JP6895760B2 - Method for producing silica-based particle dispersion liquid, silica-based particle dispersion liquid, coating liquid for forming a transparent film, and base material with a transparent film - Google Patents
Method for producing silica-based particle dispersion liquid, silica-based particle dispersion liquid, coating liquid for forming a transparent film, and base material with a transparent film Download PDFInfo
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- JP6895760B2 JP6895760B2 JP2017018820A JP2017018820A JP6895760B2 JP 6895760 B2 JP6895760 B2 JP 6895760B2 JP 2017018820 A JP2017018820 A JP 2017018820A JP 2017018820 A JP2017018820 A JP 2017018820A JP 6895760 B2 JP6895760 B2 JP 6895760B2
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- Prior art keywords
- particles
- silica
- mass
- composite oxide
- dispersion liquid
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- 239000002245 particle Substances 0.000 title claims description 552
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 376
- 239000000377 silicon dioxide Substances 0.000 title claims description 185
- 239000006185 dispersion Substances 0.000 title claims description 128
- 239000007788 liquid Substances 0.000 title claims description 80
- 238000000576 coating method Methods 0.000 title claims description 67
- 239000011248 coating agent Substances 0.000 title claims description 62
- 239000000463 material Substances 0.000 title claims description 49
- 238000004519 manufacturing process Methods 0.000 title claims description 25
- 239000002131 composite material Substances 0.000 claims description 76
- 239000000243 solution Substances 0.000 claims description 49
- 239000007787 solid Substances 0.000 claims description 48
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 47
- 239000007864 aqueous solution Substances 0.000 claims description 40
- 150000002484 inorganic compounds Chemical class 0.000 claims description 25
- 229910010272 inorganic material Inorganic materials 0.000 claims description 25
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 17
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 17
- 229910052710 silicon Inorganic materials 0.000 claims description 17
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 16
- 239000011247 coating layer Substances 0.000 claims description 14
- 239000011159 matrix material Substances 0.000 claims description 13
- 235000012239 silicon dioxide Nutrition 0.000 claims description 13
- 230000002378 acidificating effect Effects 0.000 claims description 12
- 239000010703 silicon Substances 0.000 claims description 12
- 125000000962 organic group Chemical group 0.000 claims description 9
- 239000002253 acid Substances 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 239000010410 layer Substances 0.000 claims description 6
- 239000002798 polar solvent Substances 0.000 claims description 5
- 239000011800 void material Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 description 137
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 33
- 238000000034 method Methods 0.000 description 31
- 239000002585 base Substances 0.000 description 30
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 28
- 229920005989 resin Polymers 0.000 description 26
- 239000011347 resin Substances 0.000 description 26
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 23
- -1 ammonium silicates Chemical class 0.000 description 22
- 238000006243 chemical reaction Methods 0.000 description 19
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 18
- 239000004115 Sodium Silicate Substances 0.000 description 17
- 229910052911 sodium silicate Inorganic materials 0.000 description 17
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 15
- 239000003054 catalyst Substances 0.000 description 15
- 239000000203 mixture Substances 0.000 description 15
- 238000002360 preparation method Methods 0.000 description 15
- ANBBXQWFNXMHLD-UHFFFAOYSA-N aluminum;sodium;oxygen(2-) Chemical compound [O-2].[O-2].[Na+].[Al+3] ANBBXQWFNXMHLD-UHFFFAOYSA-N 0.000 description 14
- 229910001388 sodium aluminate Inorganic materials 0.000 description 14
- 238000000108 ultra-filtration Methods 0.000 description 13
- 238000011156 evaluation Methods 0.000 description 11
- 239000010419 fine particle Substances 0.000 description 11
- 238000005259 measurement Methods 0.000 description 11
- 239000012528 membrane Substances 0.000 description 11
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 10
- 125000001183 hydrocarbyl group Chemical group 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- 239000011164 primary particle Substances 0.000 description 9
- 150000003377 silicon compounds Chemical class 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 239000002775 capsule Substances 0.000 description 8
- 125000004432 carbon atom Chemical group C* 0.000 description 8
- 239000003513 alkali Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 230000002087 whitening effect Effects 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 239000004925 Acrylic resin Substances 0.000 description 6
- 229920000178 Acrylic resin Polymers 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical group CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 5
- 238000003917 TEM image Methods 0.000 description 5
- 238000010335 hydrothermal treatment Methods 0.000 description 5
- 239000003973 paint Substances 0.000 description 5
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 4
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000005342 ion exchange Methods 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229920002284 Cellulose triacetate Polymers 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 238000004061 bleaching Methods 0.000 description 3
- 239000003729 cation exchange resin Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000002612 dispersion medium Substances 0.000 description 3
- XPFVYQJUAUNWIW-UHFFFAOYSA-N furfuryl alcohol Chemical compound OCC1=CC=CO1 XPFVYQJUAUNWIW-UHFFFAOYSA-N 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 239000012798 spherical particle Substances 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- 229920000298 Cellophane Polymers 0.000 description 2
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Natural products CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000007771 core particle Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- BAAAEEDPKUHLID-UHFFFAOYSA-N decyl(triethoxy)silane Chemical compound CCCCCCCCCC[Si](OCC)(OCC)OCC BAAAEEDPKUHLID-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000007646 gravure printing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000012452 mother liquor Substances 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 235000019353 potassium silicate Nutrition 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 229930195734 saturated hydrocarbon Natural products 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 2
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 2
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 1
- PSLRXNFNXYNXEK-UHFFFAOYSA-N 2-triethoxysilylethyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCOC(=O)C=C PSLRXNFNXYNXEK-UHFFFAOYSA-N 0.000 description 1
- HJIMAFKWSKZMBK-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F HJIMAFKWSKZMBK-UHFFFAOYSA-N 0.000 description 1
- LZKBJDFRBKBJLP-UHFFFAOYSA-N 3-[diethoxy(3-methylbutan-2-yloxy)silyl]propylurea Chemical compound CC(C)C(C)O[Si](OCC)(OCC)CCCNC(N)=O LZKBJDFRBKBJLP-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 1
- WDJHALXBUFZDSR-UHFFFAOYSA-N Acetoacetic acid Natural products CC(=O)CC(O)=O WDJHALXBUFZDSR-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- WRAGBEWQGHCDDU-UHFFFAOYSA-M C([O-])([O-])=O.[NH4+].[Zr+] Chemical compound C([O-])([O-])=O.[NH4+].[Zr+] WRAGBEWQGHCDDU-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 229910000503 Na-aluminosilicate Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- LFOXEOLGJPJZAA-UHFFFAOYSA-N [(2,6-dimethoxybenzoyl)-(2,4,4-trimethylpentyl)phosphoryl]-(2,6-dimethoxyphenyl)methanone Chemical compound COC1=CC=CC(OC)=C1C(=O)P(=O)(CC(C)CC(C)(C)C)C(=O)C1=C(OC)C=CC=C1OC LFOXEOLGJPJZAA-UHFFFAOYSA-N 0.000 description 1
- 239000001089 [(2R)-oxolan-2-yl]methanol Substances 0.000 description 1
- RMKZLFMHXZAGTM-UHFFFAOYSA-N [dimethoxy(propyl)silyl]oxymethyl prop-2-enoate Chemical compound CCC[Si](OC)(OC)OCOC(=O)C=C RMKZLFMHXZAGTM-UHFFFAOYSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 239000003957 anion exchange resin Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- HKVFISRIUUGTIB-UHFFFAOYSA-O azanium;cerium;nitrate Chemical compound [NH4+].[Ce].[O-][N+]([O-])=O HKVFISRIUUGTIB-UHFFFAOYSA-O 0.000 description 1
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- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
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- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
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- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- ALVYUZIFSCKIFP-UHFFFAOYSA-N triethoxy(2-methylpropyl)silane Chemical compound CCO[Si](CC(C)C)(OCC)OCC ALVYUZIFSCKIFP-UHFFFAOYSA-N 0.000 description 1
- MLXDKRSDUJLNAB-UHFFFAOYSA-N triethoxy(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F MLXDKRSDUJLNAB-UHFFFAOYSA-N 0.000 description 1
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- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
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- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- AAPLIUHOKVUFCC-UHFFFAOYSA-N trimethylsilanol Chemical compound C[Si](C)(C)O AAPLIUHOKVUFCC-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
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- Pigments, Carbon Blacks, Or Wood Stains (AREA)
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Description
本発明は、平均粒子径が5〜40nmのシリカ系中空粒子を含む分散液の製造方法に関する。 The present invention relates to a method for producing a dispersion liquid containing silica-based hollow particles having an average particle diameter of 5 to 40 nm.
従来より、ガラス、プラスチックシート、プラスチックレンズ等の基材表面の反射を防止するために、その表面に反射防止膜が形成されている。例えば、コート法、蒸着法、CVD法等によって、フッ素樹脂、フッ化マグネシウムのような低屈折率の物質の被膜をガラスやプラスチックの基材表面に形成したり、シリカ微粒子等の低屈折率微粒子を含む塗布液を基材表面に塗布して、反射防止被膜を形成する方法が知られている(例えば、特許文献1など参照)。このとき、反射防止性能を高めるために反射防止被膜の下層に高屈折率の微粒子等を含む高屈折率膜を形成することも知られている。 Conventionally, an antireflection film has been formed on the surface of a base material such as glass, a plastic sheet, or a plastic lens in order to prevent reflection. For example, a coating method of a substance having a low refractive index such as a fluororesin or magnesium fluoride is formed on the surface of a base material of glass or plastic by a coating method, a vapor deposition method, a CVD method or the like, or low refractive index fine particles such as silica fine particles A method of forming an antireflection film by applying a coating liquid containing the above-mentioned material to the surface of a base material is known (see, for example, Patent Document 1). At this time, it is also known to form a high refractive index film containing fine particles having a high refractive index under the antireflection film in order to enhance the antireflection performance.
一方、本願出願人は、内部に空洞を有するシリカ系微粒子の製造方法を提案している(特許文献2参照)。この方法により得られるシリカ系微粒子は屈折率が低く、このシリカ系微粒子を用いて形成された透明被膜は屈折率が低く反射防止性能に優れている。 On the other hand, the applicant of the present application has proposed a method for producing silica-based fine particles having cavities inside (see Patent Document 2). The silica-based fine particles obtained by this method have a low refractive index, and the transparent film formed by using the silica-based fine particles has a low refractive index and excellent antireflection performance.
また、本願出願人は、このような透明被膜を表示装置の前面に形成して用いると反射防止性能に優れ表示性能が向上することを開示している(特許文献3参照)。 Further, the applicant of the present application discloses that when such a transparent film is formed on the front surface of the display device and used, the antireflection performance is excellent and the display performance is improved (see Patent Document 3).
さらに、本願出願人は、平均粒子径(Dn)の2倍以上の粒子径を有する異形シリカ系中空微粒子のシリカ中空微粒子中の個数割合が1%以下で、平均粒子径が50〜120nmの範囲にあり、粒子径変動係数(CV値)が1〜50%以下の低屈折率シリカ系中空微粒子を用いると、白化が抑制され、透明性、ヘーズ、反射防止性、強度、耐擦傷性に優れた透明被膜付基材が得られることを開示している(特許文献4参照)。 Furthermore, the applicant of the present application has an average particle size in the range of 50 to 120 nm, in which the number ratio of the deformed silica-based hollow fine particles having a particle size more than twice the average particle size (Dn) in the silica hollow fine particles is 1% or less. When low-refractive-index silica-based hollow fine particles having a particle size fluctuation coefficient (CV value) of 1 to 50% or less are used, whitening is suppressed, and transparency, haze, antireflection, strength, and scratch resistance are excellent. It is disclosed that a base material with a transparent film can be obtained (see Patent Document 4).
上記特許文献2〜4に示されるように、従来、平均粒子径が50nmよりも大きいシリカ系中空粒子は得ることは可能であった。ただし、平均粒子径が50nmよりも小さいものを得る場合、再現性が低く、中空粒子及び中実粒子の合計粒子数に占める中空粒子数の割合(中空率)が低くなることが問題となっていた。そして、このような粒子を含む塗布液を使用して作製した被膜は、屈折率が十分に下がらない問題があり、実質的に反射防止被膜等に使用できないものであった。
本発明の課題は、平均粒径が50nmよりも小さなサイズのシリカ系中空粒子を、高い割合で製造することを可能にするシリカ系粒子分散液の製造方法を提供することにある。
As shown in Patent Documents 2 to 4, it has been possible to obtain silica-based hollow particles having an average particle diameter of more than 50 nm. However, when obtaining particles having an average particle diameter smaller than 50 nm, there is a problem that the reproducibility is low and the ratio of the number of hollow particles (hollow ratio) to the total number of hollow particles and solid particles is low. It was. The film prepared by using the coating liquid containing such particles has a problem that the refractive index does not decrease sufficiently, and cannot be substantially used as an antireflection film or the like.
An object of the present invention is to provide a method for producing a silica-based particle dispersion liquid, which enables the production of silica-based hollow particles having an average particle size smaller than 50 nm at a high ratio.
本発明者らは、より粒径の小さなシリカ系中空粒子の製造を目的として研究する中で、シリカの種粒子から調製される核粒子の真球度に着目した。従来の核粒子は、粒子の最長径と最短径の割合として求められる真球度の測定値が高い(球形でない)粒子が用いられていた。 The present inventors focused on the sphericity of nuclear particles prepared from silica seed particles in a study aimed at producing silica-based hollow particles having a smaller particle size. As the conventional nuclear particles, particles having a high measured value of sphericity (non-spherical), which is obtained as a ratio between the longest diameter and the shortest diameter of the particles, have been used.
しかしながら、このような真球度の測定値が高い核粒子を使用した場合、50nmより小さい中空粒子の製造においては、中空率を低下させる原因になっていることを知見した。 However, it has been found that when such nuclear particles having a high measured value of sphericity are used, it is a cause of lowering the hollow ratio in the production of hollow particles smaller than 50 nm.
したがって、本発明者らは、真球度の測定値が低い核粒子(より球形で真球に近い粒子)を使用することで、中空粒子が70%以上の割合を占める平均粒子径が5〜40nmのシリカ系中空粒子を製造できることを見出し、本発明を完成するに至った。 Therefore, the present inventors use nuclear particles having a low sphericity measurement value (particles that are more spherical and closer to a sphere), so that the average particle size in which hollow particles occupy 70% or more is 5 to 5. They have found that 40 nm silica-based hollow particles can be produced, and have completed the present invention.
すなわち、本発明は、平均粒子径が5〜40nmであり、かつ中空粒子及び中実粒子の合計粒子数に占める中空粒子数の割合(中空率)が70%以上であるシリカ系粒子の分散液を製造する方法に関する。この方法は、以下の第1〜4工程を有することを特徴とする。
(1)平均粒子径が3〜25nm、真球度が1.0〜1.5のシリカの核粒子を含む分散液に、珪酸塩水溶液及び酸性珪酸液の少なくとも一方と、珪素を含まない無機化合物水溶液とを、同時に添加して複合酸化物粒子を含む分散液を調製する第1工程。
(2)第1工程で得た複合酸化物粒子を含む分散液に、シリカ源を添加して、シリカを含む層で被覆された被覆複合酸化物粒子を含む分散液を調製する第2工程。
(3)第2工程で得た被覆複合酸化物粒子を含む分散液に酸を加えて、被覆複合酸化物粒子に含まれる前記無機化合物に由来する元素を除去する第3工程。
(4)第3工程で得た粒子を含む分散液に、アルカリ条件下で水熱処理を行う第4工程。
That is, the present invention is a dispersion liquid of silica-based particles having an average particle diameter of 5 to 40 nm and a ratio (hollow ratio) of the number of hollow particles to the total number of hollow particles and solid particles of 70% or more. Regarding the method of manufacturing. This method is characterized by having the following first to fourth steps.
(1) A dispersion liquid containing silica core particles having an average particle diameter of 3 to 25 nm and a sphericity of 1.0 to 1.5, at least one of a silicate aqueous solution and an acidic silicic acid solution, and an inorganic substance containing no silicon. The first step of preparing a dispersion liquid containing composite oxide particles by adding an aqueous compound solution at the same time.
(2) A second step of adding a silica source to the dispersion liquid containing the composite oxide particles obtained in the first step to prepare a dispersion liquid containing the coated composite oxide particles coated with a layer containing silica.
(3) A third step of adding an acid to the dispersion liquid containing the coated composite oxide particles obtained in the second step to remove the element derived from the inorganic compound contained in the coated composite oxide particles.
(4) The fourth step of subjecting the dispersion liquid containing the particles obtained in the third step to hydrothermal treatment under alkaline conditions.
また、本発明は、平均粒子径が5〜40nmであり、かつ中空粒子及び中実粒子の合計粒子数に占める中空粒子数の割合(中空率)が70%以上であるシリカ系粒子を含むシリカ系粒子の分散液に関する。 Further, the present invention includes silica containing silica-based particles having an average particle diameter of 5 to 40 nm and a ratio (hollow ratio) of the number of hollow particles to the total number of hollow particles and solid particles of 70% or more. Regarding the dispersion liquid of system particles.
また、本発明は、上記シリカ系粒子とマトリックス形成成分と極性溶媒とを含む透明被膜形成用塗布液に関する。
さらに、本発明は、基材と、該基材上に形成された、上記シリカ系粒子及びマトリックス成分を含む透明被膜とを備え、透明被膜中のシリカ系粒子の含有量が20〜80質量%である透明被膜付基材に関する。
The present invention also relates to a coating liquid for forming a transparent film containing the silica-based particles, a matrix-forming component, and a polar solvent.
Further, the present invention comprises a base material and a transparent film formed on the base material containing the silica-based particles and the matrix component, and the content of the silica-based particles in the transparent film is 20 to 80% by mass. The present invention relates to a base material with a transparent coating.
本発明は、平均粒子径が5〜40nmであり、かつ中空粒子及び中実粒子の合計粒子数に占める中空粒子数の割合(中空率)が70%以上であるシリカ系粒子の分散液およびその製造方法を提供する。このシリカ系粒子を含む塗布液で作製された透明被膜付基材は、十分な低屈折率を発現するため反射防止能が高く、比較的小粒子から構成されているため透明性が高く、白化現象が抑制され、充分な密着性、耐擦傷性、耐マジック性、耐水性、耐アルカリ性を有している。 The present invention is a dispersion of silica-based particles having an average particle diameter of 5 to 40 nm and a ratio (hollow ratio) of the number of hollow particles to the total number of hollow particles and solid particles of 70% or more. Provide a manufacturing method. The transparent film-coated base material prepared of the coating liquid containing the silica-based particles has a high antireflection ability because it exhibits a sufficiently low refractive index, and has a high transparency and whitening because it is composed of relatively small particles. The phenomenon is suppressed, and it has sufficient adhesion, scratch resistance, magic resistance, water resistance, and alkali resistance.
[シリカ系粒子の分散液の製造方法]
本発明は、平均粒子径が5〜40nmであり、かつ中空粒子及び中実粒子の合計粒子数に占める中空粒子数の割合(中空率)が70%以上であるシリカ系粒子の分散液を製造する方法であり、次の工程を少なくとも有することを特徴とする。特に第1工程の核粒子の形状を整えていることに特徴を有する。
(1)平均粒子径が3〜25nm、真球度が1.0〜1.5の核粒子を含む分散液に、珪酸塩水溶液及び酸性珪酸液の少なくとも一方と、珪素を含まない無機化合物水溶液とを、同時に添加して複合酸化物粒子を含む分散液を調製する第1工程。
(2)第1工程で得た複合酸化物粒子を含む分散液に、シリカ源を添加して、シリカを含む層で被覆された被覆複合酸化物粒子を含む分散液を調製する第2工程。
(3)第2工程で得た被覆複合酸化物粒子を含む分散液に酸を加えて、被覆複合酸化物粒子に含まれる前記無機化合物に由来する元素を除去する第3工程。
(4)第3工程で得た粒子を含む分散液に、アルカリ条件下で水熱処理を行う第4工程。
[Manufacturing method of dispersion of silica-based particles]
The present invention produces a dispersion of silica-based particles having an average particle diameter of 5 to 40 nm and a ratio (hollow ratio) of the number of hollow particles to the total number of hollow particles and solid particles of 70% or more. The method is characterized by having at least the following steps. In particular, it is characterized in that the shape of the nuclear particles in the first step is adjusted.
(1) A dispersion liquid containing nuclear particles having an average particle diameter of 3 to 25 nm and a sphericity of 1.0 to 1.5, at least one of a silicate aqueous solution and an acidic silicic acid solution, and an inorganic compound aqueous solution containing no silicon. And are added at the same time to prepare a dispersion liquid containing composite oxide particles.
(2) A second step of adding a silica source to the dispersion liquid containing the composite oxide particles obtained in the first step to prepare a dispersion liquid containing the coated composite oxide particles coated with a layer containing silica.
(3) A third step of adding an acid to the dispersion liquid containing the coated composite oxide particles obtained in the second step to remove the element derived from the inorganic compound contained in the coated composite oxide particles.
(4) A fourth step in which the dispersion liquid containing the particles obtained in the third step is hydrothermally treated under alkaline conditions.
従来は、平均粒子径が50nmより小さい中空粒子の製造は、再現性が低く、中空率が低くなることが問題となっていた。本発明では、平均粒子径が50nmより小さい中空粒子の製造を困難としていた原因が核粒子の真球度にあることを知見し、これを改良することにより、粒子全体における中空粒子の割合が70%以上のシリカ系粒子の製造が可能となった。 Conventionally, in the production of hollow particles having an average particle diameter smaller than 50 nm, there have been problems that the reproducibility is low and the hollow ratio is low. In the present invention, it has been found that the cause of difficulty in producing hollow particles having an average particle diameter of less than 50 nm is the sphericity of the nuclear particles, and by improving this, the ratio of the hollow particles in the whole particles is 70. % Or more silica-based particles can be produced.
〈前工程〉
本発明の所望する範囲の核粒子を得るには、下記(A)及び(B)の少なくとも1つの条件を採用することが好ましい。
(A)平均粒子径が8nm以上の種粒子を用いて、核粒子を調製する。
(B)温度80℃以下及び/又はpH12以下の条件下に種粒子を保持して、核粒子を調製する。
すなわち、(A)比較的サイズの大きな種粒子を用いて、真球度の測定値が1.0に近い核粒子を調製することや、(B)種粒子の粒子安定性が高い条件下で核粒子を調製することが好ましく、(A)及び(B)を満たす条件で核粒子を製造することが特に好ましい。
<pre-process>
In order to obtain the desired range of nuclear particles of the present invention, it is preferable to adopt at least one of the following conditions (A) and (B).
(A) Nuclear particles are prepared using seed particles having an average particle diameter of 8 nm or more.
(B) The seed particles are held under the conditions of a temperature of 80 ° C. or lower and / or a pH of 12 or lower to prepare nuclear particles.
That is, (A) using relatively large seed particles to prepare nuclear particles having a measured sphericity close to 1.0, and (B) under conditions where the particle stability of the seed particles is high. It is preferable to prepare the nuclear particles, and it is particularly preferable to produce the nuclear particles under the conditions satisfying (A) and (B).
まず、(A)平均粒子径が8nm以上の種粒子を用いる条件について説明する。
本条件は、種粒子の粒子径が比較的大きな種粒子を用いることを特徴とする。すなわち、従来は、空隙率の高い中空粒子を製造するには、種となる粒子は小さい方が好ましいとの知見から、平均粒子径が5nm程度のものが用いられていたが、本条件においては、あえて粒子径の大きな種粒子を適用することに特徴を有する。種粒子の粒子径が大きいことにより、核粒子を調製する際に種粒子の安定性が保持され、この結果、真球度の測定値が1.0に近い(真球に近い)核粒子を形成することができる。この粒子径の種粒子であれば、核粒子を調製する際の条件は、従来と同様のpH条件、温度条件を適用することも可能である。更に、条件(B)を併用して適用することが好ましい。
種粒子の平均粒子径は、核粒子調製における種粒子の安定性の面から上記のように、8nm以上であることが好ましく、10〜50nmであることがより好ましく、10〜30nmであることがさらに好ましく、10〜20nmであることが特に好ましい。
First, (A) the conditions for using seed particles having an average particle diameter of 8 nm or more will be described.
This condition is characterized in that seed particles having a relatively large particle size are used. That is, conventionally, in order to produce hollow particles having a high porosity, it is preferable that the seed particles are small, and therefore, particles having an average particle diameter of about 5 nm have been used, but under this condition, they have been used. It is characterized by applying seed particles with a large particle size. Due to the large particle size of the seed particles, the stability of the seed particles is maintained when preparing the nuclear particles, and as a result, the measured sphericity of the nuclear particles is close to 1.0 (close to true sphere). Can be formed. As long as the seed particles have this particle size, the same pH and temperature conditions as those used in the past can be applied as the conditions for preparing the nuclear particles. Further, it is preferable to apply the condition (B) in combination.
The average particle size of the seed particles is preferably 8 nm or more, more preferably 10 to 50 nm, and more preferably 10 to 30 nm, as described above, from the viewpoint of the stability of the seed particles in the preparation of nuclear particles. It is more preferably 10 to 20 nm, and particularly preferably 10 to 20 nm.
次に、(B)温度80℃以下及び/又はpH12以下の条件下に種粒子を保持する条件について説明する。
本条件は、種粒子が種粒子としての安定性を保った条件で核粒子を生成することを特徴とする。すなわち、従来は、核粒子の粒子成長が速やかに進行するように核粒子の調製において比較的高い温度と高いpH条件が適用されていた。このような条件下で製造された最終製品は、従来の中空粒子としては、なんら不都合はなかったが、平均粒子径が50nmよりも小さい中空粒子を製造する場合、再現性が低く、中空率が低くなる問題があった。このため、本条件(B)は、この温度及び/又はpHの条件を変更したものである。本条件(B)は、従来に比して低い温度と低いpH条件であり、核粒子の粒子成長中の種粒子の粒子安定性が保持されているために真球度の測定値が1.0に近い(真球状に近い)核粒子を形成することができる。この温度、pH条件であれば、従来の平均粒子径が5nm程度のサイズの小さな粒子を用いても所望の核粒子を得ることができる。すなわち、平均粒子径が3nm以上8nm未満の種粒子でも使用することができ、好ましくは5nm以上8nm未満の種粒子でも使用することができる。更に、条件(A)を併用して適用することが好ましい。
Next, the conditions for retaining the seed particles under the conditions of (B) temperature of 80 ° C. or lower and / or pH of 12 or lower will be described.
This condition is characterized in that the seed particles generate nuclear particles under the condition that the stability as the seed particles is maintained. That is, conventionally, relatively high temperature and high pH conditions have been applied in the preparation of nuclear particles so that the particle growth of the nuclear particles proceeds rapidly. The final product manufactured under such conditions had no inconvenience as conventional hollow particles, but when hollow particles having an average particle diameter smaller than 50 nm were produced, the reproducibility was low and the hollow ratio was high. There was a problem of becoming low. Therefore, this condition (B) is a modification of this temperature and / or pH condition. This condition (B) is a lower temperature and lower pH condition than before, and the measured value of sphericity is 1. because the particle stability of the seed particles during the particle growth of the nuclear particles is maintained. Nuclear particles close to 0 (near spherical) can be formed. Under these temperature and pH conditions, desired nuclear particles can be obtained even by using conventional small particles having an average particle diameter of about 5 nm. That is, seed particles having an average particle diameter of 3 nm or more and less than 8 nm can also be used, and preferably seed particles having an average particle diameter of 5 nm or more and less than 8 nm can also be used. Further, it is preferable to apply the condition (A) in combination.
本発明の所望する範囲の核粒子を得る条件としては、上記のように、温度80℃以下及び/又はpH12以下であることが好ましいが、温度としては、70℃以下であることがより好ましく、50〜65℃であることがさらに好ましい。pHとしては、11.5以下であることがより好ましく、9.0〜11.0であることがさらに好ましい。なお、本工程において条件(B)を採用する場合、次工程の第1工程も条件(B)を維持することが好ましい。 As described above, the conditions for obtaining the nuclear particles in the desired range of the present invention are preferably a temperature of 80 ° C. or lower and / or a pH of 12 or lower, but more preferably 70 ° C. or lower. It is more preferably 50 to 65 ° C. The pH is more preferably 11.5 or less, and further preferably 9.0 to 11.0. When the condition (B) is adopted in this step, it is preferable to maintain the condition (B) also in the first step of the next step.
種粒子から核粒子を調製する際の分散液の固形分濃度としては、0.1〜20質量%であることが好ましく、0.3〜10質量%であることがより好ましい。種粒子を含む分散液の固形分濃度が0.1質量%未満であると、種粒子1個あたりの溶解度が大きくなり、核粒子の生成が緩やかにできないため、所望の核粒子が得られない場合がある。また、製造する上での効率が低下するので好ましくない。逆に、固形分濃度が20質量%を超えると、分散液の安定性が悪く粒子が凝集するおそれがある。 The solid content concentration of the dispersion liquid when preparing the nuclear particles from the seed particles is preferably 0.1 to 20% by mass, more preferably 0.3 to 10% by mass. If the solid content concentration of the dispersion liquid containing the seed particles is less than 0.1% by mass, the solubility per seed particle becomes high and the formation of nuclear particles cannot be slowed down, so that the desired nuclear particles cannot be obtained. In some cases. In addition, it is not preferable because the efficiency in manufacturing is lowered. On the contrary, if the solid content concentration exceeds 20% by mass, the stability of the dispersion liquid is poor and the particles may aggregate.
〈第一工程〉
第一工程では、平均粒子径が3〜25nm、真球度が1.0〜1.5のシリカの核粒子を含む分散液に、珪酸塩水溶液及び酸性珪酸液の少なくとも一方と、珪素を含まない無機化合物水溶液とを、同時に添加して複合酸化物粒子(一次粒子)を含む分散液を調製する。本工程で用いる核粒子は、上記前工程で種粒子を用いて調製された核粒子である。
<First process>
In the first step, a dispersion liquid containing silica core particles having an average particle size of 3 to 25 nm and a sphericity of 1.0 to 1.5 contains at least one of a silicate aqueous solution and an acidic silicic acid solution, and silicon. A dispersion liquid containing composite oxide particles (primary particles) is prepared by adding an aqueous solution of an inorganic compound at the same time. The nuclear particles used in this step are the nuclear particles prepared by using the seed particles in the previous step.
ここで、核粒子の平均粒子径が3nm未満であると、その粒子径の粒子を得ること自体が困難であるし、例え得られたとしても、複合酸化物粒子分散液の調製において、均質な粒子成長ができない場合がある。この結果、中空率が70%以上のシリカ系粒子が得られない場合がある。逆に、核粒子の平均粒子径が25nmを超えると、以降の工程で所望する平均粒子径が5〜40nmの範囲のシリカ系中空粒子が得られない場合がある。核粒子の平均粒子径は、5〜20nmであることが好ましい。
また、核粒子の真球度が1.0〜1.5の範囲外であれば、球形でない粒子が多くなるため、以降の工程で、所望する中空率が70%以上のシリカ系粒子が得られない。
Here, if the average particle size of the nuclear particles is less than 3 nm, it is difficult to obtain particles having that particle size, and even if they can be obtained, they are homogeneous in the preparation of the composite oxide particle dispersion. Particle growth may not be possible. As a result, silica-based particles having a hollow ratio of 70% or more may not be obtained. On the contrary, if the average particle size of the nuclear particles exceeds 25 nm, silica-based hollow particles having a desired average particle size in the range of 5 to 40 nm may not be obtained in the subsequent steps. The average particle size of the nuclear particles is preferably 5 to 20 nm.
Further, if the sphericity of the nuclear particles is outside the range of 1.0 to 1.5, the number of non-spherical particles increases, so that silica-based particles having a desired hollow ratio of 70% or more can be obtained in the subsequent steps. I can't.
第1工程での複合酸化物粒子分散液の調製は、固形分濃度が0.1〜0.9質量%、さらには0.2〜0.6質量%の範囲で行うことが好ましい。この分散液の固形分濃度は、核粒子を含む分散液に、珪酸塩水溶液及び酸性珪酸液の少なくとも一方と、珪素を含まない無機化合物水溶液とを、同時に添加しはじめた時点から、添加を終了した時点まで維持されていることが好ましい。
この濃度が0.1質量%よりも低いと、収率が低下し、生産効率が低下するため好ましくない。
逆に、この濃度が0.9質量%よりも高いと、均質な粒子成長が行われず、この結果、中空率が70%以上のシリカ系粒子が得られない場合がある。
The composite oxide particle dispersion liquid in the first step is preferably prepared in a solid content concentration range of 0.1 to 0.9% by mass, more preferably 0.2 to 0.6% by mass. The solid content concentration of this dispersion is such that the addition is terminated from the time when at least one of the silicate aqueous solution and the acidic silicic acid solution and the silicon-free inorganic compound aqueous solution are simultaneously added to the dispersion containing the nuclear particles. It is preferable that it is maintained until the time when it is used.
If this concentration is lower than 0.1% by mass, the yield is lowered and the production efficiency is lowered, which is not preferable.
On the contrary, if this concentration is higher than 0.9% by mass, homogeneous particle growth is not performed, and as a result, silica-based particles having a hollow ratio of 70% or more may not be obtained.
核粒子の調製を行う場合、粒子成長の速度を適した範囲に制御して行うことが好ましい。この時の粒子成長速度は、核粒子の粒子径によっても異なるが、好ましくは0.1〜10nm/時間、より好ましくは0.2〜5nm/時間、さらに好ましくは0.2〜3nm/時間の範囲である。 When preparing nuclear particles, it is preferable to control the rate of particle growth within an appropriate range. The particle growth rate at this time varies depending on the particle size of the nuclear particles, but is preferably 0.1 to 10 nm / hour, more preferably 0.2 to 5 nm / hour, and further preferably 0.2 to 3 nm / hour. The range.
粒子成長を上記の範囲で行う手段としては、核粒子が含まれる母液や反応液の濃度を低くすること、添加する希薄珪酸塩水溶液や酸性珪酸液といったシリカ源の濃度や、無機化合物水溶液の濃度を低くすること、これら添加溶液の核粒子分散液への添加速度を制御すること、反応温度(粒子成長時の温度)を低くすること等が例示される。 Means for particle growth within the above range include lowering the concentration of mother liquor and reaction solution containing nuclear particles, the concentration of silica sources such as dilute silicate aqueous solution and acidic silicate solution to be added, and the concentration of inorganic compound aqueous solution. For example, lowering the concentration, controlling the rate of addition of these added solutions to the nuclear particle dispersion, lowering the reaction temperature (temperature at the time of particle growth), and the like.
本工程で用いる珪酸塩としては、アルカリ金属珪酸塩、アンモニウム珪酸塩および有機塩基の珪酸塩から選ばれる1種または2種以上の珪酸塩が好ましく用いられる。
このアルカリ金属珪酸塩としては、珪酸ナトリウム(水ガラス)や珪酸カリウムが例示される。有機塩基としては、テトラエチルアンモニウム塩などの第4級アンモニウム塩、モノエタノールアミン、ジエタノールアミン、トリエタノールアミンなどのアミン類を挙げることができ、アンモニウムの珪酸塩または有機塩基の珪酸塩には、珪酸液にアンモニア、第4級アンモニウム水酸化物、アミン化合物などを添加したアルカリ性溶液も含まれる。
As the silicate used in this step, one or more silicates selected from alkali metal silicates, ammonium silicates and organic base silicates are preferably used.
Examples of this alkali metal silicate include sodium silicate (water glass) and potassium silicate. Examples of the organic base include quaternary ammonium salts such as tetraethylammonium salt and amines such as monoethanolamine, diethanolamine and triethanolamine. Ammonium silicates or organic base silicates include silicate solutions. Also included is an alkaline solution containing ammonia, a quaternary ammonium hydroxide, an amine compound, or the like.
本工程で用いる無機化合物は、実質的に珪素以外の元素で構成されており、酸及びアルカリに可溶な化合物である。これを酸化物(MOx)で表すと、MOxはAl2O3、B2O3、TiO2、ZrO2、SnO2、CeO2、P2O5、Sb2O3、MoO3、ZnO、WO3等の1種または2種以上、また複合酸化物としてはTiO2−Al2O3、TiO2−ZrO2等を例示することができる。本工程で用いる無機化合物は、これら無機酸化物を構成する金属または非金属のオキソ酸のアルカリ金属塩、アルカリ土類金属塩、アンモニウム塩、第4級アンモニウム塩を挙げることができ、より具体的には、アルミン酸ナトリウム、四ホウ酸ナトリウム、炭酸ジルコニウムアンモニウム、アンチモン酸カリウム、スズ酸カリウム、アルミノ珪酸ナトリウム、モリブデン酸ナトリウム、硝酸セリウムアンモニウム、リン酸ナトリウム等が好適である。 The inorganic compound used in this step is substantially composed of an element other than silicon and is a compound that is soluble in acids and alkalis. Expressing this as an oxide (MOx), MOx is Al 2 O 3 , B 2 O 3 , TiO 2 , ZrO 2 , SnO 2 , CeO 2 , P 2 O 5 , Sb 2 O 3 , MoO 3 , ZnO, One or more of WO 3 and the like, and TiO 2- Al 2 O 3 and TiO 2- ZrO 2 and the like can be exemplified as the composite oxide. Examples of the inorganic compound used in this step include alkali metal salts, alkaline earth metal salts, ammonium salts, and quaternary ammonium salts of metal or non-metal oxo acids constituting these inorganic oxides, and are more specific. , Sodium aluminate, sodium tetraborate, ammonium zirconium carbonate, potassium antimonate, potassium tinate, sodium aluminosilicate, sodium molybdate, ammonium cerium nitrate, sodium phosphate and the like are suitable.
第1工程において、珪酸塩水溶液及び酸性珪酸液の少なくとも一方に由来するシリカをSiO2で表し、無機化合物水溶液に由来する無機化合物を酸化物としてMOXで表したときのモル比MOX/SiO2は、0.15〜3.0にあることが好ましい。モル比MOX/SiO2が0.15〜3.0の範囲にあれば、複合酸化物粒子の構造は主として珪素と珪素以外の元素が酸素を介在して交互に結合した構造となる。即ち、珪素原子の4つの結合手に酸素原子が結合し、この酸素原子には珪素以外の元素Mが結合した構造が多く生成し、第2工程で、被覆複合酸化物粒子に含まれる無機化合物に由来する元素を除去する際に、元素(M)に随伴させて、珪素原子も珪酸モノマーやオリゴマーとして除去することができるようになる。ここで、MOX/SiO2が0.15未満では、中空粒子中の空洞容積が十分大きくならず、MOX/SiO2が3.0を超えると、球状の複合酸化物粒子を得ることが困難となり、この結果、得られる中空粒子中の空隙率(空洞容積)の割合が低下する。
より好ましいモル比MOX/SiO2は、0.15〜2.0、さらに好ましくは0.2〜1.0である。
In the first step, the molar ratio MO X / SiO when silica derived from at least one of the silicate aqueous solution and the acidic silicic acid solution is represented by SiO 2 and the inorganic compound derived from the inorganic compound aqueous solution is represented by MO X as an oxide. 2 is preferably in the range of 0.15 to 3.0. When the molar ratio MO X / SiO 2 is in the range of 0.15 to 3.0, the structure of the composite oxide particles is mainly silicon and a structure in which elements other than silicon are alternately bonded via oxygen. That is, an oxygen atom is bonded to the four bonds of the silicon atom, and many structures in which an element M other than silicon is bonded to the oxygen atom are generated. In the second step, the inorganic compound contained in the coated composite oxide particles. When removing the element derived from, the silicon atom can also be removed as a silicic acid monomer or an oligomer in association with the element (M). Here, when MO X / SiO 2 is less than 0.15, the cavity volume in the hollow particles is not sufficiently large, and when MO X / SiO 2 exceeds 3.0, spherical composite oxide particles can be obtained. This makes it difficult, and as a result, the proportion of porosity (cavity volume) in the resulting hollow particles decreases.
The more preferable molar ratio MO X / SiO 2 is 0.15 to 2.0, more preferably 0.2 to 1.0.
第1工程で得られた複合酸化物粒子は、平均粒子径が3〜35nm、真球度が1.0〜1.5であることが好ましい。
ここで、複合酸化物粒子の平均粒子径が3nm未満であると、その粒子径の粒子を得ること自体が困難であるし、例え得られたとしても、この複合酸化物粒子にシリカ含有量の多い被覆層を形成させる際に、均質な粒子成長が行われず、この結果、所望する中空率が70%以上のシリカ系粒子が得られない場合がある。逆に、平均粒子径が35nmを超えると、以降の工程で、所望する平均粒子径が5〜40nmの範囲のシリカ系粒子が得られない場合がある。また、複合酸化物粒子の真球度が1.0〜1.5の範囲外であれば、球形でない粒子が多くなるため、以降の工程で、所望する中空率が70%以上のシリカ系粒子が得られない。
The composite oxide particles obtained in the first step preferably have an average particle size of 3 to 35 nm and a sphericity of 1.0 to 1.5.
Here, if the average particle size of the composite oxide particles is less than 3 nm, it is difficult to obtain particles having that particle size, and even if they can be obtained, the silica content of the composite oxide particles is high. When forming a large number of coating layers, uniform particle growth is not performed, and as a result, silica-based particles having a desired hollow ratio of 70% or more may not be obtained. On the contrary, if the average particle size exceeds 35 nm, silica-based particles having a desired average particle size in the range of 5 to 40 nm may not be obtained in the subsequent steps. Further, if the sphericity of the composite oxide particles is outside the range of 1.0 to 1.5, the number of non-spherical particles increases. Therefore, in the subsequent steps, silica-based particles having a desired hollow ratio of 70% or more. Cannot be obtained.
〈第2工程〉
第2工程では、前記第1工程で得た複合酸化物粒子を含む分散液に、シリカ源を添加して、シリカを含む層で被覆された被覆複合酸化物粒子を含む分散液を調製する。シリカ源としては、前述の珪酸塩水溶液や酸性珪酸液、およびこれらの加水分解物が挙げられる。
<Second step>
In the second step, a silica source is added to the dispersion liquid containing the composite oxide particles obtained in the first step to prepare a dispersion liquid containing the coated composite oxide particles coated with a layer containing silica. Examples of the silica source include the above-mentioned aqueous silicate solution and acidic silicic acid solution, and hydrolysates thereof.
また、本工程においては、前記シリカ源に加えて、第1工程で用いた珪素を含まない無機化合物を添加することもできる。すなわち、珪酸塩水溶液及び酸性珪酸液の少なくとも一方と、無機化合物水溶液とを、上述の第1工程のモル比MOX/SiO2よりも小さいモル比MOX/SiO2で添加して、複合酸化物粒子にシリカとシリカ以外の無機化合物を含むシリカ含有量の多い被覆層を形成することも好適である。 Further, in this step, in addition to the silica source, the silicon-free inorganic compound used in the first step can be added. That is, at least one of the silicate solution and an acidic silicic acid solution and an inorganic compound aqueous solution was added with a small molar ratio MO X / SiO 2 than the molar ratio MO X / SiO 2 of the first step described above, the composite oxide It is also preferable to form a coating layer containing silica and an inorganic compound other than silica in the physical particles and having a high silica content.
ここで、第2工程でのモル比MOX/SiO2が第1工程のモル比MOX/SiO2よりも小さいモル比であれば、被覆層はシリカの含有量が多くなり、後述する第3工程での酸処理の際に珪素以外の元素Mが除去され、実質的にシリカからなる被覆層が形成される。 Here, if the molar ratio in the second step MO X / SiO 2 is smaller molar ratio than the molar ratio MO X / SiO 2 of the first step, the coating layer increases the amount of silica, the later During the acid treatment in the three steps, the element M other than silicon is removed, and a coating layer substantially made of silica is formed.
特に、第1工程におけるMOX/SiO2のモル比(A)に対する第2工程におけるMOX/SiO2のモル比(B)の比(B/A)が0.8以下であることが好ましい。より好適には値(B/A)が0.6以下であり、さらに好適には値(B/A)が0.5以下である。 In particular, the ratio (B / A) of the molar ratio (B) of MO X / SiO 2 in the second step to the molar ratio (A) of MO X / SiO 2 in the first step is preferably 0.8 or less. .. More preferably, the value (B / A) is 0.6 or less, and more preferably, the value (B / A) is 0.5 or less.
この第2工程のシリカを含む被覆層の形成は、複合酸化物粒子を含む分散液の固形分濃度が0.1〜0.9質量%、さらには0.2〜0.6質量%の範囲で行うことが好ましい。
この濃度が0.1質量%よりも低いと、収率が低下し、生産効率が低下するため好ましくない。
逆に、この濃度が0.9質量%よりも高いと、均質な粒子成長が行われず、この結果、中空率が70%以上のシリカ系粒子が得られない場合がある。
In the formation of the coating layer containing silica in the second step, the solid content concentration of the dispersion liquid containing the composite oxide particles is in the range of 0.1 to 0.9% by mass, and further in the range of 0.2 to 0.6% by mass. It is preferable to carry out with.
If this concentration is lower than 0.1% by mass, the yield is lowered and the production efficiency is lowered, which is not preferable.
On the contrary, if this concentration is higher than 0.9% by mass, homogeneous particle growth is not performed, and as a result, silica-based particles having a hollow ratio of 70% or more may not be obtained.
このシリカを含む被覆層を形成する際、被覆層の形成速度を適した範囲に制御して行うことが好ましい。この時の形成速度は、複合酸化物粒子の一次粒子の粒子径によっても異なるが、好ましくは0.1〜10nm/時間、より好ましくは0.2〜5nm/時間、さらに好ましくは0.2〜3nm/時間の範囲である。 When forming the coating layer containing silica, it is preferable to control the formation rate of the coating layer within an appropriate range. The formation rate at this time varies depending on the particle size of the primary particles of the composite oxide particles, but is preferably 0.1 to 10 nm / hour, more preferably 0.2 to 5 nm / hour, and further preferably 0.2 to 0.2 to 5 nm / hour. It is in the range of 3 nm / hour.
被覆層の形成速度を上記の範囲で行う手段としては、複合酸化物粒子が含まれる母液や反応液の濃度を低くすること、添加する有機珪素化合物溶液、希薄珪酸塩水溶液や酸性珪酸液といったシリカ源の濃度や、珪素を含まない無機化合物水溶液の濃度を低くすること、これら添加溶液の複合酸化物粒子分散液への添加速度を制御すること、反応温度(被覆層形成時の温度)を低くすること等が例示される。 As a means for forming the coating layer within the above range, the concentration of the mother liquor or reaction solution containing the composite oxide particles is lowered, the organic silicon compound solution to be added, the dilute silicate aqueous solution or the acidic silicate solution is silica. Reduce the concentration of the source, the concentration of the inorganic compound aqueous solution containing no silicon, control the rate of addition of these added solutions to the composite oxide particle dispersion, and reduce the reaction temperature (temperature at the time of forming the coating layer). Examples of things to do.
第1工程及び/又は第2工程においては、粒子成長後、及び/又はシリカを含む被覆層形成後に、水熱処理をして、熟成を行うことが好ましい。この時の熟成は、固形分濃度が1〜30質量%、温度が30〜100℃、時間が1〜12時間の範囲で行うことが好ましい。 In the first step and / or the second step, it is preferable to carry out aging by hydrothermal treatment after the particle growth and / or the formation of the coating layer containing silica. The aging at this time is preferably carried out in the range of a solid content concentration of 1 to 30% by mass, a temperature of 30 to 100 ° C., and a time of 1 to 12 hours.
第1工程及び/又は第2工程においては、超音波を照射するなどして凝集を防止して、高分散化することが好ましい。万一、分散が困難な凝集粒子、粗大粒子が存在する場合は、カプセルフィルター、遠心分離等でこれを除去することが好ましい。 In the first step and / or the second step, it is preferable to prevent aggregation by irradiating ultrasonic waves or the like to achieve high dispersion. If agglomerated particles or coarse particles that are difficult to disperse are present, it is preferable to remove them by a capsule filter, centrifugation or the like.
第2工程で得られた被覆複合酸化物粒子は、平均粒子径が5〜40nm、真球度が1.0〜1.5であることが好ましい。
ここで、被覆複合酸化物粒子の平均粒子径が5nm未満であると、その粒子径の粒子を得ること自体が困難であるし、例え得られたとしても、以降の工程で、所望する平均粒子径が5〜40nmの範囲のシリカ系粒子が得られない場合がある。また、以降の工程で、所望する中空率が70%以上のシリカ系粒子が得られない場合がある。逆に、平均粒子径が40nmを超えても、以降の工程で、所望する平均粒子径が5〜40nmの範囲のシリカ系粒子が得られない場合があるため好ましくない。
また、被覆複合酸化物粒子の真球度が1.0〜1.5の範囲外であれば、球形でない粒子が多くなるため、以降の工程で、所望する中空率が70%以上のシリカ系粒子が得られない。
The coated composite oxide particles obtained in the second step preferably have an average particle size of 5 to 40 nm and a sphericity of 1.0 to 1.5.
Here, if the average particle size of the coated composite oxide particles is less than 5 nm, it is difficult to obtain particles having that particle size, and even if they can be obtained, the desired average particles are obtained in the subsequent steps. In some cases, silica-based particles having a diameter in the range of 5 to 40 nm cannot be obtained. Further, in the subsequent steps, silica-based particles having a desired hollow ratio of 70% or more may not be obtained. On the contrary, even if the average particle size exceeds 40 nm, silica-based particles having a desired average particle size in the range of 5 to 40 nm may not be obtained in the subsequent steps, which is not preferable.
Further, if the sphericity of the coated composite oxide particles is outside the range of 1.0 to 1.5, the number of non-spherical particles increases. Therefore, in the subsequent steps, a silica-based particle having a desired hollow ratio of 70% or more is used. No particles can be obtained.
〈第3工程〉
第3工程では、第2工程で得た被覆複合酸化物粒子を含む分散液に酸を加えて、被覆複合酸化物粒子に含まれる前記無機化合物に由来する元素を除去する。すなわち、第1工程(必要に応じて第2工程)で添加した珪素を含まない無機化合物を構成する金属元素を、被覆複合酸化物粒子より除去することにより、内部に空洞を有する中空粒子を製造する。
<Third step>
In the third step, an acid is added to the dispersion liquid containing the coated composite oxide particles obtained in the second step to remove the element derived from the inorganic compound contained in the coated composite oxide particles. That is, hollow particles having cavities inside are produced by removing the metal elements constituting the silicon-free inorganic compound added in the first step (second step if necessary) from the coated composite oxide particles. To do.
被覆複合酸化物粒子に含まれる無機化合物に由来する元素を除去する方法としては、鉱酸及び有機酸の少なくとも一方を使用して溶解除去する方法を挙げることができる。また、陽イオン交換樹脂と接触させてイオン交換除去する方法、あるいはこれらを併用する方法が例示できる。 Examples of the method for removing the element derived from the inorganic compound contained in the coated composite oxide particles include a method for dissolving and removing using at least one of a mineral acid and an organic acid. Further, a method of contacting with a cation exchange resin to remove the ion exchange, or a method of using these in combination can be exemplified.
このときの被覆複合酸化物粒子分散液中の被覆複合酸化物粒子の濃度は、処理温度によっても異なるが、酸化物に換算して0.1〜50質量%、特に0.5〜25質量%の範囲にあることが好ましい。0.1質量%未満ではシリカ被覆層におけるシリカの溶解が起きる可能性があると同時に、低濃度のために処理効率が悪い。また、被覆複合酸化物粒子の濃度が50質量%を越えると、被覆複合酸化物粒子に含まれる無機化合物に由来する元素の所望量を少ない回数で除去しにくくなる。 The concentration of the coated composite oxide particles in the coated composite oxide particle dispersion at this time varies depending on the treatment temperature, but is 0.1 to 50% by mass in terms of oxide, particularly 0.5 to 25% by mass. It is preferable that it is in the range of. If it is less than 0.1% by mass, dissolution of silica in the silica coating layer may occur, and at the same time, the treatment efficiency is poor due to the low concentration. Further, when the concentration of the coated composite oxide particles exceeds 50% by mass, it becomes difficult to remove the desired amount of the element derived from the inorganic compound contained in the coated composite oxide particles in a small number of times.
前述の無機化合物に由来する元素の除去は、得られるシリカ系粒子のモル比MOX/SiO2が、0.0001〜0.2、特に、0.0001〜0.1となるまで行うことが好ましい。元素を除去した分散液は、限外濾過等の公知の洗浄方法により洗浄することができる。この場合、予め分散液中のアルカリ金属イオン、アルカリ土類金属イオンおよびアンモニウムイオン等の一部を除去した後に限外濾過すれば、分散安定性の高い粒子が分散したゾルが得られる。なお、必要に応じて有機溶媒で置換することによって有機溶媒分散ゾルを得ることができる。このようにして得られた分散ゾル中に分散したシリカ系粒子は、外殻が多孔質なシリカ層により構成され、内部に空洞を有したものとなる。また、核粒子を完全に除去しない場合には多孔質の物質が空洞内に残留する。従って、得られる中空粒子は低屈折率となり、この中空粒子を用いて形成される被膜が低屈折率となり、反射防止性能に優れた被膜が得られる。 The removal of the element derived from the above-mentioned inorganic compound may be carried out until the molar ratio MO X / SiO 2 of the obtained silica-based particles is 0.0001 to 0.2, particularly 0.0001 to 0.1. preferable. The dispersion liquid from which the elements have been removed can be washed by a known washing method such as ultrafiltration. In this case, if a part of alkali metal ions, alkaline earth metal ions, ammonium ions and the like in the dispersion liquid is removed in advance and then ultrafiltration is performed, a sol in which particles having high dispersion stability are dispersed can be obtained. An organic solvent-dispersed sol can be obtained by substituting with an organic solvent if necessary. The silica-based particles dispersed in the dispersed sol thus obtained have an outer shell composed of a porous silica layer and having cavities inside. In addition, if the nuclear particles are not completely removed, a porous substance remains in the cavity. Therefore, the obtained hollow particles have a low refractive index, and the film formed by using the hollow particles has a low refractive index, so that a film having excellent antireflection performance can be obtained.
〈第4工程〉
第4工程は、第3工程で得た粒子を含む分散液に、アルカリ条件下で水熱処理による熟成を行う。この工程により、分散安定性に優れた中空率が70%以上の中空粒子を製造することができる。
<4th process>
In the fourth step, the dispersion liquid containing the particles obtained in the third step is aged by hydrothermal treatment under alkaline conditions. By this step, hollow particles having an excellent dispersion stability and a hollow ratio of 70% or more can be produced.
この水熱処理は、固形分濃度が1〜30質量%、pHが9.0以上、温度が30〜300℃、時間が1〜72時間の範囲で行うことが好ましい。
この水熱処理により熟成されたシリカ系粒子は、有機溶媒に溶媒置換することもできる。有機溶媒の種類としては、シリカ系粒子に悪影響を与えるものでなければ特に限定されるものではない。使用可能な有機溶媒としては、アルコール類、グリコール類、エステル類、ケトン類、窒素化合物類、芳香族類等が例示される。溶媒置換の方法も、溶媒置換されれば特に限定されるものではなく、例えば、限外ろ過膜またはロータリーエバポレーターを使用するといった従来公知の方法で構わない。
This hydrothermal treatment is preferably performed in the range of solid content concentration of 1 to 30% by mass, pH of 9.0 or more, temperature of 30 to 300 ° C., and time of 1 to 72 hours.
The silica-based particles aged by this hydrothermal treatment can also be solvent-substituted with an organic solvent. The type of the organic solvent is not particularly limited as long as it does not adversely affect the silica-based particles. Examples of usable organic solvents include alcohols, glycols, esters, ketones, nitrogen compounds, aromatics and the like. The method of solvent substitution is not particularly limited as long as the solvent is substituted, and a conventionally known method such as using an ultrafiltration membrane or a rotary evaporator may be used.
〈第5工程〉
本発明の製造方法においては、上記第1〜4工程を経た中空粒子に対して、下記式(1)で表される有機珪素化合物又はこれらの加水分解物で表面処理を行う第5工程を有することが好ましい。
<Fifth step>
The production method of the present invention includes a fifth step of surface-treating the hollow particles that have undergone the first to fourth steps with an organic silicon compound represented by the following formula (1) or a hydrolyzate thereof. Is preferable.
Rn−SiX4−n (1)
(但し、式中、Rは炭素数1〜10の非置換または置換炭化水素基であって、互いに同一であっても異なっていてもよい。Xは炭素数1〜4のアルコキシ基、シラノール基、ハロゲン、水素、nは0〜3の整数)
R n −SiX 4-n (1)
(However, in the formula, R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and may be the same or different from each other. X is an alkoxy group or a silanol group having 1 to 4 carbon atoms. , Halogen, hydrogen, n is an integer from 0 to 3)
このような式(1)で表される有機珪素化合物としては、テトラメトキシシラン、テトラエトキシシラン、テトラプロポキシシシラン、テトラブトキシシラン、メチルトリメトキシシラン、ジメチルジメトキシシラン、フェニルトリメトキシシラン、ジフェニルジメトキシシラン、メチルトリエトキシシラン、ジメチルジエトキシシラン、フェニルトリエトキシシラン、ジフェニルジエトキシシラン、イソブチルトリメトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、ビニルトリス(βメトキシエトキシ)シラン、3,3,3−トリフルオロプロピルトリメトキシシラン、メチル−3,3,3−トリフルオロプロピルジメトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、γ−グリシドキシメチルトリメトキシシラン、γ−グリシドキシメチルトリエキシシラン、γ−グリシドキシエチルトリメトキシシラン、γ−グリシドキシエチルトリエトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリエトキシシラン、γ−(β−グリシドキシエトキシ)プロピルトリメトキシシラン、γ−(メタ)アクリロキシメチルトリメトキシシラン、γ−(メタ)アクリロキシメチルトリエキシシラン、γ−(メタ)アクリロキシエチルトリメトキシシラン、γ−(メタ)アクリロキシエチルトリエトキシシラン、γ−(メタ)アクリロキシプロピルトリメトキシシラン、γ−(メタ)アクリロキシプロピルトリメトキシシラン、γ−(メタ)アクリロキシプロピルトリエトキシシラン、γ−(メタ)アクリロキシプロピルトリエトキシシラン、ブチルトリメトキシシラン、イソブチルトリメトキシシラン、ヘキシルトリエトキシシラオクチルトリエトキシシラン、デシルトリエトキシシラン、ブチルトリエトキシシラン、イソブチルトリエトキシシラン、ヘキシルトリエトキシシラン、オクチルトリエトキシシラン、デシルトリエトキシシラン、3−ウレイドイソプロピルプロピルトリエトキシシラン、パーフルオロオクチルエチルトリメトキシシラン、パーフルオロオクチルエチルトリエトキシシラン、パーフルオロオクチルエチルトリイソプロポキシシラン、トリフルオロプロピルトリメトキシシラン、N−β(アミノエチル)γ−アミノプロピルメチルジメトキシシラン、N−β(アミノエチル)γ−アミノプロピルトリメトキシシラン、N−フェニル−γ−アミノプロピルトリメトキシシラン、γ−メルカプトプロピルトリメトキシシラン、トリメチルシラノール、メチルトリクロロシラン等が挙げられる。 Examples of the organic silicon compound represented by the formula (1) include tetramethoxysilane, tetraethoxysilane, tetrapropoxysisilane, tetrabutoxysilane, methyltrimethoxysilane, dimethyldimethoxysilane, phenyltrimethoxysilane, and diphenyldimethoxy. Silane, methyltriethoxysilane, dimethyldiethoxysilane, phenyltriethoxysilane, diphenyldiethoxysilane, isobutyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (βmethoxyethoxy) silane, 3,3,3 -Trifluoropropyltrimethoxysilane, methyl-3,3,3-trifluoropropyldimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxymethyltrimethoxysilane, γ-gly Sidoxymethyltrioxysilane, γ-glycidoxyethyltrimethoxysilane, γ-glycidoxyethyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-( β-Glysidoxyethoxy) Propyltrimethoxysilane, γ- (meth) acryloximethyltrimethoxysilane, γ- (meth) acryloximethyltrioxysilane, γ- (meth) acryloxiethyltrimethoxysilane, γ- (Meta) Acryloxyethyltriethoxysilane, γ- (meth) Acryloxypropyltrimethoxysilane, γ- (meth) acryloxipropyltrimethoxysilane, γ- (meth) acryloxipropyltriethoxysilane, γ- (meth) ) Acryloxipropyltriethoxysilane, butyltrimethoxysilane, isobutyltrimethoxysilane, hexyltriethoxysilaoctyltriethoxysilane, decyltriethoxysilane, butyltriethoxysilane, isobutyltriethoxysilane, hexyltriethoxysilane, octyltriethoxysilane Silane, decyltriethoxysilane, 3-ureidoisopropylpropyltriethoxysilane, perfluorooctylethyltrimethoxysilane, perfluorooctylethyltriethoxysilane, perfluorooctylethyltriisopropoxysilane, trifluoropropyltrimethoxysilane, N- β (aminoethyl) γ-aminopropylmethyldimethoxysilane, N-β (aminoethyl) γ-aminopropyltrimethoki Examples thereof include sisilane, N-phenyl-γ-aminopropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, trimethylsilanol, and methyltrichlorosilane.
シリカ系粒子は、このような有機珪素化合物で表面処理されていると、マトリックス中に均一に分散するとともに密に充填することができ、膜の強度、耐擦傷性に優れた透明被膜を得ることができる。 When the silica-based particles are surface-treated with such an organic silicon compound, they can be uniformly dispersed and densely packed in the matrix to obtain a transparent film having excellent film strength and scratch resistance. Can be done.
シリカ系粒子の表面処理は、粒子のアルコール分散液に上述の有機珪素化合物を所定量加え、これに水を加え、必要に応じて加水分解用触媒として酸またはアルカリを加えて有機珪素化合物を加水分解する。さらに好ましくは、次いで、これを加熱処理して熟成する。 For the surface treatment of silica-based particles, a predetermined amount of the above-mentioned organic silicon compound is added to the alcohol dispersion of the particles, water is added thereto, and if necessary, an acid or alkali is added as a hydrolysis catalyst to add the organic silicon compound. Disassemble. More preferably, it is then heat treated and aged.
この時のシリカ系粒子と有機珪素化合物との質量比(有機珪素化合物の固形分(Rn−SiX(4−n)/2)としての質量/シリカ系粒子の質量)は、シリカ系粒子の平均粒子径によっても異なるが、0.005〜3.0さらには0.05〜1.0の範囲にあることが好ましい。 At this time, the mass ratio of the silica-based particles to the organic silicon compound (mass as the solid content of the organic silicon compound (R n −SiX (4-n) / 2 ) / mass of the silica-based particles) is that of the silica-based particles. Although it depends on the average particle size, it is preferably in the range of 0.005 to 3.0, more preferably 0.05 to 1.0.
前述の質量比が0.005よりも小さいと、後述するマトリックス形成成分との親和性が低く、塗料中での分散性、安定性が不充分となり、塗料中で粒子が凝集することがあり、緻密な透明被膜が得られないことがあり、基材との密着性、膜の強度、耐擦傷性等が不充分となる場合がある。 If the mass ratio is smaller than 0.005, the affinity with the matrix-forming component described later is low, the dispersibility and stability in the paint are insufficient, and the particles may aggregate in the paint. A dense transparent film may not be obtained, and the adhesion to the substrate, the strength of the film, the scratch resistance, etc. may be insufficient.
逆に、前述の質量比が30.0よりも大きいと、塗料中での分散性がさらに向上することもなく、シリカ系粒子の屈折率が高くなり、所望の低屈折率の透明被膜が得られないことがあり、反射防止性能が不充分となる場合がある。 On the contrary, when the mass ratio is larger than 30.0, the dispersibility in the coating material is not further improved, the refractive index of the silica-based particles is increased, and a transparent film having a desired low refractive index is obtained. It may not be possible, and the antireflection performance may be insufficient.
[シリカ系粒子の分散液]
本発明のシリカ系粒子の分散液は、平均粒子径が5〜40nmであり、かつ中空粒子及び中実粒子の合計粒子数に占める中空粒子数の割合(中空率)が70%以上であるシリカ系粒子を含むものである。これは、上記説明した製造方法により製造することができる。従来、平均粒子径が5〜40nmといったサイズの小さなシリカ系中空粒子はその製造が困難であったが、本発明においては、中空率70%以上という高い割合での製造を実現した。
[Dispersion of silica-based particles]
The dispersion liquid of silica-based particles of the present invention has an average particle diameter of 5 to 40 nm, and the ratio of the number of hollow particles (hollow ratio) to the total number of hollow particles and solid particles is 70% or more. It contains system particles. This can be produced by the production method described above. Conventionally, it has been difficult to produce small silica-based hollow particles having an average particle diameter of 5 to 40 nm, but in the present invention, production has been realized at a high hollow ratio of 70% or more.
反射防止膜は、一般に波長依存性があり、波長λに対してλ/4となるように設計されることが多く、通常は人間の視感度の高い550nmの波長で最低反射率となるように設計されるため、その膜厚はおよそ100nm前後という薄膜で使用されることが一般的である。
本発明においては、5〜40nmといった比較的小粒子径のシリカ系中空粒子を製造することができるため、かかる中空粒子を配合した反射防止膜はその薄膜中に中空粒子が十分に埋め込まれることになる。その結果、粒子表面の平滑性も向上し、薄膜の耐マジック性、耐水性、耐アルカリ性を向上させることができる。また、中空率が高いことから、高い反射防止性能を発現できる。更に、粒子の配合量が比較的高い場合にも小粒子径であることから粒子による散乱が抑制され、透明性の高い被膜が形成できる。
Antireflection films are generally wavelength-dependent and are often designed to be λ / 4 with respect to wavelength λ, usually having the lowest reflectance at a wavelength of 550 nm, which is highly sensitive to humans. Since it is designed, it is generally used as a thin film having a film thickness of about 100 nm.
In the present invention, since silica-based hollow particles having a relatively small particle size of 5 to 40 nm can be produced, the antireflection film containing the hollow particles has the hollow particles sufficiently embedded in the thin film. Become. As a result, the smoothness of the particle surface is also improved, and the magic resistance, water resistance, and alkali resistance of the thin film can be improved. Moreover, since the hollow ratio is high, high antireflection performance can be exhibited. Further, even when the blending amount of the particles is relatively high, since the particle size is small, scattering by the particles is suppressed, and a highly transparent film can be formed.
本発明の分散液に係るシリカ系粒子は、平均粒子径が5〜40nmのシリカを主成分とする粒子である。このシリカ系粒子は、シリカ以外に、アルミナ、マグネシアなどの酸化物や、アルカリ金属の酸化物や水酸化物を含んでいてもよい。ただし、透明被膜の用途という点では、実質的にシリカからなることが好ましい。 The silica-based particles according to the dispersion liquid of the present invention are silica-based particles having an average particle diameter of 5 to 40 nm as a main component. In addition to silica, the silica-based particles may contain oxides such as alumina and magnesia, oxides of alkali metals, and hydroxides. However, in terms of the use of the transparent coating, it is preferably substantially made of silica.
《平均粒子径の測定》
平均粒子径は、電子顕微鏡写真を撮影し、各粒子の最長径と最短径を測定し、その平均値をその粒子の粒子径として、任意の100個の粒子について粒子径を測定し、その平均値として得たものである。
<< Measurement of average particle size >>
The average particle size is determined by taking an electron micrograph, measuring the longest and shortest diameters of each particle, and using the average value as the particle size of the particles, measuring the particle size of any 100 particles and averaging them. It was obtained as a value.
シリカ系粒子の平均粒子径が5nm未満であると、その粒子径の粒子を得ること自体が困難で、特に、シリカ系中空粒子を得ることは困難である。例え、この粒子径のシリカ系中空粒子が得られたとしても、粒子径自体が小さいため粒子内部の空洞の割合が小さく、すなわち空隙率が小さいために屈折率が高く、十分な反射防止能を有する透明被膜が得られない場合がある。さらに、中空率が70%以上のシリカ系粒子が得られない。
逆に、平均粒子径が40nmを超えると、粒子が大きいために薄膜に配合した際、透明被膜表面に十分に埋め込まれない。その結果、透明被膜表面に粒子が露出し、被膜表面の外部散乱を誘発し透明性を低下させたり、透明被膜表面の平滑性が低下し、耐擦傷性等が不充分となる場合がある。
より好ましい平均粒子径は5〜35nm、さらに好ましくは8〜30nmである。
If the average particle size of the silica-based particles is less than 5 nm, it is difficult to obtain particles having that particle size, and in particular, it is difficult to obtain silica-based hollow particles. Even if silica-based hollow particles having this particle size are obtained, the particle size itself is small, so the proportion of cavities inside the particles is small, that is, the porosity is small, so the refractive index is high, and sufficient antireflection ability is provided. The transparent film to have may not be obtained. Further, silica-based particles having a hollow ratio of 70% or more cannot be obtained.
On the contrary, when the average particle size exceeds 40 nm, the particles are large and are not sufficiently embedded in the surface of the transparent film when blended in the thin film. As a result, particles may be exposed on the surface of the transparent coating film, which may induce external scattering on the surface of the coating film to reduce the transparency, or the smoothness of the surface of the transparent coating film may be lowered, resulting in insufficient scratch resistance and the like.
A more preferable average particle size is 5 to 35 nm, still more preferably 8 to 30 nm.
また、本発明の分散液に係るシリカ系粒子は、中空粒子及び中実粒子の合計粒子数に占める中空粒子数の割合(中空率)が70%以上である。ここで、中空粒子とは、内部に空洞を有する粒子で、空隙率が3%以上であるものを意味し、中実粒子とは、空隙率が3%未満であるものを指す。 Further, in the silica-based particles according to the dispersion liquid of the present invention, the ratio (hollow ratio) of the number of hollow particles to the total number of hollow particles and solid particles is 70% or more. Here, the hollow particles mean particles having cavities inside and have a porosity of 3% or more, and the solid particles mean particles having a porosity of less than 3%.
《個々の粒子の空隙率の測定》
空隙率は、粒子に占める粒子中の空洞部の割合として定義される。具体的には、粒子の透過型電子顕微鏡写真を撮影する。この時、中空粒子の空洞部分は密度が低く、透過型電子顕微鏡写真においてその部分のコントラストが低くなるため、中空粒子の空洞部分は透過型電子顕微鏡写真のコントラスト比で中空粒子の外殻部分と空洞部分を確認することができる。まず、粒子の最長径と最短径を測定し、その平均値をその粒子の粒子径として粒子形状を真球状と仮定した体積(VQ)を求める。次に、その粒子の空洞部の最長径と最短径を測定し、その平均値をその空洞の径として、空洞部形状を真球状と仮定した体積(VP)を求める。空隙率は、体積(VQ)に対する体積(VP)の割合で表される。
<< Measurement of porosity of individual particles >>
Porosity is defined as the ratio of cavities in a particle to the particle. Specifically, a transmission electron micrograph of the particles is taken. At this time, the hollow portion of the hollow particle has a low density, and the contrast of that portion is low in the transmission electron micrograph, so that the hollow portion of the hollow particle has a contrast ratio with that of the outer shell portion of the hollow particle in the transmission electron micrograph. The hollow part can be confirmed. First, the longest diameter and the shortest diameter of the particles are measured, and the average value is used as the particle diameter of the particles to obtain the volume (VQ) assuming that the particle shape is a true sphere. Next, the longest diameter and the shortest diameter of the cavity of the particle are measured, and the average value is used as the diameter of the cavity to obtain the volume (VP) assuming that the shape of the cavity is spherical. Porosity, expressed as a percentage of the volume (V P) to the volume (V Q).
《中空率の測定》
中空率は、TEM像にて100個の粒子を確認し、中空粒子(空隙率3%以上)と中実粒子(空隙率3%未満)の合計の粒子数に占める中空粒子数の割合を求める。
《Measurement of hollow ratio》
For the hollow ratio, 100 particles are confirmed on the TEM image, and the ratio of the number of hollow particles to the total number of particles of the hollow particles (porosity of 3% or more) and the solid particles (porosity of less than 3%) is determined. ..
中空率が70%未満であると、透明被膜中のシリカ系粒子の含有量や粒子サイズ、あるいは真球度にもよるが、透明被膜の屈折率を十分に低下させることができず、十分な反射防止性能が発現しない場合がある。好ましい中空率は75%以上、より好ましくは80%以上、さらに好ましくは90%以上、特に好ましくは95%以上、最も好ましくは100%である。 When the hollow ratio is less than 70%, the refractive index of the transparent film cannot be sufficiently lowered, which is sufficient, although it depends on the content of silica-based particles in the transparent film, the particle size, or the sphericity. Anti-reflection performance may not be exhibited. The hollow ratio is preferably 75% or more, more preferably 80% or more, still more preferably 90% or more, particularly preferably 95% or more, and most preferably 100%.
本発明の分散液に係るシリカ系粒子全体の空隙率は、3〜50%が好ましく、15〜50%がより好ましく、25〜48%がさらに好ましい。
《シリカ系粒子全体の空隙率》
本発明の分散液中のシリカ系粒子全体の空隙率は、上記のようにして求めた個々の粒子の空隙率を任意の100個の粒子について計算し、その平均値として得たものである。空隙率が高い粒子ほど、屈折率は低くなる。このような空隙率が高い粒子を透明被膜に配合した場合、反射防止性能の高い被膜が得られる。
The porosity of the entire silica-based particles according to the dispersion liquid of the present invention is preferably 3 to 50%, more preferably 15 to 50%, still more preferably 25 to 48%.
<< Porosity of the entire silica-based particles >>
The porosity of the entire silica-based particles in the dispersion liquid of the present invention is obtained by calculating the porosity of the individual particles obtained as described above for any 100 particles and obtaining the average value thereof. The higher the porosity, the lower the refractive index. When such particles having a high porosity are blended in a transparent film, a film having high antireflection performance can be obtained.
本発明の分散液に係るシリカ系粒子は、真球度が1.0〜1.5であることが好ましい。シリカ系粒子の真球度がこの範囲であれば、粒子形状は真球に近くなる。このため、膜厚の薄い透明被膜中に均質に充填できるようになり、被膜表面平滑性を維持しながら、すなわちシリカ系粒子が被膜表面から外部に露出しない薄膜透明被膜を形成できる。この結果、屈折率が低く、充分な強度を有す被膜を得ることができて好ましい。また、シリカ系粒子が被膜表面から外部に露出しない透明被膜が得られやすいため、白化の発生や耐擦傷性低下は起こりにくい。また、真球度が1.5を超える、いわゆる異形粒子の数割合は、1%以下であることが好ましい。
より好ましい真球度は1.0〜1.4、さらに好ましくは1.0〜1.2である。
The silica-based particles according to the dispersion liquid of the present invention preferably have a sphericity of 1.0 to 1.5. If the sphericity of the silica-based particles is in this range, the particle shape becomes close to a sphere. Therefore, the transparent film having a thin film thickness can be uniformly filled, and a thin film transparent film can be formed while maintaining the smoothness of the film surface, that is, the silica-based particles are not exposed to the outside from the film surface. As a result, a film having a low refractive index and sufficient strength can be obtained, which is preferable. Further, since it is easy to obtain a transparent film in which silica-based particles are not exposed to the outside from the surface of the film, whitening and scratch resistance are unlikely to occur. Further, the number ratio of so-called irregularly shaped particles having a sphericity of more than 1.5 is preferably 1% or less.
A more preferable sphericity is 1.0 to 1.4, and even more preferably 1.0 to 1.2.
《真球度の測定》
真球度は、粒子の最長径と最短径の割合として定義される。具体的には、透過型電子顕微鏡写真を撮影し、各粒子の最長径と最短径を測定し、その割合(最長径と最短径の比率)を任意の100個の粒子について求め、その平均値として得たものである。球形の真球状に近づくほど、最長径と最短径の差はなくなり、その比率(すなわち真球度)は1.0に近づく。
《Measurement of sphericity》
Spheroidity is defined as the ratio of the longest diameter to the shortest diameter of a particle. Specifically, a transmission electron micrograph is taken, the longest diameter and the shortest diameter of each particle are measured, and the ratio (ratio of the longest diameter to the shortest diameter) is obtained for any 100 particles, and the average value thereof is obtained. I got it as. The closer to a spherical spherical shape, the less the difference between the longest diameter and the shortest diameter, and the ratio (that is, sphericity) approaches 1.0.
《異形粒子の数割合の測定》
上述の真球度の測定において、任意の100個の粒子に対する、真球度が1.5を超える粒子の個数の割合を求めたものである。
<< Measurement of the number ratio of irregularly shaped particles >>
In the above-mentioned measurement of sphericity, the ratio of the number of particles having sphericity exceeding 1.5 to any 100 particles is obtained.
また、本発明の分散液に係るシリカ系粒子は、屈折率が1.10〜1.41であることが好ましい。このシリカ系粒子は、中空粒子を含み、中空率が70%以上であるため、通常のシリカ系中実粒子のみで構成されるものに比べて屈折率が低くなる。 Further, the silica-based particles according to the dispersion liquid of the present invention preferably have a refractive index of 1.10 to 1.41. Since these silica-based particles contain hollow particles and have a hollow ratio of 70% or more, the refractive index is lower than that of those composed of only ordinary silica-based solid particles.
屈折率が1.10未満のものは、得ることが困難である。逆に、屈折率が1.41より高くなれば、このシリカ系粒子を配合した透明被膜の屈折率も高くなるので、反射防止性能が不充分となる場合がある。より好ましい屈折率は1.10〜1.30、さらに好ましくは1.10〜1.25である。 Those with a refractive index of less than 1.10 are difficult to obtain. On the contrary, if the refractive index is higher than 1.41, the refractive index of the transparent film containing the silica-based particles is also high, so that the antireflection performance may be insufficient. A more preferable refractive index is 1.10 to 1.30, and even more preferably 1.10 to 1.25.
《屈折率の測定》
また、本発明に用いるシリカ系粒子の屈折率は、下記の方法によって測定する。
[1]シリカ系粒子の分散液をエバポレーターに採り、分散媒を蒸発させる。
[2]これを120℃で乾燥し、粉末とする。
[3]屈折率が既知の標準屈折液を2、3滴ガラス板上に滴下し、これに上記粉末を混合する。
[4]上記[3]の操作を種々の標準屈折液で行い、混合液が透明になったときの標準屈折液の屈折率をシリカ系粒子の屈折率とする。
<< Measurement of refractive index >>
The refractive index of the silica-based particles used in the present invention is measured by the following method.
[1] A dispersion of silica-based particles is taken on an evaporator to evaporate the dispersion medium.
[2] This is dried at 120 ° C. to obtain a powder.
[3] A few drops of a standard refracting liquid having a known refractive index are dropped onto a glass plate, and the above powder is mixed thereto.
[4] The operation of the above [3] is performed with various standard refracting liquids, and the refractive index of the standard refracting liquid when the mixed liquid becomes transparent is defined as the refractive index of the silica-based particles.
また、本発明のシリカ系粒子はその表面に珪素原子に直接結合した有機基を有することが好ましい。すなわち、本発明の製造方法における第5工程の表面処理を施されたものが好ましい。有機基の種類については、透明被膜形成用組成物を調製する際のバインダー、特に有機樹脂との親和性があるものが好ましい。この透明被膜形成用組成物を基材上で硬化して得られる透明被膜付基材において、透明被膜の白化を招かず、耐擦傷性および密着性を損なわないものであれば制限されるものではない。例えば、炭化水素基または炭素原子、水素原子以外の異原子を含む炭化水素基であっても良い。炭化水素基は、脂肪族であっても、芳香族であってもよく、飽和炭化水素基であっても、不飽和炭化水素基であっても良い。また、二重結合または三重結合を含むものであってもよく、エーテル結合を有するものでも良い。 Further, the silica-based particles of the present invention preferably have an organic group directly bonded to a silicon atom on the surface thereof. That is, the one subjected to the surface treatment of the fifth step in the production method of the present invention is preferable. As for the type of organic group, a binder for preparing a composition for forming a transparent film, particularly one having an affinity with an organic resin is preferable. The transparent film-coated substrate obtained by curing this transparent film-forming composition on the substrate is not limited as long as it does not cause whitening of the transparent film and does not impair scratch resistance and adhesion. Absent. For example, it may be a hydrocarbon group or a hydrocarbon group containing a carbon atom or a foreign atom other than a hydrogen atom. The hydrocarbon group may be an aliphatic group, an aromatic group, a saturated hydrocarbon group, or an unsaturated hydrocarbon group. Further, it may contain a double bond or a triple bond, or may have an ether bond.
珪素原子に直接結合した有機基の好適な例としては、飽和または不飽和の炭素数1〜18の炭化水素基、炭素数1〜18のハロゲン化炭化水素基から選ばれる有機基を挙げることができる。具体的には、3−メタクリロキシプロピル基、3−アクリロキシプロピル基、3,3,3−トリフルオロプロピル基、メチル基、フェニル基、イソブチル基、ビニル基、γ−グリシドキシトリプロピル基、γ−メタクリロキシプロピル基、N−β(アミノエチル)γ−アミノプロピル基、N−β(アミノエチル)γ−アミノプロピル基、γ−アミノプロピル基、N−フェニル−γ−アミノプロピル基などを挙げることができるがこれらに限定されるものではない。 Preferable examples of the organic group directly bonded to the silicon atom include an organic group selected from a saturated or unsaturated hydrocarbon group having 1 to 18 carbon atoms and a halogenated hydrocarbon group having 1 to 18 carbon atoms. it can. Specifically, 3-methacryloxypropyl group, 3-acryloxypropyl group, 3,3,3-trifluoropropyl group, methyl group, phenyl group, isobutyl group, vinyl group, γ-glycidoxytripropyl group, γ-methacryloxypropyl group, N-β (aminoethyl) γ-aminopropyl group, N-β (aminoethyl) γ-aminopropyl group, γ-aminopropyl group, N-phenyl-γ-aminopropyl group, etc. It can be mentioned, but it is not limited to these.
〈シリカ系粒子と有機基の好適な態様<1>〉
本発明のシリカ系粒子を含有する透明被膜の基材との密着性、被膜の白化防止および耐擦傷性の面から見て、本発明のシリカ系粒子は、下記式(2)または下記式(3)の有機基を有するものであり、熱重量測定(TG)により、200℃〜500℃の温度範囲において1.5質量%以上の重量減少を示すものが好ましい。
−R−OC(=O)CCH3=CH2 ・・・(2)
(ただし、Rは炭素数1〜12の2価の炭化水素基)
−R−OC(=O)CH=CH2 ・・・(3)
(ただし、Rは炭素数1〜12の2価の炭化水素基)
<Preferable Aspects of Silica Particles and Organic Groups <1>>
From the viewpoint of adhesion of the transparent coating film containing the silica-based particles of the present invention to the substrate, prevention of whitening of the coating film, and scratch resistance, the silica-based particles of the present invention have the following formula (2) or the following formula ( Those having the organic group of 3) and showing a weight loss of 1.5% by mass or more in the temperature range of 200 ° C. to 500 ° C. by thermal weight measurement (TG) are preferable.
-R-OC (= O) CCH 3 = CH 2 ... (2)
(However, R is a divalent hydrocarbon group having 1 to 12 carbon atoms)
-R-OC (= O) CH = CH 2 ... (3)
(However, R is a divalent hydrocarbon group having 1 to 12 carbon atoms)
〈シリカ系中空粒子と有機基の好適な態様<2>〉
また、前記と同様な理由で、本発明のシリカ系粒子が、下記式(4)の有機基を有するものが好ましい。
−R−CnFaHb ・・・(4)
(ただし、a+b=2n+1、nは1〜3の整数、Rは炭素数1〜12の2価の炭化水素基)
<Preferable Aspects of Silica-based Hollow Particles and Organic Groups <2>>
Further, for the same reason as described above, it is preferable that the silica-based particles of the present invention have an organic group of the following formula (4).
-R-C n F a H b ··· (4)
(However, a + b = 2n + 1, n is an integer of 1 to 3, R is a divalent hydrocarbon group having 1 to 12 carbon atoms)
本発明のシリカ系粒子は、通常、分散媒に分散されたものである。シリカ濃度としては、1〜70質量%であるものが安定性の面からみて好ましく、更に好ましくは3〜40質量%であるものが推奨される。 The silica-based particles of the present invention are usually dispersed in a dispersion medium. The silica concentration of 1 to 70% by mass is preferable from the viewpoint of stability, and more preferably 3 to 40% by mass is recommended.
[透明被膜形成用塗布液]
本発明に係る透明被膜形成用塗布液は、前述の平均粒子径が5〜40nm、中空率が70%以上のシリカ系粒子と、マトリックス形成成分と、極性溶媒とを含むことを特徴とする。
[Coating liquid for forming a transparent film]
The coating liquid for forming a transparent film according to the present invention is characterized by containing the above-mentioned silica-based particles having an average particle diameter of 5 to 40 nm and a hollow ratio of 70% or more, a matrix-forming component, and a polar solvent.
〈シリカ系粒子〉
本発明に用いるシリカ系粒子としては、前述したシリカ系粒子が用いられる。
<Silica particles>
As the silica-based particles used in the present invention, the above-mentioned silica-based particles are used.
〈マトリックス形成成分〉
マトリックス形成成分としては、シリコーン系(ゾルゲル系)マトリックス形成成分、有機樹脂系マトリックス形成成分等が用いられる。
<Matrix forming component>
As the matrix-forming component, a silicone-based (sol-gel-based) matrix-forming component, an organic resin-based matrix-forming component, or the like is used.
このシリコーン系マトリックス形成成分としては前述の式(1)と同様の有機珪素化合物の加水分解重縮合物が好適に用いられる。
また、有機樹脂系マトリックス形成成分としては、塗料用樹脂として公知の熱硬化性樹脂、熱可塑性樹脂、電子線硬化樹脂等が挙げられる。
As the silicone-based matrix-forming component, a hydrolyzed polycondensate of an organic silicon compound similar to the above-mentioned formula (1) is preferably used.
Examples of the organic resin matrix forming component include thermosetting resins, thermoplastic resins, and electron beam curable resins known as paint resins.
このような樹脂として、例えば、従来から用いられているポリエステル樹脂、ポリカーボネート樹脂、ポリアミド樹脂、ポリフェニレンオキサイド樹脂、熱可塑性アクリル樹脂、塩化ビニル樹脂、フッ素樹脂、酢酸ビニル樹脂、シリコーンゴムなどの熱可塑性樹脂、ウレタン樹脂、メラミン樹脂、珪素樹脂、ブチラール樹脂、反応性シリコーン樹脂、フェノール樹脂、エポキシ樹脂、不飽和ポリエステル樹脂、熱硬化性アクリル樹脂、紫外線硬化型アクリル樹脂などの熱硬化性樹脂、紫外線硬化型アクリル樹脂などが挙げられる。さらには、これら樹脂の2種以上の共重合体や変性体であってもよい。これらの樹脂は、エマルジョン樹脂、水溶性樹脂、親水性樹脂であってもよい。さらに、熱硬化性樹脂の場合、紫外線硬化型のものであっても、電子線硬化型のものであってもよく、熱硬化性樹脂の場合、硬化触媒が含まれていてもよい。 As such resins, for example, thermoplastic resins such as conventionally used polyester resins, polycarbonate resins, polyamide resins, polyphenylene oxide resins, thermoplastic acrylic resins, vinyl chloride resins, fluororesins, vinyl acetate resins, and silicone rubbers. , Urethane resin, melamine resin, silicon resin, butyral resin, reactive silicone resin, phenol resin, epoxy resin, unsaturated polyester resin, thermosetting acrylic resin, thermosetting resin such as UV curable acrylic resin, UV curable Acrylic resin and the like can be mentioned. Furthermore, it may be a copolymer or a modified product of two or more kinds of these resins. These resins may be emulsion resins, water-soluble resins, and hydrophilic resins. Further, in the case of a thermosetting resin, it may be an ultraviolet curable type or an electron beam curable type, and in the case of a thermosetting resin, a curing catalyst may be contained.
〈重合開始剤等〉
マトリックス形成成分が前述の有機樹脂である時、樹脂が紫外線硬化型樹脂の場合は、光重合開始剤が含まれていてもよく、熱硬化性樹脂の場合は、硬化触媒が含まれていてもよい。これらは、塗布液の構成物質としては、マトリックス形成成分として扱わない。
<Polymerization initiator, etc.>
When the matrix-forming component is the above-mentioned organic resin, if the resin is an ultraviolet curable resin, a photopolymerization initiator may be contained, and if the resin is a thermosetting resin, a curing catalyst may be contained. Good. These are not treated as matrix-forming components as constituent substances of the coating liquid.
重合開始剤としては、前記マトリックス形成成分を硬化できれば特に制限はなく、従来公知のものを使用することができる。例えば、ビス(2,4,6−トリメチルベンゾイル)フェニルフォスフィンオキサイド、ビス(2,6−ジメトキシベンゾイル)2,4,4−トリメチル−ペンチルフォスフィンオキサイド、2−ヒドロキシ−メチル−2−メチル−フェニル−プロパン−1−ケトン、2,2−ジメトキシ−1,2−ジフェニルエタン−1−オン、1−ヒドロキシ−シクロヘキシル−フェニル−ケトン、2−メチル−1−[4−(メチルチオフェニル]−2−モルフォリノプロパン−1−オン等が挙げられる。 The polymerization initiator is not particularly limited as long as the matrix-forming component can be cured, and conventionally known ones can be used. For example, bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide, bis (2,6-dimethoxybenzoyl) 2,4,4-trimethyl-pentylphosphine oxide, 2-hydroxy-methyl-2-methyl- Phenyl-Propane-1-ketone, 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxy-cyclohexyl-phenyl-ketone, 2-methyl-1- [4- (methylthiophenyl] -2) -Morphorinopropane-1-one and the like can be mentioned.
硬化触媒としては、例えば硝酸、塩酸、硫酸などの無機酸、ギ酸、酢酸、イタコン酸等の有機酸、アンモニア、エチルアミン、エタノールアミン等の塩基性物質等が挙げられる。 Examples of the curing catalyst include inorganic acids such as nitric acid, hydrochloric acid and sulfuric acid, organic acids such as formic acid, acetic acid and itaconic acid, and basic substances such as ammonia, ethylamine and ethanolamine.
〈極性溶媒〉
本発明に用いる極性溶媒としてはマトリックス形成成分、必要に応じて用いる重合開始剤を溶解あるいは分散できるとともにシリカ系中空粒子を均一に分散することができれば特に制限はなく、従来公知の溶媒を用いることができる。
<Polar solvent>
The polar solvent used in the present invention is not particularly limited as long as it can dissolve or disperse the matrix-forming component and the polymerization initiator used as needed and uniformly disperse the silica-based hollow particles, and a conventionally known solvent is used. Can be done.
具体的には、水、メタノール、エタノール、プロパノール、2−プロパノール(IPA)、ブタノール、ジアセトンアルコール、フルフリルアルコール、テトラヒドロフルフリルアルコール、エチレングリコール、ヘキシレングリコール、イソプロピルグリコールなどのアルコール類;酢酸メチルエステル、酢酸エチルエステル、酢酸ブチルなどのエステル類;ジエチルエーテル、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、プロピレングリコールモノメチルエーテルなどのエーテル類;アセトン、メチルエチルケトン、メチルイソブチルケトン、アセチルアセトン、アセト酢酸エステルなどのケトン類、メチルセロソルブ、エチルセロソルブ、ブチルセロソルブ、トルエン、シクロヘキサノン、イソホロン等が挙げられる。 Specifically, alcohols such as water, methanol, ethanol, propanol, 2-propanol (IPA), butanol, diacetone alcohol, furfuryl alcohol, tetrahydrofurfuryl alcohol, ethylene glycol, hexylene glycol, isopropyl glycol; acetic acid. Esters such as methyl ester, ethyl acetate ester, butyl acetate; ethers such as diethyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether ; Ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, acetyl acetone, acetoacetic acid ester, methyl cellosolve, ethyl cellosolve, butyl cellosolve, toluene, cyclohexanone, isophorone and the like can be mentioned.
なかでも、メタノール、エタノール、プロパノール、2−プロパノール(IPA)等のアルコール類は、表面処理したシリカ系微粒子を均一に分散することができ、カルボニル基を有する溶媒は、表面処理したシリカ系粒子を均一に分散することができるとともに塗料の安定性がよい。このため、均一性、基材との密着性、強度等に優れた透明被膜を再現性よく形成することができるので好適に用いることができる。 Among them, alcohols such as methanol, ethanol, propanol and 2-propanol (IPA) can uniformly disperse the surface-treated silica-based fine particles, and the solvent having a carbonyl group uses the surface-treated silica-based particles. It can be uniformly dispersed and the stability of the paint is good. Therefore, a transparent film having excellent uniformity, adhesion to a base material, strength, and the like can be formed with good reproducibility, so that it can be preferably used.
透明被膜形成用塗布液中のシリカ系微粒子の濃度は、固形分として0.4〜54質量%、さらには0.6〜54質量%の範囲にあることが好ましい。透明被膜形成用塗布液中のシリカ系粒子が少ないと、透明被膜中のシリカ系粒子の含有量が少なく屈折率の充分に低い透明被膜が得られない場合がある。逆に、シリカ系粒子が多すぎても、反対にマトリックス形成成分の含有量が少なくなるために透明被膜の強度が不充分となる場合がある。 The concentration of the silica-based fine particles in the coating liquid for forming a transparent film is preferably in the range of 0.4 to 54% by mass, more preferably 0.6 to 54% by mass as a solid content. If the amount of silica-based particles in the coating liquid for forming a transparent film is small, the content of silica-based particles in the transparent film is low and a transparent film having a sufficiently low refractive index may not be obtained. On the contrary, if the amount of silica-based particles is too large, the strength of the transparent film may be insufficient because the content of the matrix-forming component is reduced.
透明被膜形成用塗布液中のマトリックス形成成分の濃度は、固形分として0.1〜36質量%さらには0.1〜24質量%の範囲にあることが好ましい。
マトリックス形成成分の濃度が低い場合は、得られる透明被膜中のマトリックス成分が少なく、耐擦傷性、基材との密着性等が不充分となる場合がある。マトリックス形成成分の濃度が高すぎると、得られる透明被膜中のシリカ系粒子の含有量が少なくなり、屈折率が不充分となり、反射防止性能が不充分となる場合がある。
The concentration of the matrix-forming component in the coating liquid for forming a transparent film is preferably in the range of 0.1 to 36% by mass, more preferably 0.1 to 24% by mass as a solid content.
When the concentration of the matrix-forming component is low, the amount of the matrix component in the obtained transparent film is small, and scratch resistance, adhesion to the substrate, and the like may be insufficient. If the concentration of the matrix-forming component is too high, the content of silica-based particles in the obtained transparent film may be low, the refractive index may be insufficient, and the antireflection performance may be insufficient.
なお、透明被膜形成用塗布中には、マトリックス形成成分を重合や縮合などの反応を行うための触媒が含まれていてもよい。また、その他、公知の透明被膜に用いられる成分が含まれていてもよい。 The transparent film-forming coating may contain a catalyst for carrying out a reaction such as polymerization or condensation of the matrix-forming component. In addition, other components used in known transparent coatings may be contained.
透明被膜形成用塗布液の全固形分濃度は1〜60質量%、さらには3〜50質量%の範囲にあることが好ましい。
全固形分濃度が1質量%よりも低いと、透明被膜の膜厚が薄すぎてしまい、耐擦傷性が不充分になるおそれがあり、また、充分な反射防止性能が得られない場合がある。一方、全固形分濃度が60質量%よりも高いと、塗布液の粘度が高くなり、塗布液の安定性が低下したり塗工性が低下したりする。また、薄い膜を形成することが困難となり、さらに、得られる透明被膜の均一性、基材との密着性、強度等が不充分となるおそれがある。
The total solid content concentration of the coating liquid for forming a transparent film is preferably in the range of 1 to 60% by mass, more preferably 3 to 50% by mass.
If the total solid content concentration is lower than 1% by mass, the film thickness of the transparent film may be too thin, the scratch resistance may be insufficient, and sufficient antireflection performance may not be obtained. .. On the other hand, when the total solid content concentration is higher than 60% by mass, the viscosity of the coating liquid becomes high, and the stability of the coating liquid decreases or the coatability deteriorates. Further, it becomes difficult to form a thin film, and further, the uniformity of the obtained transparent film, the adhesion to the substrate, the strength and the like may be insufficient.
本発明に係る透明被膜形成用塗布液を用いて透明被膜を形成する方法として、従来公知の方法を採用することができる。
具体的には、透明被膜形成用塗布液をディップ法、スプレー法、スピナー法、ロールコート法、バーコート法、スリットコーター印刷法、グラビア印刷法、マイクログラビア印刷法等の周知の方法で基材に塗布し、乾燥し、紫外線照射、加熱処理等常法によって硬化させることによって透明被膜を形成することができる。本発明では、ロールコート法、スリットコーター印刷法、グラビア印刷法、マイクログラビア印刷法が推奨される。
As a method for forming a transparent film using the coating liquid for forming a transparent film according to the present invention, a conventionally known method can be adopted.
Specifically, the coating liquid for forming a transparent film is applied to a base material by a well-known method such as a dip method, a spray method, a spinner method, a roll coating method, a bar coating method, a slit coater printing method, a gravure printing method, or a microgravure printing method. A transparent film can be formed by applying it to a cloth, drying it, and curing it by a conventional method such as ultraviolet irradiation and heat treatment. In the present invention, a roll coating method, a slit coater printing method, a gravure printing method, and a microgravure printing method are recommended.
[透明被膜付基材]
本発明に係る透明被膜付基材は、前述の平均粒子径が5〜40nm、中空率が70%以上のシリカ系粒子と、マトリックス成分とを含むことを特徴とする。
[Base material with transparent film]
The substrate with a transparent coating according to the present invention is characterized by containing silica-based particles having an average particle diameter of 5 to 40 nm and a hollow ratio of 70% or more, and a matrix component.
〈基材〉
本発明に用いる基材としては、従来公知のものを特に制限なく使用することが可能である。例えば、ガラス、プラスチック、ポリカーボネート、アクリル系樹脂、ポリエチレンテレフタレート(PET)、トリアセチルセルロース(TAC)、シクロポリオレフィン、ノルボルネン等のプラスチックシート、プラスチックフィルム等、プラスチックパネル等が挙げられる。
<Base material>
As the base material used in the present invention, conventionally known ones can be used without particular limitation. Examples thereof include plastic sheets such as glass, plastic, polycarbonate, acrylic resin, polyethylene terephthalate (PET), triacetyl cellulose (TAC), cyclopolyolefin and norbornene, plastic films and the like, and plastic panels and the like.
〈シリカ系粒子〉
本発明に用いるシリカ系粒子としては、前述した所定の平均粒子径、中空率を有するシリカ系中空粒子が用いられる。
<Silica particles>
As the silica-based particles used in the present invention, the silica-based hollow particles having the above-mentioned predetermined average particle diameter and hollow ratio are used.
〈マトリックス成分〉
マトリックス成分としては、シリコーン系(ゾルゲル系)マトリックス成分、有機樹脂系マトリックス成分等が用いられる。
<Matrix component>
As the matrix component, a silicone-based (sol-gel-based) matrix component, an organic resin-based matrix component, or the like is used.
本発明の透明被膜付基材の概念を図1に模式的に示す。図1に示すように、前述した所定の平均粒子径、中空率を有するシリカ系中空粒子を用いると、均質な透明被膜が得られやすくなり、基材と透明被膜との密着性が高くなる。また、透明被膜の上部表面は凹凸が小さく平滑になるので、表面での外部散乱が抑えられる。さらに粒子径が小さいため、被膜内に分散している粒子に起因する被膜の内部散乱が抑えられる。このため、透明被膜は、白化が抑制され、耐擦傷性、耐マジック性、耐水性、耐アルカリ性に優れ、低屈折率で反射防止性能に優れている。 The concept of the substrate with a transparent coating of the present invention is schematically shown in FIG. As shown in FIG. 1, when silica-based hollow particles having the above-mentioned predetermined average particle diameter and hollow ratio are used, a homogeneous transparent film can be easily obtained, and the adhesion between the base material and the transparent film is improved. Further, since the upper surface of the transparent film has small irregularities and becomes smooth, external scattering on the surface can be suppressed. Further, since the particle size is small, the internal scattering of the coating film due to the particles dispersed in the coating film can be suppressed. Therefore, the transparent film is suppressed from whitening, has excellent scratch resistance, magic resistance, water resistance, and alkali resistance, and has a low refractive index and excellent antireflection performance.
前述のシリカ系粒子は、中空率が70%以上であるシリカ系粒子であり、この中空粒子は、内部が気体または気体と多孔質物質のみからなるため、透明性や反射防止性能に優れている。このため、例えば表示板や照明機器のように、透明性が要求される基材としても有用である。 The above-mentioned silica-based particles are silica-based particles having a hollow ratio of 70% or more, and the hollow particles are excellent in transparency and antireflection performance because the inside is composed only of gas or gas and a porous substance. .. Therefore, it is also useful as a base material that requires transparency, such as a display board and a lighting device.
これに対し、従来の透明被膜付基材の概念は、図2に模式的に示される。図2に示すように、従来品は、粒子の中空率が低く、粒子径が大きなものが存在している。また、被膜の上部表面の凹凸が本発明よりも大きく、膜表面での凹凸による外部散乱が本発明よりも増加する。さらに、被膜内に配合された粒子の粒子径に起因する光散乱が本発明よりも大きくなるため、透明被膜の内部散乱が増加する。このため、透明被膜が、白化したり、耐擦傷性、耐マジック性、耐水性、耐アルカリ性が低下する場合がある。また、所望する屈折率や反射防止性能が得られない場合がある。 On the other hand, the conventional concept of a substrate with a transparent coating is schematically shown in FIG. As shown in FIG. 2, some conventional products have a low particle hollow ratio and a large particle size. Further, the unevenness of the upper surface of the film is larger than that of the present invention, and the external scattering due to the unevenness on the film surface is increased as compared with the present invention. Further, since the light scattering due to the particle size of the particles blended in the coating film becomes larger than that of the present invention, the internal scattering of the transparent coating film increases. Therefore, the transparent film may be whitened or the scratch resistance, magic resistance, water resistance, and alkali resistance may be lowered. In addition, the desired refractive index and antireflection performance may not be obtained.
透明被膜のシリカ系粒子の含有量は、20〜80質量%、さらには30〜70質量%の範囲にあることが好ましい。なお、残りの成分はマトリックス成分となる。透明被膜中のシリカ系粒子の含有量が20質量%よりも少ないと屈折率の充分に低い透明被膜が得られない場合がある。逆に、透明被膜中のシリカ系粒子の含有量が80質量%を超えると、後述するマトリックス成分の含有量が少な過ぎるために透明被膜の強度、耐擦傷性が不充分となる場合がある。 The content of the silica-based particles in the transparent film is preferably in the range of 20 to 80% by mass, more preferably 30 to 70% by mass. The remaining components are matrix components. If the content of silica-based particles in the transparent film is less than 20% by mass, a transparent film having a sufficiently low refractive index may not be obtained. On the contrary, when the content of the silica-based particles in the transparent film exceeds 80% by mass, the strength and scratch resistance of the transparent film may be insufficient because the content of the matrix component described later is too small.
透明被膜の膜厚は80〜120nm、さらには90〜110nmの範囲にあることが好ましい。
透明被膜が薄すぎると、膜の強度、耐擦傷性が不充分となるおそれがある。また、膜が薄すぎて十分な反射防止性能が得られない場合がある。透明被膜が厚すぎても、所望の反射防止性能が得られない場合がある。
The film thickness of the transparent film is preferably in the range of 80 to 120 nm, more preferably 90 to 110 nm.
If the transparent film is too thin, the strength and scratch resistance of the film may be insufficient. In addition, the film may be too thin to obtain sufficient antireflection performance. If the transparent film is too thick, the desired antireflection performance may not be obtained.
透明被膜の屈折率は、1.15〜1.40、さらには1.20〜1.35の範囲にあることが好ましい。透明被膜の屈折率が前記範囲よりも低いものは、被膜組成の点で得ることが困難であり、また屈折率が大きくなると、基材の屈折率あるいは必要に応じて形成される透明被膜の下層に形成される他の膜の屈折率によっても異なるが反射防止性能が不充分となるおそれがある。 The refractive index of the transparent film is preferably in the range of 1.15 to 1.40, more preferably 1.20 to 1.35. If the refractive index of the transparent film is lower than the above range, it is difficult to obtain it in terms of the film composition, and if the refractive index is large, the refractive index of the base material or the lower layer of the transparent film formed as needed. Although it depends on the refractive index of other films formed on the surface, the antireflection performance may be insufficient.
以下、本発明を実施例により説明するが、本発明はこれら実施例に限定されるものではない。 Hereinafter, the present invention will be described with reference to Examples, but the present invention is not limited to these Examples.
[実施例1]
〈シリカ系粒子(1)の調製〉
種粒子の水分散液(日揮触媒化成(株)製:SI−550、SiO2濃度20.5質量%)53.6gに純水946.4gを加えた後、1質量%の水酸化ナトリウムを添加してpHを11.0に調整した。その後、60℃に加温して30分程度保持し、核粒子(1)の水分散液を得た。この核粒子(1)の平均粒子径は5nm、真球度は1.1であった。
核粒子(1)の水分散液を60℃で保持しながら、SiO2として濃度0.75質量%の珪酸ナトリウム水溶液28.6kgとAl2O3としての濃度0.25質量%のアルミン酸ナトリウム水溶液28.6kgを16時間で添加して、複合酸化物(SiO2・Al2O3)の一次粒子分散液を得た。このときの反応液のpHは11.1であった。また、平均粒子径は15nmであった。
ついで、SiO2として濃度0.75質量%の珪酸ナトリウム水溶液129.4kgとAl2O3としての濃度0.25質量%のアルミン酸ナトリウム水溶液43.12kgを8時間で添加して被覆複合酸化物粒子の分散液を得た。このとき、反応液のpHは11.0であった。
ついで、限外濾過膜で洗浄して固形分濃度13質量%にした後、目開き1μmのカプセルフィルターで濾過し被覆複合酸化物粒子(1)分散液を得た。このとき、平均粒子径は22nmであった。
この被覆複合酸化物粒子(1)の分散液500gに純水1,125gを加え、さらに濃塩酸(濃度35.5質量%)を滴下してpH1.0とし、脱アルミニウム処理を行った。次いで、pH3の塩酸水溶液10Lと純水5Lを加えながら限外濾過膜で溶解したアルミニウム塩を分離・洗浄して固形分濃度20質量%のシリカ系粒子(1−1)の水分散液を得た。
次に、シリカ系粒子(1−1)分散液にアンモニア水を添加して分散液のpHを10.5に調整し、ついで80℃にて11時間熟成した後、常温に冷却し、陽イオン交換樹脂(三菱化学(株)製:ダイヤイオンSK1B)400gを用いて3時間イオン交換し、ついで、陰イオン交換樹脂(三菱化学(株)製:ダイヤイオンSA20A)200gを用いて3時間イオン交換し、さらに陽イオン交換樹脂(三菱化学(株)製:ダイヤイオンSK1B)200gを用い、80℃で3時間イオン交換して洗浄を行い、固形分濃度20質量%のシリカ系粒子(1−2)の水分散液を得た。
ついで、限外濾過膜を用いて溶媒をエタノールに置換した固形分濃度20質量%のシリカ系粒子(1−2)のアルコール分散液を調製した。
固形分濃度20質量%のシリカ系粒子(1−2)のアルコール分散液100gに3−メタクリロキシプロピルトリメトキシシラン(信越化学工業(株)製:KBM−503)6gを添加し、50℃で36時間 加熱処理を行い、再び限外濾過膜を用いて溶媒をエタノールに置換した固形分濃度20質量%のシリカ系粒子(1)のアルコール分散液を調製した。
このシリカ系粒子(1)の各調製工程について表1に示す。また、シリカ系粒子(1)の平均粒子径、中空率、真球度、異形粒子の数割合、屈折率および空隙率の各物理性状を表2に示す。各測定は、「発明を実施するための形態」で示す方法で行った。
[Example 1]
<Preparation of silica-based particles (1)>
After adding 946.4 g of pure water to 53.6 g of an aqueous dispersion of seed particles (manufactured by JGC Catalysts and Chemicals Co., Ltd .: SI-550, SiO 2 concentration 20.5% by mass), 1% by mass of sodium hydroxide was added. The pH was adjusted to 11.0 by addition. Then, the mixture was heated to 60 ° C. and held for about 30 minutes to obtain an aqueous dispersion of the nuclear particles (1). The average particle size of the nuclear particles (1) was 5 nm, and the sphericity was 1.1.
While holding the aqueous dispersion of the nuclear particles (1) at 60 ° C., 28.6 kg of an aqueous sodium silicate solution having a concentration of 0.75% by mass as SiO 2 and sodium aluminate having a concentration of 0.25% by mass as Al 2 O 3 28.6 kg of an aqueous solution was added over 16 hours to obtain a primary particle dispersion of a composite oxide (SiO 2 · Al 2 O 3). The pH of the reaction solution at this time was 11.1. The average particle size was 15 nm.
Then, 129.4 kg of a sodium silicate aqueous solution having a concentration of 0.75 mass% as SiO 2 and 43.12 kg of a sodium aluminate aqueous solution having a concentration of 0.25 mass% as Al 2 O 3 were added in 8 hours to cover the composite oxide. A dispersion of particles was obtained. At this time, the pH of the reaction solution was 11.0.
Then, it was washed with an ultrafiltration membrane to a solid content concentration of 13% by mass, and then filtered with a capsule filter having an opening of 1 μm to obtain a coated composite oxide particle (1) dispersion liquid. At this time, the average particle size was 22 nm.
1,125 g of pure water was added to 500 g of the dispersion liquid of the coated composite oxide particles (1), and concentrated hydrochloric acid (concentration: 35.5% by mass) was further added dropwise to adjust the pH to 1.0, and dealumination treatment was performed. Next, while adding 10 L of a hydrochloric acid aqueous solution having a pH of 3 and 5 L of pure water, the aluminum salt dissolved in the ultrafiltration membrane was separated and washed to obtain an aqueous dispersion of silica-based particles (1-1) having a solid content concentration of 20% by mass. It was.
Next, aqueous ammonia was added to the silica-based particle (1-1) dispersion to adjust the pH of the dispersion to 10.5, then aged at 80 ° C. for 11 hours, cooled to room temperature, and cations. Ion exchange for 3 hours using 400 g of exchange resin (Mitsubishi Chemical Co., Ltd .: Diaion SK1B), and then ion exchange for 3 hours using 200 g of anion exchange resin (Mitsubishi Chemical Co., Ltd .: Diaion SA20A). Then, using 200 g of a cation exchange resin (manufactured by Mitsubishi Chemical Corporation: Diaion SK1B), ion exchange was performed at 80 ° C. for 3 hours for washing, and silica-based particles (1-2) having a solid content concentration of 20% by mass were used. ) Was obtained.
Then, an alcohol dispersion of silica-based particles (1-2) having a solid content concentration of 20% by mass was prepared by substituting ethanol for the solvent using an ultrafiltration membrane.
Add 6 g of 3-methacryloxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Industry Co., Ltd .: KBM-503) to 100 g of an alcohol dispersion of silica-based particles (1-2) having a solid content concentration of 20% by mass, and at 50 ° C. The heat treatment was carried out for 36 hours, and an alcohol dispersion of silica-based particles (1) having a solid content concentration of 20% by mass was prepared by substituting the solvent with ethanol again using an ultrafiltration membrane.
Table 1 shows each preparation step of the silica-based particles (1). Table 2 shows the physical properties of the average particle size, hollowness, sphericity, number ratio of irregularly shaped particles, refractive index and void ratio of the silica-based particles (1). Each measurement was carried out by the method shown in "Forms for Carrying Out the Invention".
〈反射防止用透明被膜形成用塗料(1)の製造〉
シリカ系粒子(1)のアルコール分散液をエタノールで固形分濃度5質量%に希釈した分散液50gと、アクリル樹脂(ヒタロイド1007、日立化成(株)製)1.67gおよびイソプロパノールとn−ブタノールの1/1(質量比)混合溶媒52.6gとを充分に混合して透明被膜形成用塗料(1)を調製した。この透明被膜形成用塗料(1)について、表3に示す。
<Manufacturing of paint (1) for forming a transparent film for antireflection>
50 g of the dispersion liquid obtained by diluting the alcohol dispersion liquid of the silica-based particles (1) with ethanol to a solid content concentration of 5% by mass, 1.67 g of an acrylic resin (Hitaroid 1007, manufactured by Hitachi Chemical Co., Ltd.), isopropanol and n-butanol. A coating material (1) for forming a transparent film was prepared by sufficiently mixing 52.6 g of a 1/1 (mass ratio) mixed solvent. The coating material (1) for forming a transparent film is shown in Table 3.
〈ハードコート膜形成用塗布液の調製〉
シリカゾル分散液(日揮触媒化成(株)製;カタロイド SI−30;平均粒子径12nm、SiO2濃度40.5質量%、分散媒:イソプロパノ−ル、粒子屈折率1.46)100gにγ−メタアクリロオキシプロピルトリメトキシシラン1.88g(信越化学工業(株)製:KBM−503、SiO2濃度81.2質量%)を混合し超純水を3.1g添加し50℃で20時間攪拌して表面処理した12nmのシリカゾル分散液を得た(固形分濃度40.5質量%)。
その後、ロータリーエバポレーターでプロピレングリコールモノプロピルエーテル(PGME)に溶剤置換した(固形分濃度40.5質量%)。
ついで、この固形分濃度40.5質量%のシリカゾルのプロピレングリコールモノプロピルエーテル分散液51.85gと、ジヘキサエリスリトールトリアセテート(共栄社化学(株)製:DPE−6A)18.90g、と1.6−ヘキサンジオールジアクリレート(共栄社化学(株)製;ライトアクリレートSR−238F)2.10gとシリコーン系レベリング剤(楠本化成(株)製;ディスパロン1610)0.01gと光重合開始剤(チバジャパン(株)製:イルガキュア184、PGMEで固形分濃度10質量%に溶解)12.60gとPGME14.54gを充分に混合して固形分濃度42.0質量%のハードコート膜形成用塗布液を調製した。
<Preparation of coating liquid for forming hard coat film>
Silica sol dispersion (manufactured by JGC Catalysts and Chemicals Co., Ltd .; Cataloid SI-30; average particle diameter 12 nm, SiO 2 concentration 40.5% by mass, dispersion medium: isopropanol, particle refractive index 1.46) γ-meth 1.88 g of acrylooxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Industry Co., Ltd .: KBM-503, SiO 2 concentration 81.2% by mass) is mixed, 3.1 g of ultrapure water is added, and the mixture is stirred at 50 ° C. for 20 hours. A 12 nm silica sol dispersion was surface-treated (solid content concentration: 40.5% by mass).
Then, the solvent was replaced with propylene glycol monopropyl ether (PGME) by a rotary evaporator (solid content concentration: 40.5% by mass).
Next, 51.85 g of this propylene glycol monopropyl ether dispersion of silica sol having a solid content concentration of 40.5% by mass, and 18.90 g of dihexaerythritol triacetate (manufactured by Kyoeisha Chemical Co., Ltd .: DPE-6A), 1.6. -Hexanediol diacrylate (manufactured by Kyoeisha Chemical Co., Ltd .; light acrylate SR-238F) 2.10 g, silicone leveling agent (manufactured by Kusumoto Kasei Co., Ltd .; Disparon 1610) 0.01 g, and photopolymerization initiator (Ciba Japan (Ciba Japan) Manufactured by: Irgacure 184, dissolved in 10% by mass of solid content with PGME) 12.60 g and 14.54 g of PGME were sufficiently mixed to prepare a coating liquid for forming a hard coat film having a solid content of 42.0% by mass. ..
〈反射防止用透明被膜付基材(1)の製造〉
ハードコート膜形成用塗布液を、TACフィルム(パナック(株)製:FT−PB80UL−M、厚さ:80μm、屈折率:1.51)にバーコーター法(#18)で塗布し、80℃で120秒間乾燥した後、300mJ/cm2の紫外線を照射して硬化させてハードコート膜を形成した。ハードコート膜の膜厚は8μmであった。
ついで、反射防止用透明被膜形成用塗布液(1)をバーコーター法(#4)で塗布し、80℃で120秒間乾燥した後、N2雰囲気下で600mJ/cm2の紫外線を照射して硬化させて反射防止用透明被膜付基材(1)を作製した。このときの反射防止用透明被膜の膜厚は100nmであった。この反射防止用透明被膜付基材(1)の全光線透過率、ヘイズ、波長550nmの光線の反射率、被膜の屈折率、密着性および鉛筆硬度、耐擦傷性、白化、耐マジック性、耐水性、耐アルカリ性についての評価結果を表4に示す。全光線透過率およびヘイズは、ヘーズメーター(スガ試験機(株)製)、反射率は分光光度計(日本分光社、Ubest−55)により各々測定した。また、被膜の屈折率は、エリプソメーター(ULVAC社製、EMS−1)により測定した。
<Manufacturing of base material with transparent coating for antireflection (1)>
The coating liquid for forming a hard coat film is applied to a TAC film (manufactured by Panac Co., Ltd .: FT-PB80UL-M, thickness: 80 μm, refractive index: 1.51) by the bar coater method (# 18), and the temperature is 80 ° C. After drying for 120 seconds, a hard coat film was formed by irradiating with ultraviolet rays of 300 mJ / cm 2 and curing. The film thickness of the hard coat film was 8 μm.
Then, the reflection preventive transparent film-forming coating liquid (1) was coated with a bar coater method (# 4), and was dried for 120 seconds at 80 ° C., and irradiated with ultraviolet rays of 600 mJ / cm 2 under N 2 It was cured to prepare a base material (1) with a transparent film for antireflection. The film thickness of the antireflection transparent film at this time was 100 nm. Total light transmittance, haze, light reflectance of light having a wavelength of 550 nm, refractive index of the film, adhesion and pencil hardness, scratch resistance, whitening, magic resistance, and water resistance of the base material (1) with a transparent film for antireflection. Table 4 shows the evaluation results of the property and alkali resistance. The total light transmittance and haze were measured by a haze meter (manufactured by Suga Test Instruments Co., Ltd.), and the reflectance was measured by a spectrophotometer (JASCO Corporation, Ubest-55). The refractive index of the coating film was measured by an ellipsometer (EMS-1 manufactured by ULVAC, Inc.).
《密着性》
透明被膜付基材(1)の表面にナイフで縦横1mmの間隔で11本の平行な傷を付け100個の升目を作り、これにセロファンテープを接着し、次いで、セロファンテープを剥離したときに被膜が剥離せず残存している升目の数を、以下の3段階に分類することによって密着性を評価した。結果を表に示す。
残存升目の数90個以上 :◎
残存升目の数85〜89個:○
残存升目の数84個以下 :△
《Adhesion》
When 11 parallel scratches are made on the surface of the transparent coating base material (1) with a knife at intervals of 1 mm in length and width to make 100 squares, cellophane tape is adhered to the squares, and then the cellophane tape is peeled off. The adhesion was evaluated by classifying the number of squares in which the coating film did not peel off and remained in the following three stages. The results are shown in the table.
Number of remaining squares 90 or more: ◎
Number of remaining squares 85-89: ○
Number of remaining squares 84 or less: △
《鉛筆硬度》
鉛筆硬度は、JIS K 5400に準じて、鉛筆硬度試験器で測定した。即ち、透明被膜表面に対して45度の角度に鉛筆をセットし、所定の加重を負荷して一定速度で引っ張り、傷の有無を観察した。
"Pencil hardness"
The pencil hardness was measured with a pencil hardness tester according to JIS K 5400. That is, a pencil was set at an angle of 45 degrees with respect to the surface of the transparent coating film, a predetermined load was applied, and the pencil was pulled at a constant speed to observe the presence or absence of scratches.
《耐擦傷性の測定》
#0000スチールウールを用い、荷重1,000g/cm2で50回摺動し、膜の表面を目視観察し、以下の基準で評価し、結果を表に示した。
評価基準:
筋状の傷が認められない :◎
筋状の傷が僅かに認められる:○
筋状の傷が多数認められる :△
面が全体的に削られている :×
《Measurement of scratch resistance》
Using # 0000 steel wool, the film was slid 50 times under a load of 1,000 g / cm 2 , the surface of the film was visually observed, evaluated according to the following criteria, and the results are shown in the table.
Evaluation criteria:
No streaky scratches: ◎
Slight streaks are seen: ○
Many streaky scratches are observed: △
The entire surface has been scraped: ×
《白化の評価》
塗膜表面を斜め(約20°)から目視し、評価を以下の4段階で評価した。
評価基準:
白化が認められない :◎
若干の白化がある :○
一部白化している :△
全面的に白化している:×
<< Evaluation of bleaching >>
The surface of the coating film was visually observed from an angle (about 20 °), and the evaluation was evaluated in the following four stages.
Evaluation criteria:
No bleaching: ◎
There is some bleaching: ○
Partially whitened: △
Fully whitened: ×
《耐マジック性の評価》
塗膜表面に油性マジックで3cmの長さでラインを引き、1分間放置後、拭き取った際の跡を目視で確認。
評価基準:
マジック跡が見えない :◎
ほとんどマジック跡が見えない:○
マジック跡が一部見える :△
全面的にマジック跡が見える :×
《Evaluation of magic resistance》
Draw a line on the surface of the coating film with an oil-based magic to a length of 3 cm, leave it for 1 minute, and then visually check the traces when wiping it off.
Evaluation criteria:
I can't see the magic marks: ◎
Almost no magic marks can be seen: ○
Part of the magic mark can be seen: △
Magic marks can be seen on the entire surface: ×
《耐水性の評価》
塗膜表面にスポイドで純水を一滴たらし、3時間放置後に水滴を拭取り、水滴が存在していた場所に跡が残るかを目視で確認。
評価基準:
水滴跡が認められない :○
若干の水滴跡が認められる :△
水滴跡がはっきりと確認できる:×
<< Evaluation of water resistance >>
Drop a drop of pure water on the surface of the coating film with a dropper, leave it for 3 hours, wipe off the water droplets, and visually check if any traces remain where the water droplets were.
Evaluation criteria:
No traces of water drops: ○
Some water droplets are observed: △
Water droplets can be clearly seen: ×
《耐アルカリ性の評価》
塗膜表面にスポイドで1%NaOH水溶液を一滴たらし、1時間放置後に水滴を拭取り、水滴が存在していた場所に跡が残るかを目視で確認。
評価基準:
跡が認められない :○
若干の跡が認められる :△
跡がはっきりと確認できる:×
<< Evaluation of alkali resistance >>
Drop a drop of 1% NaOH aqueous solution on the surface of the coating film with a dropper, leave it for 1 hour, wipe off the water droplets, and visually check if any marks remain where the water droplets were.
Evaluation criteria:
No traces: ○
Some traces are observed: △
Traces can be clearly seen: ×
[実施例2]
〈シリカ系粒子(2)の調製〉
SiO2として濃度3.5質量%の珪酸ナトリウム水溶液1000gに陽イオン交換樹脂(三菱化学(株)製:ダイヤイオンSK1B)を300g加え、室温で1時間撹拌し、その後イオン交換樹脂を分離して、珪酸水溶液を得た。次に珪酸水溶液4.2g、純水62.5g、珪酸ナトリウム13.1gを混合し、70℃で1時間熟成し、続いて70℃に保持したまま、珪酸水溶液141.4gを6時間かけて添加して、平均粒子径3nmの種粒子(2)を得た。1.1質量%の種粒子(2)水分散液1.0kgに1質量%の水酸化ナトリウムを添加してpHを11.0に調整した。その後、60℃に加温して30分程度保持し、核粒子(2)の水分散液を得た。この核粒子(2)の平均粒子径は3nm、真球度は1.2であった。
核粒子(2)の水分散液を60℃で保持しながら、SiO2として濃度0.75質量%の珪酸ナトリウム水溶液4.0kgとAl2O3としての濃度0.25質量%のアルミン酸ナトリウム水溶液4.0kgを18時間で添加して、複合酸化物(SiO2・Al2O3)の一次粒子分散液を得た。このときの反応液のpHは11.0であった。また、平均粒子径は5nmであった。
ついで、SiO2として濃度0.75質量%の珪酸ナトリウム水溶液78.4kgとAl2O3としての濃度0.25質量%のアルミン酸ナトリウム水溶液26.1kgを8時間で添加して被覆複合酸化物粒子の分散液を得た。このとき、反応液のpHは11.0であった。
ついで、限外濾過膜で洗浄して固形分濃度13質量%にした後、目開き1μmのカプセルフィルターで濾過し被覆複合酸化物粒子(2)分散液を得た。このとき、平均粒子径は12nmであった。
その後、被覆複合酸化物粒子(2)を使用した以外は実施例1と同様にして、シリカ系粒子(2)を得た。
シリカ系粒子(2)を使用した以外は実施例1と同様にして、透明被膜形成用塗料(2)、反射防止用透明被膜付基材(2)を作製した。
[Example 2]
<Preparation of silica-based particles (2)>
300 g of a cation exchange resin (manufactured by Mitsubishi Chemical Corporation: Diaion SK1B) was added to 1000 g of an aqueous sodium silicate solution having a concentration of 3.5 mass% as SiO 2, and the mixture was stirred at room temperature for 1 hour, and then the ion exchange resin was separated. , Aqueous silicate solution was obtained. Next, 4.2 g of an aqueous silicic acid solution, 62.5 g of pure water, and 13.1 g of sodium silicate were mixed and aged at 70 ° C. for 1 hour, and then 141.4 g of an aqueous silicic acid solution was added over 6 hours while being maintained at 70 ° C. The addition gave seed particles (2) having an average particle diameter of 3 nm. 1.1% by mass of seed particles (2) The pH was adjusted to 11.0 by adding 1% by mass of sodium hydroxide to 1.0 kg of the aqueous dispersion. Then, the mixture was heated to 60 ° C. and held for about 30 minutes to obtain an aqueous dispersion of the nuclear particles (2). The average particle size of the nuclear particles (2) was 3 nm, and the sphericity was 1.2.
While holding the aqueous dispersion of the nuclear particles (2) at 60 ° C., 4.0 kg of an aqueous sodium silicate solution having a concentration of 0.75% by mass as SiO 2 and sodium aluminate having a concentration of 0.25% by mass as Al 2 O 3 4.0 kg of an aqueous solution was added in 18 hours to obtain a primary particle dispersion of a composite oxide (SiO 2 · Al 2 O 3). The pH of the reaction solution at this time was 11.0. The average particle size was 5 nm.
Then, 78.4 kg of a sodium silicate aqueous solution having a concentration of 0.75 mass% as SiO 2 and 26.1 kg of a sodium aluminate aqueous solution having a concentration of 0.25 mass% as Al 2 O 3 were added in 8 hours to cover the composite oxide. A dispersion of particles was obtained. At this time, the pH of the reaction solution was 11.0.
Then, it was washed with an ultrafiltration membrane to a solid content concentration of 13% by mass, and then filtered with a capsule filter having an opening of 1 μm to obtain a coated composite oxide particle (2) dispersion. At this time, the average particle size was 12 nm.
Then, silica-based particles (2) were obtained in the same manner as in Example 1 except that the coated composite oxide particles (2) were used.
A coating material for forming a transparent film (2) and a base material with a transparent film for antireflection (2) were produced in the same manner as in Example 1 except that silica-based particles (2) were used.
[実施例3]
〈シリカ系粒子(3)の調製〉
種粒子の水分散液(日揮触媒化成(株)製:SI−30、SiO2濃度30.5質量%)36.1gに純水963.9gを加えた後、1質量%の水酸化ナトリウムを添加してpHを11.0に調整した。その後、60℃に加温して30分程度保持し、核粒子(3)の水分散液を得た。この核粒子(3)の平均粒子径は12nm、真球度は1.0であった。
核粒子(3)の水分散液を60℃で保持しながら、SiO2として濃度0.75質量%の珪酸ナトリウム水溶液7.7kgとAl2O3としての濃度0.25質量%のアルミン酸ナトリウム水溶液7.7kgを18時間で添加して、複合酸化物(SiO2・Al2O3)の一次粒子分散液を得た。このときの反応液のpHは11.2であった。また、平均粒子径は24nmであった。
ついで、SiO2として濃度0.75質量%の珪酸ナトリウム水溶液38.3kgとAl2O3としての濃度0.25質量%のアルミン酸ナトリウム水溶液12.8kgを8時間で添加して被覆複合酸化物粒子の分散液を得た。このとき、反応液のpHは11.0であった。
ついで、限外濾過膜で洗浄して固形分濃度13質量%にした後、目開き1μmのカプセルフィルターで濾過し被覆複合酸化物粒子(3)分散液を得た。このとき、平均粒子径は12nmであった。
その後、被覆複合酸化物粒子(3)を使用した以外は実施例1と同様にして、シリカ系粒子(3)を得た。
シリカ系粒子(3)を使用した以外は実施例1と同様にして、透明被膜形成用塗料(3)、反射防止用透明被膜付基材(3)を作製した。
[Example 3]
<Preparation of silica-based particles (3)>
After adding 963.9 g of pure water to 36.1 g of an aqueous dispersion of seed particles (manufactured by JGC Catalysts and Chemicals Co., Ltd .: SI-30, SiO 2 concentration 30.5% by mass), 1% by mass of sodium hydroxide was added. The pH was adjusted to 11.0 by addition. Then, the mixture was heated to 60 ° C. and held for about 30 minutes to obtain an aqueous dispersion of the nuclear particles (3). The average particle size of the nuclear particles (3) was 12 nm, and the sphericity was 1.0.
While holding the aqueous dispersion of the nuclear particles (3) at 60 ° C., 7.7 kg of an aqueous solution of sodium silicate having a concentration of 0.75% by mass as SiO 2 and sodium aluminate having a concentration of 0.25 mass% as Al 2 O 3 7.7 kg of an aqueous solution was added in 18 hours to obtain a primary particle dispersion of a composite oxide (SiO 2 · Al 2 O 3). The pH of the reaction solution at this time was 11.2. The average particle size was 24 nm.
Then, 38.3 kg of a sodium silicate aqueous solution having a concentration of 0.75 mass% as SiO 2 and 12.8 kg of a sodium aluminate aqueous solution having a concentration of 0.25 mass% as Al 2 O 3 were added in 8 hours to cover the composite oxide. A dispersion of particles was obtained. At this time, the pH of the reaction solution was 11.0.
Then, it was washed with an ultrafiltration membrane to a solid content concentration of 13% by mass, and then filtered with a capsule filter having an opening of 1 μm to obtain a coated composite oxide particle (3) dispersion liquid. At this time, the average particle size was 12 nm.
Then, silica-based particles (3) were obtained in the same manner as in Example 1 except that the coated composite oxide particles (3) were used.
A coating material for forming a transparent film (3) and a base material with a transparent film for antireflection (3) were produced in the same manner as in Example 1 except that silica-based particles (3) were used.
[実施例4]
〈シリカ系粒子(4)の調製〉
種粒子の水分散液(日揮触媒化成(株)製:SI−550、SiO2濃度20.5質量%)53.6gに純水946.4gを加えた後、1質量%の水酸化ナトリウムを添加してpHを11.0に調整した。その後、60℃に加温して30分程度保持し、核粒子(4)の水分散液を得た。この核粒子(4)の平均粒子径は5nm、真球度は1.0であった。
核粒子(4)の水分散液を60℃で保持しながら、SiO2として濃度0.75質量%の珪酸ナトリウム水溶液28.6kgとAl2O3としての濃度0.25質量%のアルミン酸ナトリウム水溶液28.6kgを18時間で添加して、複合酸化物(SiO2・Al2O3)の一次粒子分散液を得た。このときの反応液のpHは11.2であった。また、平均粒子径は15nmであった。
ついで、SiO2として濃度0.75質量%の珪酸ナトリウム水溶液141.6kgとAl2O3としての濃度0.25質量%のアルミン酸ナトリウム水溶液75.0kgを8時間で添加して被覆複合酸化物粒子の分散液を得た。このとき、反応液のpHは11.0であった。
ついで、限外濾過膜で洗浄して固形分濃度13質量%にした後、目開き1μmのカプセルフィルターで濾過し被覆複合酸化物粒子(4)分散液を得た。このとき、平均粒子径は26nmであった。
その後、被覆複合酸化物粒子(4)を使用した以外は実施例1と同様にして、シリカ系粒子(4)を得た。
シリカ系粒子(4)を使用した以外は実施例1と同様にして、透明被膜形成用塗料(4)、反射防止用透明被膜付基材(4)を作製した。
[Example 4]
<Preparation of silica-based particles (4)>
After adding 946.4 g of pure water to 53.6 g of an aqueous dispersion of seed particles (manufactured by JGC Catalysts and Chemicals Co., Ltd .: SI-550, SiO 2 concentration 20.5% by mass), 1% by mass of sodium hydroxide was added. The pH was adjusted to 11.0 by addition. Then, the mixture was heated to 60 ° C. and held for about 30 minutes to obtain an aqueous dispersion of nuclear particles (4). The average particle size of the nuclear particles (4) was 5 nm, and the sphericity was 1.0.
While holding the aqueous dispersion of the nuclear particles (4) at 60 ° C., 28.6 kg of an aqueous sodium silicate solution having a concentration of 0.75% by mass as SiO 2 and sodium aluminate having a concentration of 0.25% by mass as Al 2 O 3 28.6 kg of an aqueous solution was added in 18 hours to obtain a primary particle dispersion of a composite oxide (SiO 2 · Al 2 O 3). The pH of the reaction solution at this time was 11.2. The average particle size was 15 nm.
Then, 141.6 kg of an aqueous sodium silicate solution having a concentration of 0.75% by mass as SiO 2 and 75.0 kg of an aqueous solution of sodium aluminate having a concentration of 0.25% by mass as Al 2 O 3 were added in 8 hours to cover the composite oxide. A dispersion of particles was obtained. At this time, the pH of the reaction solution was 11.0.
Then, it was washed with an ultrafiltration membrane to a solid content concentration of 13% by mass, and then filtered with a capsule filter having an opening of 1 μm to obtain a coated composite oxide particle (4) dispersion. At this time, the average particle size was 26 nm.
Then, silica-based particles (4) were obtained in the same manner as in Example 1 except that the coated composite oxide particles (4) were used.
A coating material for forming a transparent film (4) and a base material with a transparent film for antireflection (4) were produced in the same manner as in Example 1 except that silica-based particles (4) were used.
[実施例5]
〈シリカ系粒子(5)の調製〉
種粒子の水分散液(日揮触媒化成(株)製:SI−550、SiO2濃度20.5質量%)53.6gに純水946.4gを加えた後、1質量%の水酸化ナトリウムを添加してpHを11.0に調整した。その後、80℃に加温して30分程度保持し、核粒子(5)の水分散液を得た。この核粒子(5)の平均粒子径は5nm、真球度は1.4であった。
核粒子(5)を用いた以外は実施例1と同様にして、シリカ系粒子(5)を得た。
シリカ系粒子(5)を使用した以外は実施例1と同様にして、透明被膜形成用塗料(5)、反射防止用透明被膜付基材(4)を作製した。
[Example 5]
<Preparation of silica-based particles (5)>
After adding 946.4 g of pure water to 53.6 g of an aqueous dispersion of seed particles (manufactured by JGC Catalysts and Chemicals Co., Ltd .: SI-550, SiO 2 concentration 20.5% by mass), 1% by mass of sodium hydroxide was added. The pH was adjusted to 11.0 by addition. Then, the mixture was heated to 80 ° C. and held for about 30 minutes to obtain an aqueous dispersion of nuclear particles (5). The average particle size of the nuclear particles (5) was 5 nm, and the sphericity was 1.4.
Silica-based particles (5) were obtained in the same manner as in Example 1 except that the nuclear particles (5) were used.
A coating material for forming a transparent film (5) and a base material with a transparent film for antireflection (4) were produced in the same manner as in Example 1 except that silica-based particles (5) were used.
[実施例6]
〈シリカ系粒子(6)の調製〉
種粒子の水分散液(日揮触媒化成(株)製:SI−550、SiO2濃度20.5質量%)53.6gに純水946.4gを加えた後、1質量%の水酸化ナトリウムを添加してpHを11.0に調整した。その後、60℃に加温して30分程度保持し、核粒子(6)の水分散液を得た。この核粒子(6)の平均粒子径は5nm、真球度は1.0であった。
この核粒子(6)の水分散液を60℃で保持しながら、SiO2として濃度0.75質量%の珪酸ナトリウム水溶液5.3kgとAl2O3としての濃度0.25質量%のアルミン酸ナトリウム水溶液5.3kgを18時間で添加して、複合酸化物(SiO2・Al2O3)の一次粒子分散液を得た。このときの反応液のpHは11.2であった。また、平均粒子径は9nmであった。
ついで、SiO2として濃度0.75質量%の珪酸ナトリウム水溶液148.6kgとAl2O3としての濃度0.25質量%のアルミン酸ナトリウム水溶液78.7kgを8時間で添加して被覆複合酸化物粒子の分散液を得た。このとき、反応液のpHは11.0であった。
ついで、限外濾過膜で洗浄して固形分濃度13質量%にした後、目開き1μmのカプセルフィルターで濾過し被覆複合酸化物粒子(6)分散液を得た。このとき、平均粒子径は26nmであった。
その後、被覆複合酸化物粒子(6)を使用した以外は実施例1と同様にして、シリカ系粒子(6)を得た。
シリカ系粒子(6)を使用した以外は実施例1と同様にして、透明被膜形成用塗料(6)、反射防止用透明被膜付基材(6)を作製した。
[Example 6]
<Preparation of silica-based particles (6)>
After adding 946.4 g of pure water to 53.6 g of an aqueous dispersion of seed particles (manufactured by JGC Catalysts and Chemicals Co., Ltd .: SI-550, SiO 2 concentration 20.5% by mass), 1% by mass of sodium hydroxide was added. The pH was adjusted to 11.0 by addition. Then, the mixture was heated to 60 ° C. and held for about 30 minutes to obtain an aqueous dispersion of nuclear particles (6). The average particle size of the nuclear particles (6) was 5 nm, and the sphericity was 1.0.
While holding the aqueous dispersion of the nuclear particles (6) at 60 ° C., 5.3 kg of an aqueous sodium silicate solution having a concentration of 0.75 mass% as SiO 2 and aluminate having a concentration of 0.25 mass% as Al 2 O 3 5.3 kg of an aqueous sodium solution was added over 18 hours to obtain a primary particle dispersion of a composite oxide (SiO 2 , Al 2 O 3). The pH of the reaction solution at this time was 11.2. The average particle size was 9 nm.
Then, 148.6 kg of a sodium silicate aqueous solution having a concentration of 0.75 mass% as SiO 2 and 78.7 kg of a sodium aluminate aqueous solution having a concentration of 0.25 mass% as Al 2 O 3 were added in 8 hours to cover the composite oxide. A dispersion of particles was obtained. At this time, the pH of the reaction solution was 11.0.
Then, it was washed with an ultrafiltration membrane to a solid content concentration of 13% by mass, and then filtered with a capsule filter having an opening of 1 μm to obtain a coated composite oxide particle (6) dispersion. At this time, the average particle size was 26 nm.
Then, silica-based particles (6) were obtained in the same manner as in Example 1 except that the coated composite oxide particles (6) were used.
A coating material for forming a transparent film (6) and a base material with a transparent film for antireflection (6) were produced in the same manner as in Example 1 except that silica-based particles (6) were used.
[実施例7]
〈シリカ系粒子(7)の調製〉
種粒子の水分散液(日揮触媒化成(株)製:SI−550、SiO2濃度20.5質量%)53.6gに純水946.4gを加えた後、1質量%の水酸化ナトリウムを添加してpHを11.0に調整した。その後、60℃に加温して30分程度保持し、核粒子(7)の水分散液を得た。 この核粒子(7)の平均粒子径は5nm、真球度は1.0であった。
核粒子(7)の水分散液を60℃で保持しながら、SiO2として濃度0.75質量%の珪酸ナトリウム水溶液236.5kgとAl2O3としての濃度0.25質量%のアルミン酸ナトリウム水溶液236.5kgを18時間で添加して、複合酸化物(SiO2・Al2O3)の一次粒子分散液を得た。このときの反応液のpHは11.2であった。また、平均粒子径は30nmであった。
ついで、SiO2として濃度0.75質量%の珪酸ナトリウム水溶液369.0kgとAl2O3としての濃度0.25質量%のアルミン酸ナトリウム水溶液195.4kgを8時間で添加して被覆複合酸化物粒子の分散液を得た。このとき、反応液のpHは11.4であった。
ついで、限外濾過膜で洗浄して固形分濃度13質量%にした後、目開き1μmのカプセルフィルターで濾過し被覆複合酸化物粒子(7)分散液を得た。このとき、平均粒子径は40nmであった。
その後、被覆複合酸化物粒子(7)を使用した以外は実施例1と同様にして、シリカ系粒子(7)を得た。
シリカ系粒子(7)を使用した以外は実施例1と同様にして、透明被膜形成用塗料(7)、反射防止用透明被膜付基材(7)を作製した。
[Example 7]
<Preparation of silica-based particles (7)>
After adding 946.4 g of pure water to 53.6 g of an aqueous dispersion of seed particles (manufactured by JGC Catalysts and Chemicals Co., Ltd .: SI-550, SiO 2 concentration 20.5% by mass), 1% by mass of sodium hydroxide was added. The pH was adjusted to 11.0 by addition. Then, the mixture was heated to 60 ° C. and held for about 30 minutes to obtain an aqueous dispersion of nuclear particles (7). The average particle size of the nuclear particles (7) was 5 nm, and the sphericity was 1.0.
While holding the aqueous dispersion of the nuclear particles (7) at 60 ° C., 236.5 kg of an aqueous sodium silicate solution having a concentration of 0.75% by mass as SiO 2 and 0.25% by mass of sodium aluminate as Al 2 O 3 236.5 kg of an aqueous solution was added in 18 hours to obtain a primary particle dispersion of a composite oxide (SiO 2 · Al 2 O 3). The pH of the reaction solution at this time was 11.2. The average particle size was 30 nm.
Then, 369.0 kg of a sodium silicate aqueous solution having a concentration of 0.75 mass% as SiO 2 and 195.4 kg of an aqueous sodium aluminate solution having a concentration of 0.25 mass% as Al 2 O 3 were added in 8 hours to cover the composite oxide. A dispersion of particles was obtained. At this time, the pH of the reaction solution was 11.4.
Then, it was washed with an ultrafiltration membrane to a solid content concentration of 13% by mass, and then filtered with a capsule filter having an opening of 1 μm to obtain a coated composite oxide particle (7) dispersion. At this time, the average particle size was 40 nm.
Then, silica-based particles (7) were obtained in the same manner as in Example 1 except that the coated composite oxide particles (7) were used.
A coating material for forming a transparent film (7) and a base material with a transparent film for antireflection (7) were produced in the same manner as in Example 1 except that silica-based particles (7) were used.
[実施例8]
〈シリカ系粒子(8)の調製〉
種粒子の水分散液(日揮触媒化成(株)製:SI−30、SiO2濃度30.5質量%)36.1gに純水963.9gを加えた後、1質量%の水酸化ナトリウムを添加してpHを12.5に調整した。その後、95℃に加温して30分程度保持し、核粒子(8)の水分散液を得た。この核粒子(8)の平均粒子径は12nm、真球度は1.3であった。
その後、核粒子(8)を使用した以外は実施例3と同様にして、シリカ系粒子(8)を得た。
シリカ系粒子(8)を使用した以外は実施例1と同様にして、透明被膜形成用塗料(8)、反射防止用透明被膜付基材(8)を作製した。
[Example 8]
<Preparation of silica-based particles (8)>
After adding 963.9 g of pure water to 36.1 g of an aqueous dispersion of seed particles (manufactured by JGC Catalysts and Chemicals Co., Ltd .: SI-30, SiO 2 concentration 30.5% by mass), 1% by mass of sodium hydroxide was added. Addition was added to adjust the pH to 12.5. Then, the mixture was heated to 95 ° C. and held for about 30 minutes to obtain an aqueous dispersion of nuclear particles (8). The average particle size of the nuclear particles (8) was 12 nm, and the sphericity was 1.3.
Then, silica-based particles (8) were obtained in the same manner as in Example 3 except that the nuclear particles (8) were used.
A coating material for forming a transparent film (8) and a base material with a transparent film for antireflection (8) were produced in the same manner as in Example 1 except that silica-based particles (8) were used.
[比較例1]
〈シリカ系粒子(R1)の調製〉
種粒子の水分散液(日揮触媒化成(株)製:SI−550、SiO2濃度20.5質量%)53.6gに純水946.4gを加えた後、1質量%の水酸化ナトリウムを添加してpHを12.5に調整した。その後、95℃に加温して30分程度保持し、核粒子(R1)の水分散液を得た。この核粒子(R1)の平均粒子径は5nm、真球度は1.8であった。
核粒子(R1)を用いた以外は実施例1と同様にして、シリカ系粒子(R1)を得た。
シリカ系粒子(R1)を使用した以外は実施例1と同様にして、透明被膜形成用塗料(R1)、反射防止用透明被膜付基材(R1)を作製した。
[Comparative Example 1]
<Preparation of silica-based particles (R1)>
After adding 946.4 g of pure water to 53.6 g of an aqueous dispersion of seed particles (manufactured by JGC Catalysts and Chemicals Co., Ltd .: SI-550, SiO 2 concentration 20.5% by mass), 1% by mass of sodium hydroxide was added. Addition was made to adjust the pH to 12.5. Then, the mixture was heated to 95 ° C. and held for about 30 minutes to obtain an aqueous dispersion of nuclear particles (R1). The average particle size of the nuclear particles (R1) was 5 nm, and the sphericity was 1.8.
Silica-based particles (R1) were obtained in the same manner as in Example 1 except that the nuclear particles (R1) were used.
A coating material for forming a transparent film (R1) and a base material with a transparent film for antireflection (R1) were produced in the same manner as in Example 1 except that silica-based particles (R1) were used.
[参考例1]
〈シリカ系粒子(E1)の調製〉
種粒子の水分散液(日揮触媒化成(株)製:SI−550、SiO2濃度20.5質量%)53.6gに純水946.4gを加えた後、1質量%の水酸化ナトリウムを添加してpHを11.0に調整した。その後、60℃に加温して30分程度保持し、核粒子(E1)の水分散液を得た。この核粒子(E1)の平均粒子径は5nm、真球度は1.0であった。
核粒子(E1)の水分散液を60℃で保持しながら、SiO2として濃度0.75質量%の珪酸ナトリウム水溶液562.1kgとAl2O3としての濃度0.25質量%のアルミン酸ナトリウム水溶液562.1kgを18時間で添加して、複合酸化物(SiO2・Al2O3)の一次粒子分散液を得た。このときの反応液のpHは11.2であった。また、平均粒子径は40nmであった。
ついで、SiO2として濃度0.75質量%の珪酸ナトリウム水溶液1021.0kgとAl2O3としての濃度0.25質量%のアルミン酸ナトリウム水溶液540.5kgを8時間で添加して被覆複合酸化物粒子の分散液を得た。このとき、反応液のpHは11.5であった。
ついで、限外濾過膜で洗浄して固形分濃度13質量%にした後、目開き1μmのカプセルフィルターで濾過し被覆複合酸化物粒子(E1)分散液を得た。このとき、平均粒子径は40nmであった。
その後、被覆複合酸化物粒子(E1)を使用した以外は実施例1と同様にして、シリカ系粒子(E1)を得た。
シリカ系粒子(E1)を使用した以外は実施例1と同様にして、透明被膜形成用塗料(E1)、反射防止用透明被膜付基材(E1)を作製した。
[Reference example 1]
<Preparation of silica-based particles (E1)>
After adding 946.4 g of pure water to 53.6 g of an aqueous dispersion of seed particles (manufactured by JGC Catalysts and Chemicals Co., Ltd .: SI-550, SiO 2 concentration 20.5% by mass), 1% by mass of sodium hydroxide was added. The pH was adjusted to 11.0 by addition. Then, the mixture was heated to 60 ° C. and held for about 30 minutes to obtain an aqueous dispersion of nuclear particles (E1). The average particle size of the nuclear particles (E1) was 5 nm, and the sphericity was 1.0.
While holding the aqueous dispersion of the nuclear particles (E1) at 60 ° C., 562.1 kg of an aqueous sodium silicate solution having a concentration of 0.75 mass% as SiO 2 and sodium aluminate having a concentration of 0.25 mass% as Al 2 O 3 562.1 kg of an aqueous solution was added in 18 hours to obtain a primary particle dispersion of a composite oxide (SiO 2 · Al 2 O 3). The pH of the reaction solution at this time was 11.2. The average particle size was 40 nm.
Then, coated complex oxide was added as SiO 2 concentration 0.25 wt% of an aqueous sodium aluminate solution 540.5kg as concentration 0.75 wt% aqueous solution of sodium silicate 1021.0kg and Al 2 O 3 at 8 hours A dispersion of particles was obtained. At this time, the pH of the reaction solution was 11.5.
Then, it was washed with an ultrafiltration membrane to a solid content concentration of 13% by mass, and then filtered with a capsule filter having an opening of 1 μm to obtain a coated composite oxide particle (E1) dispersion. At this time, the average particle size was 40 nm.
Then, silica-based particles (E1) were obtained in the same manner as in Example 1 except that the coated composite oxide particles (E1) were used.
A coating material for forming a transparent film (E1) and a base material with a transparent film for antireflection (E1) were produced in the same manner as in Example 1 except that silica-based particles (E1) were used.
Claims (10)
温度70℃以下及びpH11.5以下の少なくとも一方に保持された、平均粒子径が3〜25nm、真球度が1.0〜1.5のシリカの核粒子を含む分散液に、添加の開始から終了までの前記分散液の固形分濃度を0.1〜0.9質量%に維持して、かつ前記核粒子から複合酸化物粒子への粒子成長速度を0.1〜10nm/時間で行うように、珪酸塩水溶液及び酸性珪酸液の少なくとも一方と、珪素を含まない無機化合物水溶液とを、同時に添加して複合酸化物粒子を含む分散液を調製する第1工程と、
前記第1工程で得た複合酸化物粒子を含む分散液に、シリカ源を添加して、シリカを含む層で被覆された被覆複合酸化物粒子を含む分散液を調製する第2工程と、
前記第2工程で得た被覆複合酸化物粒子を含む分散液に酸を加えて、被覆複合酸化物粒子に含まれる前記無機化合物に由来する元素を除去する第3工程と、
前記第3工程で得た粒子を含む分散液に、アルカリ条件下で水熱処理を行う第4工程と、
を有することを特徴とするシリカ系粒子分散液の製造方法。 The average particle size is 5 to 40 nm , the sphericity is 1.0 to 1.5, the porosity is 15 to 50% , and the ratio of the number of hollow particles to the total number of hollow particles and solid particles (hollow). A method for producing a dispersion of silica-based particles having a porosity of 70% or more.
Start of addition to a dispersion containing silica nuclei having an average particle size of 3 to 25 nm and a sphericity of 1.0 to 1.5, which are maintained at a temperature of 70 ° C. or lower and a pH of 11.5 or lower. The solid content concentration of the dispersion liquid from to the end is maintained at 0.1 to 0.9% by mass, and the particle growth rate from the nuclear particles to the composite oxide particles is performed at 0.1 to 10 nm / hour. As described above, the first step of preparing a dispersion liquid containing composite oxide particles by simultaneously adding at least one of a silicate aqueous solution and an acidic silicic acid solution and an inorganic compound aqueous solution containing no silicon.
A second step of adding a silica source to the dispersion liquid containing the composite oxide particles obtained in the first step to prepare a dispersion liquid containing the coated composite oxide particles coated with a layer containing silica.
The third step of adding an acid to the dispersion liquid containing the coated composite oxide particles obtained in the second step to remove the element derived from the inorganic compound contained in the coated composite oxide particles, and the third step.
The fourth step of hydrothermally treating the dispersion liquid containing the particles obtained in the third step under alkaline conditions, and
A method for producing a silica-based particle dispersion liquid.
前記マトリックス形成成分の濃度が0.1〜36質量%であり、
全固形分濃度が1〜60質量%であることを特徴とする請求項8に記載の透明被膜形成用塗布液。 The concentration of the silica-based particles is 0.4 to 54% by mass as a solid content.
The concentration of the matrix-forming component is 0.1 to 36% by mass, and the concentration is 0.1 to 36% by mass.
The coating liquid for forming a transparent film according to claim 8 , wherein the total solid content concentration is 1 to 60% by mass.
前記透明被膜中のシリカ系粒子の含有量が20〜80質量%であることを特徴とする透明被膜付基材。 A base material with a transparent coating having a base material and a transparent coating film formed on the base material and containing the silica-based particles according to claim 6 or 7 and a matrix component.
A base material with a transparent coating, wherein the content of silica-based particles in the transparent coating is 20 to 80% by mass.
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