JP7047668B2 - 量子カスケード半導体レーザ - Google Patents
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- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
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Description
コア層25a:量子カスケードを発生可能に配列される超格子、GaInAs/AlInAs。
発振波長:4~10マイクロメートル。
上部クラッド層25e:n型InP。
回折格子層25f:n型InGaAs。
クラッド層(下部半導体領域23c):n型InP。
コンタクト層25d:n型InGaAs。
半導体支持体23:n型InP。
埋込領域27:FeドープInP。
分離領域15。
被覆層14/ベース層16:SiN/SiON。
金属層17:Ti/Pt/Au。
裏面金属層37:AuGeNi/Au/Ti/Au。
厚膜電極35:Au膜。
誘電体膜19:アルミナ、SiON、SiN、SiO2。
金属反射膜21:金。
しかしながら、反射構造物20は、これら2層に限定されることはない。
半導体メサ25の幅W25:1~10マイクロメートル。
ベース層16の厚さH16:100~500ナノメートル。
ベース層16の幅W16:10~100マイクロメートル。
ベース層16上の被覆層14の厚さ:100~500ナノメートル。
コンタクト層25dの厚さH25d:50~300ナノメートル。
コンタクト層25dの端と第1端面E1Fとの距離:20~110マイクロメートル、容易な作製のために25~75マイクロメートル。
第1領域13a上における被覆層14の厚さH14:100~500ナノメートル。
段差15dの高さ:100~500ナノメートル。
第1端面E1F上の誘電体膜19:厚さ100~300ナノメートル。
誘電体膜19:アルミナ、SiON、SiN、SiO2。
第1端面E1F上の金属反射膜21:厚さ10~100ナノメートル。
金属反射膜21:金。
第1部分15eの厚さH15e:200~600ナノメートル。
第2部分15fの厚さH15f:100~500ナノメートル。
第3部分15gの厚さH15g:200~600ナノメートル。
第1部分15eの幅W15e:10~100マイクロメートル。
第2部分15fの幅W15f:5~50マイクロメートル。
第3部分15gの幅W15g:10~100マイクロメートル。
第1領域13aの長さ:10~100マイクロメートル。
第2領域13bの長さ:5~50マイクロメートル。
第1領域13a上の分離領域15の厚さ:200~600ナノメートル。
第2領域13b上の分離領域15の厚さ:100~500ナノメートル。
Claims (6)
- 量子カスケード半導体レーザであって、
端面を含む第1領域、第2領域及び第3領域を有するレーザ構造体と、
前記レーザ構造体の前記第3領域の主面上に設けられた金属層と、
前記レーザ構造体の主面上に設けられた分離領域と、
前記レーザ構造体上に設けられた反射構造物と、
を備え、
前記反射構造物は、前記端面及び前記分離領域上に設けられた誘電体膜及び金属反射膜を含み、
前記レーザ構造体の前記第1領域、前記第2領域及び前記第3領域は、第1軸の方向に順に配置され、
前記分離領域は、前記レーザ構造体の前記第1領域、前記第2領域及び前記第3領域の主面上にそれぞれ設けられた第1部分、第2部分及び第3部分を有し、
前記金属層は、前記端面から離れた縁を前記第3領域に有し、
前記レーザ構造体は、コンタクト層及びコア層を含む半導体メサ、前記半導体メサを埋め込む埋込領域、並びに前記埋込領域及び前記半導体メサを搭載する半導体支持体を含み、
前記コンタクト層は、前記端面から離れた縁を前記第3領域に有し、
前記分離領域の前記第1部分は、前記半導体メサ上において、前記分離領域の前記第2部分より盛り上がっており、
前記分離領域の前記第3部分は、前記半導体メサ上において、前記分離領域の前記第2部分より盛り上がっている、量子カスケード半導体レーザ。 - 前記レーザ構造体は、第4領域を更に含み、
前記第1領域、前記第2領域、前記第3領域及び前記第4領域は、前記第1軸の方向に順に配置され、
前記分離領域は、前記レーザ構造体の前記主面上に設けられた被覆層を含み、
前記被覆層は、第1無機絶縁層を含み、
前記被覆層は、前記レーザ構造体の前記第4領域の主面において前記半導体メサ上に位置するストライプ開口を有し、
前記金属層は、前記ストライプ開口を介して前記第4領域に接触を成す、請求項1に記載された量子カスケード半導体レーザ。 - 前記分離領域は、前記第1領域上において、前記第1軸の方向に交差する第2軸の方向に延在するベース層を含み、
前記被覆層は、前記ベース層上に設けられる、請求項2に記載された量子カスケード半導体レーザ。 - 前記ベース層は、前記第1領域上において、前記第1軸の方向に交差する第2軸の方向に延在する第2無機絶縁層を更に含み、
前記第2無機絶縁層は、前記第1無機絶縁層に接触を成す上面及び側面を有し、
前記第2無機絶縁層は、前記誘電体膜に接触を成す端面を有し、
前記第2無機絶縁層は、前記半導体メサに接触を成す底面を有し、
前記第1無機絶縁層は、前記分離領域の前記第1部分において前記誘電体膜に接触を成す端面及び上面を有する、請求項3に記載された量子カスケード半導体レーザ。 - 前記ベース層は、前記第1無機絶縁層と異なる材料を備える、請求項3又は請求項4に記載された量子カスケード半導体レーザ。
- 前記ベース層は、前記第1無機絶縁層と実質的に同じ材料を備える、請求項3又は請求項4に記載された量子カスケード半導体レーザ。
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US16/540,649 US10978855B2 (en) | 2018-08-24 | 2019-08-14 | Quantum cascade semiconductor laser |
CN201910783085.8A CN110858701A (zh) | 2018-08-24 | 2019-08-23 | 量子级联半导体激光器 |
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Citations (2)
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JP2013030538A (ja) | 2011-07-27 | 2013-02-07 | Sony Corp | 半導体レーザ素子およびその製造方法 |
US20180166858A1 (en) | 2016-12-08 | 2018-06-14 | Sumitomo Electric Industries, Ltd. | Quantum cascade laser |
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JP4411540B2 (ja) * | 2005-09-15 | 2010-02-10 | ソニー株式会社 | 半導体レーザ装置 |
JP4805887B2 (ja) * | 2007-09-05 | 2011-11-02 | 株式会社東芝 | 半導体レーザ装置 |
JP2015222811A (ja) * | 2014-05-01 | 2015-12-10 | 住友電気工業株式会社 | 量子カスケード半導体レーザ、量子カスケード半導体レーザを作製する方法 |
JP6375207B2 (ja) * | 2014-10-31 | 2018-08-15 | ルネサスエレクトロニクス株式会社 | 半導体レーザおよび半導体レーザの製造方法 |
JP6939119B2 (ja) * | 2017-06-19 | 2021-09-22 | 住友電気工業株式会社 | 量子カスケード半導体レーザ、発光装置、半導体レーザを作製する方法 |
JP6939120B2 (ja) * | 2017-06-19 | 2021-09-22 | 住友電気工業株式会社 | 量子カスケード半導体レーザ、発光装置、半導体レーザを作製する方法 |
JP2019140144A (ja) * | 2018-02-06 | 2019-08-22 | 住友電気工業株式会社 | 量子カスケードレーザ、発光装置 |
US10608412B2 (en) * | 2017-06-19 | 2020-03-31 | Sumitomo Electric Industries, Ltd. | Quantum cascade laser, light emitting apparatus |
US10476237B2 (en) * | 2017-06-22 | 2019-11-12 | Sumitomo Electric Industries, Ltd. | Quantum cascade laser |
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JP2013030538A (ja) | 2011-07-27 | 2013-02-07 | Sony Corp | 半導体レーザ素子およびその製造方法 |
US20180166858A1 (en) | 2016-12-08 | 2018-06-14 | Sumitomo Electric Industries, Ltd. | Quantum cascade laser |
JP2018098263A (ja) | 2016-12-08 | 2018-06-21 | 住友電気工業株式会社 | 量子カスケード半導体レーザ |
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