JP7169350B2 - インプリントリソグラフィプロセスにおける光学層の構成 - Google Patents

インプリントリソグラフィプロセスにおける光学層の構成 Download PDF

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Publication number
JP7169350B2
JP7169350B2 JP2020521998A JP2020521998A JP7169350B2 JP 7169350 B2 JP7169350 B2 JP 7169350B2 JP 2020521998 A JP2020521998 A JP 2020521998A JP 2020521998 A JP2020521998 A JP 2020521998A JP 7169350 B2 JP7169350 B2 JP 7169350B2
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substrate
nanolayer
imprint lithography
lithography method
optical layer
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Japanese (ja)
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JP2021500746A5 (https=
JP2021500746A (ja
Inventor
ビクラムジト シン，
マイケル ネビン ミラー，
フランク ワイ． シュー，
シューチャン ヤン，
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Magic Leap Inc
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Magic Leap Inc
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Priority to JP2022069396A priority Critical patent/JP2022089961A/ja
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Priority to JP2022181728A priority patent/JP7427065B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Integrated Circuits (AREA)
JP2020521998A 2017-10-20 2018-10-19 インプリントリソグラフィプロセスにおける光学層の構成 Active JP7169350B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2022069396A JP2022089961A (ja) 2017-10-20 2022-04-20 インプリントリソグラフィプロセスにおける光学層の構成
JP2022181728A JP7427065B2 (ja) 2017-10-20 2022-11-14 インプリントリソグラフィプロセスにおける光学層の構成

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762574826P 2017-10-20 2017-10-20
US62/574,826 2017-10-20
PCT/US2018/056644 WO2019079679A1 (en) 2017-10-20 2018-10-19 CONFIGURING OPTICAL LAYERS IN PRINTING LITHOGRAPHY METHODS

Related Child Applications (1)

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JP2022069396A Division JP2022089961A (ja) 2017-10-20 2022-04-20 インプリントリソグラフィプロセスにおける光学層の構成

Publications (3)

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JP2021500746A JP2021500746A (ja) 2021-01-07
JP2021500746A5 JP2021500746A5 (https=) 2021-11-25
JP7169350B2 true JP7169350B2 (ja) 2022-11-10

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Family Applications (3)

Application Number Title Priority Date Filing Date
JP2020521998A Active JP7169350B2 (ja) 2017-10-20 2018-10-19 インプリントリソグラフィプロセスにおける光学層の構成
JP2022069396A Pending JP2022089961A (ja) 2017-10-20 2022-04-20 インプリントリソグラフィプロセスにおける光学層の構成
JP2022181728A Active JP7427065B2 (ja) 2017-10-20 2022-11-14 インプリントリソグラフィプロセスにおける光学層の構成

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JP2022069396A Pending JP2022089961A (ja) 2017-10-20 2022-04-20 インプリントリソグラフィプロセスにおける光学層の構成
JP2022181728A Active JP7427065B2 (ja) 2017-10-20 2022-11-14 インプリントリソグラフィプロセスにおける光学層の構成

Country Status (8)

Country Link
US (7) US10670971B2 (https=)
EP (1) EP3698181A4 (https=)
JP (3) JP7169350B2 (https=)
KR (3) KR102383721B1 (https=)
CN (2) CN115079514B (https=)
AU (2) AU2018351321B9 (https=)
IL (1) IL273853B2 (https=)
WO (1) WO2019079679A1 (https=)

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WO2018175874A1 (en) * 2017-03-23 2018-09-27 The Board Of Trustees Of The Leland Stanford Junior University Broadband, polarization-independent, omnidirectional, metamaterial-based antireflection coating
KR102383721B1 (ko) 2017-10-20 2022-04-08 매직 립, 인코포레이티드 임프린트 리소그래피 프로세스들에서의 광학 층들의 구성
EP3540499A1 (en) 2018-03-13 2019-09-18 Thomson Licensing Image sensor comprising a color splitter with two different refractive indexes
EP3540479A1 (en) 2018-03-13 2019-09-18 Thomson Licensing Diffraction grating comprising double-materials structures
EP3588150A1 (en) 2018-06-29 2020-01-01 Thomson Licensing An optical device comprising multi-layer waveguides
EP3591700A1 (en) 2018-07-02 2020-01-08 Thomson Licensing Image sensor comprising a color splitter with two different refractive indexes, and different height
EP3671310A1 (en) 2018-12-18 2020-06-24 Thomson Licensing Optical manipulation apparatus for trapping or moving micro or nanoparticles
EP3671322A1 (en) 2018-12-18 2020-06-24 Thomson Licensing Device for forming an outgoing electromagnetic wave from an incident electromagnetic wave
EP3671293A1 (en) 2018-12-21 2020-06-24 Thomson Licensing An optical device comprising at least one diffraction grating having a grating pitch above the wavelength
CN114514443A (zh) 2019-07-19 2022-05-17 奇跃公司 制造衍射光栅的方法
WO2021191150A1 (en) * 2020-03-23 2021-09-30 Interdigital Ce Patent Holdings, Sas Unpolarized light grating in-coupler
CN114980593B (zh) * 2021-02-18 2025-07-11 北京小米移动软件有限公司 光学膜、壳体、终端和光学膜的制备方法
CN117480420A (zh) * 2021-04-16 2024-01-30 奇跃公司 组合光学部件中的纳米图案封装功能、方法和工艺
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Also Published As

Publication number Publication date
WO2019079679A1 (en) 2019-04-25
US12044976B2 (en) 2024-07-23
US20240329540A1 (en) 2024-10-03
CN111226143A (zh) 2020-06-02
US10670971B2 (en) 2020-06-02
KR20220045081A (ko) 2022-04-12
CN115079514A (zh) 2022-09-20
CA3078522A1 (en) 2019-04-25
US20190121239A1 (en) 2019-04-25
US12332572B2 (en) 2025-06-17
KR20250026388A (ko) 2025-02-25
KR102383721B1 (ko) 2022-04-08
NZ763665A (en) 2025-05-02
JP7427065B2 (ja) 2024-02-02
AU2023274092B2 (en) 2024-07-04
IL273853B2 (en) 2025-04-01
EP3698181A1 (en) 2020-08-26
KR102769774B1 (ko) 2025-02-17
AU2018351321B2 (en) 2023-09-07
US11550226B2 (en) 2023-01-10
AU2023274092A1 (en) 2023-12-14
US10969692B2 (en) 2021-04-06
EP3698181A4 (en) 2020-11-18
US20220187716A1 (en) 2022-06-16
US20210223700A1 (en) 2021-07-22
JP2022089961A (ja) 2022-06-16
CN115079514B (zh) 2025-03-07
US20230105058A1 (en) 2023-04-06
KR20200066360A (ko) 2020-06-09
US20250264806A1 (en) 2025-08-21
JP2021500746A (ja) 2021-01-07
IL273853B1 (en) 2024-12-01
US20200257206A1 (en) 2020-08-13
AU2018351321B9 (en) 2023-09-21
AU2018351321A1 (en) 2020-05-07
IL273853A (en) 2020-05-31
CN111226143B (zh) 2022-07-12
JP2023016838A (ja) 2023-02-02
US11281109B2 (en) 2022-03-22

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