JP6944315B2 - 光検出素子 - Google Patents
光検出素子 Download PDFInfo
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- JP6944315B2 JP6944315B2 JP2017170180A JP2017170180A JP6944315B2 JP 6944315 B2 JP6944315 B2 JP 6944315B2 JP 2017170180 A JP2017170180 A JP 2017170180A JP 2017170180 A JP2017170180 A JP 2017170180A JP 6944315 B2 JP6944315 B2 JP 6944315B2
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- 229910052751 metal Inorganic materials 0.000 claims description 157
- 239000002184 metal Substances 0.000 claims description 157
- 230000000737 periodic effect Effects 0.000 claims description 114
- 239000004065 semiconductor Substances 0.000 claims description 101
- 238000001514 detection method Methods 0.000 claims description 37
- 229910052710 silicon Inorganic materials 0.000 claims description 14
- 239000010703 silicon Substances 0.000 claims description 14
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 7
- 239000010410 layer Substances 0.000 description 90
- 230000031700 light absorption Effects 0.000 description 41
- 230000035945 sensitivity Effects 0.000 description 31
- 238000011156 evaluation Methods 0.000 description 29
- 238000010521 absorption reaction Methods 0.000 description 21
- 238000012986 modification Methods 0.000 description 18
- 230000004048 modification Effects 0.000 description 18
- 239000010931 gold Substances 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 13
- 230000010287 polarization Effects 0.000 description 13
- 239000000969 carrier Substances 0.000 description 12
- 239000010936 titanium Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 230000004888 barrier function Effects 0.000 description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 7
- 229910052737 gold Inorganic materials 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 229910052719 titanium Inorganic materials 0.000 description 6
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000000470 constituent Substances 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910021418 black silicon Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- H—ELECTRICITY
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- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/108—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the Schottky type
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1226—Basic optical elements, e.g. light-guiding paths involving surface plasmon interaction
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- H01L31/02—Details
- H01L31/0224—Electrodes
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- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02327—Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/035281—Shape of the body
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035272—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions characterised by at least one potential jump barrier or surface barrier
- H01L31/03529—Shape of the potential jump barrier or surface barrier
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/12061—Silicon
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- Condensed Matter Physics & Semiconductors (AREA)
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- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Light Receiving Elements (AREA)
Description
Claims (16)
- 周期的な凸部及び凹部によって構成され、光を表面プラズモンに変換する周期的凹凸構造を一面側に有する半導体層と、
前記周期的凹凸構造に対応して前記半導体層の一面側に設けられた金属膜と、を備え、
前記周期的凹凸構造において、前記凸部の基端側には、前記金属膜とショットキー接合するショットキー接合部が設けられ、前記凸部の先端側には、前記金属膜とショットキー接合しない非ショットキー接合部が設けられ、
前記凸部の頂面には、前記非ショットキー接合部への電流の流入を抑制する絶縁膜が設けられ、
前記金属膜は、前記凹部の底面及び内壁面を覆う第1の部分と、前記第1の部分に連続して前記絶縁膜を覆う第2の部分とを有し、
前記第1の部分によって前記ショットキー接合部が構成され、前記第2の部分によって前記非ショットキー接合部が構成されている光検出素子。 - 前記絶縁膜の厚さは、前記凸部の高さ以下となっている請求項1記載の光検出素子。
- 周期的な凸部及び凹部によって構成され、光を表面プラズモンに変換する周期的凹凸構造を一面側に有する半導体層と、
前記周期的凹凸構造に対応して前記半導体層の一面側に設けられた金属膜と、を備え、
前記周期的凹凸構造において、前記凸部の基端側には、前記金属膜とショットキー接合するショットキー接合部が設けられ、前記凸部の先端側には、前記金属膜とショットキー接合しない非ショットキー接合部が設けられ、
前記凸部は、絶縁膜によって構成され、
前記金属膜は、前記凹部の底面を覆う第1の部分と、前記凸部を覆う第2の部分とを有し、
前記第1の部分によって前記ショットキー接合部が構成され、前記第2の部分によって前記非ショットキー接合部が構成されている光検出素子。 - 前記絶縁膜の屈折率は、前記半導体層の屈折率よりも小さくなっている請求項1〜3のいずれか一項記載の光検出素子。
- 周期的な凸部及び凹部によって構成され、光を表面プラズモンに変換する周期的凹凸構造を一面側に有する半導体層と、
前記周期的凹凸構造に対応して前記半導体層の一面側に設けられた金属膜と、を備え、
前記周期的凹凸構造において、前記凸部の基端側には、前記金属膜とショットキー接合するショットキー接合部が設けられ、前記凸部の先端側には、前記金属膜とショットキー接合しない非ショットキー接合部が設けられ、
前記金属膜は、前記凹部の底面及び内壁面を覆う第1の部分と、隣り合う凹部における前記第1の部分の一部同士を結ぶように前記凸部の頂面側に設けられた第2の部分とを有し、
前記第1の部分によって前記ショットキー接合部が構成され、前記第2の部分の非形成領域によって前記非ショットキー接合部が構成されている光検出素子。 - 周期的な凸部及び凹部によって構成され、光を表面プラズモンに変換する周期的凹凸構造を一面側に有する半導体層と、
前記周期的凹凸構造に対応して前記半導体層の一面側に設けられた金属膜と、を備え、
前記周期的凹凸構造において、前記凸部の基端側には、前記金属膜とショットキー接合するショットキー接合部が設けられ、前記凸部の先端側には、前記金属膜とショットキー接合しない非ショットキー接合部が設けられ、
前記金属膜は、前記凹部の底面及び内壁面を覆う第1の部分と、隣り合う凹部における前記第1の部分の一部同士を結ぶように前記凸部の頂面側に設けられた第2の部分とを有し、
前記第1の部分によって前記ショットキー接合部が構成され、前記第2の部分の非形成領域によって前記非ショットキー接合部が構成され、
前記第1の部分は、前記凸部の頂面よりも突出する突出部分を有し、
前記第2の部分は、前記突出部分同士を結ぶように前記凸部の頂面から離間して設けられている光検出素子。 - 周期的な凸部及び凹部によって構成され、光を表面プラズモンに変換する周期的凹凸構造を一面側に有する半導体層と、
前記周期的凹凸構造に対応して前記半導体層の一面側に設けられた金属膜と、を備え、
前記周期的凹凸構造において、前記凸部の基端側には、前記金属膜とショットキー接合するショットキー接合部が設けられ、前記凸部の先端側には、前記金属膜とショットキー接合しない非ショットキー接合部が設けられ、
前記凸部の頂面には、前記半導体層とオーミック接合するオーミック電極が設けられ、
前記金属膜は、前記凹部の底面及び内壁面を覆うように設けられ、
前記金属膜によって前記ショットキー接合部が構成され、前記オーミック電極によって前記非ショットキー接合部が構成されている光検出素子。 - 前記金属膜の厚さは、20nm以上となっている請求項1〜7のいずれか一項記載の光検出素子。
- 前記半導体層は、シリコンによって構成されている請求項1〜8のいずれか一項記載の光検出素子。
- 前記金属膜は、アルミニウムを含んで構成されている請求項1〜9のいずれか一項記載の光検出素子。
- 前記金属膜は、前記半導体層に接する第1の膜と、当該第1の膜よりも屈折率が小さい第2の膜とを含む複数層の膜によって構成されている請求項1〜10のいずれか一項記載の光検出素子。
- 前記周期的凹凸構造における前記凹部は、平面視でマトリクス状の配置パターンを有している請求項1〜11のいずれか一項記載の光検出素子。
- 前記凹部の横断面形状は、円形状又は矩形状となっている請求項12記載の光検出素子。
- 前記周期的凹凸構造における前記凹部は、平面視でストライプ状の配置パターンを有している請求項1〜11のいずれか一項記載の光検出素子。
- 前記周期的凹凸構造における前記凹部は、平面視で同心円状の配置パターンを有している請求項1〜11のいずれか一項記載の光検出素子。
- 前記周期的凹凸構造における前記凹部は、平面視で同心多角形状の配置パターンを有している請求項1〜11のいずれか一項記載の光検出素子。
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WO2021140743A1 (ja) * | 2020-01-10 | 2021-07-15 | パナソニックIpマネジメント株式会社 | 光デバイス |
DE102020209447A1 (de) | 2020-07-27 | 2022-02-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Sensorstruktur mit Schottky-Diode |
CN114584103B (zh) * | 2022-03-11 | 2023-06-20 | 武汉敏声新技术有限公司 | 横向激励体声波谐振器及滤波器 |
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US4593304A (en) * | 1981-04-20 | 1986-06-03 | Hughes Aircraft Company | Heterostructure interdigital high speed photoconductive detector |
JP2659184B2 (ja) | 1987-02-17 | 1997-09-30 | 日本電気株式会社 | シヨツトキ障壁型赤外線センサ |
JP2000164918A (ja) | 1998-11-27 | 2000-06-16 | Mitsubishi Electric Corp | ショットキー接合型半導体光検出素子 |
JP4438038B2 (ja) * | 2000-07-19 | 2010-03-24 | キヤノン株式会社 | 面型受光素子、およびその製造方法 |
WO2007105593A1 (ja) * | 2006-03-13 | 2007-09-20 | Nec Corporation | フォトダイオード、およびその製造方法、ならびに光通信デバイスおよび光インタコネクションモジュール |
JP4835837B2 (ja) * | 2006-03-31 | 2011-12-14 | 日本電気株式会社 | フォトダイオードとその製造方法 |
JP4789752B2 (ja) * | 2006-08-28 | 2011-10-12 | キヤノン株式会社 | 光電変換素子およびその製造方法 |
TWI341039B (en) * | 2007-03-30 | 2011-04-21 | Delta Electronics Inc | Light emitting diode apparatus |
JP2011077274A (ja) | 2009-09-30 | 2011-04-14 | Yokogawa Electric Corp | 赤外線検出装置 |
US20150228837A1 (en) * | 2014-02-10 | 2015-08-13 | National Taiwan University | Photodetector and method of facricating the same |
JP6918631B2 (ja) * | 2017-08-18 | 2021-08-11 | 浜松ホトニクス株式会社 | 光検出素子 |
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