CN116648773A - 控制装置、调节方法、光刻装置和物品制造方法 - Google Patents

控制装置、调节方法、光刻装置和物品制造方法 Download PDF

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Publication number
CN116648773A
CN116648773A CN202180082084.6A CN202180082084A CN116648773A CN 116648773 A CN116648773 A CN 116648773A CN 202180082084 A CN202180082084 A CN 202180082084A CN 116648773 A CN116648773 A CN 116648773A
Authority
CN
China
Prior art keywords
control
signal
unit
control device
adjustment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180082084.6A
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English (en)
Chinese (zh)
Inventor
猪股裕也
畑智康
森川宽
伊藤正裕
草柳博一
朝仓康伸
石井祐二
桥本拓海
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN116648773A publication Critical patent/CN116648773A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B11/00—Automatic controllers
    • G05B11/01—Automatic controllers electric
    • G05B11/36—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/0265—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric the criterion being a learning criterion
    • G05B13/027—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric the criterion being a learning criterion using neural networks only
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Artificial Intelligence (AREA)
  • Automation & Control Theory (AREA)
  • Evolutionary Computation (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Medical Informatics (AREA)
  • Software Systems (AREA)
  • Feedback Control In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN202180082084.6A 2020-12-11 2021-12-07 控制装置、调节方法、光刻装置和物品制造方法 Pending CN116648773A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020-205546 2020-12-11
JP2020205546A JP7536626B2 (ja) 2020-12-11 2020-12-11 制御装置、調整方法、リソグラフィ装置、及び物品の製造方法
PCT/JP2021/044806 WO2022124281A1 (ja) 2020-12-11 2021-12-07 制御装置、調整方法、リソグラフィ装置、及び物品の製造方法

Publications (1)

Publication Number Publication Date
CN116648773A true CN116648773A (zh) 2023-08-25

Family

ID=81974410

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180082084.6A Pending CN116648773A (zh) 2020-12-11 2021-12-07 控制装置、调节方法、光刻装置和物品制造方法

Country Status (5)

Country Link
JP (1) JP7536626B2 (https=)
KR (1) KR20230118130A (https=)
CN (1) CN116648773A (https=)
TW (1) TWI873392B (https=)
WO (1) WO2022124281A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024062786A (ja) * 2022-10-25 2024-05-10 キヤノン株式会社 制御方法、制御装置、リソグラフィ装置、および物品製造方法
CN119247877B (zh) * 2024-09-13 2025-08-01 济宁博硕工具有限公司 一种刀具点空间位姿控制方法及刀具运动控制装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2862308B2 (ja) * 1990-02-09 1999-03-03 株式会社日立製作所 コントローラの調整方法および調整システム
JPH06187006A (ja) * 1991-12-05 1994-07-08 Yokogawa Electric Corp 外乱補償装置
US5396415A (en) 1992-01-31 1995-03-07 Honeywell Inc. Neruo-pid controller
JP3040901B2 (ja) * 1993-10-20 2000-05-15 株式会社日立製作所 ニューラルネットワークによる制御方法および内蔵制御装置
JPH07277286A (ja) 1994-04-11 1995-10-24 Mitsubishi Heavy Ind Ltd 航空機用学習型飛行制御装置
WO2010023668A1 (en) * 2008-08-28 2010-03-04 Technion Research & Development Foundation Ltd. System and method for stabilizing a single-track vehicle
JP6774637B2 (ja) * 2017-02-20 2020-10-28 株式会社安川電機 制御装置及び制御方法
JP7103238B2 (ja) * 2019-01-09 2022-07-20 株式会社明電舎 プラント制御調節装置

Also Published As

Publication number Publication date
TWI873392B (zh) 2025-02-21
KR20230118130A (ko) 2023-08-10
JP2022092690A (ja) 2022-06-23
JP7536626B2 (ja) 2024-08-20
TW202223562A (zh) 2022-06-16
WO2022124281A1 (ja) 2022-06-16

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