JP6818751B2 - 硬化性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、硬化膜の製造方法、及び、多官能チオール化合物 - Google Patents

硬化性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、硬化膜の製造方法、及び、多官能チオール化合物 Download PDF

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JP6818751B2
JP6818751B2 JP2018523616A JP2018523616A JP6818751B2 JP 6818751 B2 JP6818751 B2 JP 6818751B2 JP 2018523616 A JP2018523616 A JP 2018523616A JP 2018523616 A JP2018523616 A JP 2018523616A JP 6818751 B2 JP6818751 B2 JP 6818751B2
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明夫 水野
明夫 水野
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Fujifilm Corp
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    • C07—ORGANIC CHEMISTRY
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    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/24—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/25—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
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    • C07C323/66—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton containing sulfur atoms of sulfo, esterified sulfo or halosulfonyl groups, bound to the carbon skeleton
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    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
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    • C07F7/08—Compounds having one or more C—Si linkages
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    • G—PHYSICS
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
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  • Materials For Photolithography (AREA)
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JP2018523616A 2016-06-22 2017-05-24 硬化性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、硬化膜の製造方法、及び、多官能チオール化合物 Active JP6818751B2 (ja)

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JP2016123694 2016-06-22
JP2016123694 2016-06-22
PCT/JP2017/019297 WO2017221620A1 (ja) 2016-06-22 2017-05-24 硬化性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、硬化膜の製造方法、及び、多官能チオール化合物

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KR102403787B1 (ko) * 2017-03-31 2022-05-30 동우 화인켐 주식회사 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
JP7006078B2 (ja) * 2017-08-10 2022-01-24 Ａｇｃ株式会社 反射型マスクブランク、および反射型マスク
WO2020022247A1 (ja) 2018-07-26 2020-01-30 富士フイルム株式会社 硬化性組成物、硬化性組成物の製造方法、膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
JP7230480B2 (ja) * 2018-12-14 2023-03-01 東洋インキＳｃホールディングス株式会社 カラーフィルタ用感光性着色組成物及びカラーフィルタ
TW202313911A (zh) * 2021-08-10 2023-04-01 日商納美仕有限公司 樹脂組成物及接著劑
WO2024070695A1 (ja) * 2022-09-26 2024-04-04 富士フイルム株式会社 着色組成物、膜、光学フィルタ、固体撮像素子および画像表示装置

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JP2006227223A (ja) * 2005-02-16 2006-08-31 Fuji Photo Film Co Ltd パターン形成用組成物、パターン形成材料、及びパターン形成方法
JP2007086165A (ja) * 2005-09-20 2007-04-05 Fujifilm Corp 感光性組成物、これを用いた平版印刷版原版及び画像記録方法
KR101175834B1 (ko) * 2006-11-21 2012-08-24 쇼와 덴코 가부시키가이샤 히드록실기 함유 티올 화합물을 포함하는 경화성 조성물 및 그의 경화물
JP2014041188A (ja) 2012-08-21 2014-03-06 Hitachi Chemical Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント、隔壁、隔壁の形成方法及び画像表示装置の製造方法
JP2015007729A (ja) * 2013-06-26 2015-01-15 株式会社Adeka 光硬化性黒色組成物
JP6162165B2 (ja) 2014-03-31 2017-07-12 富士フイルム株式会社 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、画像表示装置、有機エレクトロルミネッセンス素子、色素および色素の製造方法
JP2016084464A (ja) * 2014-10-24 2016-05-19 昭和電工株式会社 硬化性樹脂組成物、カラーフィルター、画像表示素子及びカラーフィルターの製造方法

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WO2017221620A1 (ja) 2017-12-28
KR102197489B1 (ko) 2020-12-31
JPWO2017221620A1 (ja) 2019-04-18
KR20200121922A (ko) 2020-10-26
TW201809101A (zh) 2018-03-16
KR20180134984A (ko) 2018-12-19

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