 低摩耗構造体 |
| JP4097434B2 (ja) | 2002-02-07 | 2008-06-11 | 楠本化成株式会社 | 非水塗料用平滑剤 |
| JP4221964B2 (ja) * | 2002-07-15 | 2009-02-12 | 東洋インキ製造株式会社 | 隔壁用組成物、それを用いた画素形成用基板および画素の形成方法 |
| JP4379088B2 (ja) * | 2002-11-11 | 2009-12-09 | 東洋インキ製造株式会社 | 隔壁用組成物、それを用いた画素形成用基板および画素の形成方法 |
| JP2005060461A (ja) * | 2003-08-08 | 2005-03-10 | Toyo Ink Mfg Co Ltd | 水性塗料組成物 |
| JP4994951B2 (ja) * | 2006-05-25 | 2012-08-08 | 中国塗料株式会社 | ポリエーテル変性シリコーンを含むオルガノポリシロキサンチオブロックビニル共重合体、その共重合体含有組成物、防汚塗料組成物、その塗膜および防汚方法 |
| JP2010085606A (ja) * | 2008-09-30 | 2010-04-15 | Dic Corp | 乳化剤、硬化性組成物及び懸濁粒子デバイス用フィルム |
| JP2014034634A (ja) * | 2012-08-09 | 2014-02-24 | Sekisui Plastics Co Ltd | 樹脂及びその用途 |
| JP2016190993A (ja) * | 2015-03-31 | 2016-11-10 | アイカ工業株式会社 | 粘着剤組成物 |
| WO2017037123A1 (en) | 2015-08-31 | 2017-03-09 | Byk-Chemie Gmbh | Copolymers containing polysiloxane macromonomer units, process of their preparation and their use in coating compositions and polymeric moulding compounds |
| JP2017227883A (ja) * | 2016-06-17 | 2017-12-28 | キヤノン株式会社 | トナー粒子の製造方法並びに樹脂粒子の製造方法 |
| KR102876885B1 (ko) * | 2019-08-22 | 2025-10-24 | 닛토 가세이 가부시끼 가이샤 | 방오 도료 조성물 |
| JP2021084972A (ja) * | 2019-11-28 | 2021-06-03 | ナトコ株式会社 | コーティング組成物及び積層フィルム |
| EP4215557A4 (en) * | 2020-09-15 | 2024-10-30 | DIC Corporation | POLYMER CONTAINING SILICONE CHAIN AND COATING COMPOSITION CONTAINING SAID POLYMER |
| JP7288234B2 (ja) * | 2020-12-17 | 2023-06-07 | Dic株式会社 | 化合物、レベリング剤、コーティング組成物、レジスト組成物及び物品 |
| US20240263025A1 (en) * | 2021-05-18 | 2024-08-08 | Dic Corporation | Leveling agent being silicone chain-containing polymer, coating composition, resist composition and article |
-
2022
- 2022-12-22 KR KR1020247014350A patent/KR20240131318A/ko active Pending
- 2022-12-22 JP JP2023571342A patent/JP7609304B2/ja active Active
- 2022-12-22 EP EP22922186.6A patent/EP4467581A4/en active Pending
- 2022-12-22 US US18/715,391 patent/US20250109255A1/en active Pending
- 2022-12-22 WO PCT/JP2022/047259 patent/WO2023140036A1/ja not_active Ceased
- 2022-12-22 CN CN202280087468.1A patent/CN118510818A/zh active Pending
-
2023
- 2023-01-11 TW TW112101135A patent/TW202337964A/zh unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0330825A (ja) * | 1989-06-27 | 1991-02-08 | Dainippon Ink & Chem Inc | 低起泡性フッ素系界面活性剤 |
| JP2002241698A (ja) * | 2001-02-16 | 2002-08-28 | Kusumoto Kasei Kk | 塗料・インキ用平滑剤 |
| JP2011116880A (ja) * | 2009-12-04 | 2011-06-16 | Kusumoto Kasei Kk | リコート時の付着性を損なわない塗料用レベリング剤 |
| JP2018199765A (ja) * | 2017-05-26 | 2018-12-20 | 楠本化成株式会社 | 両親媒性ブロック共重合体を利用した塗料用レベリング剤 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7609304B2 (ja) | 2025-01-07 |
| EP4467581A1 (en) | 2024-11-27 |
| TW202337964A (zh) | 2023-10-01 |
| WO2023140036A1 (ja) | 2023-07-27 |
| EP4467581A4 (en) | 2025-05-07 |
| US20250109255A1 (en) | 2025-04-03 |
| KR20240131318A (ko) | 2024-08-30 |
| CN118510818A (zh) | 2024-08-16 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231116 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20231116 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20231116 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20240109 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240305 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20240604 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20240730 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20241003 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20241119 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20241202 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7609304 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |