JP6810899B2 - 共振装置 - Google Patents
共振装置 Download PDFInfo
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- JP6810899B2 JP6810899B2 JP2018558796A JP2018558796A JP6810899B2 JP 6810899 B2 JP6810899 B2 JP 6810899B2 JP 2018558796 A JP2018558796 A JP 2018558796A JP 2018558796 A JP2018558796 A JP 2018558796A JP 6810899 B2 JP6810899 B2 JP 6810899B2
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- 239000010409 thin film Substances 0.000 description 40
- 239000000758 substrate Substances 0.000 description 22
- 239000010408 film Substances 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- -1 scandium aluminum Chemical compound 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02244—Details of microelectro-mechanical resonators
- H03H9/02433—Means for compensation or elimination of undesired effects
- H03H9/02448—Means for compensation or elimination of undesired effects of temperature influence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K1/00—Details of thermometers not specially adapted for particular types of thermometer
- G01K1/16—Special arrangements for conducting heat from the object to the sensitive element
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
- G01K7/16—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
- G01K7/16—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements
- G01K7/18—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements the element being a linear resistance, e.g. platinum resistance thermometer
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H2009/155—Constructional features of resonators consisting of piezoelectric or electrostrictive material using MEMS techniques
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
- H03H9/2405—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
- H03H2009/2442—Square resonators
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/24—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive
- H03H9/2405—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators
- H03H9/2426—Constructional features of resonators of material which is not piezoelectric, electrostrictive, or magnetostrictive of microelectro-mechanical resonators in combination with other electronic elements
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- General Physics & Mathematics (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Oscillators With Electromechanical Resonators (AREA)
Description
以下、添付の図面を参照して本発明の第1実施形態について説明する。図1は、本発明の第1実施形態に係る共振装置1の構造を概略的に示す平面図である。
この共振装置1は、プラットフォーム50と、共振子10と、センサ部20と、ヒータ30とを備えている。
図2を用いて共振装置1の積層構造について説明する。図2は、図1のAA´断面図である。
次に、図4、5を用いて、本発明に係る共振装置1の効果について説明する。図4(A)は、本実施形態に係る共振装置1の変形例の共振装置1´の構成を示している。変形例の共振装置1´において、共振子10は、2倍波の振動モードで輪郭振動を行う。また保持腕110は、共振子10の振動方向に沿った方向(図4のX軸方向)に上述の緩衝部を有している。なお、変形例の共振装置1´においてもセンサ部20は共振子10と合同な形状を有している。他方で、図4(B)は比較例の共振装置2の構成を示している。比較例の共振装置2において、共振子10の形状は変形例の共振装置1´と同様であるが、センサ部20は共振子10と合同な形状ではない。具体的には、センサ部20は薄膜抵抗220の周囲にスリットを有していない。また、比較例の共振装置2では、センサ部20は共振子10を挟んで2つ形成されている。
第2実施形態以降では第1実施形態と共通の事柄についての記述を省略し、異なる点についてのみ説明する。特に、同様の構成による同様の作用効果については実施形態毎には逐次言及しない。
図7を用いて、第3実施形態に係る共振装置1の構成、機能について説明する。以下に、本実施形態に係る共振装置1の詳細構成のうち、第1実施形態との差異点を中心に説明する。
図8を用いて、第4実施形態に係る共振装置1の構成、機能について説明する。以下に、本実施形態に係る共振装置1の詳細構成のうち、第3実施形態との差異点を中心に説明する。
その他の構成、機能は第3実施形態と同様である。
図9を用いて、第5実施形態に係る共振装置1の構成、機能について説明する。以下に、本実施形態に係る共振装置1の詳細構成のうち、第1実施形態との差異点を中心に説明する。
10 共振子
20 センサ部
30 ヒータ
50 プラットフォーム
51 空間
52 スリット
52a スリット
52b スリット
53 連結腕
110 保持腕
110a 保持腕
110b 保持腕
120 振動部
210 保持腕
210a 保持腕
210b 保持腕
220 薄膜抵抗
230 測定部
Claims (8)
- プラットフォームと、
振動部と、前記振動部の周囲に第1溝を設けるように前記振動部と前記プラットフォームとを連結する少なくとも1つの第1保持腕とを有する共振子と、
温度を測定する測定部を有するセンサ部と、
前記プラットフォームに形成されたヒータと、
を備え、
前記測定部と前記ヒータとの間に第2溝が設けられた
共振装置。 - 前記センサ部は、前記測定部の周囲に前記第2溝を設けるように前記測定部と前記プラットフォームとを連結する少なくとも1つの第2保持腕をさらに有する
請求項1に記載の共振装置。 - 前記第1保持腕は、前記振動部の前記ヒータ側に設けられ、
前記第2保持腕は、前記測定部の前記ヒータ側に設けられた、
請求項2に記載の共振装置。 - 前記第1保持腕と前記第2保持腕とは、数が同一である、請求項2又は3に記載の共振装置。
- 前記振動部及び前記第1保持腕の輪郭の平面形状と、前記測定部及び前記第2保持腕の輪郭の平面形状とは、互いに相似な形状である、請求項2〜4の何れか一項に記載の共振装置。
- 前記振動部及び前記第1保持腕の輪郭の平面形状と、前記測定部及び前記第2保持腕の輪郭の平面形状とは、互いに合同な形状である、請求項2〜4の何れか一項に記載の共振装置。
- 前記共振子と前記センサ部とは、熱時定数が同一である、請求項1〜6の何れか一項に記載の共振装置。
- 前記共振子と前記センサ部とは、熱容量及び熱抵抗が同一である、請求項1〜6の何れか一項に記載の共振装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016253232 | 2016-12-27 | ||
JP2016253232 | 2016-12-27 | ||
PCT/JP2017/025603 WO2018123118A1 (ja) | 2016-12-27 | 2017-07-13 | 共振装置 |
Publications (2)
Publication Number | Publication Date |
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JPWO2018123118A1 JPWO2018123118A1 (ja) | 2019-10-31 |
JP6810899B2 true JP6810899B2 (ja) | 2021-01-13 |
Family
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Family Applications (1)
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JP2018558796A Active JP6810899B2 (ja) | 2016-12-27 | 2017-07-13 | 共振装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US11509283B2 (ja) |
JP (1) | JP6810899B2 (ja) |
CN (1) | CN110089028B (ja) |
WO (1) | WO2018123118A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020212878A1 (en) * | 2019-04-18 | 2020-10-22 | King Abdullah University Of Science And Technology | Wide range highly sensitive pressure sensor based on heated micromachined arch beam |
WO2023112380A1 (ja) * | 2021-12-15 | 2023-06-22 | 株式会社村田製作所 | 共振子及び共振装置 |
Family Cites Families (22)
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US5929438A (en) * | 1994-08-12 | 1999-07-27 | Nikon Corporation | Cantilever and measuring apparatus using it |
RU2122278C1 (ru) * | 1997-07-09 | 1998-11-20 | Открытое акционерное общество "МОРИОН" | Термостатированный кварцевый генератор и способ настройки его терморегулятора |
US6936491B2 (en) * | 2003-06-04 | 2005-08-30 | Robert Bosch Gmbh | Method of fabricating microelectromechanical systems and devices having trench isolated contacts |
US7068125B2 (en) * | 2004-03-04 | 2006-06-27 | Robert Bosch Gmbh | Temperature controlled MEMS resonator and method for controlling resonator frequency |
US7102467B2 (en) * | 2004-04-28 | 2006-09-05 | Robert Bosch Gmbh | Method for adjusting the frequency of a MEMS resonator |
US7663295B2 (en) * | 2005-12-15 | 2010-02-16 | Imec | Method and system for measuring physical parameters with a piezoelectric bimorph cantilever in a gaseous or liquid environment |
US7868403B1 (en) * | 2007-03-01 | 2011-01-11 | Rf Micro Devices, Inc. | Integrated MEMS resonator device |
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US8476809B2 (en) * | 2008-04-29 | 2013-07-02 | Sand 9, Inc. | Microelectromechanical systems (MEMS) resonators and related apparatus and methods |
EP2339748B1 (en) * | 2009-09-28 | 2018-12-19 | Nxp B.V. | Resonator |
JP2013512635A (ja) * | 2009-11-30 | 2013-04-11 | アイメック | 集積電気部品用2重センサ温度安定化 |
US20110175492A1 (en) * | 2010-01-21 | 2011-07-21 | Imec | Temperature Compensation Device and Method for MEMS Resonator |
US20110210801A1 (en) * | 2010-02-26 | 2011-09-01 | Imec | Temperature measurement system comprising a resonant mems device |
US8232845B2 (en) * | 2010-09-27 | 2012-07-31 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Packaged device with acoustic resonator and electronic circuitry and method of making the same |
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JP2013051673A (ja) * | 2011-07-29 | 2013-03-14 | Nippon Dempa Kogyo Co Ltd | 水晶振動子及び水晶発振器 |
US9154103B2 (en) * | 2012-01-30 | 2015-10-06 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Temperature controlled acoustic resonator |
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JP2015173315A (ja) * | 2014-03-11 | 2015-10-01 | 日本電波工業株式会社 | 恒温槽付発振器の温度制御回路及び恒温槽付発振器 |
JP6562320B2 (ja) * | 2015-10-20 | 2019-08-21 | 株式会社村田製作所 | 水晶振動子及びその温度制御方法、並びに水晶発振器 |
US10069500B2 (en) * | 2016-07-14 | 2018-09-04 | Murata Manufacturing Co., Ltd. | Oven controlled MEMS oscillator |
US10425084B2 (en) * | 2017-10-03 | 2019-09-24 | Murata Manufacturing Co., Ltd. | Oven controlled MEMS oscillator and system and method for calibrating the same |
-
2017
- 2017-07-13 CN CN201780078842.0A patent/CN110089028B/zh active Active
- 2017-07-13 JP JP2018558796A patent/JP6810899B2/ja active Active
- 2017-07-13 WO PCT/JP2017/025603 patent/WO2018123118A1/ja active Application Filing
-
2019
- 2019-06-10 US US16/435,729 patent/US11509283B2/en active Active
Also Published As
Publication number | Publication date |
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CN110089028A (zh) | 2019-08-02 |
US11509283B2 (en) | 2022-11-22 |
WO2018123118A1 (ja) | 2018-07-05 |
CN110089028B (zh) | 2023-01-17 |
US20190296712A1 (en) | 2019-09-26 |
JPWO2018123118A1 (ja) | 2019-10-31 |
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