JP6952142B2 - 白色発光素材の製造方法 - Google Patents
白色発光素材の製造方法 Download PDFInfo
- Publication number
- JP6952142B2 JP6952142B2 JP2020011596A JP2020011596A JP6952142B2 JP 6952142 B2 JP6952142 B2 JP 6952142B2 JP 2020011596 A JP2020011596 A JP 2020011596A JP 2020011596 A JP2020011596 A JP 2020011596A JP 6952142 B2 JP6952142 B2 JP 6952142B2
- Authority
- JP
- Japan
- Prior art keywords
- light emitting
- emitting material
- white light
- white
- green
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5826—Treatment with charged particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
- C23C14/5853—Oxidation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/006—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
- C23C28/3225—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only with at least one zinc-based layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/36—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including layers graded in composition or physical properties
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/817—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous
- H10H20/818—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous within the light-emitting regions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/851—Wavelength conversion means
- H10H20/8511—Wavelength conversion means characterised by their material, e.g. binder
- H10H20/8512—Wavelength conversion materials
- H10H20/8513—Wavelength conversion materials having two or more wavelength conversion materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/036—Manufacture or treatment of packages
- H10H20/0361—Manufacture or treatment of packages of wavelength conversion means
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Thermal Sciences (AREA)
- Silicon Compounds (AREA)
- Led Device Packages (AREA)
- Luminescent Compositions (AREA)
- Chemical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Description
現在、白色LEDを製造する方法のうち、最も広く研究されている方法は、青色LED光源に黄色発光用蛍光体を組み合わせて白色を具現することである。この方法は、国際特許公開第WO98/005078号公報(“Light Emitting Device and Display Device”、出願日:1997.07.29、公開日:1998.02.05)、日本国のShuji Nakamuraの著書(S.Nakamura,“The Blue Laser Diode”,Springer−Verlag,1997)などに提示されたことがある。
上述した方法で製造された白色発光素材は、白色発光効率は優れた反面、演色評価数(color rendering index)が低く、電流密度及び使用時間によって演色評価数が変わる問題点が存在する。特に、LEDから出る励起光源である青色光の強度が強く、蛍光体から出る緑色光及び赤色光の強度が弱くて蛍光灯や月明のような青色の冷たい白色光が形成されるため、活用性に制約がある。
前記(a)段階で、前記金属は亜鉛(Zn)であることを特徴とする。
前記(b)段階で形成された青色発光素材は酸化亜鉛(ZnO)であり、緑色発光素材はSiOx(0<x<2)からなる酸化シリコンであることを特徴とする。
前記(b)段階で形成された緑色及び青色発光素材がハイブリッド化した物質は、酸化亜鉛(ZnO)相を含むSiの豊かな酸化物ナノワイヤ(sillicon−rich oxide nanowires;SONWs)であることを特徴とする。
前記(c)段階で形成された赤色発光素材はシリコンナノ結晶(Si nanocrystals;Si NCs)であることを特徴とする。
前記(b)段階は、前記PECVD反応器内に窒素で希釈された5%キシレン(SiH4)及び亜酸化窒素(N2O)からなる混合ガスを供給し、前記混合ガスの混合比(R=N2O/SiH4)によって白色光スペクトラム(white light spectrum)がチューニング(tuning)されることを特徴とする。
前記基板上に蒸着される金属膜の厚さによって白色光スペクトラム(white light spectrum)がチューニング(tuning)されることを特徴とする。
また、本発明は、前記白色発光素材の製造方法によって製造された白色発光素材を提供する。
前記白色発光素材は、350nm〜900nm範囲の発光波長を有することを特徴とする。
また、本発明は、前記白色発光素材から製造された光電素子を提供する。
第一、青色LED光源に黄色発光用蛍光体を組み合わせて白色を具現することによって可視光領域の一部スペクトラムのみ持っているから低い演色評価数を持っていた従来技術とは違い、本発明は、赤色、緑色及び青色発光ナノ素材をハイブリッド化して350nm〜900nmの発光波長を有する白色発光素材を製造することにより、製造された白色発光素材は優れた演色評価数を有することができる。
第二、白色発光素材を製造するにあたり、PECVD反応器内に投入される混合ガスの混合比及び基板上に蒸着される金属膜の厚さ調整によって350nm〜900nmの範囲内で白色光スペクトラムのチューニングが可能であり、よって本発明で提示する製造方法で製造された白色発光素材は多様な分野に応用可能である。
(a)段階(S100)は、熱蒸着(thermal evaporation)方法を行って、基板上に青色発光素材を形成するための金属を蒸着する段階である。ここで、本発明の一実施例による金属は亜鉛(Zn)であり得る。また、基板としてはp−typeシリコン基板を使ったが、これに限定されない。
(b)段階(S200)は(a)段階(S100)で金属膜が蒸着された基板をプラズマ化学気相蒸着(plasma−enhanced chemical vapor deposition;PECVD)反応器内に位置させ、プラズマ状態の珪素(Si)及び酸素(O)に露出させることにより、緑色及び青色発光素材がハイブリッド化した物質を形成する段階である。
図2(d)は室温(=〜25℃)で測定されたSONWsサンプルのPLスペクトラムを示す図である。ここで、図2(d)ではおよそ380nm及び530nmで2個のピークが観察される。
(c)段階(S300)は、赤色、緑色及び青色発光素材がハイブリッド化するように、(b)段階で形成された物質をアニーリング(annealing)して前記物質内に赤色発光素材を形成する段階である。ここで、(c)段階で形成された赤色発光素材はシリコンナノ結晶(Si nanocrystals;Si NCs)である。
図3を参照すると、図3(a)は1100℃で1時間アニーリングしたSONWsのPLスペクトラム(raw data)を示す図である。ここで、図3(a)は、図1(d)に示したPLスペクトラムと比較したとき、Red/NIR領域でのPL強度が向上して、350nm〜850nmの広範囲のPLスペクトラムを有する白色光が形成されたことを示す。
Claims (5)
- (a)熱蒸着(thermal evaporation)方法を行って、基板上に青色発光素材を形成するための金属を蒸着する段階と、
(b)前記(a)段階で金属膜が蒸着された基板をプラズマ化学気相蒸着(plasma−enhanced chemical vapor deposition;PECVD)反応器内に位置させ、プラズマ状態の珪素(Si)及び酸素(O)に露出させることにより、緑色及び青色発光素材がハイブリッド化した物質を形成する段階と、
(C)赤色、緑色及び青色発光素材がハイブリッド化するように、前記(b)段階で形成された物質をアニーリング(annealing)して前記物質内に赤色発光素材を形成する段階と、を含み、
前記(a)段階で、前記金属は亜鉛(Zn)であり、
前記(b)段階で形成された青色発光素材は酸化亜鉛(ZnO)であり、緑色発光素材はSiOx(0<x<2)からなる酸化シリコンであり、
前記(b)段階で形成された緑色及び青色発光素材がハイブリッド化した物質は、酸化亜鉛(ZnO)相を含むSiの豊かな酸化物ナノワイヤ(sillicon−rich oxide nanowires;SONWs)であり、
前記(c)段階で形成された赤色発光素材はシリコンナノ結晶(Si nanocrystals;Si NCs)であり、
前記基板上に蒸着される金属膜の厚さによって白色光スペクトラム(white light spectrum)がチューニング(tuning)されることを特徴とする、白色発光素材の製造方法。 - 前記(b)段階は、前記PECVD反応器内に窒素で希釈された5%キシレン(SiH4)及び亜酸化窒素(N2O)からなる混合ガスを供給し、
前記混合ガスの混合比(R=N2O/SiH4)によって白色光スペクトラム(white light spectrum)がチューニング(tuning)されることを特徴とする、請求項1に記載の白色発光素材の製造方法。 - 請求項1または2に記載の白色発光素材の製造方法によって製造された、白色発光素材。
- 350nm〜900nm範囲の発光波長を有することを特徴とする、請求項3に記載の白色発光素材。
- 請求項3又は4に記載の白色発光素材から製造された、光電素子。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2019-0119550 | 2019-09-27 | ||
| KR1020190119550A KR102230355B1 (ko) | 2019-09-27 | 2019-09-27 | 백색 발광 소재의 제조방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2021054700A JP2021054700A (ja) | 2021-04-08 |
| JP6952142B2 true JP6952142B2 (ja) | 2021-10-20 |
Family
ID=75162412
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020011596A Expired - Fee Related JP6952142B2 (ja) | 2019-09-27 | 2020-01-28 | 白色発光素材の製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US10964856B1 (ja) |
| JP (1) | JP6952142B2 (ja) |
| KR (1) | KR102230355B1 (ja) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW383508B (en) | 1996-07-29 | 2000-03-01 | Nichia Kagaku Kogyo Kk | Light emitting device and display |
| US7259055B2 (en) * | 2005-02-24 | 2007-08-21 | Sharp Laboratories Of America, Inc. | Method of forming high-luminescence silicon electroluminescence device |
| KR101106134B1 (ko) * | 2005-07-11 | 2012-01-20 | 서울옵토디바이스주식회사 | 나노와이어 형광체를 채택한 발광소자 |
| KR100971135B1 (ko) * | 2008-04-01 | 2010-07-20 | 경희대학교 산학협력단 | 산화아연 나노결정과 실리콘 나노결정의 하이브리드나노구조 및 그의 제조방법 |
| KR101317406B1 (ko) * | 2012-09-24 | 2013-10-15 | 강원대학교산학협력단 | 실리카 나노와이어의 제조 방법 |
-
2019
- 2019-09-27 KR KR1020190119550A patent/KR102230355B1/ko active Active
-
2020
- 2020-01-08 US US16/737,485 patent/US10964856B1/en not_active Expired - Fee Related
- 2020-01-28 JP JP2020011596A patent/JP6952142B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2021054700A (ja) | 2021-04-08 |
| KR102230355B1 (ko) | 2021-03-22 |
| US20210098658A1 (en) | 2021-04-01 |
| US10964856B1 (en) | 2021-03-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Feng et al. | Synthesis and luminescence properties of Al2O3@ YAG: Ce core–shell yellow phosphor for white LED application | |
| Cho et al. | Optical properties of sol–gel derived Y2O3: Eu3+ thin-film phosphors for display applications | |
| Avci et al. | Microencapsulation of moisture-sensitive CaS: Eu2+ particles with aluminum oxide | |
| Chao et al. | Structural and luminescent properties of YAG: Ce thin film phosphor | |
| M. ten Kate et al. | Effects of surface modification on optical properties and thermal stability of K2SiF6: Mn4+ red phosphors by deposition of an ultrathin Al2O3 layer using gas-phase deposition in a fluidized bed reactor | |
| JP2012178580A (ja) | 白色光源、照明装置、および液晶表示装置 | |
| Ramos-Guerra et al. | Multicolored photoluminescence and structural properties of zirconium oxide films co-doped with Tb3+ and Eu3+ ions | |
| Aguilar-Castillo et al. | White light generation from HfO2 films co-doped with Eu3++ Tb3+ ions synthesized by pulsed laser ablation technique | |
| JP5793723B2 (ja) | 薄膜蛍光体及びその成膜方法 | |
| CN112724962A (zh) | 一种有机半导体薄膜及其制备方法 | |
| US10403495B2 (en) | Sn doped ZnS nanowires for white light source material | |
| Choe | Luminescence and compositional analysis of Y3Al5O12: Ce films fabricated by pulsed-laser deposition | |
| KR102230355B1 (ko) | 백색 발광 소재의 제조방법 | |
| Gautam et al. | Synthesis of InN@ SiO2 nanostructures and fabrication of blue LED devices | |
| JP5339683B2 (ja) | 蛍光体膜の多元真空蒸着法を用いた製造方法 | |
| Tai et al. | Stoichiometry detuned silicon carbide as an orange and white light band solid-state phosphor | |
| Tai et al. | Nearly warm white-light emission of silicon-rich amorphous silicon carbide | |
| Deep et al. | Full‐Color Electroluminescence from ZnO Nanoparticles‐Based Homojunction Diodes | |
| Tiour et al. | Optical properties of cerium-doped SiNx thin films containing silicon nanocrystals | |
| JP2004284876A (ja) | 不純物含有窒化ガリウム粉体およびその製造方法 | |
| WO2007024017A1 (ja) | 発光層形成用基材、発光体及び発光物質 | |
| Zhu et al. | Structures and photoluminescence properties of silicon thin films prepared by pulsed ion-beam evaporation | |
| Kim et al. | Thin Film Deposition of Tb_3Al_5O_312: Ce by Pulsed Laser Ablation and Effects of Low-temperature Post-annealing | |
| WO2020040306A1 (ja) | イットリウムアルミニウムガーネット蛍光体およびそれを備える発光装置 | |
| JP2016169416A (ja) | シリコンナノ粒子発光体の製造方法およびそのシリコンナノ粒子発光体を用いた発光素子 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20200213 |
|
| A80 | Written request to apply exceptions to lack of novelty of invention |
Free format text: JAPANESE INTERMEDIATE CODE: A80 Effective date: 20200212 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210316 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210427 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210608 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210721 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20210921 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20210927 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 6952142 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| LAPS | Cancellation because of no payment of annual fees |