JP7154850B2 - 濃度制御装置及び材料ガス供給装置 - Google Patents

濃度制御装置及び材料ガス供給装置 Download PDF

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Publication number
JP7154850B2
JP7154850B2 JP2018132341A JP2018132341A JP7154850B2 JP 7154850 B2 JP7154850 B2 JP 7154850B2 JP 2018132341 A JP2018132341 A JP 2018132341A JP 2018132341 A JP2018132341 A JP 2018132341A JP 7154850 B2 JP7154850 B2 JP 7154850B2
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Prior art keywords
flow path
carrier gas
concentration
flow
block
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JP2018132341A
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English (en)
Japanese (ja)
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JP2019056173A (ja
Inventor
徹 志水
雅和 南
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Horiba Stec Co Ltd
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Horiba Stec Co Ltd
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Priority to KR1020180110828A priority Critical patent/KR102607020B1/ko
Priority to US16/134,082 priority patent/US10718050B2/en
Priority to TW107133029A priority patent/TWI808994B/zh
Priority to CN201811093056.0A priority patent/CN109519706B/zh
Publication of JP2019056173A publication Critical patent/JP2019056173A/ja
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Publication of JP7154850B2 publication Critical patent/JP7154850B2/ja
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/50—Fuel cells

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  • Chemical Vapour Deposition (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Control Of Non-Electrical Variables (AREA)
  • Sampling And Sample Adjustment (AREA)
JP2018132341A 2017-09-19 2018-07-12 濃度制御装置及び材料ガス供給装置 Active JP7154850B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020180110828A KR102607020B1 (ko) 2017-09-19 2018-09-17 농도 제어 장치 및 재료 가스 공급 장치
US16/134,082 US10718050B2 (en) 2017-09-19 2018-09-18 Concentration control apparatus and material gas supply system
TW107133029A TWI808994B (zh) 2017-09-19 2018-09-19 濃度控制裝置和材料氣體供給裝置
CN201811093056.0A CN109519706B (zh) 2017-09-19 2018-09-19 浓度控制装置和材料气体供给装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017179082 2017-09-19
JP2017179082 2017-09-19

Publications (2)

Publication Number Publication Date
JP2019056173A JP2019056173A (ja) 2019-04-11
JP7154850B2 true JP7154850B2 (ja) 2022-10-18

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ID=66107174

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JP2018132341A Active JP7154850B2 (ja) 2017-09-19 2018-07-12 濃度制御装置及び材料ガス供給装置

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JP (1) JP7154850B2 (zh)
TW (1) TWI808994B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112902005A (zh) * 2021-03-20 2021-06-04 河南中烟工业有限责任公司 用于火焰光度计的自卸压压缩空气存储装置
JP7527237B2 (ja) * 2021-04-01 2024-08-02 東京エレクトロン株式会社 ガス供給装置、ガス供給方法、および基板処理装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008047600A (ja) 2006-08-11 2008-02-28 Ckd Corp パージガスユニット及びパージガス供給集積ユニット
JP2008231515A (ja) 2007-03-20 2008-10-02 Tokyo Electron Ltd 気化器，気化モジュール，成膜装置
JP2012197941A (ja) 2012-05-21 2012-10-18 Ulvac Japan Ltd 流体制御装置およびこれを用いたガス処理装置
WO2016080532A1 (ja) 2014-11-23 2016-05-26 株式会社フジキン 光学的ガス濃度測定方法及び該方法によるガス濃度モニター方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5419276B2 (ja) * 2009-12-24 2014-02-19 株式会社堀場製作所 材料ガス濃度制御システム及び材料ガス濃度制御システム用プログラム
US9274048B2 (en) * 2010-02-16 2016-03-01 Hamamatsu Photonics K.K. Gas concentration calculation device and gas concentration measurement module
JP5548292B1 (ja) * 2013-05-30 2014-07-16 株式会社堀場エステック 加熱気化システムおよび加熱気化方法
JP5674898B1 (ja) * 2013-10-31 2015-02-25 エナジーサポート株式会社 酸素含有ガス製造装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008047600A (ja) 2006-08-11 2008-02-28 Ckd Corp パージガスユニット及びパージガス供給集積ユニット
JP2008231515A (ja) 2007-03-20 2008-10-02 Tokyo Electron Ltd 気化器，気化モジュール，成膜装置
JP2012197941A (ja) 2012-05-21 2012-10-18 Ulvac Japan Ltd 流体制御装置およびこれを用いたガス処理装置
WO2016080532A1 (ja) 2014-11-23 2016-05-26 株式会社フジキン 光学的ガス濃度測定方法及び該方法によるガス濃度モニター方法

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Publication number Publication date
TW201915381A (zh) 2019-04-16
JP2019056173A (ja) 2019-04-11
TWI808994B (zh) 2023-07-21

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