JP7221499B2 - 金属酸化物半導体モジュール及びそれを含む発光ダイオード表示装置 - Google Patents
金属酸化物半導体モジュール及びそれを含む発光ダイオード表示装置 Download PDFInfo
- Publication number
- JP7221499B2 JP7221499B2 JP2020179817A JP2020179817A JP7221499B2 JP 7221499 B2 JP7221499 B2 JP 7221499B2 JP 2020179817 A JP2020179817 A JP 2020179817A JP 2020179817 A JP2020179817 A JP 2020179817A JP 7221499 B2 JP7221499 B2 JP 7221499B2
- Authority
- JP
- Japan
- Prior art keywords
- metal oxide
- oxide semiconductor
- pattern contact
- trench
- drain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000004065 semiconductor Substances 0.000 title claims description 199
- 229910044991 metal oxide Inorganic materials 0.000 title claims description 135
- 150000004706 metal oxides Chemical class 0.000 title claims description 135
- 239000010410 layer Substances 0.000 claims description 83
- 239000000758 substrate Substances 0.000 claims description 39
- 239000002184 metal Substances 0.000 claims description 20
- 239000011241 protective layer Substances 0.000 claims description 9
- 239000011159 matrix material Substances 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 3
- 238000002161 passivation Methods 0.000 claims description 2
- 238000009413 insulation Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 description 14
- 238000010586 diagram Methods 0.000 description 13
- 238000005192 partition Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 4
- 101100328884 Caenorhabditis elegans sqt-3 gene Proteins 0.000 description 3
- 101150090280 MOS1 gene Proteins 0.000 description 2
- 101100401568 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) MIC10 gene Proteins 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
- H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
- H01L27/156—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/22—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/075—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
- H01L25/0753—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66674—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/66712—Vertical DMOS transistors, i.e. VDMOS transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
- H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
- H01L29/7809—Vertical DMOS transistors, i.e. VDMOS transistors having both source and drain contacts on the same surface, i.e. Up-Drain VDMOS transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/0004—Devices characterised by their operation
- H01L33/0008—Devices characterised by their operation having p-n or hi-lo junctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
- H01L33/508—Wavelength conversion elements having a non-uniform spatial arrangement or non-uniform concentration, e.g. patterned wavelength conversion layer, wavelength conversion layer with a concentration gradient of the wavelength conversion material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/03—Manufacturing methods
- H01L2224/036—Manufacturing methods by patterning a pre-deposited material
- H01L2224/03618—Manufacturing methods by patterning a pre-deposited material with selective exposure, development and removal of a photosensitive material, e.g. of a photosensitive conductive resin
- H01L2224/0362—Photolithography
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/03—Manufacturing methods
- H01L2224/039—Methods of manufacturing bonding areas involving a specific sequence of method steps
- H01L2224/0391—Forming a passivation layer after forming the bonding area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/0401—Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04026—Bonding areas specifically adapted for layer connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0556—Disposition
- H01L2224/05567—Disposition the external layer being at least partially embedded in the surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0556—Disposition
- H01L2224/05571—Disposition the external layer being disposed in a recess of the surface
- H01L2224/05572—Disposition the external layer being disposed in a recess of the surface the external layer extending out of an opening
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05599—Material
- H01L2224/056—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
- H01L2224/0601—Structure
- H01L2224/0603—Bonding areas having different sizes, e.g. different heights or widths
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
- H01L2224/061—Disposition
- H01L2224/06102—Disposition the bonding areas being at different heights
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
- H01L2224/13001—Core members of the bump connector
- H01L2224/13099—Material
- H01L2224/131—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/16238—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bonding area protruding from the surface of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/32227—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the layer connector connecting to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/32238—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the layer connector connecting to a bonding area protruding from the surface of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/33—Structure, shape, material or disposition of the layer connectors after the connecting process of a plurality of layer connectors
- H01L2224/3301—Structure
- H01L2224/3303—Layer connectors having different sizes, e.g. different heights or widths
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Led Devices (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Electrodes Of Semiconductors (AREA)
- Led Device Packages (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Description
Claims (12)
- 第1の導電タイプを有する半導体基板と、
前記半導体基板に形成され、且つ、複数の第1のトレンチと複数の第2のトレンチとにより仕切られて互いに間を空けて配置された複数の金属酸化物半導体部材と、
を備えている金属酸化物半導体モジュールであって、
各前記金属酸化物半導体部材は、それぞれ
前記半導体基板に形成され、ドレイン区を含み、前記第1の導電タイプとは反対の第2の導電タイプを有する重ドープ半導体層と、
エピタキシャル層と、
金属パターン接点ユニットと、を備えており、
該エピタキシャル層は、前記半導体基板の反対側に位置するように前記重ドープ半導体層に形成されると共に、前記第2の導電タイプを有し、前記重ドープ半導体層の前記ドレイン区を該エピタキシャル層から部分的に露出させる開口を有するように形成され、且つ、該エピタキシャル層内にソース区と該ソース区と間を空けて配置されたゲート区とが形成されており、
該金属パターン接点ユニットは、ソースパターン接点と、ゲートパターン接点と、ドレインパターン接点と、を有しており、
該ソースパターン接点は、前記重ドープ半導体層の反対側に位置するように前記エピタキシャル層の上表面に形成されると共に、 前記ソース区に電気的接続されており、
該ゲートパターン接点は、前記ソースパターン接点から離れるように前記エピタキシャル層の前記上表面に形成されていると共に、前記ゲート区に電気的接続されており、
該ドレインパターン接点は、前記重ドープ半導体層の露出する前記ドレイン区に形成されて該ドレイン区から前記エピタキシャル層の上表面まで延伸すると共に、前記ドレイン区に電気的接続されており、
各前記第1のトレンチ及び各前記第2のトレンチは前記エピタキシャル層及び前記重ドープ半導体層を通過して前記半導体基板に到達するまで延伸し、各前記第1のトレンチはそれぞれ第1の方向に沿って延伸し、各前記第2のトレンチは前記第1の方向に直交する第2の方向に沿って延伸し、
前記第2のトレンチと前記第1のトレンチとにより複数の前記金属酸化物半導体部材が互いに仕切られてマトリックス状を成すように配列され、
前記開口は前記第1のトレンチ及び前記第2のトレンチのいずれにも連通しない、ことを特徴とする金属酸化物半導体モジュール。 - 前記第1の導電タイプ及び第2の導電タイプにおけるいずれか1つはP型であり、他の1つはN型であることを特徴とする請求項1に記載の金属酸化物半導体モジュール。
- 各前記金属酸化物半導体部材は、トレンチ金属酸化物半導体部材であることを特徴とする請求項1に記載の金属酸化物半導体モジュール。
- 前記エピタキシャル層の上表面に配置され、且つ、前記ゲートパターン接点と、前記ソースパターン接点と、前記ドレインパターン接点との間に形成されて前記ソース区と前記ゲート区と前記ドレイン区とを互いに電気的に絶縁させる電気絶縁保護層を更に備えることを特徴とする請求項1に記載の金属酸化物半導体モジュール。
- 前記電気絶縁保護層はパッシベーション材料により作製されることを特徴とする請求項4に記載の金属酸化物半導体モジュール。
- 前記重ドープ半導体層は前記エピタキシャル層より高いドーピング濃度を有することを特徴とする請求項1に記載の金属酸化物半導体モジュール。
- 表示基板と、電源回路及び接地回路と、LEDアレイと、請求項1に記載の金属酸化物半導体モジュールと、を備える発光ダイオード表示装置であって、
前記表示基板は、表示エリアと、該表示エリアを取り囲む非表示エリアと、を有しており、
前記電源回路及び接地回路は、前記表示基板の前記非表示エリアに形成されており、
前記LEDアレイは、前記表示基板の前記表示エリアに配置され、且つ、複数の横列及び複数の縦列を有するマトリックス状に配置される複数のLEDを有しており、
前記金属酸化物半導体モジュールは、前記表示基板の前記非表示エリアに配置されることにより、前記金属酸化物半導体モジュールの各金属酸化物半導体部材の前記金属パターン接点ユニットが前記表示基板に接触することを特徴とする発光ダイオード表示装置。 - 各前記金属酸化物半導体部材が有する前記ドレイン区は、それぞれ前記LEDの前記複数の横列の内の対応の1つの前記横列に電気的接続しており、
各前記金属酸化物半導体部材が有する前記ソース区は、前記電源回路に電気的接続しており、各前記金属酸化物半導体部材が有する前記ゲート区は、シーケンス信号を受信するように構成されて各前記金属酸化物半導体部材3のONステートが制御可能になり、駆動電流を各横列のLEDに供給することができることを特徴とする請求項7に記載の発光ダイオード表示装置。 - 各前記金属酸化物半導体部材はP型の金属酸化物半導体部材であることを特徴とする請求項8に記載の発光ダイオード表示装置。
- 各前記金属酸化物半導体部材において、前記ゲートパターン接点と前記ソースパターン接点と前記ドレインパターン接点とは、この順番で発光ダイオードアレイから離れる方向に沿って配置されていることを特徴とする請求項7に記載の発光ダイオード表示装置。
- 各前記金属酸化物半導体部材が有する前記ドレイン区は、それぞれ前記LEDの前記複数の縦列の内の対応の1つの前記縦列に電気的接続しており、
各前記金属酸化物半導体部材が有する前記ソース区は、前記接地回路に電気的接続しており、各前記金属酸化物半導体部材が有する前記ゲート区は、シーケンス信号を受信するように構成されて各前記金属酸化物半導体部材のONステートまたはOFFステートが制御可能になり、駆動電流を各縦列のLEDに供給することができることを特徴とする請求項7に記載の発光ダイオード表示装置。 - 各前記金属酸化物半導体部材はN型の金属酸化物半導体部材であることを特徴とする請求項11に記載の発光ダイオード表示装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW108138870 | 2019-10-28 | ||
TW108138870A TWI717072B (zh) | 2019-10-28 | 2019-10-28 | 金氧半導體模組與發光二極體元件顯示裝置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021068906A JP2021068906A (ja) | 2021-04-30 |
JP7221499B2 true JP7221499B2 (ja) | 2023-02-14 |
Family
ID=73029869
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020179817A Active JP7221499B2 (ja) | 2019-10-28 | 2020-10-27 | 金属酸化物半導体モジュール及びそれを含む発光ダイオード表示装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US11450708B2 (ja) |
EP (1) | EP3817047A1 (ja) |
JP (1) | JP7221499B2 (ja) |
KR (1) | KR102447764B1 (ja) |
CN (1) | CN112736077A (ja) |
TW (1) | TWI717072B (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI717072B (zh) * | 2019-10-28 | 2021-01-21 | 聚積科技股份有限公司 | 金氧半導體模組與發光二極體元件顯示裝置 |
JP2022163835A (ja) | 2021-04-15 | 2022-10-27 | セイコーエプソン株式会社 | 時計用文字板、時計 |
KR102440205B1 (ko) * | 2022-02-22 | 2022-09-05 | 최태현 | 트렌치 구조를 갖는 씨모스 에스램 셀 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004289103A (ja) | 2002-06-13 | 2004-10-14 | Matsushita Electric Ind Co Ltd | 半導体デバイス及びその製造方法 |
WO2009060648A1 (ja) | 2007-11-09 | 2009-05-14 | Fuji Electric Holdings Co., Ltd. | 有機elパッシブマトリックス素子の駆動方法及び駆動装置 |
JP2009139904A (ja) | 2007-12-10 | 2009-06-25 | Richtek Technology Corp | エレクトロルミネッセンスディスプレイの列駆動セル |
US20130056821A1 (en) | 2011-09-01 | 2013-03-07 | Super Group Semiconductor Co., Ltd. | Trenched power semiconductor device and fabrication method thereof |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI470798B (zh) * | 2009-07-22 | 2015-01-21 | Niko Semiconductor Co Ltd | 金氧半導體晶片及其製作方法 |
TWI459351B (zh) * | 2012-05-23 | 2014-11-01 | Macroblock Inc | 點矩陣發光二極體顯示裝置之驅動系統與驅動方法 |
TWI717072B (zh) * | 2019-10-28 | 2021-01-21 | 聚積科技股份有限公司 | 金氧半導體模組與發光二極體元件顯示裝置 |
-
2019
- 2019-10-28 TW TW108138870A patent/TWI717072B/zh active
-
2020
- 2020-09-30 CN CN202011054299.0A patent/CN112736077A/zh active Pending
- 2020-10-23 US US17/078,240 patent/US11450708B2/en active Active
- 2020-10-27 EP EP20204003.6A patent/EP3817047A1/en active Pending
- 2020-10-27 JP JP2020179817A patent/JP7221499B2/ja active Active
- 2020-10-27 KR KR1020200139893A patent/KR102447764B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004289103A (ja) | 2002-06-13 | 2004-10-14 | Matsushita Electric Ind Co Ltd | 半導体デバイス及びその製造方法 |
WO2009060648A1 (ja) | 2007-11-09 | 2009-05-14 | Fuji Electric Holdings Co., Ltd. | 有機elパッシブマトリックス素子の駆動方法及び駆動装置 |
JP2009139904A (ja) | 2007-12-10 | 2009-06-25 | Richtek Technology Corp | エレクトロルミネッセンスディスプレイの列駆動セル |
US20130056821A1 (en) | 2011-09-01 | 2013-03-07 | Super Group Semiconductor Co., Ltd. | Trenched power semiconductor device and fabrication method thereof |
Also Published As
Publication number | Publication date |
---|---|
KR102447764B1 (ko) | 2022-09-26 |
US11450708B2 (en) | 2022-09-20 |
TW202118004A (zh) | 2021-05-01 |
KR20210052292A (ko) | 2021-05-10 |
CN112736077A (zh) | 2021-04-30 |
JP2021068906A (ja) | 2021-04-30 |
EP3817047A1 (en) | 2021-05-05 |
TWI717072B (zh) | 2021-01-21 |
US20210126047A1 (en) | 2021-04-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7221499B2 (ja) | 金属酸化物半導体モジュール及びそれを含む発光ダイオード表示装置 | |
US9508783B2 (en) | Display panel and fabrication method thereof | |
US10847696B2 (en) | Display device | |
US9239502B2 (en) | Pixel structure with data line, scan line and gate electrode formed on the same layer and manufacturing method thereof | |
US20090283790A1 (en) | Circuit substrate and light emitting diode package | |
KR101404551B1 (ko) | 박막 트랜지스터 표시판 및 그 제조 방법 | |
KR20150051464A (ko) | 박막 트랜지스터 표시판 및 그 제조 방법 | |
US20140014975A1 (en) | Semiconductor chip including heat radiation member, and display module | |
KR102356843B1 (ko) | 디스플레이 디바이스 및 그 제조 방법 | |
US20110095289A1 (en) | Laminated chips package, semiconductor substrate and method of manufacturing the laminated chips package | |
KR101778364B1 (ko) | 디스플레이 디바이스 | |
KR20150087617A (ko) | 표시 기판용 박막 트랜지스터, 표시 기판 및 표시 기판의 제조 방법 | |
CN101853819B (zh) | 芯片制作工艺 | |
JP2001326388A (ja) | 半導体発光装置 | |
CN114335087B (zh) | 显示面板及移动终端 | |
KR102417818B1 (ko) | 표시장치 | |
JP5649162B2 (ja) | 半導体基板、積層チップパッケージおよび半導体プレート並びにこれらの製造方法 | |
KR102528403B1 (ko) | 스트레처블 전자기기 및 그 기기의 제조방법 | |
KR102354376B1 (ko) | 박막 트랜지스터 표시판 및 그 제조 방법 | |
US20230187372A1 (en) | Electronic device having alignment mark | |
JP6314295B1 (ja) | 半導体デバイス及びその製造方法 | |
TW202310694A (zh) | 電子裝置 | |
CN115206993A (zh) | 一种显示装置 | |
KR20200136214A (ko) | 플렉서블 마이크로 발광 소자 모듈 | |
CN112750839A (zh) | 半导体装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20201027 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20211013 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20211026 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220113 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220419 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20220715 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220930 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220930 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230110 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230125 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7221499 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |