JP6922068B2 - 光電変換素子とその製造方法 - Google Patents
光電変換素子とその製造方法 Download PDFInfo
- Publication number
- JP6922068B2 JP6922068B2 JP2020503347A JP2020503347A JP6922068B2 JP 6922068 B2 JP6922068 B2 JP 6922068B2 JP 2020503347 A JP2020503347 A JP 2020503347A JP 2020503347 A JP2020503347 A JP 2020503347A JP 6922068 B2 JP6922068 B2 JP 6922068B2
- Authority
- JP
- Japan
- Prior art keywords
- photoelectric conversion
- conversion layer
- ion
- transparent electrode
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000006243 chemical reaction Methods 0.000 title claims description 185
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 52
- 238000000926 separation method Methods 0.000 claims description 36
- 229910052751 metal Inorganic materials 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 26
- -1 formamidinium ion Chemical class 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 20
- 150000004820 halides Chemical class 0.000 claims description 14
- 239000002904 solvent Substances 0.000 claims description 11
- 150000001768 cations Chemical class 0.000 claims description 10
- 229910052736 halogen Inorganic materials 0.000 claims description 8
- 229910052732 germanium Inorganic materials 0.000 claims description 5
- BAVYZALUXZFZLV-UHFFFAOYSA-O Methylammonium ion Chemical compound [NH3+]C BAVYZALUXZFZLV-UHFFFAOYSA-O 0.000 claims description 4
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 claims description 4
- 239000000460 chlorine Substances 0.000 claims description 4
- RVPVRDXYQKGNMQ-UHFFFAOYSA-N lead(2+) Chemical group [Pb+2] RVPVRDXYQKGNMQ-UHFFFAOYSA-N 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 229910001419 rubidium ion Inorganic materials 0.000 claims description 4
- 229910001432 tin ion Inorganic materials 0.000 claims description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052794 bromium Inorganic materials 0.000 claims description 3
- NCMHKCKGHRPLCM-UHFFFAOYSA-N caesium(1+) Chemical compound [Cs+] NCMHKCKGHRPLCM-UHFFFAOYSA-N 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims description 3
- 229910001414 potassium ion Inorganic materials 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims 1
- 239000000463 material Substances 0.000 description 33
- 239000000470 constituent Substances 0.000 description 16
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 15
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 7
- 239000012212 insulator Substances 0.000 description 7
- 229910044991 metal oxide Inorganic materials 0.000 description 6
- 150000004706 metal oxides Chemical class 0.000 description 6
- 239000011787 zinc oxide Substances 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 229910010272 inorganic material Inorganic materials 0.000 description 5
- 239000011147 inorganic material Substances 0.000 description 5
- 239000011368 organic material Substances 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 230000004075 alteration Effects 0.000 description 4
- 239000003575 carbonaceous material Substances 0.000 description 4
- 229920001940 conductive polymer Polymers 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 239000002041 carbon nanotube Substances 0.000 description 3
- 229910021393 carbon nanotube Inorganic materials 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 229910052738 indium Inorganic materials 0.000 description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000002861 polymer material Substances 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052718 tin Inorganic materials 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 241000209094 Oryza Species 0.000 description 2
- 235000007164 Oryza sativa Nutrition 0.000 description 2
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000002042 Silver nanowire Substances 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052792 caesium Inorganic materials 0.000 description 2
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910021389 graphene Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910000480 nickel oxide Inorganic materials 0.000 description 2
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000128 polypyrrole Polymers 0.000 description 2
- 235000009566 rice Nutrition 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- MAGFQRLKWCCTQJ-UHFFFAOYSA-N 4-ethenylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(C=C)C=C1 MAGFQRLKWCCTQJ-UHFFFAOYSA-N 0.000 description 1
- YPSXFMHXRZAGTG-UHFFFAOYSA-N 4-methoxy-2-[2-(5-methoxy-2-nitrosophenyl)ethyl]-1-nitrosobenzene Chemical compound COC1=CC=C(N=O)C(CCC=2C(=CC=C(OC)C=2)N=O)=C1 YPSXFMHXRZAGTG-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical class C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- UUIQMZJEGPQKFD-UHFFFAOYSA-N Methyl butyrate Chemical compound CCCC(=O)OC UUIQMZJEGPQKFD-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003917 TEM image Methods 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 229910001195 gallium oxide Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- HJZPJSFRSAHQNT-UHFFFAOYSA-N indium(3+) oxygen(2-) zirconium(4+) Chemical compound [O-2].[Zr+4].[In+3] HJZPJSFRSAHQNT-UHFFFAOYSA-N 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 description 1
- 229940006461 iodide ion Drugs 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 239000002070 nanowire Substances 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- DMTNYYLGEBSTEJ-UHFFFAOYSA-N triphenylene-1,2-diamine Chemical compound C1=CC=C2C3=C(N)C(N)=CC=C3C3=CC=CC=C3C2=C1 DMTNYYLGEBSTEJ-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
- H10K30/81—Electrodes
- H10K30/82—Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/50—Photovoltaic [PV] devices
- H10K30/57—Photovoltaic [PV] devices comprising multiple junctions, e.g. tandem PV cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
- H01G9/2022—Light-sensitive devices characterized by he counter electrode
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
- H10K30/81—Electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K39/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic radiation-sensitive element covered by group H10K30/00
- H10K39/10—Organic photovoltaic [PV] modules; Arrays of single organic PV cells
- H10K39/12—Electrical configurations of PV cells, e.g. series connections or parallel connections
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/621—Providing a shape to conductive layers, e.g. patterning or selective deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/811—Controlling the atmosphere during processing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/50—Organic perovskites; Hybrid organic-inorganic perovskites [HOIP], e.g. CH3NH3PbI3
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/10—Transparent electrodes, e.g. using graphene
- H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
- H10K2102/103—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO] comprising indium oxides, e.g. ITO
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/50—Photovoltaic [PV] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/211—Fullerenes, e.g. C60
- H10K85/215—Fullerenes, e.g. C60 comprising substituents, e.g. PCBM
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Photovoltaic Devices (AREA)
Description
一般式:ABX 3
ここで、Aサイトはメチルアンモニウムイオン、ホルムアミジニウムイオン、カリウムイオン、ルビジウムイオン、及びセシウムイオンから選ばれる少なくとも1つの一価のカチオン、Bサイトは鉛イオン、ゲルマニウムイオン、及び錫イオンから選ばれる少なくとも1つの二価のカチオン、Xサイトはヨウ素イオン、臭素イオン、及び塩素イオンから選ばれる少なくとも1つの一価のハロゲンアニオンである、
で表される組成を有し、前記不活性領域は、前記Aサイトを構成する金属及び前記Bサイトを構成する金属から選ばれる少なくとも1つの金属のハロゲン化物を含む。
まず、厚さが700μmのガラス基板上に、透明電極として厚さが150nmのITO膜を複数形成した。ITO膜は、複数のセグメントに応じてパターニングされている。次いで、複数のITO膜を有するガラス基板上に、第1の中間層として膜厚が約20nmの酸化ニッケル層を形成した。続いて、活性層としてペロブスカイト層を製膜した。ペロブスカイト材料としてはCH3NH3PbI3を用いた。ペロブスカイト材料インクの溶媒として、ジメチルホルムアミド(DMF)とジメチルスルホキシド(DMSO)の1:1の混合溶媒を用いた。ペロブスカイト材料インクを第1の中間層上に塗布した後、基板をクロロベンゼンが入った容器に浸した。その後、基板を取り出して80℃で60分間加熱することによって、ペロブスカイト層を製膜した。膜厚は約250nmとした。
実施例1と同様にして、分離溝を有する素子構造体を作製した。この素子構造体を飽和水蒸気の雰囲気下にて80℃で1時間加熱処理した。この加熱処理によって、分離溝内に残留したCH3NH3PbI3を主としてPbI2に変質させることによって、隣接する光電変換層間を分離する不活性領域を形成した。このようにして形成した光電変換素子の状態を実施例1と同様にして測定したところ、いずれの隣接する光電変換部間(光電変換層間)も十分に電気的に分離されていることが確認された。
分離溝の形成後にDMF溶媒雰囲気中での処理工程(溶媒雰囲気への晒し工程)を実施することなく、光電変換素子を作製した。このようにして形成した光電変換素子の状態を実施例1と同様にして測定したところ、いずれの隣接する光電変換部間(光電変換層間)も十分に電気的に分離されていないことが確認された。
Claims (11)
- 透明基板と、
前記透明基板上に設けられた第1の透明電極と、前記第1の透明電極上に配置され、ペロブスカイト化合物を含む第1の光電変換層と、前記第1の光電変換層上に配置された第1の対向電極とを備える第1の光電変換部と、
前記透明基板上に前記第1の透明電極と隣接して設けられ、かつ前記第1の透明電極と分離された第2の透明電極と、前記第2の透明電極上に前記第1の光電変換層と隣接するように配置され、ペロブスカイト化合物を含む第2の光電変換層と、前記第2の光電変換層上に配置された第2の対向電極とを備える第2の光電変換部と、
前記第1の対向電極と前記第2の透明電極とを電気的に接続する接続部と、
前記第1の光電変換層と前記第2の光電変換層との間に、前記隣接する第1の光電変換層及び第2の光電変換層の隣接部間を電気的に分離するように設けられ、前記第1及び第2の光電変換層より電気抵抗が高い不活性領域とを具備し、
前記ペロブスカイト化合物は、
一般式:ABX 3
ここで、Aサイトはメチルアンモニウムイオン、ホルムアミジニウムイオン、カリウムイオン、ルビジウムイオン、及びセシウムイオンから選ばれる少なくとも1つの一価のカチオン、Bサイトは鉛イオン、ゲルマニウムイオン、及び錫イオンから選ばれる少なくとも1つの二価のカチオン、Xサイトはヨウ素イオン、臭素イオン、及び塩素イオンから選ばれる少なくとも1つの一価のハロゲンアニオンである、
で表される組成を有し、
前記不活性領域は、前記Aサイトを構成する金属及び前記Bサイトを構成する金属から選ばれる少なくとも1つの金属のハロゲン化物を含む、光電変換素子。 - 前記金属のハロゲン化物はハロゲン化鉛を含む、請求項1に記載の光電変換素子。
- 前記不活性領域は、前記金属のハロゲン化物を50体積%以上含む、請求項1又は請求項2に記載の光電変換素子。
- 前記不活性領域は、前記第2の対向電極の端部から内側に1μm以内の領域に形成されている、請求項1ないし請求項3のいずれか1項に記載の光電変換素子。
- 前記不活性領域は、前記隣接する第1の光電変換層と第2の光電変換層とを分離するように設けられた溝の少なくとも壁面に形成された前記金属のハロゲン化物を含む、請求項1ないし請求項3のいずれか1項に記載の光電変換素子。
- 透明基板上に、第1の透明電極と、前記第1の透明電極と隣接し、かつ前記第1の透明電極と分離された第2の透明電極とを形成する工程と、
前記第1の透明電極及び前記第2の透明電極を覆うように、前記透明基板上にペロブスカイト化合物を含む光電変換層を形成する工程と、
前記光電変換層上に対向電極を形成する工程と、
前記光電変換層の前記ペロブスカイト化合物の一部を、前記光電変換層より電気抵抗が高い物質に変質させて不活性領域を形成し、少なくとも前記光電変換層を前記第1及び第2の透明電極に対応させて第1の光電変換層及び第2の光電変換層に分離する工程と
を具備する光電変換素子の製造方法。 - 前記ペロブスカイト化合物は、
一般式:ABX3
ここで、Aサイトはメチルアンモニウムイオン、ホルムアミジニウムイオン、カリウムイオン、ルビジウムイオン、及びセシウムイオンから選ばれる少なくとも1つの一価のカチオン、Bサイトは鉛イオン、ゲルマニウムイオン、及び錫イオンから選ばれる少なくとも1つの二価のカチオン、Xサイトはヨウ素イオン、臭素イオン、及び塩素イオンから選ばれる少なくとも1つの一価のハロゲンアニオンである、
で表される組成を有する、請求項6に記載の光電変換素子の製造方法。 - 前記不活性領域は、前記Aサイトを構成する金属及び前記Bサイトを構成する金属から選ばれる少なくとも1つの金属のハロゲン化物を含む、請求項7に記載の光電変換素子の製造方法。
- 前記光電変換層の一部を、大気雰囲気、加湿雰囲気、又は溶媒雰囲気に晒すことによって、前記ペロブスカイト化合物の一部を変質させて前記不活性領域を形成する、請求項6ないし請求項8のいずれか1項に記載の光電変換素子の製造方法。
- 前記分離工程は、前記光電変換層及び前記対向電極を前記第1及び第2の透明電極に対応させてスクライブして分離溝を形成し、前記分離溝の少なくとも壁面に前記金属のハロゲン化物を形成する工程を備える、請求項8に記載の光電変換素子の製造方法。
- 前記分離溝を形成した前記光電変換層及び前記対向電極を、大気雰囲気、加湿雰囲気、又は溶媒雰囲気に晒すことによって、前記ペロブスカイト化合物の一部を前記金属のハロゲン化物に変質させて前記不活性領域を形成する、請求項10に記載の光電変換素子の製造方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2018/034481 WO2020059023A1 (ja) | 2018-09-18 | 2018-09-18 | 光電変換素子とその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2020059023A1 JPWO2020059023A1 (ja) | 2020-12-17 |
JP6922068B2 true JP6922068B2 (ja) | 2021-08-18 |
Family
ID=69886963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020503347A Active JP6922068B2 (ja) | 2018-09-18 | 2018-09-18 | 光電変換素子とその製造方法 |
Country Status (5)
Country | Link |
---|---|
US (2) | US11335871B2 (ja) |
EP (2) | EP3855521A4 (ja) |
JP (1) | JP6922068B2 (ja) |
CN (1) | CN111201626B (ja) |
WO (1) | WO2020059023A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3783659B1 (en) * | 2019-08-23 | 2023-06-07 | Saule Spolka Akcyjna | A photovoltaic device and a method for preparation thereof |
CN114600255A (zh) * | 2020-09-09 | 2022-06-07 | 株式会社东芝 | 透明电极、透明电极的制造方法和电子器件 |
JP2022085206A (ja) * | 2020-11-27 | 2022-06-08 | 株式会社リコー | 光電変換モジュール、電子機器、及び電源モジュール |
JP2022085070A (ja) * | 2020-11-27 | 2022-06-08 | 株式会社リコー | 光電変換モジュール、電子機器、及び電源モジュール |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5397003A (en) | 1977-02-04 | 1978-08-24 | Chiyoda Chem Eng & Constr Co Ltd | Thermal cracking treatment of petroleum heavy oil |
JPS6030176B2 (ja) | 1977-09-20 | 1985-07-15 | 日立電線株式会社 | 架空送配電線路 |
JPH07105511B2 (ja) * | 1986-04-14 | 1995-11-13 | 三洋電機株式会社 | 光起電力装置の製造方法 |
JP2006222384A (ja) * | 2005-02-14 | 2006-08-24 | Matsushita Electric Ind Co Ltd | 集積型薄膜太陽電池及びその製造方法 |
WO2008036837A2 (en) | 2006-09-20 | 2008-03-27 | The Board Of Trustees Of The University Of Illinois | Release strategies for making transferable semiconductor structures, devices and device components |
JP4926150B2 (ja) * | 2008-10-21 | 2012-05-09 | 三菱電機株式会社 | 薄膜太陽電池の製造方法および薄膜太陽電池の製造装置 |
WO2011052584A1 (ja) | 2009-10-29 | 2011-05-05 | 住友化学株式会社 | 有機薄膜太陽電池モジュールの製造方法 |
GB201322572D0 (en) * | 2013-12-19 | 2014-02-05 | Oxford Photovoltaics Ltd | Connection of photoactive regions in an optoelectronic device |
GB201408947D0 (en) | 2014-05-20 | 2014-07-02 | Oxford Photovoltaics Ltd | Increased - transparency optoelectronic device |
GB2528476A (en) | 2014-07-23 | 2016-01-27 | Eight19 Ltd | Roll-to-roll processing of a coated web |
US9997707B2 (en) | 2015-02-26 | 2018-06-12 | Nanyang Technological University | Perovskite thin films having large crystalline grains |
JP6030176B2 (ja) | 2015-03-19 | 2016-11-24 | 株式会社東芝 | 光電変換素子とその製造方法 |
US20180114874A1 (en) * | 2015-03-25 | 2018-04-26 | Kyocera Corporation | Photoelectric conversion device |
JP6689100B2 (ja) | 2015-09-30 | 2020-04-28 | 株式会社Kyulux | 混合物、機能層、光電変換素子およびペロブスカイト安定化剤 |
TWI553892B (zh) * | 2015-12-31 | 2016-10-11 | 台灣中油股份有限公司 | 具鈣鈦礦施體層之太陽能電池模組 |
JP6530360B2 (ja) | 2016-09-23 | 2019-06-12 | 株式会社東芝 | 光電変換素子 |
JP6408042B2 (ja) | 2017-01-24 | 2018-10-17 | 株式会社東芝 | 光電変換素子およびその製造方法 |
JP2018120992A (ja) | 2017-01-26 | 2018-08-02 | 株式会社東芝 | 集積回路および電子機器 |
CN107516682B (zh) * | 2017-07-26 | 2019-07-02 | 中节能万润股份有限公司 | 一种钙钛矿太阳能电池组件及其制备方法 |
JP6600670B2 (ja) | 2017-09-15 | 2019-10-30 | 株式会社東芝 | 光電変換素子、その製造方法、およびその製造装置 |
-
2018
- 2018-09-18 CN CN201880056121.4A patent/CN111201626B/zh active Active
- 2018-09-18 WO PCT/JP2018/034481 patent/WO2020059023A1/ja unknown
- 2018-09-18 EP EP18931279.6A patent/EP3855521A4/en active Pending
- 2018-09-18 EP EP24158824.3A patent/EP4346350A3/en active Pending
- 2018-09-18 JP JP2020503347A patent/JP6922068B2/ja active Active
-
2020
- 2020-03-06 US US16/811,761 patent/US11335871B2/en active Active
-
2022
- 2022-04-13 US US17/659,092 patent/US11641751B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20200212330A1 (en) | 2020-07-02 |
US11641751B2 (en) | 2023-05-02 |
CN111201626B (zh) | 2023-09-12 |
CN111201626A (zh) | 2020-05-26 |
US11335871B2 (en) | 2022-05-17 |
US20220246874A1 (en) | 2022-08-04 |
EP4346350A2 (en) | 2024-04-03 |
JPWO2020059023A1 (ja) | 2020-12-17 |
EP4346350A3 (en) | 2024-06-26 |
EP3855521A4 (en) | 2022-05-04 |
EP3855521A1 (en) | 2021-07-28 |
WO2020059023A1 (ja) | 2020-03-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6922068B2 (ja) | 光電変換素子とその製造方法 | |
Seo et al. | Fully transparent quantum dot light-emitting diode integrated with graphene anode and cathode | |
JP6030176B2 (ja) | 光電変換素子とその製造方法 | |
JP6200004B2 (ja) | 透明導電積層体、透明導電積層体を含む透明電極、および透明導電積層体の製造方法{transparentconductivelaminate、transparentelectrodecomprinsingtransparentconductivelaminate、andmanufacturingfortransparentconductivelaminate} | |
CN102971882A (zh) | 光电设备及制造其的方法 | |
US20170179363A1 (en) | Thermoelectric conversion element and thermoelectric conversion module | |
US10749059B2 (en) | Photoelectric conversion device and method of manufacturing the same | |
US11749766B2 (en) | Photovoltaic device and method of manufacturing the same | |
JPWO2020175501A1 (ja) | 太陽電池素子、および太陽電池素子の製造方法 | |
JP7372965B2 (ja) | 光起電デバイス及びその製造方法 | |
WO2021181542A1 (ja) | 光電変換デバイス | |
US11489081B2 (en) | Photoelectric conversion device and method of manufacturing photoelectric conversion device | |
JP7102532B2 (ja) | 光電変換素子とその製造方法 | |
CN112352327B (zh) | 光电转换元件以及光电转换元件的制造方法 | |
JP2012160677A (ja) | 有機太陽電池の製造方法及び有機太陽電池 | |
JP2011060738A (ja) | 有機elパネルの製造方法 | |
JP2022151107A (ja) | 素子 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20200213 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20210202 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20210402 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20210629 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20210728 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6922068 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |