TWI854138B - 曝光設備和用於製造物品的方法 - Google Patents

曝光設備和用於製造物品的方法 Download PDF

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Publication number
TWI854138B
TWI854138B TW110126194A TW110126194A TWI854138B TW I854138 B TWI854138 B TW I854138B TW 110126194 A TW110126194 A TW 110126194A TW 110126194 A TW110126194 A TW 110126194A TW I854138 B TWI854138 B TW I854138B
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TW
Taiwan
Prior art keywords
thrust
substrate
actuator
substrate stage
stage
Prior art date
Application number
TW110126194A
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English (en)
Chinese (zh)
Other versions
TW202223545A (zh
Inventor
早川崇志
江本圭司
Original Assignee
日商佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商佳能股份有限公司 filed Critical 日商佳能股份有限公司
Publication of TW202223545A publication Critical patent/TW202223545A/zh
Application granted granted Critical
Publication of TWI854138B publication Critical patent/TWI854138B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
TW110126194A 2020-07-28 2021-07-16 曝光設備和用於製造物品的方法 TWI854138B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-127585 2020-07-28
JP2020127585A JP7532131B2 (ja) 2020-07-28 2020-07-28 露光装置、及び物品の製造方法

Publications (2)

Publication Number Publication Date
TW202223545A TW202223545A (zh) 2022-06-16
TWI854138B true TWI854138B (zh) 2024-09-01

Family

ID=76958758

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110126194A TWI854138B (zh) 2020-07-28 2021-07-16 曝光設備和用於製造物品的方法

Country Status (6)

Country Link
US (1) US12326666B2 (enExample)
EP (1) EP3945368A1 (enExample)
JP (1) JP7532131B2 (enExample)
KR (1) KR102890198B1 (enExample)
CN (1) CN114002917A (enExample)
TW (1) TWI854138B (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7504168B2 (ja) * 2022-08-10 2024-06-21 キヤノン株式会社 露光装置、露光方法及び物品の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030179359A1 (en) * 2002-01-18 2003-09-25 Canon Kabushiki Kaisha Stage system
US20080275661A1 (en) * 2007-04-18 2008-11-06 Nikon Corporation On-machine methods for identifying and compensating force-ripple and side-forces produced by actuators on a multiple-axis stage
US20120170008A1 (en) * 2011-01-01 2012-07-05 Canon Kabushiki Kaisha Exposure apparatus and method of manufacturing device
WO2019096536A1 (en) * 2017-11-15 2019-05-23 Asml Netherlands B.V. Positioning system and method for positioning a stage with respect to a frame

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3679776B2 (ja) 2002-04-22 2005-08-03 キヤノン株式会社 駆動装置、露光装置及びデバイス製造方法
JP2004072076A (ja) 2002-06-10 2004-03-04 Nikon Corp 露光装置及びステージ装置、並びにデバイス製造方法
US7253576B2 (en) 2004-04-05 2007-08-07 Nikon Corporation E/I core actuator commutation formula and control method
NL2004847A (en) 2009-06-30 2011-01-04 Asml Holding Nv Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus.
WO2017005387A1 (en) * 2015-07-09 2017-01-12 Asml Netherlands B.V. Movable support and lithographic apparatus
JP7005344B2 (ja) 2017-12-28 2022-01-21 キヤノン株式会社 制御方法、制御装置、リソグラフィ装置、および物品の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030179359A1 (en) * 2002-01-18 2003-09-25 Canon Kabushiki Kaisha Stage system
US20080275661A1 (en) * 2007-04-18 2008-11-06 Nikon Corporation On-machine methods for identifying and compensating force-ripple and side-forces produced by actuators on a multiple-axis stage
US20120170008A1 (en) * 2011-01-01 2012-07-05 Canon Kabushiki Kaisha Exposure apparatus and method of manufacturing device
WO2019096536A1 (en) * 2017-11-15 2019-05-23 Asml Netherlands B.V. Positioning system and method for positioning a stage with respect to a frame

Also Published As

Publication number Publication date
KR102890198B1 (ko) 2025-11-24
US20220035260A1 (en) 2022-02-03
CN114002917A (zh) 2022-02-01
US12326666B2 (en) 2025-06-10
JP7532131B2 (ja) 2024-08-13
KR20220014293A (ko) 2022-02-04
JP2022024792A (ja) 2022-02-09
EP3945368A1 (en) 2022-02-02
TW202223545A (zh) 2022-06-16

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