JP7476356B2 - Manufacturing method of far infrared ceramic polished glaze tile with high wear resistance - Google Patents

Description

The present invention belongs to the technical field of ceramic tile production and manufacturing, and relates to abrasion-resistant far-infrared polished glaze ceramic tiles and a manufacturing method thereof.

Polished glaze tile products are deeply loved by consumers for their bright colors, rich patterns, and bright glaze surface texture. However, at present, fully polished glaze products cannot combine transparency and wear resistance. Highly transparent fully polished glaze products have high transparency, clear patterns, and rich texture, while highly wear-resistant fully polished glaze products have good wear resistance, but low transparency, faint patterns, rough texture, and poor flatness after polishing. In recent years, with the development of ceramic technology, ceramic tiles are not only used as decorative materials, but also combined with many functional materials to produce many functional ceramic tiles. Due to the continuous emission of far-infrared light waves, far-infrared tiles have many positive effects on the human body, such as improving blood circulation, activating biomolecules, strengthening human immunity, and antibacterial properties. Some manufacturers have produced a series of far-infrared antique tiles, and far-infrared polished glaze tiles have not yet been mass-produced.

Chinese Utility Model No. 203022281 China Patent Publication No. 108751710 Chinese Patent Publication No. 107285812 Chinese Patent Publication No. 107382373

ZIIANG, Lingjie et al., Effects of Heat Treatment on Far-Infrared Emissivity of Tourmaline, Journal of Ceramics, Vol.30, No.3, September 2009, pp. 286-289

In consideration of the above problems, the present invention aims to provide a ceramic polished glaze tile with far-infrared function, high transparency, and high wear resistance, and a manufacturing method thereof.

In a first aspect, the present invention provides a method for producing a highly wear-resistant far-infrared ceramic polished glaze tile, which comprises sequentially applying a far-infrared surface glaze, inkjet printing, a transparent far-infrared polished glaze, and a wear-resistant far-infrared polished glaze to a substrate, followed by firing and polishing.

According to the above invention, by using a combination of far-infrared surface glaze, transparent far-infrared polished glaze, and wear-resistant far-infrared polished glaze, the polished glaze tile can combine far-infrared functionality, high transparency, and high wear resistance.

Preferably, the mineral composition of the far-infrared surface glaze includes, by mass, 30%-40% far-infrared feldspar powder, 10%-20% albite, 5%-10% kaolin, 15%-25% quartz sand, 5%-15% zirconium silicate, 5%-10% calcined kaolin, and 5%-10% alumina.

Preferably, the chemical composition of said far-infrared surface glaze comprises, by mass, SiO ₂ : 63%-73%, Al ₂ O ₃ : 16%-24%, Fe ₂ O ₃ : 0.5-0.7%, TiO ₂ : 0.25-0.35%, CaO: 0.3-0.6%, MgO: 0.4-1.0%, K ₂ O: 3.0-4.0%, Na ₂ O: 1.5-2.5%, Rb ₂ O: 120-180 ppm, Y ₂ O ₃ : 90-130 ppm, ZrO ₂ : 3.2-9.6%, and loss on ignition: 1.1-1.5%.

Preferably, the mineral composition of the transparent far-infrared polished glaze comprises, by mass, 25-35% far-infrared feldspar powder, 8-12% zinc oxide, 5-8% barium carbonate, 7-9% sintered talc, 8-10% kaolin, and 35-45% glass frit.

Preferably, the chemical composition of said transparent far-infrared polishing glaze includes, by mass, SiO ₂ : 50%-60%, Al ₂ O ₃ : 6%-8%, Fe ₂ O ₃ : 0.2-0.3%, TiO ₂ : 0.25-0.35%, CaO: 5.5-8.5%, MgO: 3.1-4.2%, BaO: 3.5-6.5%, ZnO: 8.0-13.0%, K ₂ O: 3.0-4.0%, Na ₂ O: 1.0-2.0%, Rb ₂ O: 100-155 ppm, Y ₂ O ₃ : 70-110 ppm, and loss on ignition: 2.0-3.5%.

Preferably, said transparent far-infrared polishing glaze is applied by waterfall glaze method, and the process parameters of waterfall glaze are specific gravity 1.80-1.85, weight 300-350g/ ^m2 .

Preferably, the mineral composition of the wear-resistant far-infrared polishing glaze comprises, by mass, 15-25% far-infrared feldspar powder, 10-15% zinc oxide, 12-16% barium carbonate, 7-9% sintered talc, 8-10% kaolin, 35-45% glass frit, and 4-6% 150 mesh corundum.

Preferably, the chemical composition of said wear-resistant far-infrared polishing glaze includes, by mass, SiO ₂ : 40-50%, Al ₂ O ₃ : 9-11.5%, Fe ₂ O ₃ : 0.2-0.3%, TiO ₂ : 0.25-0.35%, CaO: 6-8.5%, MgO: 2.5-4.5%, BaO: 9.5-13.0%, ZnO: 10.0-16.0%, K ₂ O: 2.0-4.0%, Na ₂ O: 0.6-1.0%, Rb ₂ O: 60-110 ppm, Y ₂ O ₃ : 40-80 ppm, and loss on ignition: 3.5-5.0%.

Preferably, the wear-resistant far-infrared polishing glaze is applied by waterfall glaze method, and the process parameters of waterfall glaze are specific gravity 1.80-1.85, weight 350-400g/ ^m2 .

In a second aspect, the present application provides a highly wear-resistant far infrared ceramic polished glaze tile obtained by any of the above manufacturing methods.

The far infrared radiation normal emissivity of the polished glaze tile reaches 0.89, and the wear resistance is 6000
rpm (level 4), the specular gloss is high, and the transparency is strong.

FIG. 1 is a process flow diagram of an embodiment of the present invention. FIG. 2 is a diagram showing the surface of a polished glazed tile manufactured in Example 1. FIG. 2 is a diagram showing the surface of a polished glazed tile produced in Example 2. FIG. 1 shows the surface of a polished glazed tile produced in Example 3. FIG. 1 shows the surface of a polished glazed tile produced in Example 4. FIG. 1 shows the surface of a polished glazed tile produced in Example 5.

BEST EMBODIMENTS OF THE PRESENT INDUSTRIAL APPLICABILITY The present invention is further described by the following embodiments, and it should be understood that the following embodiments are only used to describe the present invention, and do not limit the present invention. All percentages below refer to mass percentages unless otherwise specified.

The mineral composition of the far-infrared surface glaze formulation of the embodiment of the present invention includes, by mass, 30%-40% far-infrared feldspar powder, 10%-20% albite, 5%-10% kaolin, 15%-25% quartz sand, 5%-15% zirconium silicate, 5%-10% calcined kaolin, and 5%-10% alumina. The far-infrared feldspar powder is a type of feldspar powder with high far-infrared emissivity, and is a compound containing magnesium aluminosilicate doped with impurity ions and having a highly asymmetric lattice, and the compound has high far-infrared emissivity. In one embodiment, its chemical composition is, by mass, _SiO2 : 70-80%, _Al2O3 : _10-13 %, Fe2O3: 0.3-0.5%, _{P2O5 :} 0.25-0.35%, CaO: 0.5-1.0%, MgO _: 0.8-1.2%, _Rb2O : _400ppm -450ppm, _Y2O3 : 280ppm _- 320ppm, _K2O : 8.0-9.0%, _Na2O : 2.0-3.0%, and loss on ignition: 0.5-1.0%. Its far-infrared emissivity can reach 0.91 or more. In this field, tourmaline, zirconium dioxide, etc. are commonly used to provide far-infrared function, but tourmaline is a hydroxysilicate compound, and it decomposes at temperatures above 950 degrees, destroying its structure and greatly reducing its far-infrared emissivity, while zirconium dioxide is difficult to separate, and its cost is relatively high and its radioactivity is relatively high. Far-infrared feldspar powder has excellent high temperature stability and low radioactivity. In this embodiment, far-infrared feldspar powder is used to provide far-infrared function, which can provide high far-infrared emissivity at low cost without radioactivity, and does not harm the human body and the environment.

The chemical composition of the far-infrared surface glaze of one embodiment of the present invention includes, by mass, SiO ₂ : 63%-73%, Al ₂ O ₃ : 16%-24%, Fe ₂ O ₃ : 0.5-0.7%, TiO ₂ : 0.25-0.35%, CaO: 0.3-0.6%, MgO: 0.4-1.0%, K ₂ O: 3.0-4.0%, Na ₂ O: 1.5-2.5%, ZrO ₂ : 3.2-9.6%, Rb ₂ O: 120-180 ppm, Y ₂ O ₃ : 90-130 ppm, and loss on ignition: 1.1-1.5%. Among them, MgO-SiO ₂ -Al ₂ O ₃ form magnesium aluminosilicate compounds with highly asymmetric lattices doped with some impurity ions (Fe ³⁺ , Y ³⁺ , Mn ²⁺ , Cu ²⁺ , etc.), which have Y ³⁺ , Mn ²⁺ and far-infrared radiation functions.

The expansion coefficient of the far-infrared surface glaze at 40°C to 400°C is 8.0816×10 ^{-6 /} K to 8.3816× ^{10 -6} /K.

The mineral composition of the transparent far-infrared polished glaze (or "highly transparent far-infrared polished glaze", "highly transparent far-infrared polished glaze") according to one embodiment of the present invention includes, by mass, 25-35% far-infrared feldspar powder, 8-12% zinc oxide, 5-8% barium carbonate, 7-9% sintered talc, 8-10% kaolin, and 35-45% glass frit. Glass frit refers to highly transparent frit, and its chemical composition can be SiO ₂ : 64%-70%, Al ₂ O ₃ : 3%-6%, Fe ₂ O ₃ : 0.2-0.3%, TiO ₂ : 0.15-0.25%, CaO: 16%-22%, MgO: 1%-4%, K ₂ O: 2%-4%, Na ₂ O: 0.5%-1.5%, and ZnO: 1%-4%.

The chemical composition of the transparent far-infrared polished glaze according to one embodiment of the present invention includes, by mass, SiO ₂ : 50%-60%, Al ₂ O ₃ : 6%-8%, Fe ₂ O ₃ : 0.2-0.3%, TiO ₂ : 0.25-0.35%, CaO: 5.5-8.5%, MgO: 3.1-4.2%, BaO: 3.5-6.5%, ZnO: 8.0-13.0%, K ₂ O: 3.0-4.0%, Na ₂ O: 1.0-2.0%, Rb ₂ O: 100-155 ppm, Y ₂ O ₃ : 70-110 ppm, and loss on ignition: 2.0-3.5%.

The above-mentioned transparent far- _infrared polished glaze has a relatively small _Al2O3 content and a high CaO, MgO and ZnO content. The high-temperature viscosity of the polished glaze is small, so that the air bubbles in the polished glaze layer can be completely expelled. The polished glaze does not contain any devitrification agent, so that the transparency of the glaze layer is high.

The expansion coefficient of the transparent far infrared polishing glaze at 40°C to 400°C can be 6.0516 x 10 ^{-6 /} K to 6.4816 ^{x 10 -6} /K.

The mineral composition of the wear-resistant far-infrared polished glaze (or "high wear-resistant far-infrared polished glaze") according to one embodiment of the present invention includes, by mass, 15-25% far-infrared feldspar powder, 10-15% zinc oxide, 12-16% barium carbonate, 7-9% calcined talc, 8-10% kaolin, 35-45% glass frit, and 4-6% 150 mesh corundum. The chemical composition of the glass frit can be as described above.

The chemical composition of the wear-resistant far-infrared polished glaze according to one embodiment of the present invention includes, by mass, SiO ₂ : 40-50%, Al ₂ O ₃ : 9-11.5%, Fe ₂ O ₃ : 0.2-0.3%, TiO ₂ : 0.25-0.35%, CaO: 6-8.5%, MgO: 2.5-4.5%, BaO: 9.5-13.0%, ZnO: 10.0-16.0%, K ₂ O: 2.0-4.0%, Na ₂ O: 0.6-1.0%, Rb ₂ O: 60-110 ppm, Y ₂ O ₃ : 40-80 ppm, and loss on ignition: 3.5-5.0%.

The content of BaO in the above wear-resistant far-infrared polishing glaze is relatively high, and barium feldspar crystals can be formed under the flux action of ZnO and CaO, and the hardness and wear resistance of the barium feldspar crystals are relatively high. The magnesium aluminosilicate contained in the far-infrared feldspar powder of the above wear-resistant far-infrared glaze is retained during the reaction process, and the hardness and wear resistance of these magnesium aluminosilicate crystals are also relatively high. The feldspar barium crystals and magnesium aluminosilicate crystals and a small amount of corundum can meet the requirements for improving the hardness and wear resistance of the glaze polishing.

The expansion coefficient of wear-resistant far-infrared polished glaze at 40℃ to 400℃ is 5.9516× ^10-6
/K ^∼6.1816 ×10 ^-6 /K.

The polished glazed tile of one embodiment of the present invention is obtained by applying a far-infrared surface glaze, a transparent far-infrared glaze, and an abrasion-resistant far-infrared glaze to a base material and firing the applied layer. In a preferred embodiment, the polished glazed tile has, from bottom to top, a base material, a far-infrared surface glaze, a pattern layer, a transparent far-infrared polished glaze layer, and an abrasion-resistant far-infrared polished glaze layer. The manufacturing method of the polished glazed tile is illustrated below with reference to FIG. 1.

First, a green body is manufactured. The green body can be manufactured by a method commonly used in the art, for example, by molding a general ceramic-based material through a press. After molding, the green body can be dried. The expansion coefficient of the green body at 40°C to 400°C can be 7.4816 x 10 ^{-6 /} K to 7.6816 ^{x 10 -6} /K.

Then, the substrate is coated with a far-infrared surface glaze. The far-infrared surface glaze can radiate far-infrared rays, cover the base color of the substrate, and promote the color development of the ink. The far-infrared surface glaze can be applied by spray or waterfall glaze. When producing the glaze slurry, the ball mill compounding ratio can be 70.4%-72.4% far-infrared surface glaze (dry material), 0.11-0.16% sodium tripolyphosphate, 0.14-0.21% sodium methylcellulose, and 28.5-29.5% water. The fineness can be 325 mesh sieve residue ≦0.6%. The parameters of the spray glaze process can be specific gravity 1.40-1.50, weight 450-650g/ ^m2 . Using the spray glaze process parameters, the surface glaze is less likely to settle, the spray uniformity is higher, and defects such as dry holes are less likely to occur. The thickness of the far-infrared surface glaze layer can be 0.25mm to 0.30mm.

Next, the pattern is inkjet printed onto the far-infrared surface glaze.

Then, a highly transparent far-infrared polished glaze is applied. The highly transparent far-infrared polished glaze can be applied by waterfall glaze. When producing the glaze slurry, the ball mill compounding ratio can be 71.5%-73.5% highly transparent far-infrared polished glaze (dry material), 0.14-0.21% sodium tripolyphosphate, 0.10-0.12% sodium methylcellulose, and 27-29% water. The fineness can be 325 mesh sieve residue ≦0.6%. The process parameters of the waterfall glaze can be specific gravity 1.80-1.85, weight 250-300g/ ^m2 . The waterfall glaze process parameters can be used to make the polished glaze surface uniform and flat, and reduce the moisture of the glaze layer and the base. The thickness of the highly transparent far-infrared glaze layer can be 0.13mm-0.16mm.

Then, a highly wear-resistant far-infrared polished glaze is applied. The highly wear-resistant far-infrared polished glaze can be applied with waterfall glaze. When producing the glaze slurry, the ball mill compounding ratio can be 71.5%-73.5% highly wear-resistant far-infrared surface glaze (dry material), 0.14-0.21% sodium tripolyphosphate, 0.10-0.12% sodium methylcellulose, and 27-29% water. The fineness can be 325 mesh sieve residue ≦0.6%. The process parameters of the waterfall glaze are specific gravity 1.80-1.85, weight 350-400g/ ^m2 . The waterfall glaze process parameters can be used to make the polished glaze surface uniform and flat, and reduce the moisture of the glaze layer and the base material. The thickness of the highly wear-resistant far-infrared glaze layer can be 0.15mm-0.20mm.

Then, it is fired in a firing furnace. The maximum firing temperature can be 1200-1220°C, and the firing cycle can be 120-150 minutes.

After leaving the kiln, the glaze is polished. In one embodiment, it is polished with elastic polishing blocks arranged in the following groups: 8 groups of 140 mesh, 6 groups of 240 mesh, 6 groups of 300 mesh, 8 groups of 400 mesh, 4 groups of 600 mesh, 4 groups of 800 mesh, 4 groups of 1000 mesh, 4 groups of 1500 mesh, 4 groups of 2000 mesh, and 8 groups of 3000 mesh. This method can be used for deep polishing, so the surface of the glaze is smoother after polishing.

In this embodiment, the combination of the high transparency far-infrared polishing glaze and the high wear resistance far-infrared polishing glaze can give the polished glaze tile high transparency and high wear resistance. In addition, in the formulation of the surface glaze and the polishing glaze, both contain far-infrared feldspar powder, so that the far-infrared function is strong. The far-infrared surface glaze, the high transparency far-infrared polishing glaze, and the wear resistance far-infrared polishing glaze in the present invention all use far-infrared materials, which can obtain stronger far-infrared function, and if there is only one with far-infrared function, its far-infrared emissivity will be low. The high transparency far-infrared polishing glaze and the high wear resistance far-infrared polishing glaze of the present invention have a low expansion coefficient and a thick glaze layer, which makes it easy to produce arches in the tile shape and difficult to polish, and the far-infrared surface glaze has a high expansion coefficient and can adjust the shape of the tile. In addition, the high transparency far-infrared polishing glaze has a low content of aluminum and a high content of fluxes such as calcium, magnesium, and zinc, which can improve the fluidity of the wear resistance far-infrared polishing glaze during the firing process. The surface of the far-infrared polishing glaze is smoother, which is conducive to polishing, and at the same time, the barium feldspar in the far-infrared polishing glaze with high wear resistance is easier to crystallize and grow to a certain size.

Here, we provide a technology that uses far-infrared materials and combines the manufacturing process by adjusting the polishing glaze formula, so as to realize the wear resistance and far-infrared function of the polished glaze tile. After polishing, the product's far-infrared normal emissivity reaches more than 0.89, the wear resistance reaches 6000 rpm (level 4), the mirror gloss is high, and the transparency is strong.

[0036] The following is a detailed description of the present invention with further examples. The following examples are only used to further explain the present invention and should not be construed as limiting the scope of protection of the present invention. It should also be understood that some non-essential improvements and adjustments made by those skilled in the art according to the above content of the present invention belong to the scope of protection of the present invention. The specific process parameters in the following examples are merely examples of suitable ranges. That is, those skilled in the art can make selections within the appropriate ranges through the description of this specification, and are not intended to be limited to the specific numerical values exemplified below. The far-infrared feldspar powder was purchased from Inner Mongolia Huashen Renewable Resources Technology Co., Ltd., and its chemical composition is _SiO2 : 75.5%, _Al2O3 : _10.5 %, Fe2O3: 0.45%, _{P2O5 :} 0.27%, CaO _: 0.75%, _MgO : _1.03 %, Rb2O: 430 ppm, _Y2O3 : ₃₁₀ ppm, _K2O : 8.17%, _Na2O : 2.68%, and loss on ignition: 0.72%.

Example 1
1. The formula of the green material is carefully selected sodalite powder 5%, medium temperature sand 15%, low temperature sodium sand 15%, ban sand 18%, shaoguan ball clay 6%, washed ball clay 12%, calcined bauxite 6%, black talc 1%, potassium aluminum sand 18%, raw ore slime 4%. Its chemical composition is _SiO2 : 63.5-65%, _Al2O3 : 21-24%, _{Fe2O3 :} 0.4-0.7%, TiO2: _0.25-0.35 %, CaO: 0.25-0.35%, MgO: 0.5-0.80%, _{K2O :} 2.0-2.4%, _Na2O : 2.6-3.0%, ignition loss: 4.5-5.5%. The raw materials are pressed and dried to obtain the green material. The expansion coefficient of the substrate is 7.4816×10 ⁻⁶ /K.

2. The far-infrared surface glaze was applied to the base material. The formulation of the far-infrared surface glaze is 35% far-infrared feldspar powder, 13% albite, 9% kaolin, 20% quartz sand, 10% zirconium silicate, 8% calcined kaolin, and 5% alumina. The chemical composition of the far-infrared surface glaze is _SiO2 : 66.82%, _Al2O3 : _18.05 %, _Fe2O3 : _0.5 %, _TiO2 : 0.26%, CaO: 0.58%, MgO: 0.5%, _K2O : 3.23%, _Na2O : 1.8%, _ZrO2 : 6.4%, _Rb2O : 150ppm, _Y2O3 : _109ppm , and loss on ignition: 1.27%. The expansion coefficient of the far-infrared surface glaze at 40°C to 400°C is 8.1816×10 ^-6 /K. The ball mill compounding ratio is 70.91% far-infrared surface glaze dry material, 0.16% sodium tripolyphosphate, 0.15% sodium methylcellulose, and 28.78% water. 325 mesh sieve residue ≦0.6%. The far-infrared surface glaze uses spray glaze, the specific gravity of the glaze is 1.45, and the amount of glaze applied is 500g/m ² .

3. The pattern was ink-jet printed onto the far-infrared surface glaze.

4. Waterfall high-transparency far-infrared polished glaze. The mineral composition of the high-transparency far-infrared polished glaze is 30% far-infrared feldspar powder, 10% zinc oxide, 6% barium carbonate, 7% sintered talc, 9% kaolin, and 38% glass frit. The chemical composition of the high-transparency far-infrared polished glaze is _SiO2 : 59.38%, _Al2O3 : _6.53 %, _Fe2O3 : _0.21 %, _TiO2 : 0.26%, CaO: 8.01%, MgO: 3.51%, _BaO : 3.84%, ZnO: 10.69%, _K2O : 3.76%, _Na2O : 1.1%, _Rb2O : 129ppm, _Y2O3 : 93ppm, and ignition loss: 2.46%. The expansion coefficient of the highly transparent far-infrared glaze at 40°C to 400°C is 6.1516×10 ^-6 /K. The ball mill compounding ratio is 72.0% highly transparent far-infrared polished glaze dry material, 0.15% sodium tripolyphosphate, 0.11% sodium methylcellulose, and 27.74% water. 325 mesh sieve residue ≦0.6%. The highly transparent far-infrared polished glaze is a waterfall glaze, with a glaze specific gravity of 1.83 and a glaze amount of 310g/m ^2. The glaze layer thickness is 0.14mm.

5. Waterfall high wear-resistant far-infrared polishing glaze. The mineral composition of the high wear-resistant far-infrared polishing glaze is 17% far-infrared feldspar powder, 12% zinc oxide, 14% barium carbonate, 7% sintered talc, 9% kaolin, 36% glass frit, and 5% 150 mesh corundum. The chemical composition of the highly wear-resistant far-infrared polished glaze is _SiO2 : 46.36% _{, Al2O3} : _10.06 %, _Fe2O3 : 0.21%, TiO2: _0.27 %, CaO: 7.48%, MgO: 3.28%, BaO: 10.88%, ZnO: 12.68%, _K2O : 2.64%, _Na2O : 0.75%, _Rb2O : 73 ppm, _Y2O3 : ₅₃ ppm, ignition loss: 4.13%. The expansion coefficient of the highly wear-resistant far-infrared polished glaze at 40℃-400℃ is 6.0816× ^10-6 /K. The ball mill compounding ratio is 72.0% of the highly wear-resistant far-infrared polished glaze dry material, 0.15% of sodium tripolyphosphate, 0.11% of sodium methylcellulose, and 27.74% of water. The 325 mesh sieve residue is ≦0.6%. The highly wear-resistant far-infrared polished glaze is a waterfall glaze, with a glaze specific gravity of 1.83 and a glaze amount of 360g/ ^m2 . The glaze layer thickness is 0.18mm.

6. The mixture is fired in a firing furnace at a firing temperature of 1220°C and a firing cycle of 120 minutes.

7. After leaving the kiln, the material was polished with elastic polishing blocks, which were arranged in the following groups: 8 groups of 140 mesh, 4 groups of 240 mesh, 4 groups of 300 mesh, 8 groups of 400 mesh, 4 groups of 600 mesh, 4 groups of 800 mesh, 4 groups of 1000 mesh, 4 groups of 1500 mesh, 4 groups of 2000 mesh, and 8 groups of 3000 mesh.

The surface of the obtained polished glazed tile is shown in Figure 2. The left image in Figure 2 is a real image, and the right image is a photograph of the glaze layer enlarged 60 times. From the left image, it can be seen that the reflection of the fluorescent tube is straight, the mirror gloss is high, and the transparency is high, and from the right image, it can be seen that there are few air bubbles, no large particle crystals or devitrified components, and the inkjet pattern is clear. The abrasion resistance of the obtained polished glazed tile was tested with a glazed tile abrasion resistance tester (manufacturer: Ningxia Research Institute Co., Ltd., model: CYM-8), and the abrasion resistance is 6000 rpm (level 4). After testing the far-infrared normal emissivity of the obtained polished glazed tile with a Fourier transform infrared spectrometer, its far-infrared normal emissivity was 0.892.

Example 2
The differences from Example 1 are as follows: The mineral composition of the highly transparent far-infrared polished glaze is:
The composition of the far-infrared feldspar powder is 25%, zinc oxide 8%, barium carbonate 5%, sintered talc 9%, kaolin 8%, and glass frit 45%. The chemical composition of the highly transparent far-infrared polished glaze is _SiO2 : 59.24%, _Al2O3 : _6.11 %, _Fe2O3 : _0.20 %, _TiO2 : 0.26%, CaO: 8.38%, MgO: 4.12%, _BaO : 3.89%, ZnO: 8.84%, _K2O : 3.53%, _Na2O : 1.02%, _Rb2O : 107ppm, _Y2O3 : 77ppm, and loss on ignition: 2.11%. The expansion coefficient of the highly transparent far-infrared glaze at 40°C to 400°C is 6.1816×10 ^-6 /K.

The surface of the obtained polished glazed tile is shown in Figure 3. The left image in Figure 3 is a real image, and the right image is a photograph of the glaze layer enlarged 60 times. From the left image, it can be seen that the reflection of the fluorescent tube is straight, the mirror gloss is high, and the transparency is high, and from the right image, it can be seen that there are few air bubbles, no large crystal particles or devitrified components, and the inkjet pattern is clear. The abrasion resistance of the obtained polished glazed tile was tested using a glazed tile abrasion resistance tester, and the abrasion resistance was 6000 rpm (level 4). After testing the far-infrared normal emissivity of the obtained polished glazed tile with a Fourier transform infrared spectrometer, the far-infrared normal emissivity was 0.891.

Example 3
The differences from Example 1 are as follows. The mineral composition of the highly transparent far-infrared polished glaze is 27% far-infrared feldspar powder, 12% zinc oxide, 8% barium carbonate, 9% sintered talc, 9% kaolin, and 35% glass frit. The chemical composition of the highly transparent far-infrared polished glaze is _SiO2 : 54.51%, _Al2O3 : _6.18 %, _Fe2O3 : _0.21 %, _TiO2 : 0.26%, CaO: 7.37%, MgO: 4.06%, _BaO : 6.22%, ZnO: 12.61%, _K2O : 3.44%, _Na2O : 1.01%, _Rb2O : 116ppm, _Y2O3 : 84ppm, and loss on ignition: 2.88%. The expansion coefficient of the highly transparent far-infrared glaze at 40°C to 400°C is 6.1316×10 ^-6 /K.

The surface of the obtained polished glazed tile is shown in Figure 4. The left image in Figure 4 is a real image, and the right image is a photograph of the glaze layer enlarged 60 times. From the left image, it can be seen that the reflection of the fluorescent tube is straight, the mirror gloss is high, and the transparency is high, and from the right image, it can be seen that there are few air bubbles, no large crystal particles or devitrified components, and the inkjet pattern is clear. The abrasion resistance of the obtained polished glazed tile was tested using a glazed tile abrasion resistance tester, and the abrasion resistance was 6000 rpm (level 4). After testing the far-infrared normal emissivity of the obtained polished glazed tile with a Fourier transform infrared spectrometer, the far-infrared normal emissivity was 0.891.

Example 4
The differences from Example 1 are as follows: The mineral composition of the highly wear-resistant far-infrared polishing glaze is 15% far-infrared feldspar powder, 15% zinc oxide, 12% barium carbonate, 8% sintered talc, 9% kaolin, 35% glass frit, and 6% 150 mesh corundum. The chemical composition of the highly wear-resistant far-infrared polished glaze is _SiO2 : _44.77 %, _Al2O3 : _10.87 %, _Fe2O3 : 0.20%, TiO2: _0.26 %, CaO: 7.05%, MgO: 3.76%, BaO: 9.52%, ZnO: 15.57%, _K2O : 2.43%, _Na2O : 0.69%, _Rb2O : 64 ppm, _Y2O3 : ₄₆ ppm, ignition loss: 3.68%. The expansion coefficient of the highly wear-resistant far-infrared polished glaze at 40℃-400℃ is 6.1816× ^10-6 /K.

The surface of the obtained polished glazed tile is shown in FIG. 5. The left figure in FIG. 5 is a real image, and the right figure is a photograph of the glaze layer enlarged 60 times. From the left figure, it can be seen that the reflection of the fluorescent tube is straight, the specular gloss is high, and the transparency is high, and from the right figure, it can be seen that there are few bubbles, no large particle crystals or devitrified components, and the inkjet pattern is clear. The abrasion resistance of the obtained polished glazed tile was tested with a glazed tile abrasion resistance tester, and the abrasion resistance was 6000 rpm (level 4). After the far-infrared normal emissivity of the obtained polished glazed tile was tested by the test method of the Fourier transform infrared spectrometer, the far-infrared normal emissivity was 0.89.

Example 5
The differences from Example 1 are as follows. The mineral composition of the highly wear-resistant far-infrared polishing glaze is 19% far-infrared feldspar powder, 10% zinc oxide, 12% barium carbonate, 7% sintered talc, 8% kaolin, 40% glass frit, and 4% 150 mesh corundum. The chemical composition of the highly wear-resistant far-infrared polishing glaze is _SiO2 : 50.0%, _Al2O3 : _9.0 %, _Fe2O3 : 0.22 _% , _TiO2 : 0.27%, CaO: 8.31%, MgO: 3.38%, BaO: 9.52%, ZnO: 10.73%, _K2O : 2.90%, _Na2O : 0.82%, _Rb2O : 82ppm, _Y2O3 : _59ppm , and ignition loss: 3.60%. The expansion coefficient of the highly wear-resistant far-infrared polished glaze at 40°C to 400°C is 6.0216 x 10 ^-6 /K.

The surface of the obtained polished glazed tile is shown in Figure 6. The left image in Figure 6 is a real image, and the right image is a photograph of the glaze layer enlarged 60 times. From the left image, it can be seen that the reflection of the fluorescent tube is straight, the mirror gloss is high, and the transparency is high, and from the right image, it can be seen that there are few air bubbles, no large crystal particles or devitrified components, and the inkjet pattern is clear. The abrasion resistance of the obtained polished glazed tile was tested using the method of the glazed tile abrasion resistance tester, and the abrasion resistance was 6000 rpm (level 4). After testing the far-infrared normal emissivity of the obtained polished glazed tile with a Fourier transform infrared spectrometer, the far-infrared normal emissivity was 0.89.

Claims (6)

A method for producing a highly wear-resistant far-infrared ceramic polished glaze tile, comprising the steps of applying a far-infrared surface glaze, inkjet printing, a transparent far-infrared polished glaze, and a wear-resistant far-infrared polished glaze to a substrate in sequence, and then firing and polishing;
Here, the chemical composition of the far-infrared surface glaze includes, by mass, SiO ₂ : 63% to 73%, Al ₂ O ₃ : 16% to 24%, Fe ₂ O ₃ : 0.5 to 0.7%, TiO ₂ : 0.25 to 0.35%, CaO: 0.3 to 0.6%, MgO: 0.4 to 1.0%, K ₂ O: 3.0 to 4.0%, Na ₂ O: 1.5 to 2.5%, ZrO ₂ : 3.2 to 9.6%, Rb ₂ O: 120 to 180 ppm, Y ₂ O ₃ : 90 to 130 ppm, and ignition loss: 1.1 to 1.5%;
The chemical composition of the transparent far-infrared polished glaze includes, by mass, SiO ₂ : 50%-60%, Al ₂ O ₃ : 6%-8%, Fe ₂ O ₃ : 0.2-0.3%, TiO ₂ : 0.25-0.35%, CaO: 5.5-8.5%, MgO: 3.1-4.2%, BaO: 3.5-6.5%, ZnO: 8.0-13.0%, K ₂ O: 3.0-4.0%, Na ₂ O: 1.0-2.0%, Rb ₂ O: 100-155 ppm, Y ₂ O ₃ : 70-110 ppm, and ignition loss: 2.0-3.5%.
The chemical composition of the wear-resistant far-infrared polished glaze includes, by mass, SiO ₂ : 40-50%, Al ₂ O ₃ : 9-11.5%, Fe ₂ O ₃ : 0.2-0.3%, TiO ₂ : 0.25-0.35%, CaO: 6-8.5%, MgO: 2.5-4.5%, BaO: 9.5-13.0%, ZnO: 10.0-16.0%, K ₂ O: 2.0-4.0%, Na ₂ O: 0.6-1.0%, Rb ₂ O: 60-110 ppm, Y ₂ O ₃ : 40-80 ppm, and ignition loss: 3.5-5.0%;
Furthermore, the method for producing a highly wear-resistant far-infrared ceramic polished glaze tile is characterized in that the far-infrared surface glaze, the transparent far-infrared polished glaze and the wear- resistant far-infrared polished glaze use far-infrared feldspar powder to provide the far-infrared function, and the far-infrared feldspar powder is a compound containing magnesium aluminosilicate doped with impurity ions and having a highly asymmetric lattice. The manufacturing method described in claim 1, characterized in that the mineral composition of the far-infrared surface glaze contains, by mass, 30% to 40% far-infrared feldspar powder, 10% to 20% albite, 5% to 10% kaolin, 15% to 25% quartz sand, 5% to 15% zirconium silicate, 5% to 10% calcined kaolin, and 5% to 10% alumina. The manufacturing method described in claim 1, characterized in that the mineral composition of the transparent far-infrared polished glaze contains, by mass, 25-35% far-infrared feldspar powder, 8-12% zinc oxide, 5-8% barium carbonate, 7-9% sintered talc, 8-10% kaolin, and 35-45% glass frit. The manufacturing method as claimed in claim 1, characterized in that the transparent far-infrared polished glaze is applied by waterfall glazing method, and the process parameters of waterfall glaze are specific gravity 1.80-1.85, weight 300-350g/ ^m2 . The manufacturing method described in claim 1, characterized in that the mineral composition of the wear-resistant far-infrared polishing glaze includes, by mass, 15-25% far-infrared feldspar powder, 10-15% zinc oxide, 12-16% barium carbonate, 7-9% sintered talc, 8-10% kaolin, 35-45% glass frit, and 4-6% 150 mesh corundum. The manufacturing method according to claim 1, characterized in that the wear-resistant far-infrared polished glaze is applied by waterfall glazing method, and the process parameters of waterfall glaze are specific gravity 1.80-1.85, weight 350-400g/ ^m2 .

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