JP7095029B2 - プラズマ処理装置 - Google Patents

プラズマ処理装置 Download PDF

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Publication number
JP7095029B2
JP7095029B2 JP2020117323A JP2020117323A JP7095029B2 JP 7095029 B2 JP7095029 B2 JP 7095029B2 JP 2020117323 A JP2020117323 A JP 2020117323A JP 2020117323 A JP2020117323 A JP 2020117323A JP 7095029 B2 JP7095029 B2 JP 7095029B2
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Japan
Prior art keywords
chamber
optical path
window
unit
path changing
Prior art date
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Application number
JP2020117323A
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English (en)
Japanese (ja)
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JP2021044539A (ja
Inventor
秀史 東野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Priority to US17/009,921 priority Critical patent/US11437224B2/en
Priority to KR1020200114331A priority patent/KR102437254B1/ko
Priority to CN202010941328.9A priority patent/CN112466737B/zh
Priority to TW109130973A priority patent/TWI772880B/zh
Publication of JP2021044539A publication Critical patent/JP2021044539A/ja
Application granted granted Critical
Publication of JP7095029B2 publication Critical patent/JP7095029B2/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32972—Spectral analysis
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0266—Field-of-view determination; Aiming or pointing of a photometer; Adjusting alignment; Encoding angular position; Size of the measurement area; Position tracking; Photodetection involving different fields of view for a single detector
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0411—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using focussing or collimating elements, i.e. lenses or mirrors; Aberration correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/10—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
    • G01J1/20—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void intensity of the measured or reference value being varied to equalise their effects at the detectors, e.g. by varying incidence angle
    • G01J1/22—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void intensity of the measured or reference value being varied to equalise their effects at the detectors, e.g. by varying incidence angle using a variable element in the light-path, e.g. filter, polarising means

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
JP2020117323A 2019-09-09 2020-07-07 プラズマ処理装置 Active JP7095029B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US17/009,921 US11437224B2 (en) 2019-09-09 2020-09-02 Plasma processing apparatus
KR1020200114331A KR102437254B1 (ko) 2019-09-09 2020-09-08 플라즈마 처리 장치
CN202010941328.9A CN112466737B (zh) 2019-09-09 2020-09-09 等离子体处理装置
TW109130973A TWI772880B (zh) 2019-09-09 2020-09-09 電漿處理裝置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019163822 2019-09-09
JP2019163822 2019-09-09

Publications (2)

Publication Number Publication Date
JP2021044539A JP2021044539A (ja) 2021-03-18
JP7095029B2 true JP7095029B2 (ja) 2022-07-04

Family

ID=74862525

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020117323A Active JP7095029B2 (ja) 2019-09-09 2020-07-07 プラズマ処理装置

Country Status (3)

Country Link
JP (1) JP7095029B2 (zh)
KR (1) KR102437254B1 (zh)
TW (1) TWI772880B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240013156A (ko) * 2021-05-26 2024-01-30 도쿄엘렉트론가부시키가이샤 플라즈마 모니터 시스템, 플라즈마 모니터 방법 및 모니터 장치

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006024764A (ja) 2004-07-08 2006-01-26 Canon Inc プラズマ発光強度分布計測方法及びプラズマ処理装置
JP2015114313A (ja) 2013-12-16 2015-06-22 東京エレクトロン株式会社 温度測定方法、基板処理システム及び温度測定用部材
JP2016127087A (ja) 2014-12-26 2016-07-11 東京エレクトロン株式会社 基板処理装置及び基板温度測定装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61152017A (ja) * 1984-12-26 1986-07-10 Hitachi Ltd エツチングモニタ装置
JPH088242B2 (ja) * 1989-10-31 1996-01-29 株式会社東芝 エッチング深さ測定装置
JP2001358125A (ja) * 2000-06-14 2001-12-26 Shibaura Mechatronics Corp プラズマ処理装置
JP4581918B2 (ja) 2005-08-29 2010-11-17 パナソニック株式会社 プラズマ処理装置
JP2012212989A (ja) * 2011-03-30 2012-11-01 Brother Ind Ltd 頭部搭載型カメラ及びヘッドマウントディスプレイ
KR101877862B1 (ko) * 2014-12-19 2018-07-12 가부시키가이샤 히다치 하이테크놀로지즈 플라즈마 처리 장치 및 플라즈마 처리 장치의 운전 방법
JP6757162B2 (ja) * 2016-03-31 2020-09-16 芝浦メカトロニクス株式会社 プラズマ処理方法、およびプラズマ処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006024764A (ja) 2004-07-08 2006-01-26 Canon Inc プラズマ発光強度分布計測方法及びプラズマ処理装置
JP2015114313A (ja) 2013-12-16 2015-06-22 東京エレクトロン株式会社 温度測定方法、基板処理システム及び温度測定用部材
JP2016127087A (ja) 2014-12-26 2016-07-11 東京エレクトロン株式会社 基板処理装置及び基板温度測定装置

Also Published As

Publication number Publication date
TWI772880B (zh) 2022-08-01
KR20210030231A (ko) 2021-03-17
JP2021044539A (ja) 2021-03-18
TW202127499A (zh) 2021-07-16
KR102437254B1 (ko) 2022-08-26

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