JP6927851B2 - ヒータおよびその製造方法 - Google Patents
ヒータおよびその製造方法 Download PDFInfo
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- JP6927851B2 JP6927851B2 JP2017209520A JP2017209520A JP6927851B2 JP 6927851 B2 JP6927851 B2 JP 6927851B2 JP 2017209520 A JP2017209520 A JP 2017209520A JP 2017209520 A JP2017209520 A JP 2017209520A JP 6927851 B2 JP6927851 B2 JP 6927851B2
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- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000004020 conductor Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 5
- 238000005259 measurement Methods 0.000 description 42
- 230000002093 peripheral effect Effects 0.000 description 17
- 238000013461 design Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000007790 scraping Methods 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/28—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
- H05B3/283—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an inorganic material, e.g. ceramic
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
- H05B3/06—Heater elements structurally combined with coupling elements or holders
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
- B23Q3/15—Devices for holding work using magnetic or electric force acting directly on the work
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
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- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
- H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B1/00—Details of electric heating devices
- H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
- H05B1/0227—Applications
- H05B1/023—Industrial applications
- H05B1/0233—Industrial applications for semiconductors manufacturing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
- H05B3/03—Electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/68—Heating arrangements specially adapted for cooking plates or analogous hot-plates
- H05B3/74—Non-metallic plates, e.g. vitroceramic, ceramic or glassceramic hobs, also including power or control circuits
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
- H01R4/28—Clamped connections, spring connections
- H01R4/30—Clamped connections, spring connections utilising a screw or nut clamping member
- H01R4/34—Conductive members located under head of screw
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
- H01R4/58—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation characterised by the form or material of the contacting members
- H01R4/64—Connections between or with conductive parts having primarily a non-electric function, e.g. frame, casing, rail
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/017—Manufacturing methods or apparatus for heaters
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Resistance Heating (AREA)
Description
20 並列型ヒータ(従来技術)
30 並列型ヒータ(本発明実施例)
31,32 並列ヒータパターン
33 ヒータベース
34 ヒータエレメント
35 オーバーコート
36 ヒータ本体
37,38 分割端子部(2分割)
39 ボルト穴
40 給電ボルト
41 ナット
42 座金
43 座金
44 隙間
45,46 経路
50 並列型ヒータ(本発明実施例)
51〜54 並列ヒータパターン
55〜58 分割端子部(4分割)
59 隙間
Claims (7)
- 各々に給電ボルトが装着される一対の端子間に複数のヒータパターンが並列に形成された並列型ヒータであって、各端子は、ヒータパターン数に応じて複数個に互いに非接触に分割され、これら複数の分割端子同士が給電ボルトによって導通されており、給電ボルトが装着されない状態では一方の端子の一の分割端子部材と他方の端子の一の分割端子との間に複数の仮想直列ヒータパターンが形成され、給電ボルトが装着されることにより複数の仮想直列ヒータパターン同士が導通して並列回路が形成されることを特徴とする並列型ヒータ。
- 給電ボルトの頭部が直接または導電性材料からなる座金を介してヒータパターンを形成するヒータエレメントに接触していることを特徴とする請求項1記載の並列型ヒータ。
- 一対の端子間に第一および第二のヒータパターンが並列に形成され、各端子は、第一のヒータパターンのみに導通する第一の分割端子と、第二のヒータパターンのみに導通する第二の分割端子とに分割されていることを特徴とする請求項1または2記載の並列型ヒータ。
- 第一および第二の分割端子は各々略半円リング状に形成され、それらの間に径方向に延長するように設けられる隙間で第一及び第二のヒータパターンが絶縁されていることを特徴とする請求項3記載の並列型ヒータ。
- 一対の端子間に第一ないし第四のヒータパターンが並列に形成され、各端子は、第一のヒータパターンのみに導通する第一の分割端子と、第二のヒータパターンのみに導通する第二の分割端子と、第三のヒータパターンのみに導通する第三の分割端子と、第四のヒータパターンのみに導通する第四の分割端子に分割されていることを特徴とする請求項1または2記載の並列型ヒータ。
- 第一ないし第四の分割端子は各々略四半円リング状に形成され、それらの間に径方向および周方向に延長するように設けられる隙間で第一ないし第四のヒータパターンが絶縁されていることを特徴とする請求項5記載の並列型ヒータ。
- 一対の端子間に複数のヒータパターンが並列に形成されたヒータ本体を作製し、各端子に給電ボルトを装着する前の状態において、一方の端子の一の分割端子と他方の端子の一の分割端子との間に形成される複数の仮想直列ヒータパターンについて抵抗調整を行った後、各端子に給電ボルトを装着することにより複数の仮想直列ヒータパターン同士を導通させて並列回路を形成することを特徴とする請求項1ないし6記載の並列型ヒータの製造方法。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017209520A JP6927851B2 (ja) | 2017-10-30 | 2017-10-30 | ヒータおよびその製造方法 |
TW107126253A TWI787310B (zh) | 2017-10-30 | 2018-07-28 | 加熱器及其製造方法 |
CN201880070242.4A CN111279790B (zh) | 2017-10-30 | 2018-10-01 | 加热器及其制造方法 |
US16/754,026 US20200329534A1 (en) | 2017-10-30 | 2018-10-01 | Heater and method of manufacturing same |
KR1020207012171A KR102586537B1 (ko) | 2017-10-30 | 2018-10-01 | 히터 및 그 제조 방법 |
PCT/JP2018/036650 WO2019087645A1 (ja) | 2017-10-30 | 2018-10-01 | ヒータおよびその製造方法 |
EP18874708.3A EP3706507B1 (en) | 2017-10-30 | 2018-10-01 | Heater and method of manufacturing same |
US18/598,430 US20240215116A1 (en) | 2017-10-30 | 2024-03-07 | Heater and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2017209520A JP6927851B2 (ja) | 2017-10-30 | 2017-10-30 | ヒータおよびその製造方法 |
Publications (2)
Publication Number | Publication Date |
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JP2019083115A JP2019083115A (ja) | 2019-05-30 |
JP6927851B2 true JP6927851B2 (ja) | 2021-09-01 |
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JP2017209520A Active JP6927851B2 (ja) | 2017-10-30 | 2017-10-30 | ヒータおよびその製造方法 |
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US (2) | US20200329534A1 (ja) |
EP (1) | EP3706507B1 (ja) |
JP (1) | JP6927851B2 (ja) |
KR (1) | KR102586537B1 (ja) |
CN (1) | CN111279790B (ja) |
TW (1) | TWI787310B (ja) |
WO (1) | WO2019087645A1 (ja) |
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JP2023023346A (ja) * | 2021-08-05 | 2023-02-16 | 日本特殊陶業株式会社 | マイクロヒータ及びガスセンサ |
Family Cites Families (15)
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JPH09102665A (ja) * | 1995-10-04 | 1997-04-15 | Omron Corp | 回路基板 |
JPH10233436A (ja) * | 1997-02-18 | 1998-09-02 | Toto Ltd | 静電チャック |
JPH11317284A (ja) * | 1998-04-30 | 1999-11-16 | Komatsu Ltd | 温度制御装置 |
JPH11354260A (ja) * | 1998-06-11 | 1999-12-24 | Shin Etsu Chem Co Ltd | 複層セラミックスヒータ |
EP1191002A4 (en) * | 2000-02-24 | 2005-01-26 | Ibiden Co Ltd | SINTERED ALUMINUM NITRIDE PIECE, CERAMIC SUBSTRATE, CERAMIC HEATING BODY, AND ELECTROSTATIC CHUCK |
EP1345472A1 (en) * | 2000-11-24 | 2003-09-17 | Ibiden Co., Ltd. | Ceramic heater, and production method for ceramic heater |
JP2004087476A (ja) * | 2002-06-26 | 2004-03-18 | Okazaki Mfg Co Ltd | ウェハ加熱用熱盤の構造および熱盤の電極固定方法 |
JP2004296254A (ja) * | 2003-03-27 | 2004-10-21 | Sumitomo Electric Ind Ltd | セラミックスヒータおよびそれを搭載した半導体あるいは液晶製造装置 |
US7361865B2 (en) * | 2003-08-27 | 2008-04-22 | Kyocera Corporation | Heater for heating a wafer and method for fabricating the same |
JP4570345B2 (ja) * | 2003-09-18 | 2010-10-27 | 株式会社三幸 | 熱処理炉 |
US7280370B2 (en) * | 2005-08-26 | 2007-10-09 | Delphi Technologies, Inc. | Electronic package and circuit board having segmented contact pads |
US8168050B2 (en) * | 2006-07-05 | 2012-05-01 | Momentive Performance Materials Inc. | Electrode pattern for resistance heating element and wafer processing apparatus |
JP2013004247A (ja) * | 2011-06-15 | 2013-01-07 | Shin Etsu Chem Co Ltd | セラミックスヒーター |
JP5996519B2 (ja) * | 2013-03-13 | 2016-09-21 | 信越化学工業株式会社 | セラミックヒーター |
US10679873B2 (en) * | 2016-09-30 | 2020-06-09 | Ngk Spark Plug Co., Ltd. | Ceramic heater |
-
2017
- 2017-10-30 JP JP2017209520A patent/JP6927851B2/ja active Active
-
2018
- 2018-07-28 TW TW107126253A patent/TWI787310B/zh active
- 2018-10-01 CN CN201880070242.4A patent/CN111279790B/zh active Active
- 2018-10-01 KR KR1020207012171A patent/KR102586537B1/ko active IP Right Grant
- 2018-10-01 EP EP18874708.3A patent/EP3706507B1/en active Active
- 2018-10-01 US US16/754,026 patent/US20200329534A1/en not_active Abandoned
- 2018-10-01 WO PCT/JP2018/036650 patent/WO2019087645A1/ja unknown
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Also Published As
Publication number | Publication date |
---|---|
EP3706507B1 (en) | 2022-06-22 |
US20200329534A1 (en) | 2020-10-15 |
TW201935996A (zh) | 2019-09-01 |
CN111279790A (zh) | 2020-06-12 |
KR20200078511A (ko) | 2020-07-01 |
KR102586537B1 (ko) | 2023-10-10 |
EP3706507A4 (en) | 2021-09-08 |
JP2019083115A (ja) | 2019-05-30 |
EP3706507A1 (en) | 2020-09-09 |
WO2019087645A1 (ja) | 2019-05-09 |
CN111279790B (zh) | 2022-10-14 |
TWI787310B (zh) | 2022-12-21 |
US20240215116A1 (en) | 2024-06-27 |
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