JP7233188B2 - 成膜方法及び成膜装置 - Google Patents
成膜方法及び成膜装置 Download PDFInfo
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- JP7233188B2 JP7233188B2 JP2018176325A JP2018176325A JP7233188B2 JP 7233188 B2 JP7233188 B2 JP 7233188B2 JP 2018176325 A JP2018176325 A JP 2018176325A JP 2018176325 A JP2018176325 A JP 2018176325A JP 7233188 B2 JP7233188 B2 JP 7233188B2
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- 238000000034 method Methods 0.000 title claims description 30
- 239000007789 gas Substances 0.000 claims description 290
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 116
- 238000012545 processing Methods 0.000 claims description 115
- 239000010937 tungsten Substances 0.000 claims description 114
- 229910052721 tungsten Inorganic materials 0.000 claims description 114
- 239000012159 carrier gas Substances 0.000 claims description 56
- 238000000151 deposition Methods 0.000 claims description 22
- 230000008021 deposition Effects 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 15
- 230000007246 mechanism Effects 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000010926 purge Methods 0.000 description 27
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 description 24
- 235000012431 wafers Nutrition 0.000 description 23
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 14
- 229910052731 fluorine Inorganic materials 0.000 description 14
- 239000011737 fluorine Substances 0.000 description 14
- 238000000231 atomic layer deposition Methods 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 8
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 7
- 238000011144 upstream manufacturing Methods 0.000 description 7
- 230000003028 elevating effect Effects 0.000 description 5
- YOUIDGQAIILFBW-UHFFFAOYSA-J tetrachlorotungsten Chemical compound Cl[W](Cl)(Cl)Cl YOUIDGQAIILFBW-UHFFFAOYSA-J 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 4
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000007723 transport mechanism Effects 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910003818 SiH2Cl2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- UGACIEPFGXRWCH-UHFFFAOYSA-N [Si].[Ti] Chemical compound [Si].[Ti] UGACIEPFGXRWCH-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- ZOCHARZZJNPSEU-UHFFFAOYSA-N diboron Chemical compound B#B ZOCHARZZJNPSEU-UHFFFAOYSA-N 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- KPGXUAIFQMJJFB-UHFFFAOYSA-H tungsten hexachloride Chemical compound Cl[W](Cl)(Cl)(Cl)(Cl)Cl KPGXUAIFQMJJFB-UHFFFAOYSA-H 0.000 description 1
- WIDQNNDDTXUPAN-UHFFFAOYSA-I tungsten(v) chloride Chemical compound Cl[W](Cl)(Cl)(Cl)Cl WIDQNNDDTXUPAN-UHFFFAOYSA-I 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/28008—Making conductor-insulator-semiconductor electrodes
- H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
- H01L21/28158—Making the insulator
- H01L21/28167—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation
- H01L21/28194—Making the insulator on single crystalline silicon, e.g. using a liquid, i.e. chemical oxidation by deposition, e.g. evaporation, ALD, CVD, sputtering, laser deposition
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Description
一実施形態の成膜方法について説明する。図1は、一実施形態の成膜方法を示すフローチャートである。
上記の成膜方法を実現する成膜装置の一例について説明する。図2は、一実施形態の成膜方法を実施するのに好適な成膜装置の構成例を示す概略図である。
次に、図2を参照して説明した成膜装置を用いて、載置台2の設定温度を変化させて下地膜であるAlN膜の上に初期タングステン膜を形成した。そして、載置台2の設定温度と初期タングステン膜の成膜速度との関係を評価した。初期タングステン膜を形成する工程S10におけるプロセス条件は、以下である。
載置台の設定温度:150℃~300℃
キャリアガス:H2ガスとArガスとの混合ガス(以下「H2ガス/Arガス」という。)
キャリアガス流量:H2ガス/Arガス(4000sccm/2000sccm)
載置台の設定温度:200℃
キャリアガス:H2ガス/Arガス(4000sccm/2000sccm)、Arガス(6000sccm)、N2ガス(6000sccm)
サイクル数:5回、10回、15回
4 排気部
5 ガス供給機構
6 制御部
21 ヒータ
W ウエハ
Claims (7)
- 減圧状態の処理容器内で基板を第1温度に加熱した状態で、前記処理容器内にキャリアガスを供給しながら、B2H6ガスとWF6ガスとを交互に供給し、前記基板に形成された下地膜の上に初期タングステン膜を形成する工程と、
減圧状態の処理容器内で前記基板を第1温度より高い第2温度に加熱した状態で、前記処理容器内にタングステン含有ガスと前記タングステン含有ガスを還元する還元ガスとを交互に供給し、前記初期タングステン膜の上に主タングステン膜を形成する工程と、
を有し、
前記初期タングステン膜を形成する工程におけるWF6ガスの供給量は、前記主タングステン膜を形成する工程における前記タングステン含有ガスの供給量より少ない、
成膜方法。 - 前記第1温度は、200℃以上220℃以下である、
請求項1に記載の成膜方法。 - 前記キャリアガスは、H2ガス、Arガス、N2ガスのうちの少なくともいずれかを含む、
請求項1又は2に記載の成膜方法。 - 前記下地膜は、Ti含有膜又はAl含有膜である、
請求項1乃至3のいずれか一項に記載の成膜方法。 - 前記初期タングステン膜を形成する工程と前記主タングステン膜を形成する工程とは、同一の処理容器内で行われる、
請求項1乃至4のいずれか一項に記載の成膜方法。 - 前記初期タングステン膜を形成する工程と前記主タングステン膜を形成する工程とは、異なる処理容器内で行われる、
請求項1乃至4のいずれか一項に記載の成膜方法。 - 基板を収容する処理容器と、
前記基板を加熱するヒータと、
前記処理容器内に少なくともB2H6ガス、WF6ガス、タングステン含有ガス及び還元ガスを供給するガス供給機構と、
前記処理容器内を排気する排気部と、
制御部と、
を備え、
前記制御部は、前記ヒータ、前記ガス供給機構及び前記排気部の動作を制御することにより、
前記処理容器内で基板を第1温度に加熱した状態で、前記処理容器内にキャリアガスを供給しながら、B2H6ガスとWF6ガスとを交互に供給し、前記基板に形成された下地膜の上に初期タングステン膜を形成する工程と、
減圧状態の処理容器内で前記基板を第1温度より高い第2温度に加熱した状態で、前記処理容器内にタングステン含有ガスと前記タングステン含有ガスを還元する還元ガスとを交互に供給し、前記初期タングステン膜の上に主タングステン膜を形成する工程と、
を実行するように構成され、
前記初期タングステン膜を形成する工程におけるWF6ガスの供給量は、前記主タングステン膜を形成する工程における前記タングステン含有ガスの供給量より少ない、
成膜装置。
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JP2004536225A (ja) | 2001-07-16 | 2004-12-02 | アプライド マテリアルズ インコーポレイテッド | 表面処理後にタングステンを堆積して膜特性を改善するための方法及び装置 |
JP2015067869A (ja) | 2013-09-30 | 2015-04-13 | 株式会社日立国際電気 | 半導体装置の製造方法、基板処理装置およびプログラム |
JP2016186094A (ja) | 2015-03-27 | 2016-10-27 | 東京エレクトロン株式会社 | タングステン膜の成膜方法 |
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JP2004536225A (ja) | 2001-07-16 | 2004-12-02 | アプライド マテリアルズ インコーポレイテッド | 表面処理後にタングステンを堆積して膜特性を改善するための方法及び装置 |
JP2015067869A (ja) | 2013-09-30 | 2015-04-13 | 株式会社日立国際電気 | 半導体装置の製造方法、基板処理装置およびプログラム |
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