JP7466690B2 - 電気化学素子用分離膜の製造方法、及びその製造方法によって製造された電気化学素子用分離膜 - Google Patents
電気化学素子用分離膜の製造方法、及びその製造方法によって製造された電気化学素子用分離膜 Download PDFInfo
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Description
[式1]
ET(A)=28,592/λmax
[式2]
ET N=[ET(A)-ET(TMS)]/[ET(H2O)-ET(TMS)]
前記[式1]及び[式2]中、ET(A)の単位はkcal/molであり、前記[式2]中、ET(H2O)は63.1kcal/molであり、ET(TMS)は30.7kcal/molである。
b)前記a)の多孔性フィルムが2層以上積層された多層膜、
c)高分子樹脂を溶融/紡糸して得られたフィラメントを集積して製造された不織布ウェブ、
d)前記c)の不織布ウェブが2層以上積層された多層膜、
e)前記a)~d)のうちの2つ以上を含む多層構造の多孔性複合膜。
-19F NMR(one pulse、D1=30、ns=32、aq=0.4)
-Spinning rate=35kHz
ET(A)=28,592/λmax
[式2]
ET N=[ET(A)-ET(TMS)]/[ET(H2O)-ET(TMS)]
結晶化度(%)=(△Hm/△H°m)×100
Kα=6.1×104cm2/mol
Kβ=7.7×104cm2/mol
実施例1及び実施例2
A.分離膜基材層の準備
Al2O3粉末(粒径500nm)とPVdF-HFPバインダーポリマー(Solvay社製、Solef 21510、HFP15wt%)をバインダー高分子:無機物粒子=20:80の重量比でNMPに投入し、50℃で合計1時間ボールミル法を用いて無機物粒子を破砕及び分散して多孔性コーティング層形成用スラリーを準備した。このとき、固形分の比率は20wt%となるように調節した。次に、多孔性高分子基材としてサイズ6cm×15cmのポリエチレン多孔性高分子基材(厚さ9μm、通気度70sec/100ml、抵抗0.39Ω)を準備した。前記スラリーを前記多孔性高分子基材の両面に塗布し、70℃の条件で送風乾燥させて分離膜基材層を準備した。
第1及び第2溶媒を準備し、これを混合して混合溶媒を準備した。前記混合溶媒の組成は、下記[表1]の通りである。PVDF-HFP(Solvay社製、Solef 21510)を準備し、これを前記混合溶媒に投入して電極接着層形成用高分子溶液を準備した。前記高分子溶液をドクターブレードの方法で前記分離膜基材層の両面に塗布し、70℃で対流オーブンによって対流乾燥させて複合分離膜を得た。
実施例と同様の方法で分離膜基材層を得た。第1及び第2溶媒を準備し、これらを混合して混合溶媒を準備した。前記混合溶媒の組成は、下記[表1]の通りである。PVDF-HFP(Solvay社製、Solef 21510)を準備し、これを前記混合溶媒に投入して電極接着層形成用高分子溶液を準備した。前記高分子溶液をドクターブレードの方法で前記分離膜基材層の両面に塗布し、70℃で送風乾燥させて複合分離膜を得た。
実施例と同様の方法で分離膜基材層を得た。DMFにPVDF-HFP(Solvay社製、Solef 21510)を投入して電極接着層形成用高分子溶液を準備した。前記高分子溶液をドクターブレード法によって前記分離膜基材層の両面に塗布した。その後、100℃、相対湿度30%で加湿相分離を行い、前記高分子溶液を固化させて分離膜を得た。
実施例1及び比較例1の分離膜に対してFT-IRを介して吸収度を測定し、これを前記[式4]に適用してβ結晶相比率を計算し、その結果を図1にグラフで示した。図1によれば、(1溶媒)/(2溶媒)の極性比が0.360以上である実施例1が比較例1に比べて高いβ結晶相を示すことが確認された。
図2a及び図2bは、実施例1で得られた分離膜の表面に対するSEM画像であり、図3は、比較例1で得られた分離膜の表面に対するSEM画像である。また、図4は、比較例3で得られた分離膜の表面に対するSEM画像である。これらを参照すると、実施例1による分離膜は小さな微細気孔が多く生成され、抵抗に有利に作用することが分かる。これに対し、比較例1及び比較例3の分離膜は、比較的大きいサイズの気孔が不規則に分布していた。また、下記の実験から確認したように、これらの大きい気孔が不規則に分布している場合、抵抗に不利に作用することが確認された。
負極活物質として人造黒鉛、導電材としてデンカブラック(carbon black)、バインダーとしてポリビニリデンフルオリド(PVdF)をそれぞれ75:5:25の重量比で混合し、溶媒であるN-メチルピロリドン(NMP)を添加して負極スラリーを製造した。前記負極スラリーを銅集電体にコーティング及び乾燥させることにより、負極活物質層の形成された負極を準備した。
各実施例及び比較例で得られた分離膜をSUSの間に介在し、コインセルを製造した。前記コインセルの電解液としては、エチレンカーボネート:エチルメチルカーボネートを1:2(体積比)で混合し、LiPF6を1M濃度で添加した。各コインセルに対して分析装置(VMP3、Bio logic cence instrument)を用いて、25℃で振幅10mV及びスキャン範囲0.1hz~1Mhzの条件で電気化学インピーダンス分光分析結果から抵抗を測定した。
前記通気度は、各実施例及び比較例の分離膜に対して100mlの空気が透過する時間を測定したものである。前記通気度は、JIS P8117の方法で測定した。多孔性基材の通気度も、これに準じて測定した。
Claims (8)
- 電極接着層が備えられた複合分離膜の製造方法であって、
前記方法は、接着層用高分子溶液を分離膜基材層の少なくとも一方側の表面に塗布し、乾燥させる段階を含み、
前記高分子溶液は、電極接着層用バインダー樹脂と混合溶媒とを含み、
前記電極接着層用バインダー樹脂は、フッ素系バインダー樹脂を含み、
前記混合溶媒は、第1及び第2溶媒を含み、前記第2溶媒の極性度に対する第1溶媒の極性度の比率(第1溶媒の極性度/第2溶媒の極性度)が0.360以上のものであり、 前記第1溶媒及び第2溶媒の極性度は、それぞれ独立してDimroth-Reichardt ET30 polarity scaleによるものであり、
前記第1及び第2溶媒の極性度は、それぞれ独立して、下記[式1]及び[式2]:
[式1]
E T (A)=28,592/λ max
[式2]
E T N =[E T (A)-E T (TMS)]/[E T (H 2 O)-E T (TMS)]
(前記[式1]及び[式2]中、E T (A)の単位はkcal/molであり、前記[式2]中、E T (H 2 O)は63.1kcal/molであり、E T (TMS)は30.7kcal/molである。)
によって計算されるE T N 数値であり、
前記第1溶媒は、アセトン、テトラヒドロフラン(THF)、ジメチルホルムアミド(DMF)及びn-メチルピロリドン(NMP)の中から選択された1種又は2種以上の混合物を含み、前記第2溶媒は、炭素数1~3の低級アルコール及びH 2 Oの中から選択された1種又は2種以上の混合物を含むものである、電気化学素子用分離膜の製造方法。 - 前記極性度の比率が0.360~0.450である、請求項1に記載の電気化学素子用分離膜の製造方法。
- 前記フッ素系バインダー樹脂が、電極接着層用バインダー樹脂100wt%に対して90wt%以上含まれる、請求項1または2に記載の電気化学素子用分離膜の製造方法。
- 前記フッ素系バインダー樹脂が、フッ化ビニリデンの単独重合体(ポリフッ化ビニリデン)、フッ化ビニリデンと他の共重合可能なモノマーとの共重合体又はこれらの混合物を含む、請求項1から3のいずれか一項に記載の電気化学素子用分離膜の製造方法。
- 前記フッ化ビニリデンと他の共重合可能なモノマーとの共重合体が、ポリフッ化ビニリデン、ポリフッ化ビニリデン-ヘキサフルオロプロピレン、ポリビニリデンフルオリド-トリクロロエチレン、ポリフッ化ビニリデン-テトラフルオロエチレン、及びポリフッ化ビニリデン-トリフルオロエチレンの中から選択された1種以上である、請求項4に記載の電気化学素子用分離膜の製造方法。
- 前記フッ化ビニリデンと他の共重合可能なモノマーとの共重合体は、前記モノマーによる置換度が5wt%~20wt%である、請求項4または5に記載の電気化学素子用分離膜の製造方法。
- 請求項1から6の何れか一項に記載の方法によって製造され、
電極接着層中のフッ素系バインダーの結晶化度が40%以上であり、この中のベータ結晶の含有量が80%以上である、電気化学素子用分離膜。 - 負極、正極、及び前記負極と前記正極との間に介在する分離膜を含み、前記分離膜は請求項7によるものである、リチウムイオン二次電池。
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