JP6851946B2 - プラズマ分光分析方法、及び非ターゲットに由来するプラズマ発光の抑制剤 - Google Patents
プラズマ分光分析方法、及び非ターゲットに由来するプラズマ発光の抑制剤 Download PDFInfo
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- JP6851946B2 JP6851946B2 JP2017180832A JP2017180832A JP6851946B2 JP 6851946 B2 JP6851946 B2 JP 6851946B2 JP 2017180832 A JP2017180832 A JP 2017180832A JP 2017180832 A JP2017180832 A JP 2017180832A JP 6851946 B2 JP6851946 B2 JP 6851946B2
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- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
- G01N21/69—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence specially adapted for fluids, e.g. molten metal
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