JP7228340B2 - 着色感光性樹脂組成物及びそれから調製される遮光スペーサ - Google Patents

着色感光性樹脂組成物及びそれから調製される遮光スペーサ Download PDF

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JP7228340B2
JP7228340B2 JP2018110968A JP2018110968A JP7228340B2 JP 7228340 B2 JP7228340 B2 JP 7228340B2 JP 2018110968 A JP2018110968 A JP 2018110968A JP 2018110968 A JP2018110968 A JP 2018110968A JP 7228340 B2 JP7228340 B2 JP 7228340B2
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resin composition
photosensitive resin
colored photosensitive
meth
acrylate
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JP2019003189A (ja
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ジ・ウン・キム
ヒュン－タク・チョン
キュン－ジェ・パク
ジョン－ホ・ナ
ヒュン・ク・キム
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ローム・アンド・ハース・エレクトロニック・マテリアルズ・コリア・リミテッド
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Liquid Crystal (AREA)
JP2018110968A 2017-06-12 2018-06-11 着色感光性樹脂組成物及びそれから調製される遮光スペーサ Active JP7228340B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20170073434 2017-06-12
KR10-2017-0073434 2017-06-12
KR10-2018-0053702 2018-05-10
KR1020180053702A KR102565582B1 (ko) 2017-06-12 2018-05-10 착색 감광성 수지 조성물 및 이로부터 제조된 차광성 스페이서

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JP2019003189A JP2019003189A (ja) 2019-01-10
JP7228340B2 true JP7228340B2 (ja) 2023-02-24

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JP2018110968A Active JP7228340B2 (ja) 2017-06-12 2018-06-11 着色感光性樹脂組成物及びそれから調製される遮光スペーサ

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JP (1) JP7228340B2 (ko)
KR (1) KR102565582B1 (ko)
TW (1) TWI788367B (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7263153B2 (ja) * 2019-06-27 2023-04-24 東京応化工業株式会社 感光性組成物、硬化物、ブラックマトリクス、ブラックバンク、カラーフィルター、画像表示装置、及びパターン化された硬化膜の製造方法
KR20220097068A (ko) 2020-12-31 2022-07-07 엘지디스플레이 주식회사 발광 표시 장치

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001154206A (ja) 1999-11-25 2001-06-08 Jsr Corp スペーサー用感放射線性樹脂組成物、スペーサーおよび液晶表示素子
JP2006099033A (ja) 2004-09-22 2006-04-13 Samsung Electronics Co Ltd ブラックマトリクス用組成物及びこれを用いたブラックマトリクスパターンの形成方法
JP2009168948A (ja) 2008-01-11 2009-07-30 Tokyo Ohka Kogyo Co Ltd 着色感光性樹脂組成物
JP2015155538A (ja) 2014-02-13 2015-08-27 奇美實業股▲分▼有限公司 アルカリ可溶性樹脂、感光性樹脂組成物、カラーフィルターおよびその製造方法、ならびに液晶表示装置
US20150315376A1 (en) 2014-04-30 2015-11-05 Chi Mei Corporation Photosensitive resin composition for color filter and application thereof

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4290483B2 (ja) * 2003-06-05 2009-07-08 新日鐵化学株式会社 ブラックレジスト用感光性樹脂組成物並びにこれを用いて形成された遮光膜
JP2007071994A (ja) 2005-09-05 2007-03-22 Tokyo Ohka Kogyo Co Ltd 黒色感光性樹脂組成物
KR101349622B1 (ko) * 2011-08-26 2014-01-10 롬엔드하스전자재료코리아유한회사 광중합성 불포화 수지, 이를 포함하는 감광성 수지 조성물 및 이로부터 형성되는 차광성 스페이서와 액정 디스플레이 장치
KR101658374B1 (ko) * 2013-01-25 2016-09-22 롬엔드하스전자재료코리아유한회사 컬럼 스페이서 및 블랙 매트릭스를 동시에 구현할 수 있는 착색 감광성 수지 조성물
KR102066281B1 (ko) * 2013-02-15 2020-01-15 롬엔드하스전자재료코리아유한회사 착색 감광성 수지 조성물 및 이를 이용한 차광성 스페이서
JP6333947B2 (ja) * 2014-02-20 2018-05-30 富士フイルム株式会社 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置、赤外線カットフィルター、並びに、固体撮像装置
JP6607682B2 (ja) * 2015-03-05 2019-11-20 日鉄ケミカル＆マテリアル株式会社 遮光膜用黒色樹脂組成物、当該組成物を硬化させた遮光膜を有する遮光膜付基板、並びに当該遮光膜付基板を有するカラーフィルター及びタッチパネル

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001154206A (ja) 1999-11-25 2001-06-08 Jsr Corp スペーサー用感放射線性樹脂組成物、スペーサーおよび液晶表示素子
JP2006099033A (ja) 2004-09-22 2006-04-13 Samsung Electronics Co Ltd ブラックマトリクス用組成物及びこれを用いたブラックマトリクスパターンの形成方法
JP2009168948A (ja) 2008-01-11 2009-07-30 Tokyo Ohka Kogyo Co Ltd 着色感光性樹脂組成物
JP2015155538A (ja) 2014-02-13 2015-08-27 奇美實業股▲分▼有限公司 アルカリ可溶性樹脂、感光性樹脂組成物、カラーフィルターおよびその製造方法、ならびに液晶表示装置
US20150315376A1 (en) 2014-04-30 2015-11-05 Chi Mei Corporation Photosensitive resin composition for color filter and application thereof

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Publication number Publication date
KR20180135403A (ko) 2018-12-20
JP2019003189A (ja) 2019-01-10
KR102565582B1 (ko) 2023-08-11
TW201903527A (zh) 2019-01-16
TWI788367B (zh) 2023-01-01

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