JP6806565B2 - 投影露光系の物体視野を照明する方法 - Google Patents

投影露光系の物体視野を照明する方法 Download PDF

Info

Publication number
JP6806565B2
JP6806565B2 JP2016553537A JP2016553537A JP6806565B2 JP 6806565 B2 JP6806565 B2 JP 6806565B2 JP 2016553537 A JP2016553537 A JP 2016553537A JP 2016553537 A JP2016553537 A JP 2016553537A JP 6806565 B2 JP6806565 B2 JP 6806565B2
Authority
JP
Japan
Prior art keywords
facet
mirror
illumination
individual mirrors
facets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016553537A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017509017A5 (OSRAM
JP2017509017A (ja
Inventor
マルティン エンドレス
マルティン エンドレス
ヨハネス アイゼンメンガー
ヨハネス アイゼンメンガー
シュティグ ビーリン
シュティグ ビーリン
マルクス ハウフ
マルクス ハウフ
ラース ヴィッシュマイヤー
ラース ヴィッシュマイヤー
ファビアン ハッカー
ファビアン ハッカー
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by カール・ツァイス・エスエムティー・ゲーエムベーハー filed Critical カール・ツァイス・エスエムティー・ゲーエムベーハー
Publication of JP2017509017A publication Critical patent/JP2017509017A/ja
Publication of JP2017509017A5 publication Critical patent/JP2017509017A5/ja
Application granted granted Critical
Publication of JP6806565B2 publication Critical patent/JP6806565B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2016553537A 2014-02-21 2015-02-17 投影露光系の物体視野を照明する方法 Active JP6806565B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014203188.5 2014-02-21
DE102014203188.5A DE102014203188A1 (de) 2014-02-21 2014-02-21 Verfahren zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage
PCT/EP2015/053285 WO2015124553A1 (de) 2014-02-21 2015-02-17 Verfahren zur beleuchtung eines objektfeldes einer projektionsbelichtungsanlage

Publications (3)

Publication Number Publication Date
JP2017509017A JP2017509017A (ja) 2017-03-30
JP2017509017A5 JP2017509017A5 (OSRAM) 2020-08-06
JP6806565B2 true JP6806565B2 (ja) 2021-01-06

Family

ID=52589351

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016553537A Active JP6806565B2 (ja) 2014-02-21 2015-02-17 投影露光系の物体視野を照明する方法

Country Status (5)

Country Link
US (1) US10409167B2 (OSRAM)
JP (1) JP6806565B2 (OSRAM)
KR (1) KR102401868B1 (OSRAM)
DE (1) DE102014203188A1 (OSRAM)
WO (1) WO2015124553A1 (OSRAM)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014203189A1 (de) * 2014-02-21 2015-08-27 Carl Zeiss Smt Gmbh Spiegel-Array
US10599040B2 (en) * 2017-08-18 2020-03-24 Asml Netherland B.V. Lithographic apparatus and associated method
CN114746810B (zh) * 2019-11-21 2025-09-12 Asml荷兰有限公司 用于确定光刻设备的控制数据的方法和设备
DE102020205123A1 (de) * 2020-04-23 2021-10-28 Carl Zeiss Smt Gmbh Facetten-Baugruppe für einen Facettenspiegel
DE102020210829A1 (de) * 2020-08-27 2022-03-03 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage
DE102022209908A1 (de) * 2022-09-21 2024-03-21 Carl Zeiss Smt Gmbh Facettenspiegel, Beleuchtungsoptik, Anordnung eines Facettenspiegels, Projektionsbelichtungsanlage und Verfahren zur Herstellung eines nanostrukturierten Bauelements
DE102022212277A1 (de) * 2022-11-18 2024-05-23 Carl Zeiss Smt Gmbh Baugruppe eines optischen Systems
DE102024205430A1 (de) 2024-06-13 2025-12-18 Carl Zeiss Smt Gmbh Optomechanisches System für die Projektionslithographie

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
SE0200547D0 (sv) * 2002-02-25 2002-02-25 Micronic Laser Systems Ab An image forming method and apparatus
US7145269B2 (en) 2004-03-10 2006-12-05 Asml Netherlands B.V. Lithographic apparatus, Lorentz actuator, and device manufacturing method
DE102006023652B4 (de) 2006-05-18 2008-10-30 Esa Patentverwertungsagentur Sachsen-Anhalt Gmbh Elektromotorische Einrichtung zur Betätigung von Gaswechselventilen
DE102008050446B4 (de) 2008-10-08 2011-07-28 Carl Zeiss SMT GmbH, 73447 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln
KR101769157B1 (ko) 2008-10-20 2017-08-17 칼 짜이스 에스엠테 게엠베하 방사선 빔 안내를 위한 광학 모듈
KR101258344B1 (ko) * 2008-10-31 2013-04-30 칼 짜이스 에스엠티 게엠베하 Ｅｕｖ 마이크로리소그래피용 조명 광학 기기
DE102010029765A1 (de) * 2010-06-08 2011-12-08 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie
DE102010040811A1 (de) * 2010-09-15 2012-03-15 Carl Zeiss Smt Gmbh Abbildende Optik
DE102011076145B4 (de) 2011-05-19 2013-04-11 Carl Zeiss Smt Gmbh Verfahren zum Zuordnen einer Pupillenfacette eines Pupillenfacettenspiegels einer Beleuchtungsoptik einer Projektionsbelichtungsanlage zu einer Feldfacette eines Feldfacettenspiegels der Beleuchtungsoptik
DE102012207377A1 (de) * 2012-05-03 2013-11-07 Carl Zeiss Smt Gmbh Beleuchtungsoptik sowie optisches System für die EUV-Projektionslithographie
DE102012207572A1 (de) * 2012-05-08 2013-05-08 Carl Zeiss Smt Gmbh Beleuchtungsoptik
DE102012213515A1 (de) 2012-08-01 2014-02-06 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage

Also Published As

Publication number Publication date
US10409167B2 (en) 2019-09-10
KR102401868B1 (ko) 2022-05-25
DE102014203188A1 (de) 2015-08-27
KR20160124857A (ko) 2016-10-28
WO2015124553A1 (de) 2015-08-27
JP2017509017A (ja) 2017-03-30
US20160342094A1 (en) 2016-11-24

Similar Documents

Publication Publication Date Title
JP6568865B2 (ja) ミラーアレイ
JP6806565B2 (ja) 投影露光系の物体視野を照明する方法
JP5487118B2 (ja) マイクロリソグラフィのための投影露光装置に使用するファセットミラー
JP5543516B2 (ja) Ｅｕｖリソグラフィ用照明システム及びこの種の照明システムに使用する第１及び第２の光学要素
JP6530603B2 (ja) 光学コンポーネント
US9791691B2 (en) Mirror array
KR101662330B1 (ko) 조명광학계, 조명 광학 장치, 노광 장치, 및 디바이스 제조 방법
JP6415564B2 (ja) 光学コンポーネント
JP6045003B2 (ja) Ｅｕｖマイクロリソグラフィ用の照明系
TWI610140B (zh) 用於投射曝光裝置的照射光學單元
JP2011519172A (ja) Ｅｕｖマイクロリソグラフィ用の照明光学系及びこの種の照明光学系を含む照明系並びに投影露光装置
JP2006216917A (ja) 照明光学系、露光装置およびデバイス製造方法
KR20110134418A (ko) 조명 시스템, 리소그래피 장치 및 조명 모드 형성 방법
TW202225854A (zh) 用於投射曝光設備的照明光學單元的光瞳分面反射鏡
CN111656245B (zh) 投射光刻的照明光学单元
JP6332758B2 (ja) Ｅｕｖ投影リソグラフィのための照明光学ユニット

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20161027

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20180216

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20190124

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20190122

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20190228

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20190521

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20190726

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20190726

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20190830

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20190830

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20191219

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20200317

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20200515

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200619

A524 Written submission of copy of amendment under article 19 pct

Free format text: JAPANESE INTERMEDIATE CODE: A524

Effective date: 20200619

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20201007

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20201106

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20201204

R150 Certificate of patent or registration of utility model

Ref document number: 6806565

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250