JP6829182B2 - 紫外光殺菌装置 - Google Patents

紫外光殺菌装置 Download PDF

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Publication number
JP6829182B2
JP6829182B2 JP2017232421A JP2017232421A JP6829182B2 JP 6829182 B2 JP6829182 B2 JP 6829182B2 JP 2017232421 A JP2017232421 A JP 2017232421A JP 2017232421 A JP2017232421 A JP 2017232421A JP 6829182 B2 JP6829182 B2 JP 6829182B2
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layer
ultraviolet light
processing chamber
light source
housing
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Japanese (ja)
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JP2018034020A5 (enExample
JP2018034020A (ja
Inventor
洋明 望月
洋明 望月
真也 渡邊
真也 渡邊
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Nikkiso Co Ltd
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Nikkiso Co Ltd
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  • Apparatus For Disinfection Or Sterilisation (AREA)
  • Physical Water Treatments (AREA)
JP2017232421A 2017-12-04 2017-12-04 紫外光殺菌装置 Active JP6829182B2 (ja)

Priority Applications (1)

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JP2017232421A JP6829182B2 (ja) 2017-12-04 2017-12-04 紫外光殺菌装置

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JP2017232421A JP6829182B2 (ja) 2017-12-04 2017-12-04 紫外光殺菌装置

Related Parent Applications (1)

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JP2016168506A Division JP6419760B2 (ja) 2016-08-30 2016-08-30 紫外光殺菌装置

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JP2018034020A JP2018034020A (ja) 2018-03-08
JP2018034020A5 JP2018034020A5 (enExample) 2020-04-09
JP6829182B2 true JP6829182B2 (ja) 2021-02-10

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JP2017232421A Active JP6829182B2 (ja) 2017-12-04 2017-12-04 紫外光殺菌装置

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Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7205128B2 (ja) * 2018-09-20 2023-01-17 東芝ライテック株式会社 流体殺菌装置
JP7371000B2 (ja) 2018-11-02 2023-10-30 株式会社エンプラス 紫外線照射ユニット及び紫外線殺菌装置
CN113412240A (zh) * 2019-02-08 2021-09-17 W.L.戈尔及同仁股份有限公司 紫外光消毒系统
EP3990396A1 (en) 2019-07-31 2022-05-04 Access Business Group International Llc Water treatment system
JP7393917B2 (ja) * 2019-10-30 2023-12-07 スタンレー電気株式会社 流体殺菌装置
JP7398243B2 (ja) * 2019-10-30 2023-12-14 スタンレー電気株式会社 流体殺菌装置
JP7405035B2 (ja) * 2020-07-28 2023-12-26 豊田合成株式会社 流体殺菌装置
JP7608915B2 (ja) * 2021-03-24 2025-01-07 東芝ライテック株式会社 流体殺菌装置
CN113827749A (zh) * 2021-08-18 2021-12-24 深圳市芯晶宇净化科技有限责任公司 一种深紫外led杀菌装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2567273Y2 (ja) * 1991-08-08 1998-04-02 株式会社日本フォトサイエンス 光化学反応処理を行う紫外線照射装置
JP2000061459A (ja) * 1993-09-13 2000-02-29 Nomura Micro Sci Co Ltd 低濃度有機性廃水の処理装置
EP2205286A4 (en) * 2007-09-17 2012-01-11 Atlantium Technologies Ltd CONTROL OF OXIDATION PROCESSES IN ULTRAVIOLET LIQUID TREATMENT SYSTEMS
EP3038978A4 (en) * 2013-08-29 2016-11-23 Crystal Is Inc SYSTEMS AND METHOD FOR FLUID TREATMENT WITH HOMOGENEOUS DISTRIBUTION OF UV LIGHT
US20160207795A1 (en) * 2013-09-24 2016-07-21 Asahi Organic Chemicals Industry Co., Ltd. Ultraviolet sterilization device

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JP2018034020A (ja) 2018-03-08

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