JP7380884B2 - 蛍光ｘ線分析装置 - Google Patents

蛍光ｘ線分析装置 Download PDF

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Publication number
JP7380884B2
JP7380884B2 JP2022533027A JP2022533027A JP7380884B2 JP 7380884 B2 JP7380884 B2 JP 7380884B2 JP 2022533027 A JP2022533027 A JP 2022533027A JP 2022533027 A JP2022533027 A JP 2022533027A JP 7380884 B2 JP7380884 B2 JP 7380884B2
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sample
detector
hole
rays
passage
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Japanese (ja)
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JPWO2022004000A1 (https=
JPWO2022004000A5 (https=
Inventor
祐司 森久
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Shimadzu Corp
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Shimadzu Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/317—Accessories, mechanical or electrical features windows

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2022533027A 2020-06-30 2020-12-07 蛍光ｘ線分析装置 Active JP7380884B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020112575 2020-06-30
JP2020112575 2020-06-30
PCT/JP2020/045375 WO2022004000A1 (ja) 2020-06-30 2020-12-07 蛍光ｘ線分析装置

Publications (3)

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JPWO2022004000A1 JPWO2022004000A1 (https=) 2022-01-06
JPWO2022004000A5 JPWO2022004000A5 (https=) 2023-01-24
JP7380884B2 true JP7380884B2 (ja) 2023-11-15

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JP2022533027A Active JP7380884B2 (ja) 2020-06-30 2020-12-07 蛍光ｘ線分析装置

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US (1) US12292397B2 (https=)
EP (1) EP4174479A4 (https=)
JP (1) JP7380884B2 (https=)
CN (1) CN115803612B (https=)
WO (1) WO2022004000A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7562603B2 (ja) * 2022-06-20 2024-10-07 日本電子株式会社 蛍光ｘ線分析装置および測定方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005098906A (ja) 2003-09-26 2005-04-14 Rigaku Industrial Co 雰囲気置換機能を備えたｘ線分析装置
US20050129174A1 (en) 2003-12-01 2005-06-16 Heikki Sipila Measurement arrangement for X-ray fluoresence analysis
CN109239117A (zh) 2018-10-26 2019-01-18 钢研纳克检测技术股份有限公司 直接测定样品中痕量铝、硅、磷、硫、氯含量的分析装置及方法
JP2020085826A (ja) 2018-11-30 2020-06-04 株式会社島津製作所 蛍光ｘ線分析システム、蛍光ｘ線分析装置および蛍光ｘ線分析方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3166638B2 (ja) * 1996-11-29 2001-05-14 株式会社島津製作所 蛍光ｘ線分析装置
JPH10221047A (ja) * 1997-02-03 1998-08-21 Jeol Ltd 蛍光ｘ線膜厚分析装置及び方法
JP3629539B2 (ja) * 2002-03-04 2005-03-16 理学電機工業株式会社 蛍光ｘ線分析装置
JP3726161B2 (ja) * 2003-03-28 2005-12-14 理学電機工業株式会社 蛍光ｘ線分析装置
DE102004019030A1 (de) * 2004-04-17 2005-11-03 Katz, Elisabeth Vorrichtung für die Elementanalyse
DE08155628T1 (de) * 2008-05-05 2010-04-29 Oxford Instruments Analytical Oy Röntgenfluoreszenzanalysator mit gasgefüllter Kammer
JP6081260B2 (ja) * 2013-03-28 2017-02-15 株式会社日立ハイテクサイエンス 蛍光ｘ線分析装置
CN105247354A (zh) 2013-05-27 2016-01-13 株式会社岛津制作所 荧光x射线分析装置
CN203824942U (zh) * 2014-05-14 2014-09-10 苏州三值精密仪器有限公司 一种x荧光光谱仪测试油品中有害元素的充氦气装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005098906A (ja) 2003-09-26 2005-04-14 Rigaku Industrial Co 雰囲気置換機能を備えたｘ線分析装置
US20050129174A1 (en) 2003-12-01 2005-06-16 Heikki Sipila Measurement arrangement for X-ray fluoresence analysis
CN109239117A (zh) 2018-10-26 2019-01-18 钢研纳克检测技术股份有限公司 直接测定样品中痕量铝、硅、磷、硫、氯含量的分析装置及方法
JP2020085826A (ja) 2018-11-30 2020-06-04 株式会社島津製作所 蛍光ｘ線分析システム、蛍光ｘ線分析装置および蛍光ｘ線分析方法

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Publication number Publication date
CN115803612B (zh) 2026-02-27
WO2022004000A1 (ja) 2022-01-06
JPWO2022004000A1 (https=) 2022-01-06
US20230296541A1 (en) 2023-09-21
US12292397B2 (en) 2025-05-06
CN115803612A (zh) 2023-03-14
EP4174479A4 (en) 2024-08-14
EP4174479A1 (en) 2023-05-03

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