JP7248133B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP7248133B2 JP7248133B2 JP2021545096A JP2021545096A JP7248133B2 JP 7248133 B2 JP7248133 B2 JP 7248133B2 JP 2021545096 A JP2021545096 A JP 2021545096A JP 2021545096 A JP2021545096 A JP 2021545096A JP 7248133 B2 JP7248133 B2 JP 7248133B2
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- 239000004065 semiconductor Substances 0.000 title claims description 138
- 239000004020 conductor Substances 0.000 claims description 201
- 239000000758 substrate Substances 0.000 claims description 116
- 125000006850 spacer group Chemical group 0.000 claims description 45
- 239000000463 material Substances 0.000 claims description 38
- 238000007789 sealing Methods 0.000 claims description 24
- 230000003746 surface roughness Effects 0.000 claims description 18
- 229910000679 solder Inorganic materials 0.000 claims description 14
- 239000008393 encapsulating agent Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 238000005422 blasting Methods 0.000 claims description 3
- 238000003486 chemical etching Methods 0.000 claims description 3
- 238000010894 electron beam technology Methods 0.000 claims description 3
- 238000004544 sputter deposition Methods 0.000 claims description 3
- 238000005516 engineering process Methods 0.000 description 16
- 238000003892 spreading Methods 0.000 description 16
- 238000009736 wetting Methods 0.000 description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 9
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000017525 heat dissipation Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000446 fuel Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
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- Condensed Matter Physics & Semiconductors (AREA)
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Description
12:第1半導体素子
14:第2半導体素子
16:第1導体スペーサ
18:第2導体スペーサ
20:第1絶縁基板
22:第1絶縁層
24:第1内側導体層
24X:第1内側導体層の第1部分
24Y:第1内側導体層の第2部分
26:第1外側導体層
26X:第1外側導体層の第1部分
26Y:第1外側導体層の第2部分
30:第2絶縁基板
32:第2絶縁層
34:第2内側導体層
34X:第2内側導体層の第1部分
34Y:第2内側導体層の第2部分
36:第2外側導体層
36X:第2外側導体層の第1部分
36Y:第2外側導体層の第2部分
40:接続部材
42:第1電力端子
44:第2電力端子
46:第3電力端子
48:第1信号端子
50:第2信号端子
52:封止体
60A-60I:接合層
Claims (15)
- 第1絶縁基板と、
前記第1絶縁基板に、第1導体スペーサを介して接合された第1半導体素子と、
を備え、
前記第1絶縁基板は、第1絶縁層と、前記第1絶縁層の一方側に設けられた第1内側導体層とを有し、
前記第1内側導体層の表面は、第1領域と、前記第1領域を取り囲むとともに前記第1領域よりも表面粗さが大きい第2領域とを有し、
前記第1導体スペーサは、第1接合層を介して、前記第1内側導体層の前記第1領域に接合されており、
前記第1内側導体層を平面視したときに、前記第1導体スペーサに対する前記第1領域のマージンが部分的に拡大されており、
前記マージンが拡大された部分では、その他の部分よりも、前記第1導体スペーサから前記第1内側導体層の周縁までの距離が大きい、
半導体装置。 - 前記第1内側導体層の前記第1領域の面積は、前記第1導体スペーサの前記第1領域に対向する一表面の面積よりも大きい、請求項1に記載の半導体装置。
- 前記第1接合層が前記第1内側導体層に接触している面積は、前記第1接合層が前記第1導体スペーサの前記一表面に接触している面積よりも大きい、請求項2に記載の半導体装置。
- 前記第1接合層は、前記第1内側導体層の前記表面において、前記第1領域と前記第2領域との間の境界の少なくとも一部に達している、請求項1から3のいずれか一項に記載の半導体装置。
- 前記第1接合層は、前記第1内側導体層の前記表面において、前記第1領域の全体に広がっている、請求項4に記載の半導体装置。
- 前記第1接合層は、前記第1内側導体層の前記表面において、前記第2領域には広がっていない、請求項1から5のいずれか一項に記載の半導体装置。
- 前記第1接合層は、はんだ材料で構成されている、請求項1から6のいずれか一項に記載の半導体装置。
- 前記第1絶縁基板は、前記第1絶縁層の他方側に設けられた第1外側導体層をさらに有する、請求項1から7のいずれか一項に記載の半導体装置。
- 前記第1半導体素子を封止する封止体をさらに備え、
前記封止体は、前記第1内側導体層の前記第2領域に接触している、請求項1から8のいずれか一項に記載の半導体装置。 - 前記第1内側導体層の前記第2領域は、レーザ照射、電子ビーム照射、スパッタリング、化学的エッチング、ショットブラストのうちの少なくとも一つによって粗面化された領域である、請求項1から9のいずれか一項に記載の半導体装置。
- 前記第1半導体素子を介して前記第1絶縁基板に対向する第2絶縁基板をさらに備え、
前記第2絶縁基板は、第2絶縁層と、前記第2絶縁層の一方側に設けられた第2内側導体層とを有し、
前記第2内側導体層の表面は、第3領域と、前記第3領域を取り囲むとともに前記第3領域よりも表面粗さが大きい第4領域とを有し、
前記第1半導体素子は、第2接合層を介して、前記第2内側導体層の前記第3領域に接合されている、請求項1から10のいずれか一項に記載の半導体装置。 - 前記第2絶縁基板は、前記第2絶縁層の他方側に設けられた第2外側導体層をさらに有する、請求項11に記載の半導体装置。
- 前記第1絶縁基板に、第2導体スペーサを介して接合された第2半導体素子をさらに備え、
前記第1絶縁基板の前記第1内側導体層は、第5領域と、前記第5領域を取り囲むとともに前記第5領域よりも表面粗さが大きい第6領域とを有し、
前記第2導体スペーサは、第3接合層を介して、前記第1内側導体層の前記第5領域に接合されている、請求項1から12のいずれか一項に記載の半導体装置。 - 前記第1絶縁基板の前記第1内側導体層は、前記第1絶縁層上において互いに離間している第1部分と第2部分とを有し、
前記第1領域と前記第2領域とは、前記第1内側導体層の前記第1部分に位置しており、
前記第5領域と前記第6領域とは、前記第1内側導体層の前記第2部分に位置している、請求項13に記載の半導体装置。 - 前記第2半導体素子を介して前記第1絶縁基板に対向する第2絶縁基板をさらに備え、
前記第2絶縁基板は、第2絶縁層と、前記第2絶縁層の一方側に設けられた第2内側導体層とを有し、
前記第2内側導体層の表面は、第7領域と、前記第7領域を取り囲むとともに前記第7領域よりも表面粗さが大きい第8領域とを有し、
前記第2半導体素子は、第4接合層を介して、前記第2内側導体層の前記第7領域に接合されている、請求項13又は14に記載の半導体装置。
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