JP6954996B2 - レンズ汚染防止装置および方法 - Google Patents
レンズ汚染防止装置および方法 Download PDFInfo
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
- G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
- G03F9/7057—Gas flow, e.g. for focusing, leveling or gap setting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
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- Public Health (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lens Barrels (AREA)
Description
半導体製造工程における一連の複雑で、時間のかかるリソグラフィプロセスは、主に対応するリソグラフィ装置によって実行される。
対物レンズの下表面の最後の一枚レンズとシリコンウェハ表面との距離が近いため、揮発した有機物がレンズ表面に付着しやすくなる。
前記レンズの下表面に近い位置から保護層ガスを出力し、レンズの表面にエアカーテン保護層を形成するステップ1と、
汚染源に近い位置から前記保護層ガス及び/又は汚染ガスを吸い込み、レンズから遠く離れた環境に排出するステップ2、を含む。
100−レンズ、101−ミラーベース 102−保護フィルム、200−排気通路、300―第一装置、310―ガス入口、320―密閉容器、330−ノズル、400−第二装置、410−小孔、420−環状キャビティ、500−シリコンウェハ、600−仕切板。
ステップ1:レンズの下表面に近い位置から保護層ガスを出力し、レンズの表面にエアカーテン保護層を形成する;
ステップ2:汚染源に近い位置から前述の保護層ガス及び/又は汚染ガスを吸い込み、レンズから遠く離れた環境に排出する。
Claims (9)
- レンズ汚染防止装置であって、
第一装置、第一装置に接続される第二装置及び排気通路を有し、
前記第一装置は前記第二装置と比較してレンズの軸方向に沿ってレンズにより近く、
前記第一装置は保護層ガスを出力するために使用され、前記レンズの表面にエアカーテン保護層を形成させ、
前記第二装置は前記保護層ガス及び/又は汚染ガスを吸排するために使用され、
前記第二装置は環状キャビティを有し、
前記環状キャビティの下表面には複数の小孔が設けられ、
前記第一装置は密閉容器を有し、
前記密閉容器は、前記レンズの縁部下表面側に配置される扇型状のエアカーテンキャビティであって、前記密閉容器の内側弧面は、前記レンズの縁部の外側面に密着しており、
前記密閉容器にはノズルが設けられ、
前記ノズルは前記排気通路と水平方向において対向して設置され、
前記保護層ガスは前記ノズルから出力され、前記レンズの下表面を通って流れた後に前記小孔を通じて環状キャビティ内に入り、前記環状キャビティ内に通じる前記排気通路から排出される、
ことを特徴とするレンズ汚染防止装置。 - 前記第一装置と前記第二装置がそれぞれ前記排気通路に接続される、
ことを特徴とする請求項1に記載のレンズ汚染防止装置。 - 前記排気通路は吸排気力源に接続される、
ことを特徴とする請求項2に記載のレンズ汚染防止装置。 - 前記保護層ガスは99.999%以上の純度を有するガスである、
ことを特徴とする請求項1に記載のレンズ汚染防止装置。 - 前記密閉容器にはガス入口が設けられ、前記保護層ガスは前記ガス入口を通過して前記密閉容器の内部に入る、
ことを特徴とする請求項1に記載のレンズ汚染防止装置。 - 前記小孔間の距離は等しい、
ことを特徴とする請求項1に記載のレンズ汚染防止装置。 - 請求項1乃至請求項6のいずれか一項に記載のレンズ汚染防止装置を用い、レンズ汚染を防止する方法であって、
レンズの下表面に近い位置において、前記第一装置は保護層ガスを出力し、レンズの表面にエアカーテン保護層を形成するステップ1と、
汚染源に近い位置において、前記第二装置は上記保護層ガス及び/又は汚染ガスを上に向けて吸い込み、レンズから遠く離れた環境に排出するステップ2と、
を有する、
ことを特徴とするレンズ汚染防止方法。 - 前記レンズはリソグラフィ装置のレンズであり、前記ステップ1において、前記保護層ガスの出力は、前記リソグラフィ装置の露光の前後で連続的に行われる、
ことを特徴とする請求項7に記載のレンズ汚染防止方法。 - 前記レンズはリソグラフィ装置のレンズであり、前記ステップ2において、前記保護層ガス及び/又は汚染ガスの吸い込みおよび排出は、前記リソグラフィ装置の露光中および露光後に連続的に行われる、
ことを特徴とする請求項7に記載のレンズ汚染防止方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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CN201610767140.0 | 2016-08-30 | ||
CN201610767140.0A CN107783283B (zh) | 2016-08-30 | 2016-08-30 | 镜片防污染装置及方法 |
PCT/CN2017/099513 WO2018041099A1 (zh) | 2016-08-30 | 2017-08-29 | 镜片防污染装置及方法 |
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JP2019525259A JP2019525259A (ja) | 2019-09-05 |
JP6954996B2 true JP6954996B2 (ja) | 2021-10-27 |
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US (1) | US10539887B2 (ja) |
EP (1) | EP3508920A4 (ja) |
JP (1) | JP6954996B2 (ja) |
KR (1) | KR102212629B1 (ja) |
CN (1) | CN107783283B (ja) |
SG (1) | SG11201901811RA (ja) |
TW (1) | TWI639062B (ja) |
WO (1) | WO2018041099A1 (ja) |
Families Citing this family (6)
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CN109283797B (zh) * | 2017-07-21 | 2021-04-30 | 上海微电子装备(集团)股份有限公司 | 物镜保护装置、物镜系统以及光刻设备 |
CN110764368A (zh) * | 2018-07-27 | 2020-02-07 | 上海微电子装备(集团)股份有限公司 | 物镜防污染装置 |
US10946838B2 (en) | 2019-03-21 | 2021-03-16 | Ford Global Technologies, Llc | Cleaning apparatus for sensor |
CN110620858B (zh) * | 2019-09-11 | 2024-03-22 | 昆山丘钛微电子科技有限公司 | 镜头保护元件、摄像头模组及摄像头模组的制造方法 |
CN112748641B (zh) * | 2019-10-31 | 2022-08-12 | 上海微电子装备(集团)股份有限公司 | 镜片底部气帘防护装置 |
CN112718702A (zh) * | 2020-12-30 | 2021-04-30 | 中国科学院微电子研究所 | 可控微透镜阵列清洁装置 |
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SE412127B (sv) * | 1978-06-15 | 1980-02-18 | Aga Ab | Anordning for ett optiskt element |
JP3531914B2 (ja) | 2000-04-14 | 2004-05-31 | キヤノン株式会社 | 光学装置、露光装置及びデバイス製造方法 |
WO2001084241A1 (en) * | 2000-05-03 | 2001-11-08 | Silicon Valley Group, Inc. | Non-contact seal using purge gas |
KR100326432B1 (ko) * | 2000-05-29 | 2002-02-28 | 윤종용 | 웨이퍼 스테이지용 에어 샤워 |
US6934003B2 (en) * | 2002-01-07 | 2005-08-23 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method |
US7057702B2 (en) * | 2004-06-23 | 2006-06-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE102005020521B4 (de) * | 2005-04-29 | 2013-05-02 | Xtreme Technologies Gmbh | Verfahren und Anordnung zur Unterdrückung von Debris bei der Erzeugung kurzwelliger Strahlung auf Basis eines Plasmas |
CN101034261B (zh) * | 2006-03-09 | 2010-08-11 | 中芯国际集成电路制造(上海)有限公司 | 防止由阻挡处理对光学元件的污染的方法和设备 |
CN202837812U (zh) * | 2012-11-01 | 2013-03-27 | 张添祥 | 应用于步进式曝光机的镜头组 |
CN104887311A (zh) * | 2014-03-04 | 2015-09-09 | 镇江市新天医疗器械有限公司 | 口腔牙科手术显微镜光学镜头表面除雾器 |
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2016
- 2016-08-30 CN CN201610767140.0A patent/CN107783283B/zh active Active
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2017
- 2017-08-29 JP JP2019510647A patent/JP6954996B2/ja active Active
- 2017-08-29 EP EP17845401.3A patent/EP3508920A4/en active Pending
- 2017-08-29 WO PCT/CN2017/099513 patent/WO2018041099A1/zh unknown
- 2017-08-29 US US16/329,496 patent/US10539887B2/en active Active
- 2017-08-29 KR KR1020197009167A patent/KR102212629B1/ko active IP Right Grant
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Publication number | Publication date |
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KR20190043168A (ko) | 2019-04-25 |
EP3508920A1 (en) | 2019-07-10 |
CN107783283A (zh) | 2018-03-09 |
US20190187561A1 (en) | 2019-06-20 |
SG11201901811RA (en) | 2019-04-29 |
CN107783283B (zh) | 2020-01-24 |
TW201812485A (zh) | 2018-04-01 |
EP3508920A4 (en) | 2019-09-04 |
WO2018041099A1 (zh) | 2018-03-08 |
TWI639062B (zh) | 2018-10-21 |
JP2019525259A (ja) | 2019-09-05 |
US10539887B2 (en) | 2020-01-21 |
KR102212629B1 (ko) | 2021-02-04 |
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