JP7203417B2 - レーザアニール方法、レーザアニール装置、およびtft基板 - Google Patents
レーザアニール方法、レーザアニール装置、およびtft基板 Download PDFInfo
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- 238000005224 laser annealing Methods 0.000 title claims description 72
- 239000000758 substrate Substances 0.000 title claims description 55
- 238000000034 method Methods 0.000 title claims description 46
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 50
- 229910052710 silicon Inorganic materials 0.000 claims description 50
- 239000010703 silicon Substances 0.000 claims description 50
- 229910021424 microcrystalline silicon Inorganic materials 0.000 claims description 36
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 33
- 239000013078 crystal Substances 0.000 claims description 27
- 239000004065 semiconductor Substances 0.000 claims description 24
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 238000000137 annealing Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 107
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 18
- 238000010586 diagram Methods 0.000 description 9
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 238000002438 flame photometric detection Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
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Description
以下、図1を用いて、本発明の実施の形態に係るレーザアニール装置10の概略構成について説明する。図1に示すように、レーザアニール装置10は、被処理基板1を搬送方向(移動方向)Tへ搬送する図示しない基板搬送手段と、レーザパルスビームでなる第1レーザビームLB1を発振する第1レーザビーム出射部11と、連続発振レーザ光(CWレーザ光)でなる第2レーザビームLB2を発振する、例えば、半導体レーザなどの第2レーザビーム出射部12と、反射鏡13と、制御部14と、を備える。制御部14は、第1レーザビーム出射部11および第2レーザビーム出射部12におけるレーザビーム出射のオン・オフならびにタイミングの制御を行う。なお、図2に示すように、本実施の形態において用いる被処理基板1は、複数のパネル領域1aを備える。
以下、本実施の形態に係るレーザアニール方法について説明する。図1および図2に示すように、本実施の形態に係るレーザアニール方法では、第1レーザビームLB1のビームスポットを第2レーザビームLB2のビームスポットに先行させ、非晶質シリコン膜2上を相対的に移動させる。なお、図4に示すように、第1レーザビームLB1は、被処理基板1が移動される途中は継続してオン状態に設定する。
以上、実施の形態について説明したが、この実施の形態の開示の一部をなす論述および図面はこの発明を限定するものであると理解すべきではない。この開示から当業者には様々な代替実施の形態、実施例および運用技術が明らかとなろう。
LB1 第1レーザビーム
LB2 第2レーザビーム
T 搬送方向(一定方向)
1 被処理基板
1A,1B 結晶化シリコン膜基板
1a パネル領域
2 非晶質シリコン膜
2A 微結晶シリコン膜(種結晶膜)
2B 疑似単結晶シリコン膜(特性にばらつきの少ない結晶化シリコン膜)
2C 疑似単結晶シリコン膜(参考例)
10 レーザアニール装置
11 第1レーザビーム出射部
12 第2レーザビーム出射部
13 反射鏡
14 制御部
Claims (16)
- 基板面に形成された非晶質シリコン膜に対して、レーザビームを一定方向に相対移動させ、前記非晶質シリコン膜をラテラル結晶成長させて結晶化シリコン膜を形成するレーザアニール方法であって、
第1レーザビームを照射して、前記非晶質シリコン膜を微結晶シリコン膜に変化させる第1レーザビーム照射と、
前記微結晶シリコン膜を起点として、第2レーザビームを前記一定方向に沿って移動させて、前記基板面に前記結晶化シリコン膜をラテラル結晶成長させる第2レーザビーム照射と、
を行い、
前記基板面に対して、前記一定方向に沿って前記微結晶シリコン膜と前記結晶化シリコン膜とを交互に形成する
レーザアニール方法。 - 前記第1レーザビーム照射を、少なくとも前記微結晶シリコン膜を形成する領域で行い、前記第2レーザビーム照射を、前記一定方向へ移動させる途中において前記結晶化シリコン膜を形成する領域のみで行う
請求項1に記載のレーザアニール方法。 - 前記第1レーザビーム照射を行って、前記非晶質シリコン膜に対して前記一定方向に沿って前記微結晶シリコン膜を連続して形成し、
前記第1レーザビーム照射で形成された前記微結晶シリコン膜を起点として、第2レーザビーム照射を前記一定方向に沿って間欠的に行う
請求項1に記載のレーザアニール方法。 - 前記結晶化シリコン膜は、半導体素子を形成する領域を含む
請求項1から請求項3のいずれか一項に記載のレーザアニール方法。 - 前記第1レーザビームと前記第2レーザビームとは、パルス幅変調されている
請求項1から請求項4のいずれか一項に記載のレーザアニール方法。 - 前記第1レーザビームと前記第2レーザビームとは、変調周波数が異なる
請求項1から請求項4のいずれか一項に記載のレーザアニール方法。 - 前記第1レーザビームはパルスレーザ光であり、前記第2レーザビームは連続発振レーザ光である
請求項1から請求項4のいずれか一項に記載のレーザアニール方法。 - 前記結晶化シリコン膜の前記一定方向の長さは、50μm以下である
請求項1から請求項7のいずれか一項に記載のレーザアニール方法。 - 基板面に形成された非晶質シリコン膜に対して、レーザビームを一定方向に相対移動させ、前記非晶質シリコン膜をラテラル結晶成長させて結晶化シリコン膜を形成するレーザアニール装置であって、
第1レーザビームを照射して、前記非晶質シリコン膜を微結晶シリコン膜に変化させる第1レーザビーム出射部と、
前記微結晶シリコン膜を起点として、第2レーザビームを前記一定方向に沿って移動させて、前記基板面に前記結晶化シリコン膜をラテラル結晶成長させる第2レーザビーム出射部と、
前記第1レーザビーム出射部と前記第2レーザビーム出射部とを、前記基板面に対して前記一定方向に沿って前記微結晶シリコン膜と前記結晶化シリコン膜とを交互に形成するように駆動させる制御部と、
を備える
レーザアニール装置。 - 前記第1レーザビーム出射部が、少なくとも前記微結晶シリコン膜を形成する領域でオン状態となり、前記第2レーザビーム出射部が、前記一定方向へ移動させる途中において前記結晶化シリコン膜を形成する領域のみオン状態となる
請求項9に記載のレーザアニール装置。 - 前記第1レーザビーム出射部が、前記非晶質シリコン膜に対して前記一定方向に沿って連続してオン状態となり、前記第1レーザビームの照射を行って、前記微結晶シリコン膜を連続して形成し、
前記第1レーザビームの照射によって形成された前記微結晶シリコン膜を起点として、前記第2レーザビーム出射部が、前記一定方向に沿って間欠的にオン状態となり、前記第2レーザビームの照射を前記一定方向に沿って間欠的に行う
請求項9に記載のレーザアニール装置。 - 前記結晶化シリコン膜は、半導体素子を形成する領域を含む
請求項9から請求項11のいずれか一項に記載のレーザアニール装置。 - 前記第1レーザビームと前記第2レーザビームとは、パルス幅変調されている
請求項9から請求項12のいずれか一項に記載のレーザアニール装置。 - 前記第1レーザビームと前記第2レーザビームとは、変調周波数が異なる
請求項9から請求項12のいずれか一項に記載のレーザアニール装置。 - 前記第1レーザビームはパルス発振レーザ光であり、前記第2レーザビームは連続発振レーザ光である
請求項9から請求項12のいずれか一項に記載のレーザアニール装置。 - 前記結晶化シリコン膜の前記一定方向の長さは、50μm以下である
請求項9から請求項15のいずれか一項に記載のレーザアニール装置。
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