JP7581375B2 - 気体処理装置 - Google Patents

気体処理装置 Download PDF

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Publication number
JP7581375B2
JP7581375B2 JP2022565380A JP2022565380A JP7581375B2 JP 7581375 B2 JP7581375 B2 JP 7581375B2 JP 2022565380 A JP2022565380 A JP 2022565380A JP 2022565380 A JP2022565380 A JP 2022565380A JP 7581375 B2 JP7581375 B2 JP 7581375B2
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flow path
electrode
gas
path section
treatment device
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JP2022565380A
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Japanese (ja)
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JPWO2022114013A1 (https=
Inventor
猛 宗石
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Kyocera Corp
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Kyocera Corp
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2022565380A 2020-11-30 2021-11-24 気体処理装置 Active JP7581375B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020198601 2020-11-30
JP2020198601 2020-11-30
PCT/JP2021/043025 WO2022114013A1 (ja) 2020-11-30 2021-11-24 気体処理装置

Publications (2)

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JPWO2022114013A1 JPWO2022114013A1 (https=) 2022-06-02
JP7581375B2 true JP7581375B2 (ja) 2024-11-12

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ID=81755571

Family Applications (1)

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JP2022565380A Active JP7581375B2 (ja) 2020-11-30 2021-11-24 気体処理装置

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JP (1) JP7581375B2 (https=)
WO (1) WO2022114013A1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005108482A (ja) 2003-09-29 2005-04-21 E Square:Kk プラズマ表面処理装置
JP2006509331A (ja) 2002-12-02 2006-03-16 セム テクノロジー コーポレーション リミテッド 大気圧プラズマを利用した表面処理装置
JP2009170267A (ja) 2008-01-16 2009-07-30 Ngk Insulators Ltd セラミックプラズマ反応器、及びプラズマ反応装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3545257B2 (ja) * 1994-04-28 2004-07-21 三菱電機株式会社 オゾン発生装置およびオゾン発生方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006509331A (ja) 2002-12-02 2006-03-16 セム テクノロジー コーポレーション リミテッド 大気圧プラズマを利用した表面処理装置
JP2005108482A (ja) 2003-09-29 2005-04-21 E Square:Kk プラズマ表面処理装置
JP2009170267A (ja) 2008-01-16 2009-07-30 Ngk Insulators Ltd セラミックプラズマ反応器、及びプラズマ反応装置

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Publication number Publication date
WO2022114013A1 (ja) 2022-06-02
JPWO2022114013A1 (https=) 2022-06-02

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