CN115803612B - 荧光x射线分析装置 - Google Patents

荧光x射线分析装置

Info

Publication number
CN115803612B
CN115803612B CN202080102474.0A CN202080102474A CN115803612B CN 115803612 B CN115803612 B CN 115803612B CN 202080102474 A CN202080102474 A CN 202080102474A CN 115803612 B CN115803612 B CN 115803612B
Authority
CN
China
Prior art keywords
sample
detector
passage
rays
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202080102474.0A
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English (en)
Chinese (zh)
Other versions
CN115803612A (zh
Inventor
森久祐司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Publication of CN115803612A publication Critical patent/CN115803612A/zh
Application granted granted Critical
Publication of CN115803612B publication Critical patent/CN115803612B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/317—Accessories, mechanical or electrical features windows

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CN202080102474.0A 2020-06-30 2020-12-07 荧光x射线分析装置 Active CN115803612B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020-112575 2020-06-30
JP2020112575 2020-06-30
PCT/JP2020/045375 WO2022004000A1 (ja) 2020-06-30 2020-12-07 蛍光ｘ線分析装置

Publications (2)

Publication Number Publication Date
CN115803612A CN115803612A (zh) 2023-03-14
CN115803612B true CN115803612B (zh) 2026-02-27

Family

ID=79315823

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202080102474.0A Active CN115803612B (zh) 2020-06-30 2020-12-07 荧光x射线分析装置

Country Status (5)

Country Link
US (1) US12292397B2 (https=)
EP (1) EP4174479A4 (https=)
JP (1) JP7380884B2 (https=)
CN (1) CN115803612B (https=)
WO (1) WO2022004000A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7562603B2 (ja) * 2022-06-20 2024-10-07 日本電子株式会社 蛍光ｘ線分析装置および測定方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN203824942U (zh) * 2014-05-14 2014-09-10 苏州三值精密仪器有限公司 一种x荧光光谱仪测试油品中有害元素的充氦气装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3166638B2 (ja) * 1996-11-29 2001-05-14 株式会社島津製作所 蛍光ｘ線分析装置
JPH10221047A (ja) * 1997-02-03 1998-08-21 Jeol Ltd 蛍光ｘ線膜厚分析装置及び方法
JP3629539B2 (ja) * 2002-03-04 2005-03-16 理学電機工業株式会社 蛍光ｘ線分析装置
JP3726161B2 (ja) * 2003-03-28 2005-12-14 理学電機工業株式会社 蛍光ｘ線分析装置
JP3823155B2 (ja) * 2003-09-26 2006-09-20 理学電機工業株式会社 雰囲気置換機能を備えたｘ線分析方法
FI20031753L (fi) 2003-12-01 2005-06-02 Metorex Internat Oy Parannettu mittausjärjestely röntgenfluoresenssianalyysiä varten
DE102004019030A1 (de) * 2004-04-17 2005-11-03 Katz, Elisabeth Vorrichtung für die Elementanalyse
DE08155628T1 (de) * 2008-05-05 2010-04-29 Oxford Instruments Analytical Oy Röntgenfluoreszenzanalysator mit gasgefüllter Kammer
JP6081260B2 (ja) * 2013-03-28 2017-02-15 株式会社日立ハイテクサイエンス 蛍光ｘ線分析装置
CN105247354A (zh) 2013-05-27 2016-01-13 株式会社岛津制作所 荧光x射线分析装置
CN109239117B (zh) * 2018-10-26 2024-01-30 钢研纳克检测技术股份有限公司 直接测定样品中痕量铝、硅、磷、硫、氯含量的分析装置及方法
JP7135795B2 (ja) * 2018-11-30 2022-09-13 株式会社島津製作所 蛍光ｘ線分析システムおよび蛍光ｘ線分析方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN203824942U (zh) * 2014-05-14 2014-09-10 苏州三值精密仪器有限公司 一种x荧光光谱仪测试油品中有害元素的充氦气装置

Also Published As

Publication number Publication date
WO2022004000A1 (ja) 2022-01-06
JPWO2022004000A1 (https=) 2022-01-06
US20230296541A1 (en) 2023-09-21
US12292397B2 (en) 2025-05-06
CN115803612A (zh) 2023-03-14
EP4174479A4 (en) 2024-08-14
EP4174479A1 (en) 2023-05-03
JP7380884B2 (ja) 2023-11-15

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