JP5159265B2 - Substrate with transparent film and coating liquid for forming transparent film - Google Patents

Substrate with transparent film and coating liquid for forming transparent film Download PDF

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JP5159265B2
JP5159265B2 JP2007297949A JP2007297949A JP5159265B2 JP 5159265 B2 JP5159265 B2 JP 5159265B2 JP 2007297949 A JP2007297949 A JP 2007297949A JP 2007297949 A JP2007297949 A JP 2007297949A JP 5159265 B2 JP5159265 B2 JP 5159265B2
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silica
transparent film
range
transparent
coating
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JP2009119780A (en
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良 村口
光章 熊澤
政幸 松田
昭 中島
俊晴 平井
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JGC Catalysts and Chemicals Ltd
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Catalysts and Chemicals Industries Co Ltd
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本発明は、反射防止性能および防眩性能に優れた凹凸のある透明被膜が形成された透明被膜付基材および該透明被膜を形成するための透明被膜形成用塗布液とに関する。 The present invention relates to a substrate with a transparent film on which an uneven transparent film excellent in antireflection performance and antiglare performance is formed, and a coating liquid for forming a transparent film for forming the transparent film.

従来より、ガラス、プラスチックシート、プラスチックレンズ等の基材表面の反射を防止するため、基材表面に反射防止膜を形成することが知られており、たとえば、コート法、蒸着法、CVD法等によって、フッ素樹脂、フッ化マグネシウムのような低屈折率の物質の被膜をガラスやプラスチックの基材表面に形成したり、シリカ微粒子等の低屈折率微粒子を含む塗布液を基材表面に塗布して、反射防止被膜を形成する方法が知られている(たとえば、特開平7−133105号公報(特許文献1)など参照)。このとき、反射防止性能を高めるために反射防止被膜の下層に高屈折率の微粒子等を含む高屈折率膜を形成することも知られている。   Conventionally, it has been known to form an antireflection film on the surface of a substrate in order to prevent reflection on the surface of the substrate such as glass, plastic sheet, and plastic lens. For example, a coating method, a vapor deposition method, a CVD method, etc. To form a coating of a low refractive index substance such as fluororesin or magnesium fluoride on the surface of a glass or plastic substrate, or apply a coating solution containing low refractive index fine particles such as silica fine particles to the surface of the substrate. Thus, a method for forming an antireflection coating is known (see, for example, JP-A-7-133105 (Patent Document 1) and the like). At this time, in order to improve the antireflection performance, it is also known to form a high refractive index film containing fine particles of high refractive index under the antireflection coating.

さらに、前記表示装置等では、防眩性(アンチグレア性ということがある)を付与するために表面に凹凸を形成することも知られている。(特開2002−169001号公報(特許文献2)、特開2002−71904号公報(特許文献3)、特開2001−281411号公報(特許文献4)、特開2001−34350号公報(特許文献5))
また、本願発明者等は、特開2003−12965号公報(特許文献6)において、平均粒子径が異なり、粒子径の小さい導電性微粒子と粒子径の大きい低屈折率微粒子の異なる2種の微粒子を含む塗布液を用いることによって、1回の塗布で反射防止性能に優れた導電性被膜が形成できることを提案している。
特開平7−133105号公報 特開2002−169001号公報 特開2002−71904号公報 特開2001−281411号公報 特開2001−34350号公報 特開2003−12965号公報
Further, in the display device or the like, it is also known to form irregularities on the surface in order to impart antiglare properties (sometimes referred to as antiglare properties). (JP 2002-169001 (Patent Document 2), JP 2002-71904 (Patent Document 3), JP 2001-281411 (Patent Document 4), JP 2001-34350 (Patent Document) 5))
Further, the inventors of the present application disclosed in Japanese Patent Application Laid-Open No. 2003-12965 (Patent Document 6) two kinds of fine particles having different average particle diameters, different conductive fine particles having a small particle size and low refractive index fine particles having a large particle size. It has been proposed that a conductive film excellent in antireflection performance can be formed by a single application by using a coating solution containing.
JP 7-133105 A JP 2002-169001 A JP 2002-71904 A JP 2001-281411 A JP 2001-34350 A JP 2003-12965 A

しかしながら、特許文献1〜5に記載のような従来の多層膜を形成する方法では、塗料を塗布し、乾燥し、必要に応じて硬化させる工程を各塗料について行う必要があり、各膜間の密着性が不充分であったり、生産性、経済性等に問題があった。また、特許文献6の方法では防眩性能がないため明所コントラストが低く、表示装置に用いた場合、表示性能が不充分であった。   However, in the conventional method of forming a multilayer film as described in Patent Documents 1 to 5, it is necessary to perform a process of applying a paint, drying, and curing as necessary, for each paint, Adhesion was insufficient, and there were problems with productivity and economy. Further, the method of Patent Document 6 has low anti-glare performance because of no anti-glare performance, and when used in a display device, the display performance is insufficient.

本発明者らは、このような問題点に鑑み鋭意検討した結果、表面に凹凸を形成できる程度に平均粒子径の大きな無機酸化物微粒子と、平均粒子径の小さい低屈折率のシリカ系中空微粒子(B)とを含む透明被膜は防眩性能を有するとともに反射防止性能に優れているこ
とを見出して本発明を完成するに至った。
As a result of intensive studies in view of such problems, the present inventors have found that inorganic oxide fine particles having a large average particle diameter to such an extent that irregularities can be formed on the surface, and low refractive index silica-based hollow fine particles having a small average particle diameter. The transparent film containing (B) was found to have antiglare performance and excellent antireflection performance, and the present invention was completed.

本発明の構成は以下の通りである。
[1]表面に凹凸を有する透明被膜が形成された透明被膜付基材であって、
該透明被膜が、平均粒子径(DpA)が0.5〜5μmの範囲にある金属酸化物粒子(A)と、
平均粒子径(DpB)が5〜200nmの範囲にあり、屈折率が1.10〜1.40の範囲
にあるシリカ系中空微粒子(B)とマトリックス成分とからなる透明被膜付基材。
[2]前記金属酸化物粒子(A)が、屈折率が1.10〜1.40の範囲にあるシリカ系中空微粒子である[1]の透明被膜付基材。
[3]前記透明被膜の平均膜厚が1μm〜10μmの範囲にあり、
透明被膜の凹凸は、凸部の平均高さ(T凸)と凹部の平均高さ(T凹)との差(T凸)−(T凹)が30〜1500nmの範囲にある[1]または[2]の透明被膜付基材。
[4]前記透明被膜中の金属酸化物粒子(A)の含有量が、10〜70重量%の範囲にあり、シリカ系中空微粒子(B)の含有量が5〜50重量%の範囲にあり、金属酸化物粒子(A)とシリカ系中空微粒子(B)の合計の含有量が20〜80重量%の範囲にある[1]から[3]の透明被
膜付基材。
[5]平均粒子径(DpA)が0.5〜5μmの範囲にある金属酸化物粒子(A)と平均粒子径(DpB)が5〜200nmの範囲にあり、屈折率が1.10〜1.40の範囲にあるシリカ系中空微粒子(B)とマトリックス成分と溶媒とからなる透明被膜形成用塗布液。
[6]前記金属酸化物粒子(A)が、屈折率が1.10〜1.40の範囲にあるシリカ系中空微粒子である[5]の透明被膜形成用塗布液。
[7]前記金属酸化物粒子(A)の濃度が固形分として0.1〜10重量%の範囲にあり、前記シリカ系中空微粒子(B)の濃度が固形分として0.1〜10重量%の範囲にあり、マトリ
ックス形成成分の固形分としての濃度が1〜30重量%の範囲にある[5]または[6]の透明被膜形成用塗布液。
The configuration of the present invention is as follows.
[1] A substrate with a transparent coating on which a transparent coating having irregularities is formed,
The transparent coating comprises metal oxide particles (A) having an average particle diameter (DpA) in the range of 0.5 to 5 μm;
A substrate with a transparent coating comprising silica-based hollow fine particles (B) having a mean particle size (DpB) in the range of 5 to 200 nm and a refractive index in the range of 1.10 to 1.40 and a matrix component.
[2] The substrate with a transparent coating according to [1], wherein the metal oxide particles (A) are silica-based hollow fine particles having a refractive index in the range of 1.10 to 1.40.
[3] The average film thickness of the transparent film is in the range of 1 μm to 10 μm,
The unevenness of the transparent coating is such that the difference between the average height of the convex portion (T convex) and the average height of the concave portion (T concave) (T convex) − (T concave) is in the range of 30 to 1500 nm [1] or [2] A substrate with a transparent coating.
[4] The content of the metal oxide particles (A) in the transparent film is in the range of 10 to 70% by weight, and the content of the silica-based hollow fine particles (B) is in the range of 5 to 50% by weight. The substrate with a transparent coating according to [1] to [3], wherein the total content of the metal oxide particles (A) and the silica-based hollow fine particles (B) is in the range of 20 to 80% by weight.
[5] Metal oxide particles (A) having an average particle diameter (DpA) in the range of 0.5 to 5 μm and average particle diameter (DpB) in the range of 5 to 200 nm, and a refractive index of 1.10 to 1 A coating solution for forming a transparent film comprising silica-based hollow fine particles (B) in the range of 40, a matrix component and a solvent.
[6] The coating liquid for forming a transparent film according to [5], wherein the metal oxide particles (A) are silica-based hollow fine particles having a refractive index in the range of 1.10 to 1.40.
[7] The concentration of the metal oxide particles (A) is in the range of 0.1 to 10% by weight as the solid content, and the concentration of the silica-based hollow fine particles (B) is 0.1 to 10% by weight as the solid content. The coating liquid for forming a transparent film according to [5] or [6], wherein the concentration of the matrix-forming component as a solid content is in the range of 1 to 30% by weight.

本発明によれば、透明被膜形成用塗料を1回塗布・乾燥によって所望の凹凸を基材表面に形成できるばかりか、基材との密着性、強度等に優れるとともに反射防止性能および防眩性能に優れ、さらに生産性および経済性にも優れた透明被膜が形成可能な透明被膜形成用塗布液を提供することができる。得られる透明被膜付基材はLCDディスプレィ、プラズマディスプレィ、プロジェクションディスプレィ、ELディスプレィ、CRTディスプレィ等の表示画面に好適に用いることができる。   According to the present invention, the desired unevenness can be formed on the surface of the base material by applying and drying the coating for forming a transparent film once, and the anti-reflection performance and anti-glare performance as well as excellent adhesion and strength to the base material. In addition, it is possible to provide a coating solution for forming a transparent film that can form a transparent film that is excellent in productivity and economy. The obtained substrate with a transparent coating can be suitably used for a display screen such as an LCD display, a plasma display, a projection display, an EL display, or a CRT display.

以下、先ず、本発明に係る透明被膜付基材について具体的に説明する。
透明被膜付基材
本発明に係る透明被膜付基材は、基材上に、表面に凹凸を有する透明被膜が形成されてなる。
Hereinafter, first, the transparent film-coated substrate according to the present invention will be specifically described.
Substrate with a transparent coating The substrate with a transparent coating according to the present invention is formed by forming a transparent coating having irregularities on the surface thereof.

該透明被膜は、平均粒子径(DpA)が0.5〜5μmの範囲にある金属酸化物粒子(A)と、
平均粒子径(DpB)が5〜200nmの範囲にあり、屈折率が1.10〜1.40の範囲
にあるシリカ系中空微粒子(B)と、
マトリックス成分と からなることを特徴としている。
The transparent coating comprises metal oxide particles (A) having an average particle diameter (DpA) in the range of 0.5 to 5 μm,
Silica-based hollow fine particles (B) having an average particle diameter (DpB) in the range of 5 to 200 nm and a refractive index in the range of 1.10 to 1.40;
It is characterized by comprising a matrix component.

図1に本発明の透明被膜付基材の1例を示す概略断面図を示す。
基材表面に平均粒子径の大きな金属酸化物粒子(A)が並び、そのまわりに平均粒子径の
小さなシリカ系中空微粒子と、その他の白抜きの箇所がマトリックス成分で存在しており、透明被膜の表面は大きな粒子(A)に由来する凹凸を有している。
FIG. 1 is a schematic sectional view showing an example of the substrate with a transparent coating according to the present invention.
The metal oxide particles (A) with a large average particle diameter are arranged on the surface of the substrate, and silica-based hollow fine particles with a small average particle diameter and other white spots are present as matrix components around the transparent coating. The surface of has an unevenness derived from large particles (A).

基材
基材としては、トリアセチルセルロースフィルム(TAC)、ジアセチルセルロースフィルム、アセテートブチレートセルロースフィルム等のセルロース系基材、ポリエチレンテレフタレート、ポリエチレンナフタレート等のポリエステル系基材、ポリエチレンフィルム、ポリプロピレンフィルム、環状ポリオレフィンフィルム等のポリオレフィン系基材、ナイロン−6、ナイロン−66等のポリアミド系基材等、さらには、ポリアクリル系フ
ィルム、ポリウレタン系フィルム、ポリカーボネートフィルム、ポリエーテウフィルム、ポリエーテルサルホンフィルム、ポリスチレンフィルム、ポリメチルペンテンフィルム、ポリエーテルケトンフィルム、アクリロニトリルフィルム等の基材が挙げられる。また、このような基材上に、ハードコート膜等他の被膜が形成された被膜付基材を用いこともできる。
As the base material , cellulose base materials such as triacetyl cellulose film (TAC), diacetyl cellulose film, acetate butyrate cellulose film, polyester base materials such as polyethylene terephthalate and polyethylene naphthalate, polyethylene film, polypropylene film, Polyolefin-based substrates such as cyclic polyolefin films, polyamide-based substrates such as nylon-6 and nylon-66, etc., as well as polyacrylic films, polyurethane-based films, polycarbonate films, polyether film, polyethersulfone films , Base materials such as polystyrene film, polymethylpentene film, polyetherketone film, and acrylonitrile film. In addition, a coated substrate in which another coating such as a hard coat film is formed on such a substrate can also be used.

本発明で用いる基材としては、トリアセチルセルロースフィルム(TAC)は屈折率が近接していることから好適に用いることができる。
透明被膜
透明被膜は金属酸化物粒子(A)とシリカ系中空微粒子(B)とマトリックス成分とからなる。
(i)金属酸化物粒子(A)
金属酸化物粒子(A)の平均粒子径は0.5〜5μm、さらには1〜3μmの範囲にある
ことが好ましい。
As a substrate used in the present invention, a triacetyl cellulose film (TAC) can be suitably used because of its close refractive index.
Transparent coating The transparent coating comprises metal oxide particles (A), silica-based hollow fine particles (B), and a matrix component.
(i) Metal oxide particles (A)
The average particle diameter of the metal oxide particles (A) is preferably in the range of 0.5 to 5 μm, more preferably 1 to 3 μm.

金属酸化物粒子(A)の平均粒子径が小さい場合は、透明被膜に所望の凹凸が設けられな
いことがあり、充分な防眩性能が得られないことがある。
金属酸化物粒子(A)の平均粒子径が大きすぎても、透明被膜が凹凸が大きくなりすぎて
しまい、この場合もチラついたり、充分な防眩性能が得られないことがある。
When the average particle size of the metal oxide particles (A) is small, desired irregularities may not be provided on the transparent film, and sufficient antiglare performance may not be obtained.
Even if the average particle diameter of the metal oxide particles (A) is too large, the transparent film becomes excessively uneven, and in this case as well, flickering or sufficient antiglare performance may not be obtained.

金属酸化物粒子(A)の屈折率は特に限定されないが、望ましくは屈折率の低いシリカ粒
子、中空シリカ系粒子を用いることである。屈折率としては、1.10〜1.50、さらには1.10〜1.45であればよい。なかでも、中空シリカ系粒子は屈折率が低く、反射防止性能に優れた透明被膜が得られるので好ましい。なおかかる中空シリカ系粒子の詳細は後述する。
The refractive index of the metal oxide particles (A) is not particularly limited, but it is desirable to use silica particles or hollow silica-based particles having a low refractive index. The refractive index may be 1.10 to 1.50, further 1.10 to 1.45. Among these, hollow silica-based particles are preferable because a transparent film having a low refractive index and excellent antireflection performance can be obtained. Details of the hollow silica-based particles will be described later.

本発明に用いる金属酸化物粒子(A)は下記式(1)で表される有機珪素化合物で表面処理されていることが好ましい。
n-SiX4-n (1)
(但し、式中、Rは炭素数1〜10の非置換または置換炭化水素基であって、互いに同一であっても異なっていてもよい。X:炭素数1〜4のアルコキシ基、シラノール基、ハロゲン、水素、n:0〜3の整数)
このような式(1)で表される有機珪素化合物としてはテトラメトキシシラン、テトラエトキシシラン、テトラプロポキシシシラン、テトラブトキシシラン、メチルトリメトキシシラン、ジメチルジメトキシシラン、フェニルトリメトキシシラン、ジフェニルジメトキシシラン、メチルトリエトキシシラン、ジメチルジエトキシシラン、フェニルトリエトキシシラン、ジフェニルジエトキシシラン、イソブチルトリメトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、ビニルトリス(βメトキシエトキシ)シラン、3,3,3−トリフルオロプロピルトリメトキシシラン、メチル-3,3,3−トリフルオロプ
ロピルジメトキシシラン、β−(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、γ-グリシドキシメチルトリメトキシシラン、γ-グリシドキシメチルトリエキシシラン、γ-グリシドキシエチルトリメトキシシラン、γ-グリシドキシエチルトリエトキシシラン、γ-グリシドキシプロピルトリメトキシシラン、γ-グリシドキシプロピルトリメトキシシラン、γ-グリシドキシプロピルトリエトキシシラン、γ-グリシドキシプロピルトリエトキシシラン、γ−(β−グリシドキシエトキシ)プロピルトリメトキシシラン、γ-(メタ)アクリロオキシメチルトリメトキシシラン、γ-(メタ)アクリロオキシメチルトリエキシシラン、γ-(メタ)アクリロオキシエチルトリメトキシシラン、γ-(メタ)アクリロオキシエチルトリエトキシシラン、γ-(メタ)アクリロオキシプロピルトリメ
トキシシラン、γ-(メタ)アクリロオキシプロピルトリメトキシシラン、γ-(メタ)アクリロオキシプロピルトリエトキシシラン、γ-(メタ)アクリロオキシプロピルトリエ
トキシシラン、ブチルトリメトキシシラン、イソブチルトリエトキシシラン、ヘキシルトリエトキシシラオクチルトリエトキシシラン、デシルトリエトキシシラン、ブチルトリエトキシシラン、イソブチルトリエトキシシラン、ヘキシルトリエトキシシラン、オクチルトリエトキシシラン、デシルトリエトキシシラン、3-ウレイドイソプロピルプロピルトリエトキシシラン、パーフルオロオクチルエチルトリメトキシシラン、パーフルオロオクチルエチルトリエトキシシラン、パーフルオロオクチルエチルトリイソプロポキシシラン、トリフルオロプロピルトリメトキシシラン、N−β(アミノエチル)γ-アミノプロピル
メチルジメトキシシラン、N−β(アミノエチル)γ-アミノプロピルトリメトキシシラ
ン、N-フェニル-γ-アミノプロピルトリメトキシシラン、γ-メルカプトプロピルトリメトキシシラン、トリメチルシラノール、メチルトリクロロシラン、等が挙げられる。
The metal oxide particles (A) used in the present invention are preferably surface-treated with an organosilicon compound represented by the following formula (1).
R n -SiX 4-n (1 )
(In the formula, R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and may be the same or different from each other. X: an alkoxy group having 1 to 4 carbon atoms or a silanol group) , Halogen, hydrogen, n: an integer of 0 to 3)
Examples of the organosilicon compound represented by the formula (1) include tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, methyltrimethoxysilane, dimethyldimethoxysilane, phenyltrimethoxysilane, diphenyldimethoxysilane. , Methyltriethoxysilane, dimethyldiethoxysilane, phenyltriethoxysilane, diphenyldiethoxysilane, isobutyltrimethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (βmethoxyethoxy) silane, 3,3,3- Trifluoropropyltrimethoxysilane, methyl-3,3,3-trifluoropropyldimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ-glycidoxymethyltrimethoxy Silane, γ-glycidoxymethyltriexisilane, γ-glycidoxyethyltrimethoxysilane, γ-glycidoxyethyltriethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltrimethoxy Silane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltriethoxysilane, γ- (β-glycidoxyethoxy) propyltrimethoxysilane, γ- (meth) acrylooxymethyltrimethoxysilane, γ- (meth) acrylooxymethyltriethoxysilane, γ- (meth) acrylooxyethyltrimethoxysilane, γ- (meth) acryloxyethyltriethoxysilane, γ- (meth) acrylooxypropyltrimethoxy Silane, γ- (meth) acrylooxypropyltrimethoxysilane, γ- (meth) a Acryloxypropyltriethoxysilane, γ- (meth) acryloxypropyltriethoxysilane, butyltrimethoxysilane, isobutyltriethoxysilane, hexyltriethoxysilaoctyltriethoxysilane, decyltriethoxysilane, butyltriethoxysilane, isobutyl Triethoxysilane, hexyltriethoxysilane, octyltriethoxysilane, decyltriethoxysilane, 3-ureidoisopropylpropyltriethoxysilane, perfluorooctylethyltrimethoxysilane, perfluorooctylethyltriethoxysilane, perfluorooctylethyltriiso Propoxysilane, trifluoropropyltrimethoxysilane, N-β (aminoethyl) γ-aminopropylmethyldimethoxysilane, N-β ( Minoechiru) .gamma.-aminopropyltrimethoxysilane, N- phenyl--γ- aminopropyltrimethoxysilane, .gamma.-mercaptopropyltrimethoxysilane, trimethylsilanol, methyltrichlorosilane, and the like.

金属酸化物粒子(A)の表面処理は、従来公知の方法を採用することができ、例えば、シ
リカ粒子のアルコール分散液に前記有機ケイ素化合物を所定量加え、これに水を加え、必要に応じて加水分解用触媒として酸またはアルカリを加えて加水分解する。この時、有機ケイ素化合物の使用量は金属酸化物粒子(A)と有機ケイ素化合物のRn-SiX(4-n)/2とし
ての重量比(Rn-SiX(4-n)/2重量/金属酸化物粒子(A)の重量)が0.01〜0.5さ
らには0.02〜0.25の範囲にあることが好ましい。
For the surface treatment of the metal oxide particles (A), a conventionally known method can be adopted.For example, a predetermined amount of the organosilicon compound is added to an alcohol dispersion of silica particles, water is added thereto, and if necessary Then, hydrolysis is carried out by adding an acid or alkali as a catalyst for hydrolysis. At this time, the weight ratio (R n -SiX (4-n ) / 2 weight of the amount of organosilicon compound as R n -SiX (4-n) / 2 of the metal oxide particles (A) and organic silicon compound / Weight of metal oxide particles (A)) is preferably in the range of 0.01 to 0.5, more preferably 0.02 to 0.25.

前記重量比が小さい場合は、有機ケイ素化合物の量が少ないために、後述する透明被膜形成用塗布液中のマトリックス形成成分あるいは分散媒との親和性が低く安定性が不充分で、塗布液中で均一に分散せず、場合によっては金属酸化物粒子(A)が凝集することがあ
り、透明被膜表面に規則的な凹凸を形成できない場合がある。
When the weight ratio is small, since the amount of the organosilicon compound is small, the affinity with the matrix-forming component or the dispersion medium in the coating liquid for forming a transparent film described later is low, and the stability is insufficient. In some cases, the metal oxide particles (A) may aggregate, and regular irregularities may not be formed on the surface of the transparent coating.

前記重量比が前記範囲を越えて多くしてもさらに分散性が向上することもなく、高価な有機ケイ素化合物が増加するだけで経済性が低下する。
このような、有機溶媒に置換することによって表面処理した金属酸化物粒子(A)の有機
溶媒分散液を得ることができる。有機溶媒としては、後述する透明被膜形成用塗布液と同様の有機溶媒を用いることが好ましい。
Even if the weight ratio exceeds the above range, the dispersibility is not further improved, and the economical efficiency is lowered only by increasing the number of expensive organosilicon compounds.
An organic solvent dispersion of the metal oxide particles (A) subjected to the surface treatment can be obtained by substituting with an organic solvent. As the organic solvent, it is preferable to use an organic solvent similar to a coating liquid for forming a transparent film described later.

透明被膜中の金属酸化物粒子(A)の含有量は、固形分換算で、5〜70重量%、さらに
は10〜50重量%の範囲にあることが好ましい。
透明被膜中の金属酸化物粒子(A)の含有量が少ないと、透明被膜表面の凹凸の密度が少な
くなり防眩性能が不充分となることがある。金属酸化物粒子(A)の含有量が多すぎても、
透明被膜の膜厚が不均一となったり、基材との密着性、膜の強度、耐擦傷性が不充分となることがある。
(ii)シリカ系中空微粒子(B)
シリカ系中空微粒子(B)としては、本願出願人の出願による特開2001−23361
1号公報、特開2003−192994号公報に開示した内部に空洞を有するシリカ系微粒子は屈折率が低く、コロイド領域の微粒子であり、分散性等に優れているので好適に採用することができる。
シリカ系中空微粒子(B)の平均粒子径(DpB)は5〜200nm、さらには10〜100nmの範囲にあることが好ましい。
The content of the metal oxide particles (A) in the transparent film is preferably 5 to 70% by weight, more preferably 10 to 50% by weight, in terms of solid content.
When the content of the metal oxide particles (A) in the transparent film is small, the density of the unevenness on the surface of the transparent film is decreased, and the antiglare performance may be insufficient. Even if the content of metal oxide particles (A) is too much,
The film thickness of the transparent film may be non-uniform, and the adhesion to the substrate, the film strength, and the scratch resistance may be insufficient.
(ii) Silica-based hollow fine particles (B)
As silica-based hollow fine particles (B), Japanese Patent Application Laid-Open No. 2001-23361 filed by the present applicant.
The silica-based fine particles having cavities inside disclosed in JP-A No. 1 and JP-A No. 2003-192994 have a low refractive index, are fine particles in a colloidal region, and are excellent in dispersibility and can be suitably used. .
The average particle diameter (DpB) of the silica-based hollow fine particles (B) is preferably in the range of 5 to 200 nm, more preferably 10 to 100 nm.

シリカ系中空微粒子(B)が小さいと、低屈折率微粒子を得ることが困難であり、得られ
たとしても屈折率が1.40を超えることがあり、透明被膜の反射防止性能が不充分となる場合がある。シリカ系中空微粒子(B)が大きいと、透明被膜の表面に不要な凹凸が形成
されことがあり、透明被膜のヘーズ値が高くなる場合がある。
If the silica-based hollow fine particles (B) are small, it is difficult to obtain low refractive index fine particles, and even if obtained, the refractive index may exceed 1.40, and the antireflection performance of the transparent coating is insufficient. There is a case. When the silica-based hollow fine particles (B) are large, unnecessary irregularities may be formed on the surface of the transparent coating, and the haze value of the transparent coating may be increased.

シリカ系中空微粒子(B)の屈折率は1.10〜1.40、さらには1.10〜1.35
の範囲にあることが好ましい。
この範囲の下限未満の屈折率の粒子を得ること自体が困難であり、屈折率が高いと基材あるいは下層膜の屈折率にもよるが反射防止性能が不充分となったり、透明被膜の反射率が高いために明所コントラストが不充分となることがある。
The refractive index of the silica-based hollow fine particles (B) is 1.10 to 1.40, more preferably 1.10 to 1.35.
It is preferable that it exists in the range.
It is difficult to obtain particles having a refractive index below the lower limit of this range. If the refractive index is high, the antireflection performance is insufficient or the reflection of the transparent coating depends on the refractive index of the substrate or the lower layer film. Due to the high rate, the photopic contrast may be insufficient.

本発明に用いるシリカ系中空微粒子(B)も前記した金属酸化物粒子(A)と同様に有機珪素化合物で表面処理されていることが好ましい。シリカ系中空微粒子(B)が有機珪素化合物
で表面処理されていると透明被膜形成用塗布液中のマトリックス形成成分あるいは分散媒との親和性が高く、分散安定性がよく、塗布液中で均一に分散し、基材との密着性、膜の強度、耐擦傷性に優れた透明被膜を得ることができる。
The silica-based hollow fine particles (B) used in the present invention are preferably surface-treated with an organosilicon compound in the same manner as the metal oxide particles (A). When silica-based hollow fine particles (B) are surface-treated with an organosilicon compound, they have a high affinity with the matrix-forming component or dispersion medium in the coating solution for forming a transparent film, good dispersion stability, and uniformity in the coating solution A transparent film excellent in adhesion to the substrate, film strength, and scratch resistance can be obtained.

透明被膜中のシリカ系中空微粒子(B)の含有量は固形分として1〜50重量%、さらには2〜25重量%の範囲にあることが好ましい。
シリカ系中空微粒子(B)の含有量が少ないと、透明被膜の屈折率が充分低くならないために、透明被膜の反射率が高くなり反射防止性能が不充分であったり明所コントラストが不充分となることがある。シリカ系中空微粒子(B)の含有量が高いと、透明被膜中のシリカ系中空微粒子(B)が多すぎるためか十分な凹凸を形成することが困難となることがあり、充分な防眩性能が得られないことがある。
The content of the silica-based hollow fine particles (B) in the transparent film is preferably in the range of 1 to 50% by weight , more preferably 2 to 25 % by weight as the solid content.
If the content of the silica-based hollow fine particles (B) is small, the refractive index of the transparent coating will not be sufficiently low, so the reflectance of the transparent coating will be high and the antireflection performance will be insufficient or the contrast in the bright place will be insufficient. May be. If the content of the silica-based hollow fine particles (B) is high, it may be difficult to form sufficient irregularities due to too much silica-based hollow fine particles (B) in the transparent film, and sufficient anti-glare performance May not be obtained.

シリカ系中空微粒子(B)の量と、金属酸化物粒子(A)との量比は、(A):(B)が70:1〜5:35、好ましくは50:2〜10:25の範囲にあることが望ましい。
このような量比で特定の大きさの金属酸化物粒子(A)とシリカ系中空微粒子(B)とを組合わせると、所望の凹凸が形成される。
The amount ratio of the silica-based hollow fine particles (B) to the metal oxide particles (A) is such that (A) :( B) is 70: 1 to 5:35, preferably 50: 2 to 10:25 It is desirable to be in range.
When the metal oxide particles (A) having a specific size and the silica-based hollow fine particles (B) are combined in such a quantitative ratio, desired irregularities are formed.

凹凸の調整は、大きめの凹凸を形成するのであれば、金属酸化物粒子(A)の粒径が大
きく、シリカ系中空微粒子(B)の粒径が小さいものを使用すればよい。
マトリックス成分
マトリックス成分としては、シリコーン系(ゾルゲル系)マトリックス成分、有機樹脂系マトリックス成分等が用いられる。
In order to adjust the unevenness, if a large unevenness is formed, a metal oxide particle (A) having a large particle size and a silica-based hollow fine particle (B) having a small particle size may be used.
As the matrix component , a silicone (sol-gel) matrix component, an organic resin matrix component, or the like is used.

シリコーン系マトリックス成分としては前記式(1)と同様の有機珪素化合物の加水分解
重縮合物が好適に用いられる。有機樹脂系マトリックス成分としては、塗料用樹脂として公知の熱硬化性樹脂、熱可塑性樹脂、電子線硬化樹脂等が挙げられる。
As the silicone matrix component, a hydrolyzed polycondensate of an organosilicon compound similar to the formula (1) is preferably used. Examples of the organic resin-based matrix component include known thermosetting resins, thermoplastic resins, electron beam curable resins, and the like as coating resins.

このような樹脂として、たとえば、従来から用いられているポリエステル樹脂、ポリカーボネート樹脂、ポリアミド樹脂、ポリフェニレンオキサイド樹脂、熱可塑性アクリル樹脂、塩化ビニル樹脂、フッ素樹脂、酢酸ビニル樹脂、シリコーンゴムなどの熱可塑性樹脂、ウレタン樹脂、メラミン樹脂、ケイ素樹脂、ブチラール樹脂、反応性シリコーン樹脂、フェノール樹脂、エポキシ樹脂、不飽和ポリエステル樹脂、熱硬化性アクリル樹脂、紫外線硬化型アクリル樹脂などの熱硬化性樹脂、紫外線硬化型アクリル樹脂などが挙げられる。さらにはこれら樹脂の2種以上の共重合体や変性体であってもよい。なお、熱硬化性樹脂の場合、マトリックス成分は、重合物となっている。   Examples of such resins include conventionally used thermoplastic resins such as polyester resins, polycarbonate resins, polyamide resins, polyphenylene oxide resins, thermoplastic acrylic resins, vinyl chloride resins, fluororesins, vinyl acetate resins, and silicone rubbers. , Urethane resin, melamine resin, silicon resin, butyral resin, reactive silicone resin, phenol resin, epoxy resin, unsaturated polyester resin, thermosetting acrylic resin, UV curable acrylic resin, etc., UV curable type An acrylic resin etc. are mentioned. Further, it may be a copolymer or modified body of two or more of these resins. In the case of a thermosetting resin, the matrix component is a polymer.

これらの樹脂は、エマルジョン樹脂、水溶性樹脂、親水性樹脂であってもよい。さらに、熱硬化性樹脂の場合、紫外線硬化型のものであっても、電子線硬化型のものであってもよく、熱硬化性樹脂の場合、硬化触媒や増感剤、安定剤が含まれていてもよい。   These resins may be emulsion resins, water-soluble resins, and hydrophilic resins. Further, in the case of a thermosetting resin, it may be an ultraviolet curable type or an electron beam curable type, and in the case of a thermosetting resin, a curing catalyst, a sensitizer, and a stabilizer are included. It may be.

透明被膜中のマトリックス成分の含有量は固形分として25〜94重量%、さらには30〜90重量%の範囲にあることが好ましい。透明被膜中のマトリックス成分の含有量が固形分として25重量%未満の場合は透明被膜の強度、耐擦傷性が不充分となることがある。   The content of the matrix component in the transparent coating is preferably in the range of 25 to 94% by weight, more preferably 30 to 90% by weight as the solid content. When the content of the matrix component in the transparent film is less than 25% by weight as the solid content, the strength and scratch resistance of the transparent film may be insufficient.

透明被膜中のマトリックス成分の含有量が多すぎると、一方の粒子の量が少ないために本願発明の効果、すなわち反射防止性能と防眩性能の双方を備えた透明被膜が得られない場合がある。また含有量が少ないと被膜の強度や耐擦傷性が低下することがある。   If the content of the matrix component in the transparent film is too large, the amount of one of the particles is small, so that the transparent film having the effects of the present invention, that is, both the antireflection performance and the antiglare performance may not be obtained. . Moreover, when there is little content, the intensity | strength and abrasion resistance of a film may fall.

透明被膜の膜厚は、平均膜厚で1〜10μm、さらには2〜8μmの範囲にあることが好ましい。ここで、平均膜厚とは透明被膜の凸部の平均高さ(T凸)と凹部の平均高さ(T凹)との平均値をいう。なお、透明被膜の平均膜厚は、金属酸化物粒子(A)の大きさ(
直径)よりも小さくとも良い。凸部は、金属酸化物粒子(A)に由来して形成されたもの
であり、凸部の平均高さ(T凸)は、金属酸化物粒子(A)の大きさよりも高くなる。
The film thickness of the transparent film is preferably 1 to 10 μm, more preferably 2 to 8 μm in terms of average film thickness. Here, the average film thickness refers to the average value of the average height of convex portions (T convex) and the average height of concave portions (T concave) of the transparent coating. The average film thickness of the transparent coating is the size of the metal oxide particles (A) (
Smaller than (diameter). The convex portions are formed from the metal oxide particles (A), and the average height (T convex) of the convex portions is higher than the size of the metal oxide particles (A).

透明被膜の膜厚が小さくしすぎると、凹凸を形成すること自体が困難となる。透明被膜の平均膜厚が厚すぎると、粒子(A)および(B)の大きさによるが、透明被膜にクラックを生じたり、基材がプラスチック等の場合はカーリング(湾曲あるいは反り)を生じる場合がある。   If the film thickness of the transparent coating is too small, it becomes difficult to form the unevenness itself. If the average thickness of the transparent coating is too thick, depending on the size of the particles (A) and (B), the transparent coating may crack, or if the substrate is plastic, etc., curling (curving or warping) There is.

透明被膜の凸部の平均高さ(T凸)と凹部の平均高さ(T凹)との差(T凸)−(T凹)は、粒子(A)および(B)の大きさによるが、30〜1500nm、さらには50〜1000nmの範囲にあることが好ましい。この差が小さいと、凹凸が不十分となり、充分な防眩性が得られない場合がある。
(T凸)−(T凹)が大きいと光の表面散乱が大きく白っぽく見える場合がある。
The difference between the average height of convex portions (T convex) and the average height of concave portions (T concave) (T convex)-(T concave) depends on the size of particles (A) and (B). 30 to 1500 nm, and more preferably in the range of 50 to 1000 nm. If this difference is small, the unevenness becomes insufficient and sufficient antiglare properties may not be obtained.
When (T-convex)-(T-concave) is large, the surface scattering of light may be large and appear whitish.

本発明では、透明被膜付基材の膜を一部剥離し透明被膜の平均膜厚、凸部の高さ(T凸)
と凹部の高さ(T凹)との差をレーザー顕微鏡(キーエンス株式会社製:VE-3000)を用
いて測定する。
In the present invention, a part of the film of the substrate with the transparent film is peeled off, the average film thickness of the transparent film, the height of the convex part (T convex)
And the height of the recess (T-concave) are measured using a laser microscope (manufactured by Keyence Corporation: VE-3000).

なお、本発明では、金属酸化物粒子(A)とシリカ系中空微粒子(B)とが分離することなく、混在している。また、金属酸化物粒子(A)が1層で、それによって凹凸が形成されてい
てもよく、さらに、金属酸化物粒子(A)が2層以上配列して、それによって凹凸が形成さ
れていてもよい。シリカ系中空微粒子(B)が金属酸化物粒子(A)の粒子間を埋めることで、防眩性が発現されるが、シリカ系中空微粒子(B)が金属酸化物粒子(A)表面に付着していてもよい。
In the present invention, the metal oxide particles (A) and the silica-based hollow fine particles (B) are mixed without being separated. Further, the metal oxide particles (A) may be a single layer, thereby forming irregularities. Furthermore, the metal oxide particles (A) may be arranged in two or more layers, thereby forming irregularities. Also good. Silica-based hollow fine particles (B) fill the space between the metal oxide particles (A), and anti-glare properties are exhibited, but the silica-based hollow fine particles (B) adhere to the surface of the metal oxide particles (A). You may do it.

つぎに、本発明に係る透明被膜形成用塗布液について具体的に説明する。
透明被膜形成用塗布液
本発明に係る透明被膜形成用塗布液は、前記金属酸化物(A)と、前記シリカ系中空微
粒子(B)と、マトリックス形成成分と溶媒とからなることを特徴としている。
Next, the coating liquid for forming a transparent film according to the present invention will be specifically described.
Transparent Film Forming Coating Liquid The transparent film forming coating liquid according to the present invention is characterized by comprising the metal oxide (A), the silica-based hollow fine particles (B), a matrix forming component and a solvent. .

透明被膜形成用塗布液中の金属酸化物粒子(A)の濃度は固形分として0.1〜10重量%、さらには0.2〜5重量%の範囲にあることが好ましい。金属酸化物粒子(A)の濃度が
低いと、透明被膜表面に規則的で充分な凹凸を形成できず、このため防眩性能が不充分となることがある。金属酸化物粒子(A)の濃度が高いと、透明被膜の膜厚が不均一になった
り、透明被膜表面に規則的な凹凸を形成できず、このため防眩性能が充分発揮されない場合があり、また、透明被膜の耐擦傷性が不充分となることがある。
The concentration of the metal oxide particles (A) in the coating solution for forming a transparent coating is preferably in the range of 0.1 to 10% by weight, more preferably 0.2 to 5% by weight as the solid content. When the concentration of the metal oxide particles (A) is low, regular and sufficient irregularities cannot be formed on the surface of the transparent coating, and thus the antiglare performance may be insufficient. If the concentration of the metal oxide particles (A) is high, the film thickness of the transparent film may not be uniform, or regular irregularities may not be formed on the surface of the transparent film, and thus the antiglare performance may not be sufficiently exhibited. In addition, the scratch resistance of the transparent film may be insufficient.

透明被膜形成用塗布液中のシリカ系中空微粒子(B)の濃度は固形分として0.1〜10重量%あることが好ましい。シリカ系中空微粒子(B)の濃度が固形分として0.1重量%未満の場合は、所望の屈折率の低い透明被膜が得られず、透明被膜の反射率が高くなり反射防止性能が不充分であったり、明所コントラストが不充分となることがある。シリカ系中空微粒子(B)の濃度が固形分として10重量%を超えると、塗布液の合計固形分濃度も高くなり、塗布性が低下して均一な透明被膜の形成が困難となったり、表面の平滑性がなくなったり、場合によっては透明被膜の内部に空隙が形成され、光の散乱を引き起こしたり、透明被膜のヘーズ値が高くなることがあり、さらに耐擦傷性が不充分となることがある。 The concentration of the silica-based hollow fine particles (B) in the coating liquid for forming a transparent film is preferably 0.1 to 10% by weight as a solid content. When the concentration of the silica-based hollow fine particles (B) is less than 0.1 % by weight as a solid content, a transparent coating film having a desired low refractive index cannot be obtained, and the reflectance of the transparent coating film is increased, resulting in insufficient antireflection performance. Or the photopic contrast may be insufficient. When the concentration of the silica-based hollow fine particles (B) exceeds 10 % by weight as the solid content, the total solid content concentration of the coating solution also increases, and the coating property is deteriorated and it becomes difficult to form a uniform transparent film. In some cases, the smoothness of the transparent film may be lost, or voids may be formed inside the transparent film, causing light scattering, haze value of the transparent film may be increased, and scratch resistance may be insufficient. is there.

なお、粒子(A)と(B)の量比は上記したとおりである。
(iii)マトリックス形成成分
マトリックス形成成分としては、シリコーン系マトリックス形成成分、有機樹脂系マトリックス形成成分等が用いられる。
The quantity ratio of the particles (A) and (B) is as described above.
(iii) Matrix-forming component As the matrix-forming component, a silicone-based matrix-forming component, an organic resin-based matrix-forming component, or the like is used.

シリコーン系マトリックス形成成分としては下記式(1)で表される有機珪素化合物およ
び/またはこれらの加水分解物、加水分解重縮合物が好適に用いられる。
n-SiX4-n (1)
(但し、式中、Rは炭素数1〜10の非置換または置換炭化水素基であって、互いに同一であっても異なっていてもよい。X:炭素数1〜4のアルコキシ基、シラノール基、ハロゲン、水素、n:0〜3の整数)
このような式(1)で表される有機珪素化合物としては前記したものが使用される。また、有機樹脂系マトリックス形成成分としては、塗料用樹脂として公知の熱硬化性樹脂、熱可塑性樹脂、電子線硬化樹脂等が挙げられる。このような樹脂として、たとえば、前記の熱可塑性樹脂、熱硬化性樹脂(紫外線硬化樹脂、電子線硬化樹脂も含む)などが使用される。なお、熱硬化性樹脂の場合、モノマーやオリゴマー、プレポリマーなどの重合前のものが使用される。
As the silicone-based matrix-forming component, an organosilicon compound represented by the following formula (1) and / or a hydrolyzate or hydrolyzed polycondensate thereof is preferably used.
R n -SiX 4-n (1 )
(In the formula, R is an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, and may be the same or different from each other. X: an alkoxy group having 1 to 4 carbon atoms or a silanol group) , Halogen, hydrogen, n: an integer of 0 to 3)
As such an organosilicon compound represented by the formula (1), those described above are used. Examples of the organic resin matrix forming component include known thermosetting resins, thermoplastic resins, electron beam curable resins, and the like as coating resins. As such a resin, for example, the above-mentioned thermoplastic resin, thermosetting resin (including ultraviolet curable resin and electron beam curable resin), and the like are used. In addition, in the case of a thermosetting resin, the thing before superposition | polymerization, such as a monomer, an oligomer, and a prepolymer, is used.

これらの樹脂は、エマルジョン樹脂、水溶性樹脂、親水性樹脂であってもよい。さらに、熱硬化性樹脂の場合、紫外線硬化型のものであっても、電子線硬化型のものであってもよく、熱硬化性樹脂の場合、硬化触媒が含まれていてもよい。   These resins may be emulsion resins, water-soluble resins, and hydrophilic resins. Further, in the case of a thermosetting resin, it may be an ultraviolet curable type or an electron beam curable type, and in the case of a thermosetting resin, a curing catalyst may be included.

透明被膜形成用塗布液中のマトリックス形成成分の濃度は固形分として0.5〜30重量%、さらには1〜20重量%の範囲にあることが好ましい。
マトリックス形成成分の濃度が少ないと、マトリックスに対し微粒子が多過ぎてしまい、透明被膜の膜厚が不均一になったり、透明被膜表面に規則的な凹凸を形成できず、このため防眩性能が不充分になったり、透明被膜の耐擦傷性が不充分となることがある。マトリックス形成成分の濃度が高すぎると、マトリックスに対し微粒子が少な過ぎるので、反射防止性能および防眩性能が不充分となったり、明所コントラストの向上効果が不充分となることがある。
(iv)溶媒
本発明に用いる溶媒としてはマトリックス形成成分、重合開始剤を溶解あるいは分散できるとともに金属酸化物粒子(A)、シリカ系中空微粒子(B)を均一に分散することができれば特に制限はなく、従来公知の溶媒を用いることができる。
The concentration of the matrix-forming component in the coating solution for forming a transparent coating is preferably in the range of 0.5 to 30% by weight, more preferably 1 to 20% by weight as the solid content.
If the concentration of the matrix-forming component is low, there are too many fine particles relative to the matrix, and the film thickness of the transparent coating becomes non-uniform or regular irregularities cannot be formed on the surface of the transparent coating. Insufficient or scratch resistance of the transparent film may be insufficient. If the concentration of the matrix forming component is too high, the amount of fine particles is too small relative to the matrix, so that the antireflection performance and antiglare performance may be insufficient, or the effect of improving the bright place contrast may be insufficient.
(Iv) Solvent The solvent used in the present invention is not particularly limited as long as it can dissolve or disperse the matrix forming component and the polymerization initiator and can uniformly disperse the metal oxide particles (A) and the silica-based hollow fine particles (B). In addition, a conventionally known solvent can be used.

具体的には、水、メタノール、エタノール、プロパノール、2-プロパノール(IPA)、ブタノール、ジアセトンアルコール、フルフリルアルコール、テトラヒドロフルフリルアルコール、エチレングリコール、ヘキシレングリコール、イソプロピルグリコールなどのアルコール類;酢酸メチルエステル、酢酸エチルエステル、酢酸ブチルなどのエステル類;ジエチルエーテル、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、プロピレングリコールモノメチルエーテルなどのエーテル類;アセトン、メチルエチルケトン、メチルイソブチルケトン、アセチルアセトン、アセト酢酸エステルなどのケトン類、メチルセロソルブ、エチルセロソルブ、ブチルセロソルブ、トルエン、シクロヘキサノン、イソホロン等が挙げら
れる。
(v)重合開始剤
本発明の透明被膜形成用塗布液には、マトリックス形成成分が熱硬化性樹脂(電子線硬化性樹脂、紫外線硬化樹脂も含む)の場合に、必要に応じて重合開始剤を用いることができる。
Specifically, alcohols such as water, methanol, ethanol, propanol, 2-propanol (IPA), butanol, diacetone alcohol, furfuryl alcohol, tetrahydrofurfuryl alcohol, ethylene glycol, hexylene glycol, isopropyl glycol; acetic acid Esters such as methyl ester, ethyl acetate, butyl acetate; ethers such as diethyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether Acetone, methyl ethyl ketone, methyl isobutyl ketone, acetylacetone, acetone Ketones such as acetate, methyl cellosolve, ethyl cellosolve, butyl cellosolve, toluene, cyclohexanone, isophorone and the like.
(v) Polymerization initiator In the coating liquid for forming a transparent film of the present invention, when the matrix forming component is a thermosetting resin (including an electron beam curable resin and an ultraviolet curable resin), a polymerization initiator is used as necessary. Can be used.

重合開始剤としては前記マトリックス形成成分を重合、硬化させることができれば特に制限はなく、樹脂によって適宜選択し、従来公知の重合開始剤を用いることができる。
例えば、アシルホスフィンオキシド類、アセトフェノン類、プロピオフェノン類、ベンジル類、ベンゾイン類、ベンゾフェノン類、チオキサントン類等の重合開始剤の他、カチオン系光重合開始剤等が挙げられる。
The polymerization initiator is not particularly limited as long as the matrix-forming component can be polymerized and cured, and can be appropriately selected depending on the resin, and conventionally known polymerization initiators can be used.
For example, in addition to polymerization initiators such as acylphosphine oxides, acetophenones, propiophenones, benzyls, benzoins, benzophenones, and thioxanthones, cationic photopolymerization initiators and the like can be mentioned.

透明被膜形成用塗布液中の重合開始剤の濃度はマトリックス形成成分の種類によっても異なるが、マトリックス形成成分および重合開始剤を固形分としたとき、マトリックス形成成分の0.1〜20重量%、さらには0.5〜10重量%の範囲にあることが好ましい。   The concentration of the polymerization initiator in the coating solution for forming a transparent film varies depending on the type of the matrix-forming component, but when the matrix-forming component and the polymerization initiator are solids, 0.1 to 20% by weight of the matrix-forming component, Furthermore, it is preferable that it exists in the range of 0.5 to 10 weight%.

重合開始剤の含有量が少ないと、透明被膜の硬化が不充分となることがある。また重合開始剤の含有量が多すぎると、塗布液の安定性が不充分となることがある。また重合開始剤とともに、増感剤、安定剤なども含んでいても良い。   If the content of the polymerization initiator is small, the transparent film may be insufficiently cured. Moreover, when there is too much content of a polymerization initiator, stability of a coating liquid may become inadequate. Further, it may contain a sensitizer, a stabilizer and the like together with the polymerization initiator.

透明被膜形成用塗布液の濃度(すなわち粒子(A)、(B)、マトリックス形成成分、その他の成分の合計濃度)は固形分として概ね1〜50重量%、さらには2〜30重量%の範囲にあることが好ましい。   The concentration of the coating solution for forming the transparent film (that is, the total concentration of the particles (A), (B), the matrix-forming component, and other components) is generally in the range of 1 to 50% by weight, further 2 to 30% by weight as the solid content. It is preferable that it exists in.

透明被膜形成用塗布液の濃度が低いと、金属酸化物粒子(A)の濃度も低く、透明被膜表
面に規則的で凹凸差が30nm以上の凹凸を形成できず、このため防眩性能が不充分となることがある。透明被膜形成用塗布液の濃度が高すぎると、透明被膜表面に規則的な凹凸を形成できず、このため防眩性能が充分発揮されない場合があり、また、透明被膜の耐擦傷性が不充分となることがある。このような本発明に係る塗布液は上記した成分を耕地の方法で混合することによって調製できる。
If the concentration of the coating solution for forming the transparent coating is low, the concentration of the metal oxide particles (A) is also low, and irregularities with a regular unevenness of 30 nm or more cannot be formed on the transparent coating surface, resulting in poor antiglare performance. May be sufficient. If the concentration of the coating solution for forming the transparent film is too high, regular irregularities cannot be formed on the surface of the transparent film, and thus the antiglare performance may not be sufficiently exhibited, and the scratch resistance of the transparent film is insufficient. It may become. Such a coating liquid according to the present invention can be prepared by mixing the above-described components by a cultivated land method.

本発明に係る透明被膜形成用塗布液を用いて透明被膜を形成する方法として従来公知の方法を採用することができる。具体的には、透明被膜形成用塗布液をディップ法、スプレー法、スピナー法、ロールコート法、バーコート法、スリットコーター印刷法、グラビア印刷法、マイクログラビア印刷法等の周知の方法で基材に塗布し、乾燥し、紫外線照射、加熱処理等常法によって硬化させることによって透明被膜を形成することができるが、本発明ではロールコート法、スリットコーター印刷法、グラビア印刷法、マイクログラビア印刷法が推奨される。
[実施例]
以下、本発明を実施例により説明するが、本発明はこれら実施例に限定されるものではない。
[実施例1]
透明被膜形成用塗布液(A-1)の調製
金属酸化物粒子として、シリカ粒子(触媒化成工業(株)製:シリカマイクロビードP-500、平均粒子径2μm、粒子屈折率1.45、粉体)20gをメタノール180gに懸
濁し、γ-アクリロオキシプロピルトリメトキシシラン4g(信越化学(株)製:KBM−5103、SiO2成分81.2重量%)を混合し、超純水10gを添加し、50℃で5時間攪拌して表面処理をしたシリカ粒子分散液を得た(固形分濃度11.2重量%)。
A conventionally well-known method can be employ | adopted as a method of forming a transparent film using the coating liquid for transparent film formation concerning this invention. Specifically, the coating liquid for forming a transparent film is formed by a known method such as dipping, spraying, spinner, roll coating, bar coating, slit coater printing, gravure printing, or micro gravure printing. It is possible to form a transparent film by applying, drying and curing by a conventional method such as ultraviolet irradiation, heat treatment, etc., but in the present invention, a roll coating method, a slit coater printing method, a gravure printing method, a micro gravure printing method. Is recommended.
[Example]
EXAMPLES Hereinafter, although an Example demonstrates this invention, this invention is not limited to these Examples.
[Example 1]
Preparation of coating liquid (A-1) for forming transparent coating As metal oxide particles, silica particles (manufactured by Catalyst Chemical Industry Co., Ltd .: silica microbead P-500, average particle diameter 2 μm, particle refractive index 1.45, powder Body) 20 g is suspended in 180 g of methanol, 4 g of γ-acryloxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd .: KBM-5103, SiO 2 component 81.2 wt%) is mixed, and 10 g of ultrapure water is added. The resulting mixture was stirred at 50 ° C. for 5 hours to obtain a surface-treated silica particle dispersion (solid content concentration: 11.2% by weight).

別途、シリカ系中空微粒子分散ゾル(触媒化成工業(株)製:スルーリア1420、平均粒子径50nm、濃度20.5重量%、分散媒:イソプロパノ−ル、粒子屈折率1.30)100gにパーフルオロオクチルエチルトリエトキシシラン10g(東レダウコーニング(株)製:AY43−158E、SiO2成分26.6重量%)を混合し、超純水を10g添加して40℃で5時間攪拌して表面処理したシリカ系中空微粒子分散ゾルを得た(固形分19.3重量%)。 Separately, 100 g of silica-based hollow fine particle dispersion sol (manufactured by Catalyst Kasei Kogyo Co., Ltd .: through rear 1420, average particle size 50 nm, concentration 20.5 wt%, dispersion medium: isopropanol, particle refractive index 1.30) is perfluoro. 10 g of octylethyltriethoxysilane (manufactured by Toray Dow Corning Co., Ltd .: AY43-158E, 26.6 wt% of SiO 2 component) was mixed, 10 g of ultrapure water was added, and the mixture was stirred at 40 ° C. for 5 hours for surface treatment. A silica-based hollow fine particle-dispersed sol was obtained (solid content: 19.3% by weight).

ついで、表面処理したシリカ粒子分散液144.6gと表面処理したシリカ系中空微粒子分散液69.9g、疎水性マトリックスとしてヘキサエリスリトールトリペンタアクリレート(日本化薬(株):KAYARAD DPHA)24.3gに、光開始剤(チバスプシャリティ(株)製イルガキュア184、IPAで溶解、固形分濃度10%)0.35gおよび溶剤としてイソプロパノ−ル13.2g、メチルイソブチルケトン8.0g、プロピレングリコールモノメチルエーテル6.0gとを充分に混合して透明被膜形成用塗布液(A-1)を調製
した。
透明被膜付基材(1)の調製
透明被膜形成用塗布液(A-1)をトリアセチルセルロース(TAC)フィルム(厚さ:0.8mm、屈折率:1.50)に#14バ−コ−タ−で塗布し、70℃で1分間乾燥した後、高圧水銀灯(80W/cm)を1分間照射して硬化させて透明被膜付基材(1)を調製した。得
られた透明被膜付基材(1)の全光線透過率、ヘ−ズ、波長550nmの光線の反射率を測
定し、結果を表1に示す。
Next, 144.6 g of the surface-treated silica particle dispersion and 69.9 g of the surface-treated silica-based hollow fine particle dispersion, and 24.3 g of hexaerythritol tripentaacrylate (Nippon Kayaku Co., Ltd .: KAYARAD DPHA) as a hydrophobic matrix. , 0.35 g of photoinitiator (Irgacure 184 manufactured by Ciba Specialty Inc., dissolved in IPA, solid content concentration 10%) and 13.2 g of isopropanol as a solvent, 8.0 g of methyl isobutyl ketone, propylene glycol monomethyl ether 6 0.0 g was mixed well to prepare a coating liquid for forming a transparent film (A-1).
Preparation of substrate with transparent coating (1) Coating solution (A-1) for forming transparent coating was applied to a triacetyl cellulose (TAC) film (thickness: 0.8 mm, refractive index: 1.50) with # 14 barco. After coating with a coater and drying at 70 ° C. for 1 minute, a high-pressure mercury lamp (80 W / cm) was irradiated for 1 minute to cure, thereby preparing a substrate (1) with a transparent coating. The total light transmittance, haze, and reflectance of light having a wavelength of 550 nm of the obtained substrate (1) with a transparent coating were measured, and the results are shown in Table 1.

全光線透過率およびヘ−ズはヘ−ズメ−タ−(日本電色(株)製:NDH2000)により、反射率は分光光度計(日本分光社製:Ubest−55)によりそれぞれ測定した。
また、防眩性、密着性、鉛筆硬度を以下の方法および評価基準で評価し、結果を表1に示した。
防眩性
ハードコート機能付き反射防止膜付基材(1)の裏面を黒スプレーで均一に塗り、30Wの蛍光灯から2mはなれ蛍光灯の映り込みを目視に確認し防眩性を評価した。結果を表1に示す。
The total light transmittance and haze were measured with a haze meter (Nippon Denshoku Co., Ltd .: NDH2000), and the reflectance was measured with a spectrophotometer (Nippon Bunko Co., Ltd .: Ubest-55).
Further, antiglare properties, adhesion, and pencil hardness were evaluated by the following methods and evaluation criteria, and the results are shown in Table 1.
The back surface of the antireflection film-coated substrate (1) with an antiglare hard coat function was evenly applied with black spray, and the reflection of the fluorescent lamp was visually confirmed from a 30 W fluorescent lamp to evaluate the antiglare property. The results are shown in Table 1.

蛍光灯が全く見えない :◎
蛍光灯がわずかに見える :○
蛍光灯は見えるが輪郭がぼける :△
蛍光灯がはっきり見える :×
密着性
ハードコート機能付き反射防止膜付基材(1)の表面にナイフで縦横1mmの間隔で1
1本の平行な傷を付け100個の升目を作り、これにセロハンテ−プを接着し、ついで、セロハンテ−プを剥離したときに被膜が剥離せず残存している升目の数を、以下の4段階に分類することにより密着性を評価した。結果を表1に示す。
I can't see any fluorescent lights: ◎
Fluorescent light is slightly visible: ○
Fluorescent lamp is visible but outline is blurred: △
Fluorescent light is clearly visible: ×
1 on the surface of the substrate with anti-reflection coating with adhesive hard coat function (1) at intervals of 1 mm in length and width with a knife
One parallel scratch was made to make 100 squares, cellophane tape was adhered to this, and when the cellophane tape was peeled off, the number of squares remaining after the coating was not peeled The adhesion was evaluated by classifying into 4 stages. The results are shown in Table 1.

残存升目の数100個 :◎
残存升目の数90〜99個 :○
残存升目の数85〜89個 :△
残存升目の数84個以下 :×
鉛筆硬度
JIS−K−5400に準じて鉛筆硬度試験器により測定した。
平均膜厚・T凸−T凹部の差
透明被膜付基材(1)の膜を一部剥離し透明被膜の平均膜厚、凸部の高さ(T凸)と凹部の高さ(T凹)との差をレーザー顕微鏡(キーエンス株式会社製:VE-3000)を用いて測定し
た。結果を表1に示す。
[実施例2]
透明被膜形成用塗布液(A-2)の調製
実施例1と同様にして、表面処理したシリカ粒子分散液96.4gと表面処理したシリカ系中空微粒子分散液69.9g、疎水性マトリックスとしてヘキサエリスリトールトリペンタアクリレート(日本化薬(株):KAYARAD DPHA)29.7gに、光開始剤(チバス
プシャリティ(株)製イルガキュア184、IPAで溶解、固形分濃度10%)0.43
gおよび溶剤としてイソプロパノ−ル13.2g、メチルイソブチルケトン8.0g、プロピレングリコールモノメチルエーテル6.0gとを充分に混合して透明被膜形成用塗布液(A-2)を調製した。
透明被膜付基材(2)の調製
透明被膜形成用塗布液(A-2)を用いた以外は実施例1と同様にして透明被膜付基材(2)を調製した。得られた透明被膜付基材(2)の全光線透過率、ヘ−ズ、反射率、防眩性、密着
性、鉛筆硬度および平均膜厚、凸部の高さ(T凸)と凹部の高さ(T凹)との差を測定し、結果を表1に示した。
[実施例3]
透明被膜形成用塗布液(A-3)の調製
実施例1と同様にして、表面処理したシリカ粒子分散液192.9gと表面処理したシリカ系中空微粒子分散液69.9g、疎水性マトリックスとしてヘキサエリスリトールトリペンタアクリレート(日本化薬(株):KAYARAD DPHA)18.9gに、光開始剤(チバ
スプシャリティ(株)製イルガキュア184、IPAで溶解、固形分濃度10%)0.2
7gおよび溶剤としてイソプロパノ−ル13.2g、メチルイソブチルケトン8.0g、プロピレングリコールモノメチルエーテル6.0gとを充分に混合して透明被膜形成用塗布液(A-3)を調製した。
透明被膜付基材(3)の調製
透明被膜形成用塗布液(A-3)を用いた以外は実施例1と同様にして透明被膜付基材(3)を調製した。
得られた透明被膜付基材(3)の全光線透過率、ヘ−ズ、反射率、防眩性、密着性、鉛筆硬
度および平均膜厚、凸部の高さ(T凸)と凹部の高さ(T凹)との差を測定し、結果を表1に示した。
[実施例4]
透明被膜形成用塗布液(A-4)の調製
金属酸化物粒子として、シリカ粒子(触媒化成工業(株)製:真絲球SW1.0、平均粒子径1μm、粒子屈折率1.45、粉体)20gをメタノール180gに懸濁し、γ-
アクリロオキシプロピルトリメトキシシラン4g(信越化学(株)製:KBM−5103、
SiO2成分81.2重量%)を混合し、超純水10gを添加し、50℃で5時間攪拌して表面処理をしたシリカ粒子分散液を得た(固形分濃度11.2重量%)。
Number of remaining squares: ◎
Number of remaining squares 90-99: ○
Number of remaining squares: 85 to 89: Δ
Number of remaining squares: 84 or less: ×
Pencil hardness It measured with the pencil hardness tester according to JIS-K-5400.
Difference in average film thickness / T-convex-T-concave part The film of the substrate with transparent coating (1) is partially peeled off, and the average film thickness of the transparent film, the height of the convex part (T-convex) and the height of the concave part (T-concave ) Was measured using a laser microscope (manufactured by Keyence Corporation: VE-3000). The results are shown in Table 1.
[Example 2]
Preparation of coating liquid for forming transparent film (A-2) In the same manner as in Example 1, 96.4 g of the surface-treated silica particle dispersion, 69.9 g of the surface-treated silica-based hollow fine particle dispersion, hexagonal as the hydrophobic matrix Erythritol tripentaacrylate (Nippon Kayaku Co., Ltd .: KAYARAD DPHA) 29.7g, photoinitiator (Irgacure 184 manufactured by Ciba Specialty Co., Ltd., dissolved in IPA, solid content concentration 10%) 0.43
g and a solvent, 13.2 g of isopropanol, 8.0 g of methyl isobutyl ketone, and 6.0 g of propylene glycol monomethyl ether were sufficiently mixed to prepare a coating solution (A-2) for forming a transparent film.
Preparation of substrate with transparent film (2) A substrate with transparent film (2) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (A-2) was used. Total light transmittance, haze, reflectivity, antiglare property, adhesion, pencil hardness and average film thickness, height of convex part (T convex) and concave part of the obtained substrate with transparent coating (2) The difference from the height (T-concave) was measured, and the results are shown in Table 1.
[Example 3]
Preparation of coating liquid for forming transparent film (A-3) In the same manner as in Example 1, 192.9 g of a surface-treated silica particle dispersion, 69.9 g of a surface-treated silica-based hollow fine particle dispersion, hexagonal as a hydrophobic matrix Erythritol tripentaacrylate (Nippon Kayaku Co., Ltd .: KAYARAD DPHA) 18.9g, photoinitiator (Irgacure 184 manufactured by Ciba Specialty Co., Ltd., dissolved in IPA, solid content concentration 10%) 0.2
7 g and 13.2 g of isopropanol as a solvent, 8.0 g of methyl isobutyl ketone, and 6.0 g of propylene glycol monomethyl ether were sufficiently mixed to prepare a coating solution (A-3) for forming a transparent film.
Preparation of substrate with transparent film (3) A substrate with transparent film (3) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (A-3) was used.
Total light transmittance, haze, reflectance, anti-glare property, adhesion, pencil hardness and average film thickness, height of convex part (T convex) and concave part of the obtained substrate with transparent coating (3) The difference from the height (T-concave) was measured, and the results are shown in Table 1.
[Example 4]
Preparation of coating liquid for forming transparent coating (A-4) As metal oxide particles, silica particles (manufactured by Catalytic Chemical Industry Co., Ltd .: true sphere SW1.0, average particle diameter 1 μm, particle refractive index 1.45, powder ) 20 g suspended in 180 g methanol and γ −
4 g of acryloxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd .: KBM-5103,
SiO 2 component 81.2 wt%) were mixed, ultrapure water was added 10 g, to obtain a silica particle dispersion in which the surface treatment by stirring for 5 hours at 50 ° C. (solids concentration 11.2 wt%) .

別途、実施例1と同様にして表面処理したシリカ系中空微粒子分散ゾルを得た(固形分19.3重量%)。
ついで、表面処理したシリカ粒子分散液144.6gと表面処理したシリカ系中空微粒子分散液69.9g、疎水性マトリックスとしてヘキサエリスリトールトリペンタアクリレート(日本化薬(株):KAYARAD DPHA)24.3gに、光開始剤(チバスプシャリティ(株)製イルガキュア184、IPAで溶解、固形分濃度10%)0.35gおよび溶剤としてイソプロパノ−ル13.2g、メチルイソブチルケトン8.0g、プロピレングリコールモノメチルエーテル6.0gとを充分に混合して透明被膜形成用塗布液(A-4)を調製
した。
透明被膜付基材(4)の調製
透明被膜形成用塗布液(A-4)を#8バ−コ−タ−用いて塗布した以外は実施例1と同様
にして透明被膜付基材(4)を調製した。
Separately, a silica-based hollow fine particle dispersed sol surface-treated in the same manner as in Example 1 was obtained (solid content: 19.3% by weight).
Next, 144.6 g of the surface-treated silica particle dispersion and 69.9 g of the surface-treated silica-based hollow fine particle dispersion, and 24.3 g of hexaerythritol tripentaacrylate (Nippon Kayaku Co., Ltd .: KAYARAD DPHA) as a hydrophobic matrix. , 0.35 g of photoinitiator (Irgacure 184 manufactured by Ciba Specialty Inc., dissolved in IPA, solid content concentration 10%) and 13.2 g of isopropanol as a solvent, 8.0 g of methyl isobutyl ketone, propylene glycol monomethyl ether 6 0.0 g was mixed well to prepare a coating solution for forming a transparent film (A-4).
Preparation of substrate with transparent film (4) Substrate with transparent film (4) The same procedure as in Example 1 was applied except that the coating liquid for forming a transparent film (A-4) was applied using a # 8 bar coater. ) Was prepared.

得られた透明被膜付基材(4)の全光線透過率、ヘ−ズ、反射率、防眩性、密着性、鉛筆
硬度および平均膜厚、凸部の高さ(T凸)と凹部の高さ(T凹)との差を測定し、結果を表1に示した。
[実施例5]
透明被膜形成用塗布液(A-5)の調製
金属酸化物粒子として、シリカ粒子(触媒化成工業(株)製:真絲球SW4.0、平均粒子径4μm、粒子屈折率1.45、粉体)20gをメタノール180gに懸濁し、γ-
アクリロオキシプロピルトリメトキシシラン4g(信越化学(株)製:KBM−5103、
SiO2成分81.2重量%)を混合し、超純水10gを添加し、50℃で5時間攪拌して表面処理をしたシリカ粒子分散液を得た(固形分濃度11.2重量%)。
Total light transmittance, haze, reflectance, anti-glare property, adhesion, pencil hardness and average film thickness, height of convex part (T convex) and concave part of the obtained substrate with transparent coating (4) The difference from the height (T-concave) was measured, and the results are shown in Table 1.
[Example 5]
Preparation of coating liquid for forming transparent film (A-5) As metal oxide particles, silica particles (manufactured by Catalyst Kasei Kogyo Co., Ltd .: true sphere SW4.0, average particle diameter 4 μm, particle refractive index 1.45, powder ) 20 g suspended in 180 g methanol and γ −
4 g of acryloxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd .: KBM-5103,
SiO 2 component 81.2 wt%) were mixed, ultrapure water was added 10 g, to obtain a silica particle dispersion in which the surface treatment by stirring for 5 hours at 50 ° C. (solids concentration 11.2 wt%) .

別途、実施例1と同様にして表面処理したシリカ系中空微粒子分散ゾルを得た(固形分19.3重量%)。
ついで、表面処理したシリカ粒子分散液144.6gと表面処理したシリカ系中空微粒子分散液69.9g、疎水性マトリックスとしてヘキサエリスリトールトリペンタアクリレート(日本化薬(株):KAYARAD DPHA)24.3gに、光開始剤(チバスプシャリティ(株)製イルガキュア184、IPAで溶解、固形分濃度10%)0.35gおよび溶剤としてイソプロパノ−ル13.2g、メチルイソブチルケトン8.0g、プロピレングリコールモノメチルエーテル6.0gとを充分に混合して透明被膜形成用塗布液(A-5)を調製
した。
透明被膜付基材(5)の調製
透明被膜形成用塗布液(A-5)を#20バ−コ−タ−用いて塗布した以外は実施例1と同
様にして透明被膜付基材(5)を調製した。
得られた透明被膜付基材(5)の全光線透過率、ヘ−ズ、反射率、防眩性、密着性、鉛筆硬
度および平均膜厚、凸部の高さ(T凸)と凹部の高さ(T凹)との差を測定し、結果を表1に示した。
[実施例6]
透明被膜形成用塗布液(A-6)の調製
実施例1と同様にして、表面処理したシリカ粒子分散液144.6gと表面処理したシリカ系中空微粒子分散液28.0g、疎水性マトリックスとしてヘキサエリスリトールトリペンタアクリレート(日本化薬(株):KAYARAD DPHA)32.4gに、光開始剤(チバ
スプシャリティ(株)製イルガキュア184、IPAで溶解、固形分濃度10%)0.3
5gおよび溶剤としてイソプロパノ−ル13.2g、メチルイソブチルケトン8.0g、プロピレングリコールモノメチルエーテル6.0gとを充分に混合して透明被膜形成用塗布液(A-6)を調製した。
透明被膜付基材(6)の調製
透明被膜形成用塗布液(A-6)を用いた以外は実施例1と同様にして透明被膜付基材(6)を調製した。得られた透明被膜付基材(6)の全光線透過率、ヘ−ズ、反射率、防眩性、密着
性、鉛筆硬度および平均膜厚、凸部の高さ(T凸)と凹部の高さ(T凹)との差を測定し、結果を表1に示した。
[実施例7]
透明被膜形成用塗布液(A-7)の調製
実施例1と同様にして、表面処理したシリカ粒子分散液120.5gと表面処理したシリカ系中空微粒子分散液111.9g、疎水性マトリックスとしてヘキサエリスリトールトリペンタアクリレート(日本化薬(株):KAYARAD DPHA)18.9gに、光開始剤(チ
バスプシャリティ(株)製イルガキュア184、IPAで溶解、固形分濃度10%)0.
27gおよび溶剤としてイソプロパノ−ル13.2g、メチルイソブチルケトン8.0g、プロピレングリコールモノメチルエーテル6.0gとを充分に混合して透明被膜形成用塗布液(A-7)を調製した。
透明被膜付基材(7)の調製
透明被膜形成用塗布液(A-7)を用いた以外は実施例1と同様にして透明被膜付基材(7)を調製した。得られた透明被膜付基材(7)の全光線透過率、ヘ−ズ、反射率、防眩性、密着
性、鉛筆硬度および平均膜厚、凸部の高さ(T凸)と凹部の高さ(T凹)との差を測定し、結
果を表1に示した。
[実施例8]
透明被膜付基材(8)の調製
実施例1と同様にして調製した透明被膜形成用塗布液(A-1)をトリアセチルセルロース
(TAC)フィルム(厚さ:0.8mm、屈折率:1.50)に#8バ−コ−タ−で塗布し、70℃で1分間乾燥した後、高圧水銀灯(80W/cm)を1分間照射して硬化させて透明
被膜付基材(8)を調製した。得られた透明被膜付基材(8)の全光線透過率、ヘ−ズ、反射率、防眩性、密着性、鉛筆硬度および平均膜厚、凸部の高さ(T凸)と凹部の高さ(T凹)との差を測定し、結果を表1に示した。
[実施例9]
透明被膜付基材(9)の調製
実施例1と同様にして調製した透明被膜形成用塗布液(A-1)をトリアセチルセルロース
(TAC)フィルム(厚さ:0.8mm、屈折率:1.50)に#20バ−コ−タ−で塗布し、70℃で1分間乾燥した後、高圧水銀灯(80W/cm)を1分間照射して硬化させて透
明被膜付基材(9)を調製した。得られた透明被膜付基材(9)の全光線透過率、ヘ−ズ、反射率、防眩性、密着性、鉛筆硬度および平均膜厚、凸部の高さ(T凸)と凹部の高さ(T凹)との差を測定し、結果を表1に示した。
[実施例10]
透明被膜形成用塗布液(A-10)の調製
金属酸化物粒子として、シリカ系中空微粒子分散ゾル(触媒化成工業(株)製:スルーリアS特殊品、平均粒子径0.5μm、濃度10.5重量%、分散媒:イソプロパノ−ル、粒子屈折率1.20)190.5gとγ-アクリロオキシプロピルトリメトキシシラン
4g(信越化学(株)製:KBM−5103、SiO2成分81.2重量%)とを混合し、超
純水10gを添加し、50℃で5時間攪拌して表面処理をしたシリカ粒子分散液を得た(固形分濃度11.2重量%)。
Separately, a silica-based hollow fine particle dispersed sol surface-treated in the same manner as in Example 1 was obtained (solid content: 19.3% by weight).
Next, 144.6 g of the surface-treated silica particle dispersion and 69.9 g of the surface-treated silica-based hollow fine particle dispersion, and 24.3 g of hexaerythritol tripentaacrylate (Nippon Kayaku Co., Ltd .: KAYARAD DPHA) as a hydrophobic matrix. , 0.35 g of photoinitiator (Irgacure 184 manufactured by Ciba Specialty Inc., dissolved in IPA, solid content concentration 10%) and 13.2 g of isopropanol as a solvent, 8.0 g of methyl isobutyl ketone, propylene glycol monomethyl ether 6 0.0 g was mixed well to prepare a coating solution for forming a transparent film (A-5).
Preparation of transparent coated substrate (5) Transparent coated substrate (5) was prepared in the same manner as in Example 1 except that the coating solution (A-5) for forming a transparent coating was applied using a # 20 bar coater. ) Was prepared.
Total light transmittance, haze, reflectance, anti-glare property, adhesion, pencil hardness and average film thickness, height of convex part (T convex) and concave part of the obtained substrate with transparent coating (5) The difference from the height (T-concave) was measured, and the results are shown in Table 1.
[Example 6]
Preparation of coating liquid for forming transparent film (A-6) In the same manner as in Example 1, 144.6 g of a surface-treated silica particle dispersion, 28.0 g of a surface-treated silica-based hollow fine particle dispersion, hexagonal as a hydrophobic matrix Erythritol tripentaacrylate (Nippon Kayaku Co., Ltd .: KAYARAD DPHA) 32.4 g, photoinitiator (Irgacure 184 manufactured by Ciba Specialty Co., Ltd., dissolved in IPA, solid content concentration 10%) 0.3
5 g and 13.2 g of isopropanol as a solvent, 8.0 g of methyl isobutyl ketone, and 6.0 g of propylene glycol monomethyl ether were sufficiently mixed to prepare a coating solution for forming a transparent film (A-6).
Preparation of substrate with transparent film (6) A substrate with transparent film (6) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (A-6) was used. Total light transmittance, haze, reflectance, anti-glare property, adhesion, pencil hardness and average film thickness, height of convex part (T convex) and concave part of the obtained substrate with transparent coating (6) The difference from the height (T-concave) was measured, and the results are shown in Table 1.
[Example 7]
Preparation of coating solution for forming transparent film (A-7) In the same manner as in Example 1, 120.5 g of the surface-treated silica particle dispersion, 111.9 g of the surface-treated silica-based hollow fine particle dispersion, hexagonal as the hydrophobic matrix Erythritol tripentaacrylate (Nippon Kayaku Co., Ltd .: KAYARAD DPHA) 18.9 g, photoinitiator (Irgacure 184 manufactured by Ciba Specialty Co., Ltd., dissolved in IPA, solid content concentration 10%)
27 g and 13.2 g of isopropanol as a solvent, 8.0 g of methyl isobutyl ketone, and 6.0 g of propylene glycol monomethyl ether were sufficiently mixed to prepare a coating solution (A-7) for forming a transparent film.
Preparation of substrate with transparent film (7) A substrate with transparent film (7) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (A-7) was used. Total light transmittance, haze, reflectance, anti-glare property, adhesion, pencil hardness and average film thickness of the obtained transparent film-coated substrate (7), the height of the convex part (T convex) and the concave part The difference from the height (T-concave) was measured, and the results are shown in Table 1.
[Example 8]
Preparation of substrate with transparent coating (8) A coating solution for forming a transparent coating (A-1) prepared in the same manner as in Example 1 was prepared from a triacetyl cellulose (TAC) film (thickness: 0.8 mm, refractive index: 1). .50) with a # 8 bar coater, dried at 70 ° C. for 1 minute, and then cured by irradiation with a high pressure mercury lamp (80 W / cm) for 1 minute to form a substrate (8) with a transparent coating. Prepared. Total light transmittance, haze, reflectance, anti-glare property, adhesion, pencil hardness and average film thickness, height of convex portion (T convex) and concave portion of the obtained substrate with transparent coating (8) The difference from the height (T-concave) was measured, and the results are shown in Table 1.
[Example 9]
Preparation of substrate with transparent coating (9) A coating solution for forming a transparent coating (A-1) prepared in the same manner as in Example 1 was prepared from a triacetyl cellulose (TAC) film (thickness: 0.8 mm, refractive index: 1). .50) with a # 20 bar coater, dried at 70 ° C. for 1 minute, and then cured by irradiation with a high pressure mercury lamp (80 W / cm) for 1 minute to form a substrate (9) with a transparent coating. Prepared. Total light transmittance, haze, reflectance, anti-glare property, adhesion, pencil hardness and average film thickness, height of convex part (T convex) and concave part of the obtained substrate with transparent coating (9) The difference from the height (T-concave) was measured, and the results are shown in Table 1.
[Example 10]
Preparation of coating liquid for forming transparent film (A-10) As metal oxide particles, silica-based hollow fine particle dispersion sol (manufactured by Catalyst Kasei Kogyo Co., Ltd .: Thruria S special product, average particle size 0.5 μm, concentration 10.5) % By weight, dispersion medium: isopropanol, particle refractive index 1.20) and 4 g of γ-acrylooxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd .: KBM-5103, SiO 2 component 81.2 weight) %) Was added, 10 g of ultrapure water was added, and the mixture was stirred at 50 ° C. for 5 hours to obtain a surface-treated silica particle dispersion (solid content concentration: 11.2 wt%).

別途、シリカ系中空微粒子分散ゾル(触媒化成工業(株)製:スルーリア1420、平均粒子径50nm、濃度20.5重量%、分散媒:イソプロパノ−ル、粒子屈折率1.30)100gにパーフルオロオクチルエチルトリエトキシシラン10g(東レダウコーニング(株)製:AY43−158E、SiO2成分26.6重量%)を混合し、超純水を10g添加して40℃で5時間攪拌して表面処理したシリカ系中空微粒子分散ゾルを得た(固形分19.3重量%)。 Separately, 100 g of silica-based hollow fine particle dispersion sol (manufactured by Catalyst Kasei Kogyo Co., Ltd .: through rear 1420, average particle size 50 nm, concentration 20.5 wt%, dispersion medium: isopropanol, particle refractive index 1.30) is perfluoro. 10 g of octylethyltriethoxysilane (manufactured by Toray Dow Corning Co., Ltd .: AY43-158E, 26.6 wt% of SiO 2 component) was mixed, 10 g of ultrapure water was added, and the mixture was stirred at 40 ° C. for 5 hours for surface treatment. A silica-based hollow fine particle-dispersed sol was obtained (solid content: 19.3% by weight).

ついで、表面処理したシリカ系中空微粒子分散ゾル144.6gと表面処理したシリカ系中空微粒子分散液69.9g、疎水性マトリックスとしてヘキサエリスリトールトリペンタアクリレート(日本化薬(株):KAYARAD DPHA)24.3gに、光開始剤(チバスプ
シャリティ(株)製イルガキュア184、IPAで溶解、固形分濃度10%)0.35g
および溶剤としてイソプロパノ−ル13.2g、メチルイソブチルケトン8.0g、プロピレングリコールモノメチルエーテル6.0gとを充分に混合して透明被膜形成用塗布液(A-10)を調製した。
透明被膜付基材(10)の調製
透明被膜形成用塗布液(A-10)を用いた以外は実施例1と同様にして透明被膜付基材(10)を調製した。
Next, 144.6 g of the surface-treated silica-based hollow fine particle dispersion sol and 69.9 g of the surface-treated silica-based hollow fine particle dispersion liquid, hexaerythritol tripentaacrylate (Nippon Kayaku Co., Ltd .: KAYARAD DPHA) as the hydrophobic matrix 24. To 3 g, photoinitiator (Irgacure 184, manufactured by Ciba Specialty Co., Ltd., dissolved in IPA, solid content concentration 10%) 0.35 g
Further, 13.2 g of isopropanol, 8.0 g of methyl isobutyl ketone, and 6.0 g of propylene glycol monomethyl ether were sufficiently mixed as a solvent to prepare a coating solution (A-10) for forming a transparent film.
Preparation of substrate with transparent film (10) A substrate with transparent film (10) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (A-10) was used.

得られた透明被膜付基材(10)の全光線透過率、ヘ−ズ、反射率、防眩性、密着性、鉛筆硬度および平均膜厚、凸部の高さ(T凸)と凹部の高さ(T凹)との差を測定し、結果を表1に示した。
[比較例1]
透明被膜形成用塗布液(A-R1)の調製
金属酸化物粒子として、シリカ粒子(触媒化成工業(株)製:シリカマイクロビードP-500、平均粒子径2μm、粒子屈折率1.45、粉体)20gをメタノール180gに懸
濁し、γ-アクリロオキシプロピルトリメトキシシラン4g(信越化学(株)製:KBM−5103、SiO2成分81.2重量%)を混合し、超純水10gを添加し、50℃で5時間攪拌して表面処理をしたシリカ粒子分散液を得た(固形分濃度11.2重量%)。
Total light transmittance, haze, reflectance, anti-glare property, adhesion, pencil hardness and average film thickness, height of convex part (T convex) and concave part of the obtained substrate with transparent coating (10) The difference from the height (T-concave) was measured, and the results are shown in Table 1.
[Comparative Example 1]
Preparation of coating liquid for forming transparent film (A-R1) As metal oxide particles, silica particles (Catalyst Chemical Industries, Ltd .: silica microbead P-500, average particle diameter 2 μm, particle refractive index 1.45, powder Body) 20 g is suspended in 180 g of methanol, 4 g of γ-acryloxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd .: KBM-5103, SiO 2 component 81.2 wt%) is mixed, and 10 g of ultrapure water is added. The resulting mixture was stirred at 50 ° C. for 5 hours to obtain a surface-treated silica particle dispersion (solid content concentration: 11.2% by weight).

ついで、表面処理したシリカ粒子分散液144.6gと疎水性マトリックスとしてヘキサエリスリトールトリペンタアクリレート(日本化薬(株):KAYARAD DPHA)37.8g
に、光開始剤(チバスプシャリティ(株)製イルガキュア184、IPAで溶解、固形分
濃度10%)0.54gおよび溶剤としてイソプロパノ−ル13.2g、メチルイソブチルケトン8.0g、プロピレングリコールモノメチルエーテル6.0gとを充分に混合して透明被膜形成用塗布液(A-R1)を調製した。
透明被膜付基材(R1)の調製
透明被膜形成用塗布液(A-R1)を用いた以外は実施例1と同様にして透明被膜付基材(R1)を調製した。得られた透明被膜付基材(R1)の全光線透過率、ヘ−ズ、反射率、防眩性、密着性、鉛筆硬度および平均膜厚、凸部の高さ(T凸)と凹部の高さ(T凹)との差を測定し、結果を表1に示した。
[比較例2]
透明被膜形成用塗布液(A-R2)の調製
シリカ系中空微粒子分散ゾル(触媒化成工業(株)製:スルーリア1420、平均粒子径50nm、濃度20.5重量%、分散媒:イソプロパノ−ル、粒子屈折率1.30)100gにパーフルオロオクチルエチルトリエトキシシラン10g(東レダウコーニング(株)製:AY43−158E、SiO2成分26.6重量%)を混合し、超純水を10g添加して40℃で5時間攪拌して表面処理したシリカ系中空微粒子分散ゾルを得た(固形分19.3重量%)。
Next, 144.6 g of the surface-treated silica particle dispersion and 37.8 g of hexaerythritol tripentaacrylate (Nippon Kayaku Co., Ltd .: KAYARAD DPHA) as a hydrophobic matrix.
In addition, 0.54 g of photoinitiator (Irgacure 184 manufactured by Ciba Specialty Inc., dissolved in IPA, solid content concentration 10%) and 13.2 g of isopropanol as a solvent, 8.0 g of methyl isobutyl ketone, propylene glycol monomethyl ether A coating solution for forming a transparent film (A-R1) was prepared by thoroughly mixing 6.0 g.
Preparation of substrate with transparent film (R1) A substrate with transparent film (R1) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (A-R1) was used. Total light transmittance, haze, reflectance, anti-glare property, adhesion, pencil hardness and average film thickness, height of convex part (T convex) and concave part of the obtained substrate with transparent coating (R1) The difference from the height (T-concave) was measured, and the results are shown in Table 1.
[Comparative Example 2]
Preparation of coating liquid for forming transparent film (A-R2) Silica-based hollow fine particle dispersion sol (manufactured by Catalyst Kasei Kogyo Co., Ltd .: through rear 1420, average particle diameter 50 nm, concentration 20.5 wt%, dispersion medium: isopropanol, 100 g of particle refractive index 1.30) is mixed with 10 g of perfluorooctylethyltriethoxysilane (manufactured by Toray Dow Corning Co., Ltd .: AY43-158E, SiO 2 component 26.6% by weight), and 10 g of ultrapure water is added. Thus, a silica-based hollow particle-dispersed sol having been surface-treated by stirring at 40 ° C. for 5 hours was obtained (solid content 19.3% by weight).

ついで、表面処理したシリカ系中空微粒子分散液69.9g、疎水性マトリックスとしてヘキサエリスリトールトリペンタアクリレート(日本化薬(株):KAYARAD DPHA)40
.5gに、光開始剤(チバスプシャリティ(株)製イルガキュア184、IPAで溶解、
固形分濃度10%)0.58gおよび溶剤としてイソプロパノ−ル13.2g、メチルイソブチルケトン8.0g、プロピレングリコールモノメチルエーテル6.0gとを充分に混合して透明被膜形成用塗布液(A-R1)を調製した。
透明被膜付基材(R2)の調製
透明被膜形成用塗布液(A-R2)を用いた以外は実施例1と同様にして透明被膜付基材(R2)を調製した。得られた透明被膜付基材(R2)の全光線透過率、ヘ−ズ、反射率、防眩性、密着性、鉛筆硬度および平均膜厚、凸部の高さ(T凸)と凹部の高さ(T凹)との差を測定し、
結果を表1に示した。
[比較例3]
透明被膜形成用塗布液(A-R3)の調製
金属酸化物粒子として、シリカ粒子水分散液(触媒化成工業(株)製:スフェリカスラリー、平均粒子径0.3μm、粒子屈折率1.45、SiO2濃度20重量%)100gをメタノール100gに懸濁し、γ-アクリロオキシプロピルトリメトキシシラン4g(信
越化学(株)製:KBM−5103、SiO2成分81.2重量%)を混合し、超純水10g
を添加し、50℃で5時間攪拌して表面処理をしたシリカ粒子分散液を得た(固形分濃度11.2重量%)。
Then, 69.9 g of the surface-treated silica-based hollow fine particle dispersion, hexaerythritol tripentaacrylate (Nippon Kayaku Co., Ltd .: KAYARAD DPHA) 40 as a hydrophobic matrix
. To 5 g, photoinitiator (Irgacure 184 manufactured by Ciba Specialty Co., Ltd., dissolved in IPA,
(Solid content 10%) 0.58 g and 13.2 g of isopropanol, 8.0 g of methyl isobutyl ketone, and 6.0 g of propylene glycol monomethyl ether as a solvent were mixed thoroughly to form a coating solution for forming a transparent film (A-R1 ) Was prepared.
Preparation of substrate with transparent film (R2) A substrate with transparent film (R2) was prepared in the same manner as in Example 1 except that the coating liquid for forming a transparent film (A-R2) was used. Total light transmittance, haze, reflectance, anti-glare property, adhesion, pencil hardness and average film thickness, height of convex part (T convex) and concave part of the obtained substrate with transparent coating (R2) Measure the difference from the height (T-concave)
The results are shown in Table 1.
[Comparative Example 3]
Preparation of coating liquid for forming transparent film (A-R3) As metal oxide particles, silica particle aqueous dispersion (manufactured by Catalyst Kasei Kogyo Co., Ltd .: Spherica slurry, average particle size 0.3 μm, particle refractive index 1.45) , 100 g of SiO 2 concentration is suspended in 100 g of methanol, and 4 g of γ-acrylooxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd .: KBM-5103, SiO 2 component 81.2 wt%) is mixed. , 10g of ultrapure water
Was added and stirred at 50 ° C. for 5 hours to obtain a surface-treated silica particle dispersion (solid content concentration: 11.2% by weight).

別途、実施例1と同様にして表面処理したシリカ系中空微粒子分散ゾルを得た(固形分19.3重量%)。ついで、表面処理したシリカ粒子分散液144.6gと表面処理した
シリカ系中空微粒子分散液69.9g、疎水性マトリックスとしてヘキサエリスリトールトリペンタアクリレート(日本化薬(株):KAYARAD DPHA)24.3gに、光開始剤(チ
バスプシャリティ(株)製イルガキュア184、IPAで溶解、固形分濃度10%)0.
35gおよび溶剤としてイソプロパノ−ル13.2g、メチルイソブチルケトン8.0g、プロピレングリコールモノメチルエーテル6.0gとを充分に混合して透明被膜形成用塗布液(A-R3)を調製した。
透明被膜付基材(R3)の調製
透明被膜形成用塗布液(A-R3)を用いた以外は実施例1と同様にして透明被膜付基材(R3)を調製した。得られた透明被膜付基材(R3)の全光線透過率、ヘ−ズ、反射率、防眩性、密着性、鉛筆硬度および平均膜厚、凸部の高さ(T凸)と凹部の高さ(T凹)との差を測定し、結果を表1に示した。
[比較例4]
透明被膜形成用塗布液(A-R4)の調製
金属酸化物粒子として、シリカ粒子(触媒化成工業(株)製:真絲球SW7.0、平均粒子径7μm、粒子屈折率1.45、粉体)20gをメタノール180gに懸濁し、γ-
アクリロオキシプロピルトリメトキシシラン4g(信越化学(株)製:KBM−5103、
SiO2成分81.2重量%)を混合し、超純水10gを添加し、50℃で5時間攪拌して表面処理をしたシリカ粒子分散液を得た(固形分濃度11.2重量%)。
Separately, a silica-based hollow fine particle dispersed sol surface-treated in the same manner as in Example 1 was obtained (solid content: 19.3% by weight). Next, 144.6 g of the surface-treated silica particle dispersion and 69.9 g of the surface-treated silica-based hollow fine particle dispersion, and 24.3 g of hexaerythritol tripentaacrylate (Nippon Kayaku Co., Ltd .: KAYARAD DPHA) as a hydrophobic matrix. , Photoinitiator (Irgacure 184, manufactured by Ciba Specialty Co., Ltd., dissolved in IPA, solid content concentration 10%)
35 g and 13.2 g of isopropanol as a solvent, 8.0 g of methyl isobutyl ketone, and 6.0 g of propylene glycol monomethyl ether were sufficiently mixed to prepare a coating solution for forming a transparent film (A-R3).
Preparation of substrate with transparent coating (R3) A substrate with transparent coating (R3) was prepared in the same manner as in Example 1 except that the coating solution for forming a transparent coating (A-R3) was used. Total light transmittance, haze, reflectance, anti-glare property, adhesion, pencil hardness and average film thickness, height of convex part (T convex) and concave part of the obtained substrate with transparent coating (R3) The difference from the height (T-concave) was measured, and the results are shown in Table 1.
[Comparative Example 4]
Preparation of coating liquid for forming transparent film (A-R4) As metal oxide particles, silica particles (manufactured by Catalyst Kasei Kogyo Co., Ltd .: true sphere SW 7.0, average particle diameter 7 μm, particle refractive index 1.45, powder ) 20 g suspended in 180 g methanol and γ −
4 g of acryloxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd .: KBM-5103,
SiO 2 component 81.2 wt%) were mixed, ultrapure water was added 10 g, to obtain a silica particle dispersion in which the surface treatment by stirring for 5 hours at 50 ° C. (solids concentration 11.2 wt%) .

別途、実施例1と同様にして表面処理したシリカ系中空微粒子分散ゾルを得た(固形分19.3重量%)。ついで、表面処理したシリカ粒子分散液144.6gと表面処理したシリカ系中空微粒子分散液69.9g、疎水性マトリックスとしてヘキサエリスリトールトリペンタアクリレート(日本化薬(株):KAYARAD DPHA)24.3gに、光開始剤(チバスプシャリティ(株)製イルガキュア184、IPAで溶解、固形分濃度10%)0.35gおよび溶剤としてイソプロパノール13.2g、メチルイソブチルケトン8.0g、プロピレングリコールモノメチルエーテル6.0gとを充分に混合して透明被膜形成用塗布液(A-R3)を調製した。
透明被膜付基材(R4)の調製
透明被膜形成用塗布液(A-R4)を用いた以外は実施例1と同様にして透明被膜付基材(R4)を調製した。得られた透明被膜付基材(R4)の全光線透過率、ヘ−ズ、反射率、防眩性、密着性、鉛筆硬度および平均膜厚、凸部の高さ(T凸)と凹部の高さ(T凹)との差を測定し、結果を表1に示した。
Separately, a silica-based hollow fine particle dispersed sol surface-treated in the same manner as in Example 1 was obtained (solid content: 19.3% by weight). Next, 144.6 g of the surface-treated silica particle dispersion, 69.9 g of the surface-treated silica-based hollow fine particle dispersion, and 24.3 g of hexaerythritol tripentaacrylate (Nippon Kayaku Co., Ltd .: KAYARAD DPHA) as a hydrophobic matrix. , 0.35 g of photoinitiator (Irgacure 184 manufactured by Ciba Specialty Corporation, dissolved in IPA, solid content concentration 10%) and 13.2 g of isopropanol as solvent, 8.0 g of methyl isobutyl ketone, 6.0 g of propylene glycol monomethyl ether Were mixed well to prepare a coating solution for forming a transparent film (A-R3).
Preparation of substrate with transparent coating (R4) A substrate with transparent coating (R4) was prepared in the same manner as in Example 1, except that the coating solution for forming a transparent coating (A-R4) was used. Total light transmittance, haze, reflectance, anti-glare property, adhesion, pencil hardness and average film thickness, height of convex part (T convex) and concave part of the obtained substrate with transparent coating (R4) The difference from the height (T-concave) was measured, and the results are shown in Table 1.

Figure 0005159265
Figure 0005159265

本発明の透明被膜付基材の1例を示す概略断面図を示す。The schematic sectional drawing which shows an example of the base material with a transparent film of this invention is shown.

Claims (5)

表面に凹凸を有する透明被膜が形成された透明被膜付基材であって、
該透明被膜が、平均粒子径(DpA)が0.5〜5μmの範囲にあるシリカ粒子(A)と、
平均粒子径(DpB)が5〜200nmの範囲にあり、屈折率が1.10〜1.40の範囲にあるシリカ系中空微粒子(B)とマトリックス成分とからなり、前記シリカ粒子(A)が、屈折率が1.10〜1.40の範囲にあるシリカ系中空微粒子であることを特徴とする透明被膜付基材。
A substrate with a transparent film on which a transparent film having irregularities on the surface is formed,
The transparent coating comprises silica particles (A) having an average particle size (DpA) in the range of 0.5 to 5 μm;
The silica particles (A) are composed of silica-based hollow fine particles (B) having a mean particle diameter (DpB) in the range of 5 to 200 nm and a refractive index in the range of 1.10 to 1.40, and a matrix component. A substrate with a transparent coating, characterized by being silica-based hollow fine particles having a refractive index in the range of 1.10 to 1.40 .
前記透明被膜の平均膜厚が1μm〜10μmの範囲にあり、
透明被膜の凹凸は、凸部の平均高さ(T凸)と凹部の平均高さ(T凹)との差(T凸)−(T凹)が30〜1500nmの範囲にあることを特徴とする請求項1に記載の透明被膜付基材。
The transparent film has an average film thickness in the range of 1 μm to 10 μm,
The unevenness of the transparent film is characterized in that the difference between the average height of the convex portions (T convex) and the average height of the concave portions (T concave) (T convex) − (T concave) is in the range of 30 to 1500 nm. The substrate with a transparent film according to claim 1.
前記透明被膜中のシリカ粒子(A)の含有量が、10〜70重量%の範囲にあり、シリカ系中空微粒子(B)の含有量が5〜50重量%の範囲にあり、金属酸化物粒子(A)とシリカ系中空微粒子(B)の合計の含有量が20〜80重量%の範囲にあることを特徴とする請求項1または2に記載の透明被膜付基材。   The content of silica particles (A) in the transparent coating is in the range of 10 to 70% by weight, the content of silica-based hollow fine particles (B) is in the range of 5 to 50% by weight, and the metal oxide particles The substrate with a transparent coating according to claim 1 or 2, wherein the total content of (A) and silica-based hollow fine particles (B) is in the range of 20 to 80% by weight. 平均粒子径(DpA)が0.5〜5μmの範囲にあるシリカ粒子(A)と平均粒子径(DpB)が5〜200nmの範囲にあり、屈折率が1.10〜1.40の範囲にあるシリカ系中空微粒子(B)とマトリックス成分と溶媒とからなり、前記シリカ粒子(A)が、屈折率が1.10〜1.40の範囲にあるシリカ系中空微粒子であることを特徴とする透明被膜形成用塗布液。 Silica particles (A) having an average particle diameter (DpA) in the range of 0.5 to 5 μm and average particle diameters (DpB) in the range of 5 to 200 nm, and the refractive index in the range of 1.10 to 1.40. It consists of a certain silica-based hollow fine particle (B), a matrix component, and a solvent, and the silica particle (A) is a silica-based hollow fine particle having a refractive index in the range of 1.10 to 1.40. Coating liquid for forming a transparent film. 前記シリカ粒子(A)の濃度が固形分として0.1〜10重量%の範囲にあり、前記シリカ系中空微粒子(B)の濃度が固形分として0.1〜10重量%の範囲にあり、マトリックス形成成分の濃度が固形分として1〜30重量%の範囲にあることを特徴とする請求項4に記載の透明被膜形成塗布液。 The concentration of the silica particles (A) is in the range of 0.1 to 10% by weight as the solid content, and the concentration of the silica-based hollow fine particles (B) is in the range of 0.1 to 10% by weight as the solid content, The coating liquid for forming a transparent film according to claim 4, wherein the concentration of the matrix-forming component is in the range of 1 to 30% by weight as a solid content.
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CN110441837A (en) * 2019-07-11 2019-11-12 昆山之奇美材料科技有限公司 It is a kind of it is low reflection anti-dazzle film, with this it is low reflection anti-dazzle film polarizer and liquid crystal display panel
US11917883B2 (en) 2020-06-05 2024-02-27 Samsung Display Co., Ltd. Color control member and display device including same

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