JP6969727B2 - 水処理分離膜、これを含む水処理モジュールおよびその製造方法 - Google Patents
水処理分離膜、これを含む水処理モジュールおよびその製造方法 Download PDFInfo
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- JP6969727B2 JP6969727B2 JP2020518517A JP2020518517A JP6969727B2 JP 6969727 B2 JP6969727 B2 JP 6969727B2 JP 2020518517 A JP2020518517 A JP 2020518517A JP 2020518517 A JP2020518517 A JP 2020518517A JP 6969727 B2 JP6969727 B2 JP 6969727B2
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- water treatment
- separation membrane
- treatment separation
- active layer
- water
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- -1 amine compound Chemical class 0.000 claims description 41
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 claims description 38
- 239000007864 aqueous solution Substances 0.000 claims description 28
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- ALSTYHKOOCGGFT-KTKRTIGZSA-N (9Z)-octadecen-1-ol Chemical compound CCCCCCCC\C=C/CCCCCCCCO ALSTYHKOOCGGFT-KTKRTIGZSA-N 0.000 description 1
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Images
Classifications
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- B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
- B01D61/025—Reverse osmosis; Hyperfiltration
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- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Description
多孔性支持体;および
前記多孔性支持体上に備えられ、表面に塩素を含むポリアミド活性層を含み、
25℃〜80℃で30日以上保管後、CIE L*a*b*表色系の値が下記式1〜式3を満足する水処理分離膜を提供する。
[式1]
91<L*<97
[式2]
−1.5<a*<1.5
[式3]
−1.5<b*<8
(a)アミン化合物とアシルハライド化合物とを界面重合して多孔性支持体上にポリアミド活性層を形成するステップと、
(b)前記ポリアミド活性層を水を含む前処理溶液に接触させて前処理するステップと、
(c)前記前処理されたポリアミド活性層に濃度が50ppm〜450ppmの次亜塩素酸溶液を接触させるステップとを含む水処理分離膜の製造方法を提供する。
(a)アミン化合物とアシルハライド化合物とを界面重合して多孔性支持体上にポリアミド活性層を形成するステップと、
(b)前記ポリアミド活性層を水を含む前処理溶液に接触させて前処理するステップと、
(c)前記前処理されたポリアミド活性層に濃度が50ppm〜450ppmの次亜塩素酸溶液を接触させて水処理分離膜を製造するステップと、
(e)前記水処理分離膜を一重以上ローリングするステップとを含む水処理モジュールの製造方法を提供する。
(a)アミン化合物とアシルハライド化合物とを界面重合して多孔性支持体上にポリアミド活性層を形成するステップと、
(b)前記ポリアミド活性層を水を含む前処理溶液に接触させて前処理するステップと、
(c)前記前処理されたポリアミド活性層に濃度が50ppm〜450ppmの次亜塩素酸溶液を接触させるステップとを含む。
本明細書の一実施態様において、前記多孔性支持体は、不織布上に高分子材料をコーティングして製造され、不織布の種類、厚さおよび気孔度は、必要に応じて多様に変更可能である。
本明細書の一実施態様において、前記前処理は、ステップ(a)で製造されたポリアミド活性層を水を含む前処理溶液に接触させる過程により行われる。
本明細書の一実施態様において、水処理分離膜の製造方法は、塩除去率および透過流量の向上のために、ポリアミド活性層に濃度が50ppm〜450ppmの次亜塩素酸溶液を接触させるステップを含む。
本明細書の一実施態様において、前記水処理分離膜の製造方法は、前記ステップ(c)の後に、(d)前記ポリアミド活性層上にグリセリン水溶液をコーティングして保護層を形成するステップをさらに含んでもよい。
本明細書の一実施態様において、水処理モジュールの製造方法は、
(a)アミン化合物とアシルハライド化合物とを界面重合して多孔性支持体上にポリアミド活性層を形成するステップと、
(b)前記ポリアミド活性層を水を含む前処理溶液に接触させて前処理するステップと、
(c)前記前処理されたポリアミド活性層に濃度が50ppm〜450ppmの次亜塩素酸溶液を接触させて水処理分離膜を製造するステップと、
(e)前記水処理分離膜を一重以上ローリングするステップとを含む。
本明細書の一実施態様において、水処理分離膜は、多孔性支持体;および前記多孔性支持体上に備えられ、表面に塩素を含むポリアミド活性層を含み、25℃〜80℃で30日以上保管後、CIE L*a*b*表色系の値が下記式1〜式3を満足する。
[式1]
91<L*<97
[式2]
−1.5<a*<1.5
[式3]
−1.5<b*<8
本明細書の一実施態様において、水処理モジュールは、本明細書の一実施態様に係る水処理分離膜を1つ以上含む。
DMF(N,N−ジメチルホルムアミド)に18重量%のポリスルホン固形分を入れて、80℃〜85℃で12時間以上溶かして均一な液相を得た。この溶液をポリエステル材質の95μm〜100μmの厚さの不織布上に150μmの厚さにキャスティングした。その後、キャスティングされた不織布を水に入れて多孔性ポリスルホン支持体を製造した。
前記製造例の水処理分離膜を常温で30秒間水に浸漬させる方法で前処理した後、25℃、100ppmの次亜塩素酸溶液に前処理された水処理分離膜を浸漬する方法で次亜塩素酸処理を行った。この後、次亜塩素酸処理されたポリアミド活性層上に10wt%のグリセリン水溶液を塗布する方法で保護層を形成することにより、水処理分離膜を完成した。
前記実施例1において、前処理溶液である水の温度を40℃以上に調整し、次亜塩素酸溶液の濃度を300ppmに変更した以外は、前記実施例1と同様の過程で水処理モジュールを製造した。
前記製造例の水処理分離膜を複数重ローリングして、直径1.8in、長さ12inの円形の円筒水処理モジュールを製造した。
前記実施例1において、次亜塩素酸溶液の濃度を10ppmに変更した以外は、前記実施例1と同様の過程で水処理モジュールを製造した。
前記実施例1において、前処理を行わないことを除けば、前記実施例1と同様の過程で水処理モジュールを製造した。
前記製造例の水処理分離膜を複数重ローリングして、直径1.8in、長さ12inの円形の円筒水処理モジュールを製造した後、製造された水処理モジュールを25℃、20ppmの次亜塩素酸溶液および10psiの加圧条件で次亜塩素酸処理を行った。
前記実施例および比較例により製造された水処理モジュールに対して、250ppmのNaClを含有する塩水を用いて、性能を評価した。
前記実施例および比較例の製造過程において、各ステップの含水率を、以下の条件下、IR heaterで100℃で1分30秒間乾燥した後、乾燥前および後の重量の変化により測定した。
*ステップ(b)の直後:前処理後3分以内に含水率測定
*ステップ(c)の直後:次亜塩素酸処理後3分以内に含水率測定
*ステップ(d)の直後:グリセリンコーティング後、80℃の乾燥機で1分30秒間保護層を乾燥させた後3分以内に含水率測定
*ステップ(e)の後:モジュールの製造後、水処理分離膜状態に再度分解した後3分以内に含水率測定
前記実施例および比較例で製造された水処理分離膜に対して、水処理モジュールにローリングする前、5cm×5cmの大きさのサンプルに裁断した後、コニカミノルタ(Konica Minolta)社のCM−3600D分光光度計(spectrophotometer)を用いて、SCI(specular component included)ベースでCIE L*a*b*表色系の値を測定した。
前記実施例1、2および比較例1で製造された水処理分離膜に対して、表面の元素分析の結果を通して得られた各元素の含有量を下記表4に示した。また、実施例1および比較例1の元素分析の結果グラフを図2および図3に示した。
200:多孔性支持体
300:ポリアミド活性層
400:不純物を含む原水
500:精製水
600:濃縮水
Claims (12)
- 多孔性支持体;および
前記多孔性支持体上に備えられ、表面に塩素を含むポリアミド活性層を含み、
25℃〜80℃で30日以上保管後、CIE L*a*b*表色系の値が下記式1〜式3を満足し、
水処理分離膜の表面の元素分析時、塩素元素の含有量が0.1at%以上3at%以下である、水処理分離膜:
[式1]
91<L*<97
[式2]
−1.5<a*<1.5
[式3]
−1.5<b*<8。 - 前記ポリアミド活性層上にグリセリンを含む保護層をさらに含むものである、請求項1に記載の水処理分離膜。
- 請求項1または2に記載の水処理分離膜を1つ以上含む水処理モジュール。
- (a)アミン化合物とアシルハライド化合物とを界面重合して多孔性支持体上にポリアミド活性層を形成するステップと、
(b)前記ポリアミド活性層を水を含む前処理溶液に接触させて前処理するステップと、
(c)前記前処理されたポリアミド活性層に濃度が50ppm〜450ppmの次亜塩素酸溶液を接触させるステップとを含む、請求項1または2に記載の水処理分離膜の製造方法。 - 前記ステップ(c)の後に、(d)前記ポリアミド活性層上にグリセリン水溶液をコーティングして保護層を形成するステップをさらに含む、請求項4に記載の水処理分離膜の製造方法。
- 前記ステップ(a)の直後に測定された水処理分離膜の含水率は0.1%〜3%である、請求項4または5に記載の水処理分離膜の製造方法。
- 前記ステップ(b)の直後に測定された水処理分離膜の含水率は20%〜50%である、請求項4から6のいずれか一項に記載の水処理分離膜の製造方法。
- 前記ステップ(d)の直後に測定された水処理分離膜の含水率は0.1%〜5%である、請求項5に記載の水処理分離膜の製造方法。
- 前記前処理溶液は、1種以上の酸性塩または塩基性塩をさらに含むものである、請求項4から8のいずれか一項に記載の水処理分離膜の製造方法。
- 前記次亜塩素酸溶液は、次亜塩素酸ナトリウム(NaOCl)水溶液である、請求項4から9のいずれか一項に記載の水処理分離膜の製造方法。
- (a)アミン化合物とアシルハライド化合物とを界面重合して多孔性支持体上にポリアミド活性層を形成するステップと、
(b)前記ポリアミド活性層を水を含む前処理溶液に接触させて前処理するステップと、
(c)前記前処理されたポリアミド活性層に濃度が50ppm〜450ppmの次亜塩素酸溶液を接触させて水処理分離膜を製造するステップと、
(e)前記水処理分離膜を一重以上ローリングするステップとを含む、請求項3に記載の水処理モジュールの製造方法。 - 前記ステップ(e)の後に水処理モジュールを水処理分離膜に分解して測定された水処理分離膜の含水率は0.1%〜5%である、請求項11に記載の水処理モジュールの製造方法。
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JP2020535957A (ja) | 2020-12-10 |
EP3702020A4 (en) | 2021-02-17 |
EP3702020A1 (en) | 2020-09-02 |
WO2020013562A1 (ko) | 2020-01-16 |
KR20200006019A (ko) | 2020-01-17 |
US11517861B2 (en) | 2022-12-06 |
US20200254397A1 (en) | 2020-08-13 |
CN111201078A (zh) | 2020-05-26 |
KR102230984B1 (ko) | 2021-03-23 |
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