JP7133992B2 - 基板載置台及び基板処理装置 - Google Patents

基板載置台及び基板処理装置 Download PDF

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Publication number
JP7133992B2
JP7133992B2 JP2018109738A JP2018109738A JP7133992B2 JP 7133992 B2 JP7133992 B2 JP 7133992B2 JP 2018109738 A JP2018109738 A JP 2018109738A JP 2018109738 A JP2018109738 A JP 2018109738A JP 7133992 B2 JP7133992 B2 JP 7133992B2
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Japan
Prior art keywords
plate
temperature control
substrate
temperature
mounting table
Prior art date
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Application number
JP2018109738A
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English (en)
Japanese (ja)
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JP2019212844A (ja
Inventor
芳彦 佐々木
雅人 南
英樹 齊藤
喬史 神戸
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Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2018109738A priority Critical patent/JP7133992B2/ja
Priority to TW108118551A priority patent/TWI787514B/zh
Priority to KR1020190065203A priority patent/KR102260238B1/ko
Priority to CN201910488033.8A priority patent/CN110581087B/zh
Publication of JP2019212844A publication Critical patent/JP2019212844A/ja
Application granted granted Critical
Publication of JP7133992B2 publication Critical patent/JP7133992B2/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67276—Production flow monitoring, e.g. for increasing throughput
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Drying Of Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Supply And Installment Of Electrical Components (AREA)
JP2018109738A 2018-06-07 2018-06-07 基板載置台及び基板処理装置 Active JP7133992B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2018109738A JP7133992B2 (ja) 2018-06-07 2018-06-07 基板載置台及び基板処理装置
TW108118551A TWI787514B (zh) 2018-06-07 2019-05-29 基板載置台及基板處理裝置
KR1020190065203A KR102260238B1 (ko) 2018-06-07 2019-06-03 기판 적재대 및 기판 처리 장치
CN201910488033.8A CN110581087B (zh) 2018-06-07 2019-06-05 基板载置台和基板处理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018109738A JP7133992B2 (ja) 2018-06-07 2018-06-07 基板載置台及び基板処理装置

Publications (2)

Publication Number Publication Date
JP2019212844A JP2019212844A (ja) 2019-12-12
JP7133992B2 true JP7133992B2 (ja) 2022-09-09

Family

ID=68810479

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018109738A Active JP7133992B2 (ja) 2018-06-07 2018-06-07 基板載置台及び基板処理装置

Country Status (4)

Country Link
JP (1) JP7133992B2 (zh)
KR (1) KR102260238B1 (zh)
CN (1) CN110581087B (zh)
TW (1) TWI787514B (zh)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003243490A (ja) 2002-02-18 2003-08-29 Hitachi High-Technologies Corp ウエハ処理装置とウエハステージ及びウエハ処理方法
JP2016082077A (ja) 2014-10-17 2016-05-16 東京エレクトロン株式会社 載置台及び載置台の製造方法
JP2017092104A (ja) 2015-11-04 2017-05-25 東京エレクトロン株式会社 基板載置台および基板処理装置
JP2018026571A (ja) 2013-05-07 2018-02-15 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 最小限のクロストークで熱的に分離されたゾーンを有する静電チャック

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3742349B2 (ja) * 2002-02-15 2006-02-01 株式会社日立製作所 プラズマ処理装置
US20040187787A1 (en) * 2003-03-31 2004-09-30 Dawson Keith E. Substrate support having temperature controlled substrate support surface
KR102103136B1 (ko) * 2011-09-30 2020-04-22 어플라이드 머티어리얼스, 인코포레이티드 온도 제어되는 정전 척
JPWO2013187192A1 (ja) * 2012-06-13 2016-02-04 東京エレクトロン株式会社 基板載置台および基板処理装置
JP6584286B2 (ja) * 2015-10-26 2019-10-02 日本発條株式会社 ヒータユニット
JP2017147278A (ja) 2016-02-15 2017-08-24 東京エレクトロン株式会社 基板載置台および基板処理装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003243490A (ja) 2002-02-18 2003-08-29 Hitachi High-Technologies Corp ウエハ処理装置とウエハステージ及びウエハ処理方法
JP2018026571A (ja) 2013-05-07 2018-02-15 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 最小限のクロストークで熱的に分離されたゾーンを有する静電チャック
JP2016082077A (ja) 2014-10-17 2016-05-16 東京エレクトロン株式会社 載置台及び載置台の製造方法
JP2017092104A (ja) 2015-11-04 2017-05-25 東京エレクトロン株式会社 基板載置台および基板処理装置

Also Published As

Publication number Publication date
CN110581087A (zh) 2019-12-17
JP2019212844A (ja) 2019-12-12
TW202013585A (zh) 2020-04-01
CN110581087B (zh) 2023-08-29
TWI787514B (zh) 2022-12-21
KR102260238B1 (ko) 2021-06-02
KR20190139138A (ko) 2019-12-17

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