JP7536626B2 - 制御装置、調整方法、リソグラフィ装置、及び物品の製造方法 - Google Patents

制御装置、調整方法、リソグラフィ装置、及び物品の製造方法 Download PDF

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Publication number
JP7536626B2
JP7536626B2 JP2020205546A JP2020205546A JP7536626B2 JP 7536626 B2 JP7536626 B2 JP 7536626B2 JP 2020205546 A JP2020205546 A JP 2020205546A JP 2020205546 A JP2020205546 A JP 2020205546A JP 7536626 B2 JP7536626 B2 JP 7536626B2
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Japan
Prior art keywords
control
signal
control device
adjustment
controlled object
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JP2020205546A
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English (en)
Japanese (ja)
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JP2022092690A (ja
JP2022092690A5 (https=
Inventor
裕也 猪股
智康 畑
寛 森川
正裕 伊藤
博一 草柳
康伸 朝倉
祐二 石井
拓海 橋本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2020205546A priority Critical patent/JP7536626B2/ja
Priority to KR1020237022519A priority patent/KR20230118130A/ko
Priority to CN202180082084.6A priority patent/CN116648773A/zh
Priority to PCT/JP2021/044806 priority patent/WO2022124281A1/ja
Priority to TW110146060A priority patent/TWI873392B/zh
Publication of JP2022092690A publication Critical patent/JP2022092690A/ja
Publication of JP2022092690A5 publication Critical patent/JP2022092690A5/ja
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B11/00—Automatic controllers
    • G05B11/01—Automatic controllers electric
    • G05B11/36—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/0265—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric the criterion being a learning criterion
    • G05B13/027—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric the criterion being a learning criterion using neural networks only
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Artificial Intelligence (AREA)
  • Automation & Control Theory (AREA)
  • Evolutionary Computation (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Medical Informatics (AREA)
  • Software Systems (AREA)
  • Feedback Control In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2020205546A 2020-12-11 2020-12-11 制御装置、調整方法、リソグラフィ装置、及び物品の製造方法 Active JP7536626B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2020205546A JP7536626B2 (ja) 2020-12-11 2020-12-11 制御装置、調整方法、リソグラフィ装置、及び物品の製造方法
KR1020237022519A KR20230118130A (ko) 2020-12-11 2021-12-07 제어 장치, 조정 방법, 리소그래피 장치 및 물품의제조 방법
CN202180082084.6A CN116648773A (zh) 2020-12-11 2021-12-07 控制装置、调节方法、光刻装置和物品制造方法
PCT/JP2021/044806 WO2022124281A1 (ja) 2020-12-11 2021-12-07 制御装置、調整方法、リソグラフィ装置、及び物品の製造方法
TW110146060A TWI873392B (zh) 2020-12-11 2021-12-09 控制裝置、調整方法、光刻裝置及物品之製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020205546A JP7536626B2 (ja) 2020-12-11 2020-12-11 制御装置、調整方法、リソグラフィ装置、及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2022092690A JP2022092690A (ja) 2022-06-23
JP2022092690A5 JP2022092690A5 (https=) 2023-12-06
JP7536626B2 true JP7536626B2 (ja) 2024-08-20

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JP2020205546A Active JP7536626B2 (ja) 2020-12-11 2020-12-11 制御装置、調整方法、リソグラフィ装置、及び物品の製造方法

Country Status (5)

Country Link
JP (1) JP7536626B2 (https=)
KR (1) KR20230118130A (https=)
CN (1) CN116648773A (https=)
TW (1) TWI873392B (https=)
WO (1) WO2022124281A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024062786A (ja) * 2022-10-25 2024-05-10 キヤノン株式会社 制御方法、制御装置、リソグラフィ装置、および物品製造方法
CN119247877B (zh) * 2024-09-13 2025-08-01 济宁博硕工具有限公司 一种刀具点空间位姿控制方法及刀具运动控制装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018151215A1 (ja) 2017-02-20 2018-08-23 株式会社安川電機 制御装置及び制御方法
JP2020112921A (ja) 2019-01-09 2020-07-27 株式会社明電舎 プラント制御調節装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2862308B2 (ja) * 1990-02-09 1999-03-03 株式会社日立製作所 コントローラの調整方法および調整システム
JPH06187006A (ja) * 1991-12-05 1994-07-08 Yokogawa Electric Corp 外乱補償装置
US5396415A (en) 1992-01-31 1995-03-07 Honeywell Inc. Neruo-pid controller
JP3040901B2 (ja) * 1993-10-20 2000-05-15 株式会社日立製作所 ニューラルネットワークによる制御方法および内蔵制御装置
JPH07277286A (ja) 1994-04-11 1995-10-24 Mitsubishi Heavy Ind Ltd 航空機用学習型飛行制御装置
WO2010023668A1 (en) * 2008-08-28 2010-03-04 Technion Research & Development Foundation Ltd. System and method for stabilizing a single-track vehicle

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018151215A1 (ja) 2017-02-20 2018-08-23 株式会社安川電機 制御装置及び制御方法
JP2020112921A (ja) 2019-01-09 2020-07-27 株式会社明電舎 プラント制御調節装置

Also Published As

Publication number Publication date
TWI873392B (zh) 2025-02-21
KR20230118130A (ko) 2023-08-10
JP2022092690A (ja) 2022-06-23
TW202223562A (zh) 2022-06-16
CN116648773A (zh) 2023-08-25
WO2022124281A1 (ja) 2022-06-16

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