JP7293907B2 - 外観検査管理システム、外観検査管理装置、外観検査管理方法及びプログラム - Google Patents

外観検査管理システム、外観検査管理装置、外観検査管理方法及びプログラム Download PDF

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JP7293907B2
JP7293907B2 JP2019117331A JP2019117331A JP7293907B2 JP 7293907 B2 JP7293907 B2 JP 7293907B2 JP 2019117331 A JP2019117331 A JP 2019117331A JP 2019117331 A JP2019117331 A JP 2019117331A JP 7293907 B2 JP7293907 B2 JP 7293907B2
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image
defect
visual inspection
inspection
display
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JP2021004748A (ja
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雅博 中田
佳昭 宮田
将彦 松井
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Omron Corp
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Omron Corp
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Priority to JP2019117331A priority Critical patent/JP7293907B2/ja
Priority to CN202010384580.4A priority patent/CN112213315A/zh
Priority to TW109115419A priority patent/TWI753424B/zh
Priority to KR1020200057022A priority patent/KR102295669B1/ko
Publication of JP2021004748A publication Critical patent/JP2021004748A/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F18/00—Pattern recognition
    • G06F18/20—Analysing
    • G06F18/24—Classification techniques
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/0006—Industrial image inspection using a design-rule based approach
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/60—Analysis of geometric attributes
    • G06T7/62—Analysis of geometric attributes of area, perimeter, diameter or volume
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/10—Image acquisition modality
    • G06T2207/10004—Still image; Photographic image
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Chemical & Material Sciences (AREA)
  • Quality & Reliability (AREA)
  • Signal Processing (AREA)
  • Data Mining & Analysis (AREA)
  • Textile Engineering (AREA)
  • Geometry (AREA)
  • Artificial Intelligence (AREA)
  • Bioinformatics & Cheminformatics (AREA)
  • Bioinformatics & Computational Biology (AREA)
  • Evolutionary Biology (AREA)
  • Evolutionary Computation (AREA)
  • General Engineering & Computer Science (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2019117331A 2019-06-25 2019-06-25 外観検査管理システム、外観検査管理装置、外観検査管理方法及びプログラム Active JP7293907B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2019117331A JP7293907B2 (ja) 2019-06-25 2019-06-25 外観検査管理システム、外観検査管理装置、外観検査管理方法及びプログラム
CN202010384580.4A CN112213315A (zh) 2019-06-25 2020-05-08 外观检查管理系统、装置、方法以及存储介质
TW109115419A TWI753424B (zh) 2019-06-25 2020-05-08 外觀檢查管理系統、外觀檢查管理裝置、外觀檢查管理方法以及程式
KR1020200057022A KR102295669B1 (ko) 2019-06-25 2020-05-13 외관 검사 관리 시스템, 외관 검사 관리 장치, 외관 검사 관리 방법 및 프로그램

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JP2019117331A JP7293907B2 (ja) 2019-06-25 2019-06-25 外観検査管理システム、外観検査管理装置、外観検査管理方法及びプログラム

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JP2021004748A JP2021004748A (ja) 2021-01-14
JP7293907B2 true JP7293907B2 (ja) 2023-06-20

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JP (1) JP7293907B2 (ko)
KR (1) KR102295669B1 (ko)
CN (1) CN112213315A (ko)
TW (1) TWI753424B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023013867A (ja) * 2021-07-16 2023-01-26 オムロン株式会社 情報処理システム及び情報処理方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006098155A (ja) 2004-09-29 2006-04-13 Hitachi High-Technologies Corp 検査方法及びその装置
JP2009002743A (ja) 2007-06-20 2009-01-08 Hitachi High-Technologies Corp 外観検査方法及びその装置および画像処理評価システム
JP2011089976A (ja) 2009-09-28 2011-05-06 Hitachi High-Technologies Corp 欠陥検査装置および欠陥検査方法
JP2014520266A (ja) 2011-06-17 2014-08-21 コンスティテューション・メディカル・インコーポレイテッド 試料の表示およびレビューのためのシステムおよび方法
JP2015172519A (ja) 2014-03-12 2015-10-01 オムロン株式会社 シート検査装置
JP2017062677A (ja) 2015-09-25 2017-03-30 株式会社Ｓｃｒｅｅｎホールディングス 分類器構築方法、画像分類方法、分類器構築装置および画像分類装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4534827B2 (ja) 2005-03-24 2010-09-01 住友電気工業株式会社 フィルムの欠陥検出方法および欠陥検出装置
JP5825278B2 (ja) * 2013-02-21 2015-12-02 オムロン株式会社 欠陥検査装置および欠陥検査方法
CN104655644A (zh) * 2015-02-13 2015-05-27 华南理工大学 一种锂电池极片缺陷的自动检测方法及装置
JP2017166929A (ja) * 2016-03-15 2017-09-21 株式会社リコー シート状の被検査体の欠陥検査装置、欠陥検査方法及び欠陥検査システム
JP2017194334A (ja) 2016-04-20 2017-10-26 株式会社リコー 検査装置、検査方法及び検査プログラム
JP7005930B2 (ja) * 2017-04-21 2022-01-24 オムロン株式会社 シート検査装置及び検査システム
CN108876802B (zh) * 2018-04-20 2022-04-15 北京交通大学 对车轮的荧光磁粉缺陷进行自动定位的装置和方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006098155A (ja) 2004-09-29 2006-04-13 Hitachi High-Technologies Corp 検査方法及びその装置
JP2009002743A (ja) 2007-06-20 2009-01-08 Hitachi High-Technologies Corp 外観検査方法及びその装置および画像処理評価システム
JP2011089976A (ja) 2009-09-28 2011-05-06 Hitachi High-Technologies Corp 欠陥検査装置および欠陥検査方法
JP2014520266A (ja) 2011-06-17 2014-08-21 コンスティテューション・メディカル・インコーポレイテッド 試料の表示およびレビューのためのシステムおよび方法
JP2015172519A (ja) 2014-03-12 2015-10-01 オムロン株式会社 シート検査装置
JP2017062677A (ja) 2015-09-25 2017-03-30 株式会社Ｓｃｒｅｅｎホールディングス 分類器構築方法、画像分類方法、分類器構築装置および画像分類装置

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Publication number Publication date
TW202100990A (zh) 2021-01-01
TWI753424B (zh) 2022-01-21
CN112213315A (zh) 2021-01-12
KR20210000657A (ko) 2021-01-05
KR102295669B1 (ko) 2021-08-30
JP2021004748A (ja) 2021-01-14

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