JP6689068B2 - 耐引掻特性を有する透明な多層系の堆積方法 - Google Patents
耐引掻特性を有する透明な多層系の堆積方法 Download PDFInfo
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- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 10
- 229910052725 zinc Inorganic materials 0.000 claims description 10
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- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 claims description 7
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- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 7
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- 239000010955 niobium Substances 0.000 claims description 5
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 5
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- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
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- 229910052736 halogen Inorganic materials 0.000 description 1
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- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
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- 230000003287 optical effect Effects 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
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- C23C16/403—Oxides of aluminium, magnesium or beryllium
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
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- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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Description
1. プラスチック基材およびその上にプラズマ支援化学蒸着によって堆積された耐引掻性層を含む、耐引掻特性を有する透明な多層系の製造方法であって、耐引掻性層の堆積のために、少なくとも1種の有機金属前駆体が入口(15)を通じて、かつ少なくとも1種の第一の反応性ガスが入口(17)を通じて真空チャンバ(11)中に入れられ、プラズマ(16)がパルス駆動されたスパッタマグネトロン(14)によって発生される前記製造方法において、前記多層系において、更に1つのスパッタ層が、マグネトロンスパッタによって第二の反応性ガスの存在下で堆積され、その際、前記スパッタ層が、化学元素の亜鉛、スズ、チタン、ニオブ、ジルコニウムの少なくとも1つを、少なくとも30%の質量割合で有することを特徴とする前記製造方法。
2. 前記スパッタ層は、前記プラスチック基材と前記耐引掻性層との間に堆積されることを特徴とする、1に記載の方法。
3. 前記スパッタ層は、前記耐引掻性層の後にはじめて堆積されることを特徴とする、1に記載の方法。
4. 第二の反応性ガスとして、元素の酸素および/または窒素の少なくとも1つを有するガスが使用されることを特徴とする、1に記載の方法。
5. 前記スパッタ層のマグネトロンスパッタのために、固有伝導性の酸化亜鉛ターゲットが使用されることを特徴とする、1に記載の方法。
6. 前記多層系において、紫外線反射性の層系が堆積されることを特徴とする、1に記載の方法。
7. 前記紫外線反射性の層系の個々の層は、元素のケイ素、タンタル、チタンの少なくとも1つの酸化物として堆積されることを特徴とする、6に記載の方法。
8. 前記マグネトロンスパッタが、パルス駆動され、そして遷移モードで実施されることを特徴とする、1に記載の方法。
9. 前記耐引掻性層は、2μmから5μmの層厚で堆積されることを特徴とする、1に記載の方法。
10. 前記スパッタ層は、100nmから500nmの層厚で堆積されることを特徴とする、1に記載の方法。
11. 前記多層系の内側に、水または水蒸気に対するバリヤ作用を有する少なくとも1つの層が堆積されることを特徴とする、1に記載の方法。
Claims (11)
- プラスチック基材およびその上にプラズマ支援化学蒸着によって堆積された耐引掻性層を含む、耐引掻特性を有する透明な多層系の製造方法であって、耐引掻性層の堆積のために、少なくとも1種の有機金属前駆体が入口(15)を通じて、かつ少なくとも1種の第一の反応性ガスが入口(17)を通じて真空チャンバ(11)中に入れられ、プラズマ(16)がパルス駆動されたスパッタマグネトロン(14)によって発生される前記製造方法において、前記多層系において、更に1つのスパッタ層が、マグネトロンスパッタによって第二の反応性ガスの存在下で堆積され、その際、前記スパッタ層が、化学元素の亜鉛、スズ、チタン、ニオブ、ジルコニウムの少なくとも1つを、少なくとも30%の質量割合で有することを特徴とする前記製造方法。
- 前記スパッタ層は、前記プラスチック基材と前記耐引掻性層との間に堆積されることを特徴とする、請求項1に記載の方法。
- 前記スパッタ層は、前記耐引掻性層の後にはじめて堆積されることを特徴とする、請求項1に記載の方法。
- 第二の反応性ガスとして、元素の酸素および/または窒素の少なくとも1つを有するガスが使用されることを特徴とする、請求項1に記載の方法。
- 前記スパッタ層のマグネトロンスパッタのために、固有伝導性の酸化亜鉛ターゲットが使用されることを特徴とする、請求項1に記載の方法。
- 前記多層系において、紫外線反射性の層系が堆積されることを特徴とする、請求項1に記載の方法。
- 前記紫外線反射性の層系の個々の層は、元素のケイ素、タンタル、チタンの少なくとも1つの酸化物として堆積されることを特徴とする、請求項6に記載の方法。
- 前記マグネトロンスパッタが、パルス駆動され、そして遷移モードで実施されることを特徴とする、請求項1に記載の方法。
- 前記耐引掻性層は、2μmから5μmの層厚で堆積されることを特徴とする、請求項1に記載の方法。
- 前記スパッタ層は、100nmから500nmの層厚で堆積されることを特徴とする、請求項1に記載の方法。
- 前記多層系の内側に、水または水蒸気に対するバリヤ作用を有する少なくとも1つの層が堆積されることを特徴とする、請求項1に記載の方法。
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---|---|---|---|---|
US4783374A (en) | 1987-11-16 | 1988-11-08 | Ovonic Synthetic Materials Company | Coated article and method of manufacturing the article |
FR2731370B1 (fr) * | 1995-03-07 | 1997-06-06 | Cie Generale D Optique Essilor | Procede pour le depot assiste par plasma d'au moins une couche mince sur un substrat a deux faces, et reacteur correspondant |
US6110544A (en) * | 1997-06-26 | 2000-08-29 | General Electric Company | Protective coating by high rate arc plasma deposition |
JP4076265B2 (ja) * | 1998-03-31 | 2008-04-16 | 三井金属鉱業株式会社 | 酸化亜鉛焼結体スパッタリングターゲットおよびその製造方法 |
US6186090B1 (en) * | 1999-03-04 | 2001-02-13 | Energy Conversion Devices, Inc. | Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor |
DE19940312A1 (de) | 1999-08-25 | 2001-03-01 | Basf Ag | Verfahren zur Herstellung kratzfester Beschichtungen |
CN1957109A (zh) * | 2004-05-20 | 2007-05-02 | 陶氏环球技术公司 | 金属氧化物的等离子体增强化学气相沉积 |
DE102007019994A1 (de) * | 2007-04-27 | 2008-10-30 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Transparente Barrierefolie und Verfahren zum Herstellen derselben |
DE102008028537B4 (de) | 2008-06-16 | 2012-11-29 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Abscheiden einer Kratzschutzbeschichtung auf einem Kunststoffsubstrat |
DE102011116062A1 (de) | 2011-10-18 | 2013-04-18 | Sintertechnik Gmbh | Keramisches Erzeugnis zur Verwendung als Target |
JPWO2014061617A1 (ja) * | 2012-10-19 | 2016-09-05 | コニカミノルタ株式会社 | 改質方法 |
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JP2016113698A (ja) | 2016-06-23 |
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