JP7319588B2 - 固体撮像素子用平坦化膜形成樹脂組成物 - Google Patents
固体撮像素子用平坦化膜形成樹脂組成物 Download PDFInfo
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- JP7319588B2 JP7319588B2 JP2019160342A JP2019160342A JP7319588B2 JP 7319588 B2 JP7319588 B2 JP 7319588B2 JP 2019160342 A JP2019160342 A JP 2019160342A JP 2019160342 A JP2019160342 A JP 2019160342A JP 7319588 B2 JP7319588 B2 JP 7319588B2
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Citations (7)
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|---|---|---|---|---|
| JP2001181570A (ja) | 1999-12-24 | 2001-07-03 | Jsr Corp | 膜形成用組成物、膜の形成方法および低密度化膜 |
| JP2011181563A (ja) | 2010-02-26 | 2011-09-15 | Fujifilm Corp | トレンチ埋め込み用組成物 |
| JP2013122965A (ja) | 2011-12-09 | 2013-06-20 | Asahi Kasei E-Materials Corp | ポリシロキサン縮合物を含有する絶縁材料及び該絶縁材料を用いた硬化膜の製造方法 |
| WO2017145808A1 (ja) | 2016-02-24 | 2017-08-31 | 日産化学工業株式会社 | シリコン含有組成物を用いた半導体基板の平坦化方法 |
| WO2017170385A1 (ja) | 2016-03-31 | 2017-10-05 | 日産化学工業株式会社 | 被膜形成用組成物及びその製造方法 |
| JP2018516998A (ja) | 2015-04-13 | 2018-06-28 | ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． | オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング |
| JP2018109160A (ja) | 2016-12-28 | 2018-07-12 | 東京応化工業株式会社 | 樹脂組成物、樹脂組成物の製造方法、膜形成方法及び硬化物 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001181570A (ja) | 1999-12-24 | 2001-07-03 | Jsr Corp | 膜形成用組成物、膜の形成方法および低密度化膜 |
| JP2011181563A (ja) | 2010-02-26 | 2011-09-15 | Fujifilm Corp | トレンチ埋め込み用組成物 |
| JP2013122965A (ja) | 2011-12-09 | 2013-06-20 | Asahi Kasei E-Materials Corp | ポリシロキサン縮合物を含有する絶縁材料及び該絶縁材料を用いた硬化膜の製造方法 |
| JP2018516998A (ja) | 2015-04-13 | 2018-06-28 | ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． | オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング |
| WO2017145808A1 (ja) | 2016-02-24 | 2017-08-31 | 日産化学工業株式会社 | シリコン含有組成物を用いた半導体基板の平坦化方法 |
| WO2017170385A1 (ja) | 2016-03-31 | 2017-10-05 | 日産化学工業株式会社 | 被膜形成用組成物及びその製造方法 |
| JP2018109160A (ja) | 2016-12-28 | 2018-07-12 | 東京応化工業株式会社 | 樹脂組成物、樹脂組成物の製造方法、膜形成方法及び硬化物 |
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