JP7482653B2 - マーキング方法 - Google Patents
マーキング方法 Download PDFInfo
- Publication number
- JP7482653B2 JP7482653B2 JP2020040493A JP2020040493A JP7482653B2 JP 7482653 B2 JP7482653 B2 JP 7482653B2 JP 2020040493 A JP2020040493 A JP 2020040493A JP 2020040493 A JP2020040493 A JP 2020040493A JP 7482653 B2 JP7482653 B2 JP 7482653B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- cutting
- axis
- chuck table
- marking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000000034 method Methods 0.000 title claims description 52
- 238000005520 cutting process Methods 0.000 claims description 118
- 238000003384 imaging method Methods 0.000 claims description 29
- 230000002093 peripheral effect Effects 0.000 claims description 18
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- 239000013078 crystal Substances 0.000 claims description 7
- 238000002360 preparation method Methods 0.000 claims description 7
- 238000001514 detection method Methods 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000011109 contamination Methods 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67282—Marking devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54493—Peripheral marks on wafers, e.g. orientation flats, notches, lot number
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Dicing (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
1A:基台
1B:門型フレーム
2:表示手段
4:操作パネル
10:ウエーハ
10a:表面
10b:裏面
10c:デバイス形成領域
10d:外周余剰領域
10e:ノッチ側外周余剰領域
12:結晶方位マーク
14:デバイス
16:分割予定ライン
20:切削手段
20A:スピンドルハウジング
21:切削ブレード
22:スピンドル
24:切削水供給手段
28:撮像手段
30:保持手段
32:X軸可動板
38:チャックテーブル
40:X軸送り手段
42:パルスモータ
50:Y軸送り手段
56:Y軸移動基台
58:パルスモータ
60:Z軸送り手段
62:Z軸移動基台
64:パルスモータ
100:制御手段
Claims (4)
- ウエーハへのマーキング方法であって、
ウエーハを保持し回転可能なチャックテーブルと、該チャックテーブルに保持されたウエーハを切削する切削ブレードを回転可能に備えた切削手段と、該チャックテーブルと該切削手段とを相対的にX軸方向に加工送りするX軸送り手段と、該チャックテーブルと該切削手段とを相対的にY軸方向に加工送りするY軸送り手段と、該X軸方向及び該Y軸方向に直交したZ軸方向に該チャックテーブルと該切削手段とを相対的に切込み送りするZ軸送り手段と、該チャックテーブルに保持されたウエーハを撮像する撮像手段と、該撮像手段が撮像した画像を表示する表示手段と、制御手段と、を少なくとも備えた切削装置を用意する切削装置用意工程と、
マーキングすべきマークの情報を該制御手段に登録するマーク情報登録工程と、
ウエーハを該チャックテーブルに保持してウエーハを該撮像手段で撮像し該表示手段に表示してマーキングすべきウエーハの所望位置をX座標、Y座標で特定する位置特定工程と、
該位置特定工程において特定された所望位置のX座標、Y座標に基づいて該X軸送り手段及びY軸送り手段を作動して該切削ブレードを該所望位置に位置付けると共に、該Z軸送り手段を作動して該切削ブレードでマーキングするマーキング工程と、
を含み構成され、
該マーキング工程は、X座標及びY座標によって特定される該所望位置内において、該切削ブレードによって、X軸方向に沿う複数の溝をY軸方向に形成するものであり、該溝を形成する位置の組み合わせによって、アルファベット又は数字の文字形状を描画するマーキング方法。 - 該位置特定工程において、マーキングすべきウエーハの所望位置は、ウエーハの表面のデバイス形成領域を囲繞する外周余剰領域で特定される請求項1に記載のマーキング方法。
- 該位置特定工程において、マーキングすべきウエーハの所望位置は、外周余剰領域の結晶方位マークの側である請求項2に記載のマーキング方法。
- 該位置特定工程において、マーキングすべきウエーハの所望位置は、ウエーハの裏面である請求項1に記載のマーキング方法。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020040493A JP7482653B2 (ja) | 2020-03-10 | 2020-03-10 | マーキング方法 |
TW110106757A TW202135210A (zh) | 2020-03-10 | 2021-02-25 | 標記方法 |
KR1020210028783A KR20210114341A (ko) | 2020-03-10 | 2021-03-04 | 마킹 방법 |
CN202110249737.7A CN113380612A (zh) | 2020-03-10 | 2021-03-08 | 标记方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020040493A JP7482653B2 (ja) | 2020-03-10 | 2020-03-10 | マーキング方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021144963A JP2021144963A (ja) | 2021-09-24 |
JP7482653B2 true JP7482653B2 (ja) | 2024-05-14 |
Family
ID=77570627
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020040493A Active JP7482653B2 (ja) | 2020-03-10 | 2020-03-10 | マーキング方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP7482653B2 (ja) |
KR (1) | KR20210114341A (ja) |
CN (1) | CN113380612A (ja) |
TW (1) | TW202135210A (ja) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019021883A (ja) | 2017-07-21 | 2019-02-07 | 株式会社ディスコ | ウエーハの切削方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60217624A (ja) * | 1984-04-13 | 1985-10-31 | Toshiba Corp | 半導体ウエ−ハ製造方法 |
JPH02125412A (ja) * | 1988-11-04 | 1990-05-14 | Yamaha Corp | バーコード付き物品とその製法 |
JP3685837B2 (ja) | 1995-05-30 | 2005-08-24 | 宮崎沖電気株式会社 | 半導体ウエハへのレーザマーキング方法及びその装置 |
-
2020
- 2020-03-10 JP JP2020040493A patent/JP7482653B2/ja active Active
-
2021
- 2021-02-25 TW TW110106757A patent/TW202135210A/zh unknown
- 2021-03-04 KR KR1020210028783A patent/KR20210114341A/ko active Search and Examination
- 2021-03-08 CN CN202110249737.7A patent/CN113380612A/zh active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019021883A (ja) | 2017-07-21 | 2019-02-07 | 株式会社ディスコ | ウエーハの切削方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2021144963A (ja) | 2021-09-24 |
CN113380612A (zh) | 2021-09-10 |
TW202135210A (zh) | 2021-09-16 |
KR20210114341A (ko) | 2021-09-23 |
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