AU2018351321B9 - Configuring optical layers in imprint lithography processes - Google Patents

Configuring optical layers in imprint lithography processes Download PDF

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Publication number
AU2018351321B9
AU2018351321B9 AU2018351321A AU2018351321A AU2018351321B9 AU 2018351321 B9 AU2018351321 B9 AU 2018351321B9 AU 2018351321 A AU2018351321 A AU 2018351321A AU 2018351321 A AU2018351321 A AU 2018351321A AU 2018351321 B9 AU2018351321 B9 AU 2018351321B9
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AU
Australia
Prior art keywords
substrate
nanolayer
imprint lithography
light
lithography method
Prior art date
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AU2018351321A
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English (en)
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AU2018351321B2 (en
AU2018351321A1 (en
Inventor
Michael Nevin Miller
Vikramjit Singh
Frank Y. Xu
Shuqiang Yang
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Magic Leap Inc
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Magic Leap Inc
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Publication date
Application filed by Magic Leap Inc filed Critical Magic Leap Inc
Publication of AU2018351321A1 publication Critical patent/AU2018351321A1/en
Publication of AU2018351321B2 publication Critical patent/AU2018351321B2/en
Application granted granted Critical
Publication of AU2018351321B9 publication Critical patent/AU2018351321B9/en
Priority to AU2023274092A priority Critical patent/AU2023274092B2/en
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Integrated Circuits (AREA)
AU2018351321A 2017-10-20 2018-10-19 Configuring optical layers in imprint lithography processes Active AU2018351321B9 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU2023274092A AU2023274092B2 (en) 2017-10-20 2023-11-28 Configuring optical layers in imprint lithography processes

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201762574826P 2017-10-20 2017-10-20
US62/574,826 2017-10-20
PCT/US2018/056644 WO2019079679A1 (en) 2017-10-20 2018-10-19 CONFIGURING OPTICAL LAYERS IN PRINTING LITHOGRAPHY METHODS

Related Child Applications (1)

Application Number Title Priority Date Filing Date
AU2023274092A Division AU2023274092B2 (en) 2017-10-20 2023-11-28 Configuring optical layers in imprint lithography processes

Publications (3)

Publication Number Publication Date
AU2018351321A1 AU2018351321A1 (en) 2020-05-07
AU2018351321B2 AU2018351321B2 (en) 2023-09-07
AU2018351321B9 true AU2018351321B9 (en) 2023-09-21

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
AU2018351321A Active AU2018351321B9 (en) 2017-10-20 2018-10-19 Configuring optical layers in imprint lithography processes
AU2023274092A Active AU2023274092B2 (en) 2017-10-20 2023-11-28 Configuring optical layers in imprint lithography processes

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Country Status (8)

Country Link
US (7) US10670971B2 (https=)
EP (1) EP3698181A4 (https=)
JP (3) JP7169350B2 (https=)
KR (3) KR102383721B1 (https=)
CN (2) CN115079514B (https=)
AU (2) AU2018351321B9 (https=)
IL (1) IL273853B2 (https=)
WO (1) WO2019079679A1 (https=)

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EP3591700A1 (en) 2018-07-02 2020-01-08 Thomson Licensing Image sensor comprising a color splitter with two different refractive indexes, and different height
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EP3671322A1 (en) 2018-12-18 2020-06-24 Thomson Licensing Device for forming an outgoing electromagnetic wave from an incident electromagnetic wave
EP3671293A1 (en) 2018-12-21 2020-06-24 Thomson Licensing An optical device comprising at least one diffraction grating having a grating pitch above the wavelength
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Publication number Publication date
WO2019079679A1 (en) 2019-04-25
US12044976B2 (en) 2024-07-23
US20240329540A1 (en) 2024-10-03
CN111226143A (zh) 2020-06-02
US10670971B2 (en) 2020-06-02
KR20220045081A (ko) 2022-04-12
CN115079514A (zh) 2022-09-20
CA3078522A1 (en) 2019-04-25
US20190121239A1 (en) 2019-04-25
US12332572B2 (en) 2025-06-17
KR20250026388A (ko) 2025-02-25
KR102383721B1 (ko) 2022-04-08
NZ763665A (en) 2025-05-02
JP7427065B2 (ja) 2024-02-02
AU2023274092B2 (en) 2024-07-04
IL273853B2 (en) 2025-04-01
EP3698181A1 (en) 2020-08-26
KR102769774B1 (ko) 2025-02-17
JP7169350B2 (ja) 2022-11-10
AU2018351321B2 (en) 2023-09-07
US11550226B2 (en) 2023-01-10
AU2023274092A1 (en) 2023-12-14
US10969692B2 (en) 2021-04-06
EP3698181A4 (en) 2020-11-18
US20220187716A1 (en) 2022-06-16
US20210223700A1 (en) 2021-07-22
JP2022089961A (ja) 2022-06-16
CN115079514B (zh) 2025-03-07
US20230105058A1 (en) 2023-04-06
KR20200066360A (ko) 2020-06-09
US20250264806A1 (en) 2025-08-21
JP2021500746A (ja) 2021-01-07
IL273853B1 (en) 2024-12-01
US20200257206A1 (en) 2020-08-13
AU2018351321A1 (en) 2020-05-07
IL273853A (en) 2020-05-31
CN111226143B (zh) 2022-07-12
JP2023016838A (ja) 2023-02-02
US11281109B2 (en) 2022-03-22

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