JP6661164B2 - 微細な溝を形成した金型、及びその製造方法 - Google Patents
微細な溝を形成した金型、及びその製造方法 Download PDFInfo
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- JP6661164B2 JP6661164B2 JP2014246359A JP2014246359A JP6661164B2 JP 6661164 B2 JP6661164 B2 JP 6661164B2 JP 2014246359 A JP2014246359 A JP 2014246359A JP 2014246359 A JP2014246359 A JP 2014246359A JP 6661164 B2 JP6661164 B2 JP 6661164B2
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- Prior art keywords
- cutting
- molding die
- mold
- molding
- groove
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- 238000004519 manufacturing process Methods 0.000 title claims description 60
- 238000005520 cutting process Methods 0.000 claims description 108
- 238000000465 moulding Methods 0.000 claims description 86
- 238000000034 method Methods 0.000 claims description 35
- 238000007747 plating Methods 0.000 claims description 35
- 239000000758 substrate Substances 0.000 claims description 9
- 238000005323 electroforming Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 description 26
- 239000010408 film Substances 0.000 description 16
- 238000001746 injection moulding Methods 0.000 description 15
- 239000002184 metal Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 12
- 230000000694 effects Effects 0.000 description 10
- 238000005530 etching Methods 0.000 description 9
- 238000003754 machining Methods 0.000 description 9
- 238000001459 lithography Methods 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 230000003746 surface roughness Effects 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229910018104 Ni-P Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910018536 Ni—P Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000002082 metal nanoparticle Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910001315 Tool steel Inorganic materials 0.000 description 1
- -1 cemented carbide Substances 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 230000000994 depressogenic effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000010076 replication Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Priority Applications (1)
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---|---|---|---|
JP2014246359A JP6661164B2 (ja) | 2014-12-04 | 2014-12-04 | 微細な溝を形成した金型、及びその製造方法 |
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JP2014246359A JP6661164B2 (ja) | 2014-12-04 | 2014-12-04 | 微細な溝を形成した金型、及びその製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2016107484A JP2016107484A (ja) | 2016-06-20 |
JP2016107484A5 JP2016107484A5 (enrdf_load_stackoverflow) | 2018-03-08 |
JP6661164B2 true JP6661164B2 (ja) | 2020-03-11 |
Family
ID=56122825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2014246359A Active JP6661164B2 (ja) | 2014-12-04 | 2014-12-04 | 微細な溝を形成した金型、及びその製造方法 |
Country Status (1)
Country | Link |
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JP (1) | JP6661164B2 (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7083982B2 (ja) * | 2016-09-26 | 2022-06-14 | 国立大学法人東京農工大学 | 超短パルスレーザを用いた微細加工方法、導出装置、加工装置および加工物 |
JP7046693B2 (ja) * | 2018-04-18 | 2022-04-04 | 株式会社吉野工業所 | 撥液性合成樹脂製品の製造方法 |
JP2023003795A (ja) * | 2021-06-24 | 2023-01-17 | デクセリアルズ株式会社 | ロール製造方法、ロール製造装置、ロールおよび転写物 |
CN114749992B (zh) * | 2022-03-10 | 2023-06-06 | 清华大学 | 异形截面微织构槽的加工方法及系统 |
CN116372507B (zh) * | 2023-01-13 | 2025-08-15 | 华中科技大学 | 一种功能微结构光学元件的快速成形方法和系统 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200504384A (en) * | 2003-07-24 | 2005-02-01 | Zeon Corp | Molded article for anti-reflection and method for preparing the article |
JP4506307B2 (ja) * | 2004-06-30 | 2010-07-21 | 日本ゼオン株式会社 | グリッド偏光子の製造方法 |
JP2008307735A (ja) * | 2007-06-13 | 2008-12-25 | Towa Corp | 樹脂成形用金型 |
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2014
- 2014-12-04 JP JP2014246359A patent/JP6661164B2/ja active Active
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Publication number | Publication date |
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JP2016107484A (ja) | 2016-06-20 |
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