JPWO2022004000A1 - - Google Patents
Info
- Publication number
- JPWO2022004000A1 JPWO2022004000A1 JP2022533027A JP2022533027A JPWO2022004000A1 JP WO2022004000 A1 JPWO2022004000 A1 JP WO2022004000A1 JP 2022533027 A JP2022533027 A JP 2022533027A JP 2022533027 A JP2022533027 A JP 2022533027A JP WO2022004000 A1 JPWO2022004000 A1 JP WO2022004000A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/317—Accessories, mechanical or electrical features windows
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020112575 | 2020-06-30 | ||
| JP2020112575 | 2020-06-30 | ||
| PCT/JP2020/045375 WO2022004000A1 (ja) | 2020-06-30 | 2020-12-07 | 蛍光x線分析装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022004000A1 true JPWO2022004000A1 (https=) | 2022-01-06 |
| JPWO2022004000A5 JPWO2022004000A5 (https=) | 2023-01-24 |
| JP7380884B2 JP7380884B2 (ja) | 2023-11-15 |
Family
ID=79315823
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022533027A Active JP7380884B2 (ja) | 2020-06-30 | 2020-12-07 | 蛍光x線分析装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12292397B2 (https=) |
| EP (1) | EP4174479A4 (https=) |
| JP (1) | JP7380884B2 (https=) |
| CN (1) | CN115803612B (https=) |
| WO (1) | WO2022004000A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7562603B2 (ja) * | 2022-06-20 | 2024-10-07 | 日本電子株式会社 | 蛍光x線分析装置および測定方法 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10160691A (ja) * | 1996-11-29 | 1998-06-19 | Shimadzu Corp | 蛍光x線分析装置 |
| JPH10221047A (ja) * | 1997-02-03 | 1998-08-21 | Jeol Ltd | 蛍光x線膜厚分析装置及び方法 |
| JP2005098906A (ja) * | 2003-09-26 | 2005-04-14 | Rigaku Industrial Co | 雰囲気置換機能を備えたx線分析装置 |
| US20050129174A1 (en) * | 2003-12-01 | 2005-06-16 | Heikki Sipila | Measurement arrangement for X-ray fluoresence analysis |
| CN109239117A (zh) * | 2018-10-26 | 2019-01-18 | 钢研纳克检测技术股份有限公司 | 直接测定样品中痕量铝、硅、磷、硫、氯含量的分析装置及方法 |
| JP2020085826A (ja) * | 2018-11-30 | 2020-06-04 | 株式会社島津製作所 | 蛍光x線分析システム、蛍光x線分析装置および蛍光x線分析方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3629539B2 (ja) * | 2002-03-04 | 2005-03-16 | 理学電機工業株式会社 | 蛍光x線分析装置 |
| JP3726161B2 (ja) * | 2003-03-28 | 2005-12-14 | 理学電機工業株式会社 | 蛍光x線分析装置 |
| DE102004019030A1 (de) * | 2004-04-17 | 2005-11-03 | Katz, Elisabeth | Vorrichtung für die Elementanalyse |
| DE08155628T1 (de) * | 2008-05-05 | 2010-04-29 | Oxford Instruments Analytical Oy | Röntgenfluoreszenzanalysator mit gasgefüllter Kammer |
| JP6081260B2 (ja) * | 2013-03-28 | 2017-02-15 | 株式会社日立ハイテクサイエンス | 蛍光x線分析装置 |
| CN105247354A (zh) | 2013-05-27 | 2016-01-13 | 株式会社岛津制作所 | 荧光x射线分析装置 |
| CN203824942U (zh) * | 2014-05-14 | 2014-09-10 | 苏州三值精密仪器有限公司 | 一种x荧光光谱仪测试油品中有害元素的充氦气装置 |
-
2020
- 2020-12-07 WO PCT/JP2020/045375 patent/WO2022004000A1/ja not_active Ceased
- 2020-12-07 US US18/013,205 patent/US12292397B2/en active Active
- 2020-12-07 JP JP2022533027A patent/JP7380884B2/ja active Active
- 2020-12-07 EP EP20943522.1A patent/EP4174479A4/en active Pending
- 2020-12-07 CN CN202080102474.0A patent/CN115803612B/zh active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10160691A (ja) * | 1996-11-29 | 1998-06-19 | Shimadzu Corp | 蛍光x線分析装置 |
| JPH10221047A (ja) * | 1997-02-03 | 1998-08-21 | Jeol Ltd | 蛍光x線膜厚分析装置及び方法 |
| JP2005098906A (ja) * | 2003-09-26 | 2005-04-14 | Rigaku Industrial Co | 雰囲気置換機能を備えたx線分析装置 |
| US20050129174A1 (en) * | 2003-12-01 | 2005-06-16 | Heikki Sipila | Measurement arrangement for X-ray fluoresence analysis |
| CN109239117A (zh) * | 2018-10-26 | 2019-01-18 | 钢研纳克检测技术股份有限公司 | 直接测定样品中痕量铝、硅、磷、硫、氯含量的分析装置及方法 |
| JP2020085826A (ja) * | 2018-11-30 | 2020-06-04 | 株式会社島津製作所 | 蛍光x線分析システム、蛍光x線分析装置および蛍光x線分析方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN115803612B (zh) | 2026-02-27 |
| WO2022004000A1 (ja) | 2022-01-06 |
| US20230296541A1 (en) | 2023-09-21 |
| US12292397B2 (en) | 2025-05-06 |
| CN115803612A (zh) | 2023-03-14 |
| EP4174479A4 (en) | 2024-08-14 |
| EP4174479A1 (en) | 2023-05-03 |
| JP7380884B2 (ja) | 2023-11-15 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20221026 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20221026 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230718 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230915 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20231003 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20231016 |
|
| R151 | Written notification of patent or utility model registration |
Ref document number: 7380884 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |