JP7532131B2 - 露光装置、及び物品の製造方法 - Google Patents

露光装置、及び物品の製造方法 Download PDF

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Publication number
JP7532131B2
JP7532131B2 JP2020127585A JP2020127585A JP7532131B2 JP 7532131 B2 JP7532131 B2 JP 7532131B2 JP 2020127585 A JP2020127585 A JP 2020127585A JP 2020127585 A JP2020127585 A JP 2020127585A JP 7532131 B2 JP7532131 B2 JP 7532131B2
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JP
Japan
Prior art keywords
thrust
substrate
substrate stage
actuator
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2020127585A
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English (en)
Japanese (ja)
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JP2022024792A5 (enExample
JP2022024792A (ja
Inventor
崇志 早川
圭司 江本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2020127585A priority Critical patent/JP7532131B2/ja
Priority to KR1020210092235A priority patent/KR102890198B1/ko
Priority to EP21186008.5A priority patent/EP3945368A1/en
Priority to TW110126194A priority patent/TWI854138B/zh
Priority to US17/385,752 priority patent/US12326666B2/en
Priority to CN202110841387.3A priority patent/CN114002917A/zh
Publication of JP2022024792A publication Critical patent/JP2022024792A/ja
Publication of JP2022024792A5 publication Critical patent/JP2022024792A5/ja
Application granted granted Critical
Publication of JP7532131B2 publication Critical patent/JP7532131B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP2020127585A 2020-07-28 2020-07-28 露光装置、及び物品の製造方法 Active JP7532131B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2020127585A JP7532131B2 (ja) 2020-07-28 2020-07-28 露光装置、及び物品の製造方法
KR1020210092235A KR102890198B1 (ko) 2020-07-28 2021-07-14 노광 장치, 및 물품의 제조 방법
TW110126194A TWI854138B (zh) 2020-07-28 2021-07-16 曝光設備和用於製造物品的方法
EP21186008.5A EP3945368A1 (en) 2020-07-28 2021-07-16 Exposing apparatus and method for manufacturing article
US17/385,752 US12326666B2 (en) 2020-07-28 2021-07-26 Exposing apparatus and method for manufacturing article
CN202110841387.3A CN114002917A (zh) 2020-07-28 2021-07-26 曝光设备和用于制造制品的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020127585A JP7532131B2 (ja) 2020-07-28 2020-07-28 露光装置、及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2022024792A JP2022024792A (ja) 2022-02-09
JP2022024792A5 JP2022024792A5 (enExample) 2023-07-25
JP7532131B2 true JP7532131B2 (ja) 2024-08-13

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020127585A Active JP7532131B2 (ja) 2020-07-28 2020-07-28 露光装置、及び物品の製造方法

Country Status (6)

Country Link
US (1) US12326666B2 (enExample)
EP (1) EP3945368A1 (enExample)
JP (1) JP7532131B2 (enExample)
KR (1) KR102890198B1 (enExample)
CN (1) CN114002917A (enExample)
TW (1) TWI854138B (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7504168B2 (ja) * 2022-08-10 2024-06-21 キヤノン株式会社 露光装置、露光方法及び物品の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050218842A1 (en) 2004-04-05 2005-10-06 Pai-Hsueh Yang E/I core actuator commutation formula and control method
JP2011035381A (ja) 2009-06-30 2011-02-17 Asml Holding Nv 可動物体の位置を制御する方法、位置決め装置を制御する制御システム、およびリソグラフィ装置
JP2012142463A (ja) 2011-01-01 2012-07-26 Canon Inc 露光装置及びデバイス製造方法
JP2019121656A (ja) 2017-12-28 2019-07-22 キヤノン株式会社 制御方法、制御装置、リソグラフィ装置、および物品の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3977086B2 (ja) * 2002-01-18 2007-09-19 キヤノン株式会社 ステージシステム
JP3679776B2 (ja) 2002-04-22 2005-08-03 キヤノン株式会社 駆動装置、露光装置及びデバイス製造方法
JP2004072076A (ja) 2002-06-10 2004-03-04 Nikon Corp 露光装置及びステージ装置、並びにデバイス製造方法
US8140288B2 (en) * 2007-04-18 2012-03-20 Nikon Corporation On-machine methods for identifying and compensating force-ripple and side-forces produced by actuators on a multiple-axis stage
WO2017005387A1 (en) * 2015-07-09 2017-01-12 Asml Netherlands B.V. Movable support and lithographic apparatus
US11460786B2 (en) * 2017-11-15 2022-10-04 Asml Netherlands B.V. Positioning system and a method for positioning a substage or a stage with respect to a frame

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050218842A1 (en) 2004-04-05 2005-10-06 Pai-Hsueh Yang E/I core actuator commutation formula and control method
JP2011035381A (ja) 2009-06-30 2011-02-17 Asml Holding Nv 可動物体の位置を制御する方法、位置決め装置を制御する制御システム、およびリソグラフィ装置
JP2012142463A (ja) 2011-01-01 2012-07-26 Canon Inc 露光装置及びデバイス製造方法
JP2019121656A (ja) 2017-12-28 2019-07-22 キヤノン株式会社 制御方法、制御装置、リソグラフィ装置、および物品の製造方法

Also Published As

Publication number Publication date
TWI854138B (zh) 2024-09-01
KR102890198B1 (ko) 2025-11-24
US20220035260A1 (en) 2022-02-03
CN114002917A (zh) 2022-02-01
US12326666B2 (en) 2025-06-10
KR20220014293A (ko) 2022-02-04
JP2022024792A (ja) 2022-02-09
EP3945368A1 (en) 2022-02-02
TW202223545A (zh) 2022-06-16

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