JP7289608B1 - 活性ガス生成装置 - Google Patents

活性ガス生成装置 Download PDF

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Publication number
JP7289608B1
JP7289608B1 JP2022548153A JP2022548153A JP7289608B1 JP 7289608 B1 JP7289608 B1 JP 7289608B1 JP 2022548153 A JP2022548153 A JP 2022548153A JP 2022548153 A JP2022548153 A JP 2022548153A JP 7289608 B1 JP7289608 B1 JP 7289608B1
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Prior art keywords
electrode
film
discharge
metal electrode
active gas
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Japanese (ja)
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JPWO2023105753A5 (https=
JPWO2023105753A1 (https=
Inventor
廉 有田
謙資 渡辺
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Toshiba Mitsubishi Electric Industrial Systems Corp
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Toshiba Mitsubishi Electric Industrial Systems Corp
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2022548153A 2021-12-10 2021-12-10 活性ガス生成装置 Active JP7289608B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/045536 WO2023105753A1 (ja) 2021-12-10 2021-12-10 活性ガス生成装置

Publications (3)

Publication Number Publication Date
JP7289608B1 true JP7289608B1 (ja) 2023-06-12
JPWO2023105753A1 JPWO2023105753A1 (https=) 2023-06-15
JPWO2023105753A5 JPWO2023105753A5 (https=) 2023-11-09

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ID=86721439

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JP2022548153A Active JP7289608B1 (ja) 2021-12-10 2021-12-10 活性ガス生成装置

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JP (1) JP7289608B1 (https=)
WO (1) WO2023105753A1 (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005055678A1 (ja) * 2003-12-08 2005-06-16 Ngk Insulators, Ltd. プラズマ発生電極及びその製造方法、並びにプラズマ反応器
WO2019229873A1 (ja) * 2018-05-30 2019-12-05 東芝三菱電機産業システム株式会社 活性ガス生成装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005055678A1 (ja) * 2003-12-08 2005-06-16 Ngk Insulators, Ltd. プラズマ発生電極及びその製造方法、並びにプラズマ反応器
WO2019229873A1 (ja) * 2018-05-30 2019-12-05 東芝三菱電機産業システム株式会社 活性ガス生成装置

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Publication number Publication date
JPWO2023105753A1 (https=) 2023-06-15
WO2023105753A1 (ja) 2023-06-15

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