JP7171007B1 - ガラス回折格子及びその製造方法 - Google Patents
ガラス回折格子及びその製造方法 Download PDFInfo
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- JP7171007B1 JP7171007B1 JP2022541660A JP2022541660A JP7171007B1 JP 7171007 B1 JP7171007 B1 JP 7171007B1 JP 2022541660 A JP2022541660 A JP 2022541660A JP 2022541660 A JP2022541660 A JP 2022541660A JP 7171007 B1 JP7171007 B1 JP 7171007B1
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- glass plate
- silicon substrate
- diffraction grating
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- 239000011521 glass Substances 0.000 title claims abstract description 122
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 23
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 119
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 119
- 239000010703 silicon Substances 0.000 claims abstract description 119
- 239000000758 substrate Substances 0.000 claims abstract description 63
- 238000010438 heat treatment Methods 0.000 claims abstract description 24
- 238000000034 method Methods 0.000 claims abstract description 21
- 239000005388 borosilicate glass Substances 0.000 claims abstract description 16
- 238000005530 etching Methods 0.000 claims abstract description 14
- 238000005498 polishing Methods 0.000 claims abstract description 12
- 229910052788 barium Inorganic materials 0.000 claims abstract description 7
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims abstract description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000000156 glass melt Substances 0.000 claims abstract 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 40
- 238000009623 Bosch process Methods 0.000 claims description 12
- BLIQUJLAJXRXSG-UHFFFAOYSA-N 1-benzyl-3-(trifluoromethyl)pyrrolidin-1-ium-3-carboxylate Chemical compound C1C(C(=O)O)(C(F)(F)F)CCN1CC1=CC=CC=C1 BLIQUJLAJXRXSG-UHFFFAOYSA-N 0.000 claims description 7
- 230000003647 oxidation Effects 0.000 claims description 5
- 238000007254 oxidation reaction Methods 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 19
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 16
- 238000010586 diagram Methods 0.000 description 14
- 238000010306 acid treatment Methods 0.000 description 13
- 238000001878 scanning electron micrograph Methods 0.000 description 13
- 239000007789 gas Substances 0.000 description 11
- 230000003287 optical effect Effects 0.000 description 11
- 230000001154 acute effect Effects 0.000 description 9
- 235000012239 silicon dioxide Nutrition 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000001020 plasma etching Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 239000005350 fused silica glass Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000001513 hot isostatic pressing Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- 229910001415 sodium ion Inorganic materials 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- 241000237503 Pectinidae Species 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 235000020637 scallop Nutrition 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000004341 Octafluorocyclobutane Substances 0.000 description 1
- 229910018503 SF6 Inorganic materials 0.000 description 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- BCCOBQSFUDVTJQ-UHFFFAOYSA-N octafluorocyclobutane Chemical compound FC1(F)C(F)(F)C(F)(F)C1(F)F BCCOBQSFUDVTJQ-UHFFFAOYSA-N 0.000 description 1
- 235000019407 octafluorocyclobutane Nutrition 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 1
- 229960000909 sulfur hexafluoride Drugs 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000009279 wet oxidation reaction Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Description
Claims (2)
- 周期が0.2~10マイクロメータ、溝のアスペクト比が2以上のホウケイ酸ガラスまたはバリウムホウケイ酸ガラスの回折格子の製造方法であって、
ケイ素基板の表面にボッシュプロセスにより格子を形成するステップと、
該ケイ素基板を加熱し、水蒸気を暴露することによって該格子の表面に酸化膜を形成するステップと、
フッ化水素酸により該酸化膜を除去するステップと、
該ケイ素基板の該格子を備えた面とガラス板の一つの面とを真空度が0.01~0.1パスカルの容器内で陽極接合するステップと、
ガラスを溶融させケイ素からなる該格子の畝部の間に充填させるように、接合された該ケイ素基板及び該ガラス板を加熱するステップと、
該ケイ素基板及び該ガラス板のそれぞれの、接合された面と反対側の面を研磨するステップと、
該ガラス板からケイ素を二フッ化キセノンガスによる選択的エッチングにより除去するステップと、を含むガラス回折格子の製造方法。 - 該ガラス板からケイ素を選択的エッチングにより除去するステップの後に、該ガラス板を加熱し水蒸気を暴露する熱酸化ステップを含む請求項1に記載のガラス回折格子の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US202163165361P | 2021-03-24 | 2021-03-24 | |
US63/165,361 | 2021-03-24 | ||
PCT/JP2022/006859 WO2022202033A1 (ja) | 2021-03-24 | 2022-02-21 | ガラス回折格子及びその製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JPWO2022202033A1 JPWO2022202033A1 (ja) | 2022-09-29 |
JP7171007B1 true JP7171007B1 (ja) | 2022-11-15 |
JPWO2022202033A5 JPWO2022202033A5 (ja) | 2023-02-21 |
Family
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Application Number | Title | Priority Date | Filing Date |
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JP2022541660A Active JP7171007B1 (ja) | 2021-03-24 | 2022-02-21 | ガラス回折格子及びその製造方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20240004111A1 (ja) |
JP (1) | JP7171007B1 (ja) |
CN (1) | CN116981967A (ja) |
WO (1) | WO2022202033A1 (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004093634A (ja) * | 2002-08-29 | 2004-03-25 | Nippon Sheet Glass Co Ltd | 構造体の形成方法 |
WO2018100868A1 (ja) * | 2016-12-02 | 2018-06-07 | 日本碍子株式会社 | 光学素子及びその製造方法 |
WO2018155556A1 (ja) * | 2017-02-23 | 2018-08-30 | デンカ株式会社 | フォトニック結晶 |
JP2020056973A (ja) * | 2018-10-04 | 2020-04-09 | 国立研究開発法人理化学研究所 | 石英製の格子構造体および回折格子ならびに製造方法 |
US20200249377A1 (en) * | 2019-01-31 | 2020-08-06 | Canon U.S.A., Inc. | Diffractive optical device, endoscopic probe, and fabrication methods therefor |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002048907A (ja) * | 2000-08-01 | 2002-02-15 | Canon Inc | 回折光学素子の製作方法 |
JP2005037872A (ja) * | 2003-01-28 | 2005-02-10 | Nippon Sheet Glass Co Ltd | 光学素子およびそれを備えた光回路並びに光分波器 |
WO2011081692A2 (en) * | 2009-10-06 | 2011-07-07 | Sri International | Twin sub-wavelength grating optical signal processor |
JP2019510998A (ja) * | 2016-01-30 | 2019-04-18 | レイア、インコーポレイテッドLeia Inc. | プライバシーディスプレイおよびデュアルモードプライバシーディスプレイシステム |
-
2022
- 2022-02-21 JP JP2022541660A patent/JP7171007B1/ja active Active
- 2022-02-21 WO PCT/JP2022/006859 patent/WO2022202033A1/ja active Application Filing
- 2022-02-21 CN CN202280021095.8A patent/CN116981967A/zh active Pending
-
2023
- 2023-09-15 US US18/468,120 patent/US20240004111A1/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004093634A (ja) * | 2002-08-29 | 2004-03-25 | Nippon Sheet Glass Co Ltd | 構造体の形成方法 |
WO2018100868A1 (ja) * | 2016-12-02 | 2018-06-07 | 日本碍子株式会社 | 光学素子及びその製造方法 |
WO2018155556A1 (ja) * | 2017-02-23 | 2018-08-30 | デンカ株式会社 | フォトニック結晶 |
JP2020056973A (ja) * | 2018-10-04 | 2020-04-09 | 国立研究開発法人理化学研究所 | 石英製の格子構造体および回折格子ならびに製造方法 |
US20200249377A1 (en) * | 2019-01-31 | 2020-08-06 | Canon U.S.A., Inc. | Diffractive optical device, endoscopic probe, and fabrication methods therefor |
Also Published As
Publication number | Publication date |
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US20240004111A1 (en) | 2024-01-04 |
JPWO2022202033A1 (ja) | 2022-09-29 |
CN116981967A (zh) | 2023-10-31 |
WO2022202033A1 (ja) | 2022-09-29 |
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